Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

NASA Astrophysics Data System (ADS)

Madey, Theodore E.; Faradzhev, Nadir S.; Yakshinskiy, Boris V.; Edwards, N. V.

2006-12-01

One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films ∼2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H2O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes.

Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic

NASA Astrophysics Data System (ADS)

Goldberg, Kenneth A.; Naulleau, Patrick P.; Bokor, Jeffrey; Chapman, Henry N.

2002-07-01

As the quality of optical systems for extreme ultraviolet lithography improves, high-accuracy wavefront metrology for alignment and qualification becomes ever more important. To enable the development of diffraction-limited EUV projection optics, visible-light and EUV interferometries must work in close collaboration. We present a detailed comparison of EUV and visible-light wavefront measurements performed across the field of view of a lithographic-quality EUV projection optical system designed for use in the Engineering Test Stand developed by the Virtual National Laboratory and the EUV Limited Liability Company. The comparisons reveal that the present level of RMS agreement lies in the 0.3-0.4-nm range. Astigmatism is the most significant aberration component for the alignment of this optical system; it is also the dominant term in the discrepancy, and the aberration with the highest measurement uncertainty. With EUV optical systems requiring total wavefront quality in the (lambda) EUV/50 range, and even higher surface-figure quality for the individual mirror elements, improved accuracy through future comparisons, and additional studies, are required.

Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory.

PubMed

Soufli, Regina; Baker, Sherry L; Windt, David L; Gullikson, Eric M; Robinson, Jeff C; Podgorski, William A; Golub, Leon

2007-06-01

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV) wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM). The AFM measurements revealed features in the topography of each substrate that are associated with specific polishing techniques. Theoretical predictions of the mirror performance based on the AFM-measured high-spatial-frequency roughness are in good agreement with EUV reflectance measurements of the mirrors after multilayer coating.

Monitoring of solar far ultraviolet radiation from the OSO-5 satellite

NASA Technical Reports Server (NTRS)

Rense, W. A.; Parker, R.

1972-01-01

A spectrophotometer for monitoring the solar EUV in three broad wavelength bands is described. The kind of data obtained, along with sources of error, are presented. The content of the tape library which contains the data is outlined. The scientific results are discussed. These include the following: solar flares in the EUV, solar eclipse observations in the EUV, SFD's and relationship to solar flares, and the application of satellite sunrise and sunset data for the study of model upper atmospheres for the earth.

Low density of neutral hydrogen and helium in the local interstellar medium: Extreme Ultraviolet Explorer photometry of the Lyman continuum of the hot white dwarfs MCT 0501-2858, MCT 0455-2812, HZ 43, and GD 153

NASA Technical Reports Server (NTRS)

Vennes, Stephane; Dupuis, Jean; Bowyer, Stuart; Fontaine, Gilles; Wiercigroch, Alexandria; Jelinsky, Patrick; Wesemael, Francois; Malina, Roger

1994-01-01

The first comprehensive sky survey of the extreme ultraviolet (EUV) spectral range performed by the Extreme Ultraviolet Explorer (EUVE) has uncovered a handful of very bright sources at wavelengths longer than the He I 504 A photoionization edge. Among these objects are four white dwarfs with exceptionally low interstellar medium (ISM) column densities along the line of sight. Analysis of EUV photometry of the He-rich DO white dwarf MCT 0501-2858 and the H-rich DA white dwarf MCT 0455-2812 along one line of sight and of the DA white dwarfs HZ 43 and GD 153 near the north Galactic pole indicates that the overall minimum column density of the neutral material centered on the Sun is N(H I) = 0.5-1.0 x 10(exp 18)/sq cm. In the case of MCT 0501-2858, EUV photometric measurements provide a clear constraint to the effective temperature (60,000-70,000 K). Given these neutral hydrogen columns, the actual contribution to the density of neutral species from the immediate solar environment (the 'local fluff') would only cover a distance of approximately equals 2-3 pc (assuming an average density n(H I) = 0.1/cu cm) leaving these lines of sight almost entirely within the hot phase of the ISM. A preliminary examination of the complete EUVE long-wavelength survey indicates that these lines of sight are exceptional and set a minimum column density in the solar environment.

Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

NASA Astrophysics Data System (ADS)

Li, W.; Urbanski, L.; Marconi, M. C.

2015-12-01

Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

Modeling of radiative properties of Sn plasmas for extreme-ultraviolet source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sasaki, Akira; Sunahara, Atsushi; Furukawa, Hiroyuki

Atomic processes in Sn plasmas are investigated for application to extreme-ultraviolet (EUV) light sources used in microlithography. We develop a full collisional radiative (CR) model of Sn plasmas based on calculated atomic data using Hebrew University Lawrence Livermore Atomic Code (HULLAC). Resonance and satellite lines from singly and multiply excited states of Sn ions, which contribute significantly to the EUV emission, are identified and included in the model through a systematic investigation of their effect on the emission spectra. The wavelengths of the 4d-4f+4p-4d transitions of Sn{sup 5+} to Sn{sup 13+} are investigated, because of their importance for determining themore » conversion efficiency of the EUV source, in conjunction with the effect of configuration interaction in the calculation of atomic structure. Calculated emission spectra are compared with those of charge exchange spectroscopy and of laser produced plasma EUV sources. The comparison is also carried out for the opacity of a radiatively heated Sn sample. A reasonable agreement is obtained between calculated and experimental EUV emission spectra observed under the typical condition of EUV sources with the ion density and ionization temperature of the plasma around 10{sup 18} cm{sup -3} and 20 eV, respectively, by applying a wavelength correction to the resonance and satellite lines. Finally, the spectral emissivity and opacity of Sn plasmas are calculated as a function of electron temperature and ion density. The results are useful for radiation hydrodynamics simulations for the optimization of EUV sources.« less

Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory

DOE Office of Scientific and Technical Information (OSTI.GOV)

Soufli, Regina; Baker, Sherry L.; Windt, David L.

2007-06-01

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV)wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM). The AFM measurements revealed features in the topography of each substrate that are associated with specific polishing techniques. Theoretical predictions of the mirror performance based on the AFM-measured high-spatial-frequency roughness are in good agreement withmore » EUV reflectance measurements of the mirrors after multilayer coating.« less

SUMER: Solar Ultraviolet Measurements of Emitted Radiation

NASA Technical Reports Server (NTRS)

Wilhelm, K.; Axford, W. I.; Curdt, W.; Gabriel, A. H.; Grewing, M.; Huber, M. C. E.; Jordan, M. C. E.; Lemaire, P.; Marsch, E.; Poland, A. I.

1988-01-01

The SUMER (solar ultraviolet measurements of emitted radiation) experiment is described. It will study flows, turbulent motions, waves, temperatures and densities of the plasma in the upper atmosphere of the Sun. Structures and events associated with solar magnetic activity will be observed on various spatial and temporal scales. This will contribute to the understanding of coronal heating processes and the solar wind expansion. The instrument will take images of the Sun in EUV (extreme ultra violet) light with high resolution in space, wavelength and time. The spatial resolution and spectral resolving power of the instrument are described. Spectral shifts can be determined with subpixel accuracy. The wavelength range extends from 500 to 1600 angstroms. The integration time can be as short as one second. Line profiles, shifts and broadenings are studied. Ratios of temperature and density sensitive EUV emission lines are established.

Method for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, Glenn D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

Method for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

2000-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

Extreme ultraviolet reflectivity studies of gold on glass and metal substrates

NASA Technical Reports Server (NTRS)

Jelinsky, Sharon R.; Malina, Roger F.; Jelinsky, Patrick

1988-01-01

The paper reports measurements of the extreme ultraviolet reflectivity of gold from 44 to 920 A at grazing incidence. Gold was deposited using vacuum evaporation and electroplating on substrates of glass and polished nickel, respectively. Measurements are also presented of the extreme ultraviolet reflectivity of electroless nickel in the same wavelength region, where one of the polished nickel substrates was used as a sample. Derived optical constants for evaporated and electroplated gold and electroless nickel are presented. Additional studies of the effects of various contaminants on the EUV reflectivity are also reported. The variations of the optical constants are discussed in terms of density variations, surface roughness and contamination effects. These results ae reported as part of studies for the Extreme Ultraviolet Explorer satellite program to determine acceptance criteria for the EUV optics, contamination budgets and calibration plans.

Photoresist composition for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model

PubMed Central

Su, M. G.; Min, Q.; Cao, S. Q.; Sun, D. X.; Hayden, P.; O’Sullivan, G.; Dong, C. Z.

2017-01-01

One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been chosen for operation at a wavelength of 13.5 nm. For an investigation of EUV radiation of laser-produced tin plasmas, it is crucial to study the related atomic processes and their evolution so as to reliably predict the optimum plasma and experimental conditions. Here, we present a simplified radiation hydrodynamic model based on the fluid dynamic equations and the radiative transfer equation to rapidly investigate the evolution of radiation properties and dynamics in laser-produced tin plasmas. The self-absorption features of EUV spectra measured at an angle of 45° to the direction of plasma expansion have been successfully simulated and explained, and the evolution of some parameters, such as the plasma temperature, ion distribution and density, expansion size and velocity, have also been evaluated. Our results should be useful for further understanding of current research on extreme ultraviolet and soft X-ray source development for applications such as lithography, metrology and biological imaging. PMID:28332621

The extreme ultraviolet spectrograph: A radial groove grating, sounding rocket-borne, astronomical instrument

NASA Technical Reports Server (NTRS)

Wilkinson, Erik; Green, James C.; Cash, Webster

1993-01-01

The design, calibration, and sounding rocket flight performance of a novel spectrograph suitable for moderate-resolution EUV spectroscopy are presented. The sounding rocket-borne instrument uses a radial groove grating to maintain a high system efficiency while controlling the aberrations induced when doing spectroscopy in a converging beam. The instrument has a resolution of approximately 2 A across the 200-330 A bandpass with an average effective area of 2 sq cm. The instrument, called the Extreme Ultraviolet Spectrograph, acquired the first EUV spectra in this wavelength region of the hot white dwarf G191-B2B and the late-type star Capella.

The first Extreme Ultraviolet Explorer source catalog

NASA Technical Reports Server (NTRS)

Bowyer, S.; Lieu, R.; Lampton, M.; Lewis, J.; Wu, X.; Drake, J. J.; Malina, R. F.

1994-01-01

The Extreme Ultraviolet Explorer (EUVE) has conducted an all-sky survey to locate and identify point sources of emission in four extreme ultraviolet wavelength bands centered at approximately 100, 200, 400, and 600 A. A companion deep survey of a strip along half the ecliptic plane was simultaneously conducted. In this catalog we report the sources found in these surveys using rigorously defined criteria uniformly applied to the data set. These are the first surveys to be made in the three longer wavelength bands, and a substantial number of sources were detected in these bands. We present a number of statistical diagnostics of the surveys, including their source counts, their sensitivites, and their positional error distributions. We provide a separate list of those sources reported in the EUVE Bright Source List which did not meet our criteria for inclusion in our primary list. We also provide improved count rate and position estimates for a majority of these sources based on the improved methodology used in this paper. In total, this catalog lists a total of 410 point sources, of which 372 have plausible optical ultraviolet, or X-ray identifications, which are also listed.

EUV Cross-Calibration Strategies for the GOES-R SUVI

NASA Astrophysics Data System (ADS)

Darnel, Jonathan; Seaton, Daniel

2016-10-01

The challenges of maintaining calibration for solar EUV instrumentation is well-known. The lack of standard calibration sources and the fact that most solar EUV telescopes are incapable of utilizing bright astronomical EUV sources for calibration make knowledge of instrument performance quite difficult. In the recent past, calibration rocket underflights have helped establish a calibration baseline. The EVE instrument on SDO for a time provided well-calibrated, high spectral resolution solar spectra for a broad range of the EUV, but has suffered a loss of coverage at the shorter wavelengths. NOAA's Solar UltraViolet Imager (SUVI), a solar EUV imager with similarities to SDO/AIA, will provide solar imagery over nearly an entire solar cycle. In order to maintain the scientific value of the SUVI's dataset, novel approaches to calibration are necessary. Here we demonstrate a suite of methods to cross-calibrate SUVI against other solar EUV instruments through the use of proxy solar spectra.

Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

NASA Astrophysics Data System (ADS)

Sertsu, M. G.; Giglia, A.; Brose, S.; Park, D.; Wang, Z. S.; Mayer, J.; Juschkin, L.; Nicolosi, P.

2016-03-01

New multilayers of boron carbide/cerium dioxide (B4C/CeO2) combination on silicon (Si) substrate are manufactured to represent reflective-optics candidates for future lithography at 6.x nm wavelength. This is one of only a few attempts to make multilayers of this kind. Combination of several innovative experiments enables detailed study of optical properties, structural properties, and interface profiles of the multilayers in order to open up a room for further optimization of the manufacturing process. The interface profile is visualized by high-angle annular dark-field imaging which provides highly sensitive contrast to atomic number. Synchrotron based at-wavelength extreme ultraviolet (EUV) reflectance measurements near the boron (B) absorption edge allow derivation of optical parameters with high sensitivity to local atom interactions. X-ray reflectivity measurements at Cu-Kalpha (8 keV ) determine the period of multilayers with high in-depth resolution. By combining these measurements and choosing robust nonlinear curve fitting algorithms, accuracy of the results has been significantly improved. It also enables a comprehensive characterization of multilayers. Interface diffusion is determined to be a major cause for the low reflectivity performance. Optical constants of B4C and CeO2 layers are derived in EUV wavelengths. Besides, optical properties and asymmetric thicknesses of inter-diffusion layers (interlayers) in EUV wavelengths near the boron edge are determined. Finally, ideal reflectivity of the B4C/CeO2 combination is calculated by using optical constants derived from the proposed measurements in order to evaluate the potentiality of the design.

Detection of significant differences between absorption spectra of neutral helium and low temperature photoionized helium plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bartnik, A.; Wachulak, P.; Fiedorowicz, H.

2013-11-15

In this work, spectral investigations of photoionized He plasmas were performed. The photoionized plasmas were created by irradiation of helium stream, with intense pulses from laser-plasma extreme ultraviolet (EUV) source. The EUV source was based on a double-stream Xe/Ne gas-puff target irradiated with 10 ns/10 J Nd:YAG laser pulses. The most intense emission from the source spanned a relatively narrow spectral region below 20 nm, however, spectrally integrated intensity at longer wavelengths was also significant. The EUV radiation was focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulse. The long-wavelength part of the EUVmore » radiation was used for backlighting of the photoionized plasmas to obtain absorption spectra. Both emission and absorption spectra in the EUV range were investigated. Significant differences between absorption spectra acquired for neutral helium and low temperature photoionized plasmas were demonstrated for the first time. Strong increase of intensities and spectral widths of absorption lines, together with a red shift of the K-edge, was shown.« less

Extreme Ultraviolet Emission Spectrum of CO_2 Induced by Electron Impact at 200 eV

NASA Technical Reports Server (NTRS)

Kanik, I.; Ajello, J. M.; James, G. K.

1993-01-01

We present the extreme ultraviolet (EUV) emission spectrum of CO_2 induced by electronimpact at 200 eV. There are 36 spectral features which are identified with a resolution of 0.5 nmover the wavelength range of 40 to 125 nm. Absolute emission cross sections were obtained for eachof these features. The EUV emission spectrum induced by electron impact consist of atomicmultiplets of CI,II and OI,II,III as well as CO and CO^+ molecular band systems produced bydissociative excitation. The CI (119.4 nm) multiplet is the strongest feature of CI with a peak crosssection of 3.61 x 10^(-19) cm^2 at 200 eV. The strongest feature of OI in the EUV spectrum is theOI (99.0 nm) multiplet with a peak cross section of 3.59 x 10^(-19) cm^2 at 200 eV.

DUV or EUV: that is the question

NASA Astrophysics Data System (ADS)

Williamson, David M.

2000-11-01

Lord Rayleigh's well-known equations for resolution and depth of focus indicate that resolution is better improved by reducing the wavelength of light rather than by increasing the numerical aperture (NA) of the projection optics, particularly when NA is approaching its physical limit of 1.0 in air (or vacuum). Vector aerial image simulations of diffraction-limited Deep Ultraviolet (DUV) and Extreme Ultraviolet (EUV) lithographic systems verify this simple view, even though Rayleigh's constants in Microlithography are not constant because of a variety of image enhancement techniques that attempt to compensate for the shortcomings of the aerial image when it is pushed to the limit. The aerial image is not the whole story, however. The competition between DUV and EUV systems will be decided more by economic and technological factors such as risk, time and cost of development and cost of ownership. These in turn depend on cost, availability and quality of light sources, refracting materials, photoresists and reticles.

The EUV spectrophotometer on Atmosphere Explorer.

NASA Technical Reports Server (NTRS)

Hinteregger, H. E.; Bedo, D. E.; Manson, J. E.

1973-01-01

An extreme ultraviolet (EUV) spectrophotometer for measurements of solar radiation at wavelengths ranging from 140 to 1850 A will be included in the payload of each of the three Atmosphere-Explorer (AE) missions, AE-C, -D, and -E. The instrument consists of 24 grating monochromators, 12 of which can be telecommanded either to execute 128-step scans each covering a relatively small section of the total spectrophotometer wavelength range or to maintain fixed (command-selected) wavelength positions. The remaining 12 nonscan monochromators operate at permanently fixed wavelengths and view only a small fraction of the solar disk except for one viewing the whole sun in H Lyman alpha. Ten of the 12 scan-capable monochromators also view the entire solar disk since their primary function is to measure the total fluxes independent of the distribution of sources across the solar disk.

Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

DOEpatents

Montcalm, Claude; Stearns, Daniel G.; Vernon, Stephen P.

1999-01-01

A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

The Extreme Ultraviolet Explorer - Optics fabrication and performance

NASA Technical Reports Server (NTRS)

Green, J.; Finley, D.; Bowyer, S.; Malina, R. F.

1986-01-01

The fabrication methods, testing and evaluation techniques, and performance results are presented for the mirrors for the Extreme Ultraviolet Explorer (EUVE). The finest mirror produced to date has a measured half energy width of 8 arcsec at optical wavelengths. With a polished nickel surface, the telescope throughput was 35 percent at 44 A and 60 percent at 256 A. The surface roughness is 20 A rms.

Continued Analysis of EUVE Solar System Observations

NASA Technical Reports Server (NTRS)

Gladstone, G. Randall

2001-01-01

This is the final report for this project. We proposed to continue our work on extracting important results from the EUVE (Extreme UltraViolet Explorer) archive of lunar and jovian system observations. In particular, we planned to: (1) produce several monochromatic images of the Moon at the wavelengths of the brightest solar EUV emission lines; (2) search for evidence of soft X-ray emissions from the Moon and/or X-ray fluorescence at specific EUV wavelengths; (3) search for localized EUV and soft X-ray emissions associated with each of the Galilean satellites; (4) search for correlations between localized Io Plasma Torus (IPT) brightness and volcanic activity on Io; (5) search for soft X-ray emissions from Jupiter; and (6) determine the long term variability of He 58.4 nm emissions from Jupiter, and relate these to solar variability. However, the ADP review panel suggested that the work concentrate on the Jupiter/IPT observations, and provided half the requested funding. Thus we have performed no work on the first two tasks, and instead concentrated on the last three. In addition we used funds from this project to support reduction and analysis of EUVE observations of Venus. While this was not part of the original statement of work, it is entirely in keeping with extracting important results from EUVE solar system observations.

Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fernández-Perea, Mónica; Soufli, Regina; Robinson, Jeff C.

2012-01-01

We have developed new, corrosion-resistant Mg/SiC multilayer coatings which can be used to efficiently and simultaneously reflect extreme ultraviolet (EUV) radiation in single or multiple narrow bands centered at wavelengths in the spectral region from 25 to 80 nm. Corrosion mitigation is achieved through the use of partially amorphous Al-Mg thin layers. Three different multilayer design concepts were developed and deposited by magnetron sputtering and the reflectance was measured at near-normal incidence in a broad spectral range. Unprotected Mg/SiC multilayers were also deposited and measured for comparison. They were shown to efficiently reflect radiation at a wavelength of 76.9 nmmore » with a peak reflectance of 40.6% at near-normal incidence, the highest experimental reflectance reported at this wavelength for a narrowband coating. The demonstration of multilayer coatings with corrosion resistance and multiplewavelength EUV performance is of great interest in the development of mirrors for space-borne solar physics telescopes and other applications requiring long-lasting coatings with narrowband response in multiple emission lines across the EUV range.« less

A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

DOE PAGES

Zastrau, U.; Rodel, C.; Nakatsutsumi, M.; ...

2018-02-05

We present an extreme ultraviolet (EUV) microscope using a Schwarzschild objective which is optimized for single-shot sub-micrometer imaging of laser-plasma targets. The microscope has been designed and constructed for imaging the scattering from an EUV-heated solid-density hydrogen jet. Here, imaging of a cryogenic hydrogen target was demonstrated using single pulses of the free-electron laser in Hamburg (FLASH) free-electron laser at a wavelength of 13.5 nm. In a single exposure, we observe a hydrogen jet with ice fragments with a spatial resolution in the sub-micrometer range. In situ EUV imaging is expected to enable novel experimental capabilities for warm dense mattermore » studies of micrometer-sized samples in laser-plasma experiments.« less

A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zastrau, U.; Rodel, C.; Nakatsutsumi, M.

We present an extreme ultraviolet (EUV) microscope using a Schwarzschild objective which is optimized for single-shot sub-micrometer imaging of laser-plasma targets. The microscope has been designed and constructed for imaging the scattering from an EUV-heated solid-density hydrogen jet. Here, imaging of a cryogenic hydrogen target was demonstrated using single pulses of the free-electron laser in Hamburg (FLASH) free-electron laser at a wavelength of 13.5 nm. In a single exposure, we observe a hydrogen jet with ice fragments with a spatial resolution in the sub-micrometer range. In situ EUV imaging is expected to enable novel experimental capabilities for warm dense mattermore » studies of micrometer-sized samples in laser-plasma experiments.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Vilkas, M J; Ishikawa, Y; Trabert, E

Many-Body Perturbation Theory (MBPT) has been employed to calculate with high wavelength accuracy the extreme ultraviolet (EUV) spectra of F-like to P-like Xe ions. They discuss the reliability of the new calculations using the example of EUV beam-foil spectra of Xe, in which n = 3, {Delta}n = 0 transitions of Na-, Mg-, Al-like, and Si-like ions have been found to dominate. A further comparison is made with spectra from an electron beam ion trap, that is, from a device with a very different (low density) excitation balance.

Extreme ultraviolet performance of a multilayer coated high density toroidal grating

NASA Technical Reports Server (NTRS)

Thomas, Roger J.; Keski-Kuha, Ritva A. M.; Neupert, Werner M.; Condor, Charles E.; Gum, Jeffrey S.

1991-01-01

The performance of a multilayer coated diffraction grating has been evaluated at EUV wavelengths both in terms of absolute efficiency and spectral resolution. The application of ten-layer Ir/Si multilayer coating to a 3600-lines/mm blazed toroidal replica grating produced a factor of 9 enhancement in peak efficiency near the design wavelength of about 30 nm in first order, without degrading its excellent quasistigmatic spectral resolution. The measured EUV efficiency peaked at 3.3 percent and was improved over the full spectral range between 25 and 35 nm compared with the premultilayer replica which had a standard gold coating. In addition, the grating's spectral resolution of greater than 5000 was maintained.

Optical design of a stigmatic spectroheliometer for photometric studies of dynamic phenomena at extreme-ultraviolet wavelengths

NASA Technical Reports Server (NTRS)

Huber, M. C. E.; Timothy, J. G.

1977-01-01

The design of a stigmatic spectroheliometer for photometric studies of dynamic phenomena in the solar atmosphere at extreme ultraviolet (EUV) wavelengths is described. The normal-incidence spectrometer requires only one reflective surface, and is equipped with a series of exit slits and associated one-dimensional detector arrays that are mounted at the secondary (vertical) foci of the concave diffraction grating. It is shown that such a spectrometer mounted at the focus of an off-axis paraboloid telescope mirror of the size employed in the EUV spectroheliometer flown on Skylab could record monochromatic images of a 2 x 2 (arcmin) sq field-of-view with a spatial resolution element of 1 x 1 (arcsec) sq in a time of 4 s, 24 s, or 4 min, depending on whether the region studied is flaring, active, or quiet. The resulting spectroheliograms would have an average photometric precision of 10% and a spectral purity of 0.1 A.

Nanoplasmonic generation of ultrashort EUV pulses

NASA Astrophysics Data System (ADS)

Choi, Joonhee; Lee, Dong-Hyub; Han, Seunghwoi; Park, In-Yong; Kim, Seungchul; Kim, Seung-Woo

2012-10-01

Ultrashort extreme-ultraviolet (EUV) light pulses are an important tool for time-resolved pump-probe spectroscopy to investigate the ultrafast dynamics of electrons in atoms and molecules. Among several methods available to generate ultrashort EUV light pulses, the nonlinear frequency upconversion process of high-harmonic generation (HHG) draws attention as it is capable of producing coherent EUV pulses with precise control of burst timing with respect to the driving near-infrared (NIR) femtosecond laser. In this report, we present and discuss our recent experimental data obtained by the plasmon-driven HHG method that generate EUV radiation by means of plasmonic nano-focusing of NIR femtosecond pulses. For experiment, metallic waveguides having a tapered hole of funnel shape inside were fabricated by adopting the focused-ion-beam process on a micro-cantilever substrate. The plasmonic field formed within the funnelwaveguides being coupled with the incident femtosecond pulse permitted intensity enhancement by a factor of ~350, which creates a hot spot of sub-wavelength size with intensities strong enough for HHG. Experimental results showed that with injection of noble gases into the funnel-waveguides, EUV radiation is generated up to wavelengths of 32 nm and 29.6 nm from Ar and Ne gas atoms, respectively. Further, it was observed that lower-order EUV harmonics are cut off in the HHG spectra by the tiny exit aperture of the funnel-waveguide.

The evaluation of a deformable diffraction grating for a stigmatic EUV spectroheliometer

NASA Technical Reports Server (NTRS)

Timothy, J. G.

1987-01-01

A high-efficiency, extreme ultraviolet (EUV) imaging spectrometer is constructed and tested. The spectrometer employs a concave toroidal grating illuminated at normal incidence in a Rowland circle mounting and has only one reflecting surface. The toroidal grating has been fabricated by a new technique employing an elastically-deformable sub-master grating replicated in a spherical form and then mechanically distorted to produce the desired aspect ratio of the toroidal surface for stigmatic imaging over the selected wavelength range. The fixed toroidal grating used in the spectrometer is then replicated from this surface. Photographic tests and initial photoelectric tests with a two-dimensional, pulse-counting detector system verify the image quality of the toroidal grating at wavelengths near 600 A. The results of these tests and the basic designs of two instruments which could employ the imaging spectrometer for astrophysical investigations in space are described; i.e., a high-resolution EUV spectroheliometer for studies of the solar chromosphere, transition region, and corona; and an EUV spectroscopic telescope for studies of non-solar objects.

Extreme ultraviolet spectroscopy of low pressure helium microwave driven discharges

NASA Astrophysics Data System (ADS)

Espinho, Susana; Felizardo, Edgar; Tatarova, Elena; Alves, Luis Lemos

2016-09-01

Surface wave driven discharges are reliable plasma sources that can produce high levels of vacuum and extreme ultraviolet radiation (VUV and EUV). The richness of the emission spectrum makes this type of discharge a possible alternative source in EUV/VUV radiation assisted applications. However, due to challenging experimental requirements, publications concerning EUV radiation emitted by microwave plasmas are scarce and a deeper understanding of the main mechanisms governing the emission of radiation in this spectral range is required. To this end, the EUV radiation emitted by helium microwave driven plasmas operating at 2.45 GHz has been studied for low pressure conditions. Spectral lines from excited helium atoms and ions were detected via emission spectroscopy in the EUV/VUV regions. Novel data concerning the spectral lines observed in the 23 - 33 nm wavelength range and their intensity behaviour with variation of the discharge operational conditions are presented. The intensity of all the spectral emissions strongly increases with the microwave power delivered to the plasma up to 400 W. Furthermore, the intensity of all the ion spectral emissions in the EUV range decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar. Work funded by FCT - Fundacao para a Ciencia e a Tecnologia, under Project UID/FIS/50010/2013 and grant SFRH/BD/52412/2013 (PD-F APPLAuSE).

Recent solar extreme ultraviolet irradiance observations and modeling: A review

NASA Technical Reports Server (NTRS)

Tobiska, W. Kent

1993-01-01

For more than 90 years, solar extreme ultraviolet (EUV) irradiance modeling has progressed from empirical blackbody radiation formulations, through fudge factors, to typically measured irradiances and reference spectra was well as time-dependent empirical models representing continua and line emissions. A summary of recent EUV measurements by five rockets and three satellites during the 1980s is presented along with the major modeling efforts. The most significant reference spectra are reviewed and threee independently derived empirical models are described. These include Hinteregger's 1981 SERF1, Nusinov's 1984 two-component, and Tobiska's 1990/1991/SERF2/EUV91 flux models. They each provide daily full-disk broad spectrum flux values from 2 to 105 nm at 1 AU. All the models depend to one degree or another on the long time series of the Atmosphere Explorer E (AE-E) EUV database. Each model uses ground- and/or space-based proxies to create emissions from solar atmospheric regions. Future challenges in EUV modeling are summarized including the basic requirements of models, the task of incorporating new observations and theory into the models, the task of comparing models with solar-terrestrial data sets, and long-term goals and modeling objectives. By the late 1990s, empirical models will potentially be improved through the use of proposed solar EUV irradiance measurements and images at selected wavelengths that will greatly enhance modeling and predictive capabilities.

Characterization of gas targets for laser produced extreme ultraviolet plasmas with a Hartmann-Shack sensor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Peth, Christian; Kranzusch, Sebastian; Mann, Klaus

2004-10-01

A table top extreme ultraviolet (EUV)-source was developed at Laser-Laboratorium Goettingen for the characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. EUV radiation is generated by focusing the beam of a Q-switched Nd:YAG laser into a pulsed xenon gas jet. Since a directed gas jet with a high number density is needed for an optimal performance of the source, conical nozzles with different cone angles were drilled with an excimer laser to produce a supersonic gas jet. The influence of the nozzle geometry on the gas jet was characterized with a Hartmann-Shackmore » wave front sensor. The deformation of a planar wave front after passing the gas jet was analyzed with this sensor, allowing a reconstruction of the gas density distribution. Thus, the gas jet was optimized resulting in an increase of EUV emission by a factor of two and a decrease of the plasma size at the same time.« less

Extreme ultraviolet interferometry of warm dense matter in laser plasmas.

PubMed

Gartside, L M R; Tallents, G J; Rossall, A K; Wagenaars, E; Whittaker, D S; Kozlová, M; Nejdl, J; Sawicka, M; Polan, J; Kalal, M; Rus, B

2010-11-15

We demonstrate that interferometric probing with extreme ultraviolet (EUV) laser light enables determination of the degree of ionization of the "warm dense matter" produced between the critical and ablation surfaces of laser plasmas. Interferometry has been utilized to measure both transmission and phase information for an EUV laser beam at the photon energy of 58.5 eV, probing longitudinally through laser-irradiated plastic (parylene-N) targets (thickness 350 nm) irradiated by a 300 ps duration pulse of wavelength 438 nm and peak irradiance 10(12) W cm(-2). The transmission of the EUV probe beam provides a measure of the rate of target ablation, as ablated plasma becomes close to transparent when the photon energy is less than the ionization energy of the predominant ion species. We show that refractive indices η below the solid parylene N (η(solid) = 0.946) and expected plasma values are produced in the warm dense plasma created by laser irradiation due to bound-free absorption in C(+).

Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shahzad, M.; Culfa, O.; Rossall, A. K.

2015-02-15

We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV).more » A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.« less

Probing the Production of Extreme-ultraviolet Late-phase Solar Flares Using the Model Enthalpy-based Thermal Evolution of Loops

NASA Astrophysics Data System (ADS)

Dai, Yu; Ding, Mingde

2018-04-01

Recent observations in extreme-ultraviolet (EUV) wavelengths reveal an EUV late phase in some solar flares that is characterized by a second peak in warm coronal emissions (∼3 MK) several tens of minutes to a few hours after the soft X-ray (SXR) peak. Using the model enthalpy-based thermal evolution of loops (EBTEL), we numerically probe the production of EUV late-phase solar flares. Starting from two main mechanisms of producing the EUV late phase, i.e., long-lasting cooling and secondary heating, we carry out two groups of numerical experiments to study the effects of these two processes on the emission characteristics in late-phase loops. In either of the two processes an EUV late-phase solar flare that conforms to the observational criteria can be numerically synthesized. However, the underlying hydrodynamic and thermodynamic evolutions in late-phase loops are different between the two synthetic flare cases. The late-phase peak due to a long-lasting cooling process always occurs during the radiative cooling phase, while that powered by a secondary heating is more likely to take place in the conductive cooling phase. We then propose a new method for diagnosing the two mechanisms based on the shape of EUV late-phase light curves. Moreover, from the partition of energy input, we discuss why most solar flares are not EUV late flares. Finally, by addressing some other factors that may potentially affect the loop emissions, we also discuss why the EUV late phase is mainly observed in warm coronal emissions.

The Extreme Ultraviolet Spectrograph Sounding Rocket Payload: Recent Modifications for Planetary Observations in the EUV/FUV

NASA Technical Reports Server (NTRS)

Slater, David C.; Stern, S. Alan; Scherrer, John; Cash, Webster; Green, James C.; Wilkinson, Erik

1995-01-01

We report on the status of modifications to an existing extreme ultraviolet (EUV) telescope/spectrograph sounding rocket payload for planetary observations in the 800 - 1200 A wavelength band. The instrument is composed of an existing Wolter Type 2 grazing incidence telescope, a newly built 0.4-m normal incidence Rowland Circle spectrograph, and an open-structure resistive-anode microchannel plate detector. The modified payload has successfully completed three NASA sounding rocket flights within 1994-1995. Future flights are anticipated for additional studies of planetary and cometary atmospheres and interstellar absorption. A detailed description of the payload, along with the performance characteristics of the integrated instrument are presented. In addition, some preliminary flight results from the above three missions are also presented.

Expected scientific performance of the three spectrometers on the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Vallerga, J. V.; Jelinsky, P.; Vedder, P. W.; Malina, R. F.

1990-01-01

The expected in-orbit performance of the three spectrometers included on the Extreme Ultraviolet Explorer astronomical satellite is presented. Recent calibrations of the gratings, mirrors and detectors using monochromatic and continuum EUV light sources allow the calculation of the spectral resolution and throughput of the instrument. An effective area range of 0.2 to 2.8 sq cm is achieved over the wavelength range 70-600 A with a peak spectral resolution (FWHM) of 360 assuming a spacecraft pointing knowledge of 10 arc seconds (FWHM). For a 40,000 sec observation, the average 3 sigma sensitivity to a monochromatic line source is 0.003 photons/sq cm s. Simulated observations of known classes of EUV sources, such as hot white dwarfs, and cataclysmic variables are also presented.

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-07-01

In extreme ultraviolet (EUV) lithography, development of review tools for EUV mask pattern and phase defect at working wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern (50 - 70 nm thick) and Mo/Si multilayer (280 nm thick) on a glass substrate. This mask pattern seems three-dimensional (3D) structure. This 3D structure would modulate EUV reflection phase, which would cause focus and pattern shifts. Thus, EUV phase imaging is important to evaluate this phase modulation. We have developed coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. EUV phase and intensity image are reconstructed with diffraction images by ptychography with coherent EUV illumination. The high-harmonic-generation (HHG) EUV source was employed for standalone CSM system. In this study, we updated HHG system of pump-laser reduction and gas-pressure control. Two types of EUV mask absorber patterns were observed. An 88-nm lines-and-spaces and a cross-line patterns were clearly reconstructed by ptychography. In addition, a natural defect with 2-μm diameter on the cross-line was well reconstructed. This demonstrated the high capability of the standalone CSM, which system will be used in the factories, such as mask shops and semiconductor fabrication plants.

The novel top-coat material for RLS trade-off reduction in EUVL

NASA Astrophysics Data System (ADS)

Onishi, Ryuji; Sakamoto, Rikimaru; Fujitani, Noriaki; Endo, Takafumi; Ho, Bang-ching

2012-03-01

For the next generation lithography (NGL), several technologies have been proposed to achieve the 22nm-node devices and beyond. Extreme ultraviolet (EUV) lithography is one of the candidates for the next generation lithography. In EUV light source development, low power is one of the critical issue because of the low throughput, and another issue is Out of Band (OoB) light existing in EUV light. OoB is concerned to be the cause of deterioration for the lithography performance. In order to avoid this critical issue, we focused on development of the resist top coat material with OoB absorption property as Out of Band Protection Layer (OBPL). We designed this material having high absorbance around 240nm wavelength and high transmittance for EUV light. And this material aimed to improve sensitivity, resolution and LWR performance.

Efficient extreme-UV-to-extreme-UV conversion by four-wave mixing with intense near-IR pulses in highly charged ion plasmas

NASA Astrophysics Data System (ADS)

Chu, Hsu-hsin; Wang, Jyhpyng

2018-05-01

Nonlinear optics in the extreme-ultraviolet (EUV) has been limited by lack of transparent media and small conversion efficiency. To overcome this problem we explore the advantage of using multiply charged ion plasmas as the interacting media between EUV and intense near-infrared (NIR) pulses. Such media are transparent to EUV and can withstand intense NIR driving pulses without damage. We calculate the third-order nonlinear polarizabilities of Ar2 + and Ar3 + ions for EUV and NIR four-wave mixing by using the well-proven Cowan code and find that the EUV-to-EUV conversion efficiency as high as 26% can be expected for practical experimental configurations using multi-terawatt NIR lasers. Such a high efficiency is possible because the driving pulse intensity can be scaled up to several orders of magnitude higher than in conventional nonlinear media, and the group-velocity and phase mismatch are insignificant at the experimental plasma densities. This effective scheme of wave mixing can be utilized for ultrafast EUV waveform measurement and control as well as wavelength conversion.

Solar Dynamics Observatory Lessons Learned

NASA Technical Reports Server (NTRS)

Rivera, Rachel; Uhl, Andrew; Secunda, Mark

2010-01-01

Mission is to study how solar activity is created and how space weather results from that activity. Atmospheric Imaging Assembly (AIA): High Resolution Images of 10 wavelengths every 10 seconds. Extreme Ultraviolet Variability Experiment (EVE): Measure Sun's brightness in EUV. Helioseismic and Magnetic Imager (HMI): Measures Doppler shift to study waves of the Sun. Launched February 11, 2010.

EUV and Magnetic Activities Associated with Type-I Solar Radio Bursts

NASA Astrophysics Data System (ADS)

Li, C. Y.; Chen, Y.; Wang, B.; Ruan, G. P.; Feng, S. W.; Du, G. H.; Kong, X. L.

2017-06-01

Type-I bursts ( i.e. noise storms) are the earliest-known type of solar radio emission at the meter wavelength. They are believed to be excited by non-thermal energetic electrons accelerated in the corona. The underlying dynamic process and exact emission mechanism still remain unresolved. Here, with a combined analysis of extreme ultraviolet (EUV), radio and photospheric magnetic field data of unprecedented quality recorded during a type-I storm on 30 July 2011, we identify a good correlation between the radio bursts and the co-spatial EUV and magnetic activities. The EUV activities manifest themselves as three major brightening stripes above a region adjacent to a compact sunspot, while the magnetic field there presents multiple moving magnetic features (MMFs) with persistent coalescence or cancelation and a morphologically similar three-part distribution. We find that the type-I intensities are correlated with those of the EUV emissions at various wavelengths with a correlation coefficient of 0.7 - 0.8. In addition, in the region between the brightening EUV stripes and the radio sources there appear consistent dynamic motions with a series of bi-directional flows, suggesting ongoing small-scale reconnection there. Mainly based on the induced connection between the magnetic motion at the photosphere and the EUV and radio activities in the corona, we suggest that the observed type-I noise storms and the EUV brightening activities are the consequence of small-scale magnetic reconnection driven by MMFs. This is in support of the original proposal made by Bentley et al. ( Solar Phys. 193, 227, 2000).

Compact advanced extreme-ultraviolet imaging spectrometer for spatiotemporally varying tungsten spectra from fusion plasmas.

PubMed

Song, Inwoo; Seon, C R; Hong, Joohwan; An, Y H; Barnsley, R; Guirlet, R; Choe, Wonho

2017-09-01

A compact advanced extreme-ultraviolet (EUV) spectrometer operating in the EUV wavelength range of a few nanometers to measure spatially resolved line emissions from tungsten (W) was developed for studying W transport in fusion plasmas. This system consists of two perpendicularly crossed slits-an entrance aperture and a space-resolved slit-inside a chamber operating as a pinhole, which enables the system to obtain a spatial distribution of line emissions. Moreover, a so-called v-shaped slit was devised to manage the aperture size for measuring the spatial resolution of the system caused by the finite width of the pinhole. A back-illuminated charge-coupled device was used as a detector with 2048 × 512 active pixels, each with dimensions of 13.5 × 13.5 μm 2 . After the alignment and installation on Korea superconducting tokamak advanced research, the preliminary results were obtained during the 2016 campaign. Several well-known carbon atomic lines in the 2-7 nm range originating from intrinsic carbon impurities were observed and used for wavelength calibration. Further, the time behavior of their spatial distributions is presented.

Quantitative Evaluation of Hard X-ray Damage to Biological Samples using EUV Ptychography

NASA Astrophysics Data System (ADS)

Baksh, Peter; Odstrcil, Michal; Parsons, Aaron; Bailey, Jo; Deinhardt, Katrin; Chad, John E.; Brocklesby, William S.; Frey, Jeremy G.

2017-06-01

Coherent diffractive imaging (CDI) has become a standard method on a variety of synchrotron beam lines. The high brilliance short wavelength radiation from these sources can be used to reconstruct attenuation and relative phase of a sample with nanometre resolution via CDI methods. However, the interaction between the sample and high energy ionising radiation can cause degradation to sample structure. We demonstrate, using a laboratory based high harmonic generation (HHG) based extreme ultraviolet (EUV) source, imaging a sample of hippocampal neurons using the ptychography method. The significant increase in contrast of the sample in the EUV light allows identification of damage induced from exposure to 7.3 keV photons, without causing any damage to the sample itself.

CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

NASA Astrophysics Data System (ADS)

Nowak, K. M.; Ohta, T.; Suganuma, T.; Fujimoto, J.; Mizoguchi, H.; Sumitani, A.; Endo, A.

2013-12-01

It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Naulleau, Patrick; Mochi, Iacopo; Goldberg, Kenneth A.

Defect free masks remain one of the most significant challenges facing the commercialization of extreme ultraviolet (EUV) lithography. Progress on this front requires high-performance wavelength-specific metrology of EUV masks, including high-resolution and aerial-image microscopy performed near the 13.5 nm wavelength. Arguably the most cost-effective and rapid path to proliferating this capability is through the development of Fresnel zoneplate-based microscopes. Given the relative obscurity of such systems, however, modeling tools are not necessarily optimized to deal with them and their imaging properties are poorly understood. Here we present a modeling methodology to analyze zoneplate microscopes based on commercially available optical modelingmore » software and use the technique to investigate the imaging performance of an off-axis EUV microscope design. The modeling predicts that superior performance can be achieved by tilting the zoneplate, making it perpendicular to the chief ray at the center of the field, while designing the zoneplate to explicitly work in that tilted plane. Although the examples presented here are in the realm of EUV mask inspection, the methods described and analysis results are broadly applicable to zoneplate microscopes in general, including full-field soft-x-ray microscopes rou tinely used in the synchrotron community.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Naulleau, Patrick P.; Mochi, Iacopo; Goldberg, Kenneth A.

Defect free masks remain one of the most significant challenges facing the commercialization of extreme ultraviolet (EUV) lithography. Progress on this front requires high-performance wavelength-specific metrology of EUV masks, including high-resolution and aerial-image microscopy performed near the 13.5 nm wavelength. Arguably the most cost-effective and rapid path to proliferating this capability is through the development of Fresnel zoneplate-based microscopes. Given the relative obscurity of such systems, however, modeling tools are not necessarily optimized to deal with them and their imaging properties are poorly understood. Here we present a modeling methodology to analyze zoneplate microscopes based on commercially available optical modelingmore » software and use the technique to investigate the imaging performance of an off-axis EUV microscope design. The modeling predicts that superior performance can be achieved by tilting the zoneplate, making it perpendicular to the chief ray at the center of the field, while designing the zoneplate to explicitly work in that tilted plane. Although the examples presented here are in the realm of EUV mask inspection, the methods described and analysis results are broadly applicable to zoneplate microscopes in general, including full-field soft-x-ray microscopes routinely used in the synchrotron community.« less

Up-down asymmetry measurement of tungsten distribution in large helical device using two extreme ultraviolet (EUV) spectrometers

DOE Office of Scientific and Technical Information (OSTI.GOV)

Liu, Y., E-mail: liu.yang@nifs.ac.jp; Zhang, H. M.; Morita, S.

Two space-resolved extreme ultraviolet spectrometers working in wavelength ranges of 10-130 Å and 30-500 Å have been utilized to observe the full vertical profile of tungsten line emissions by simultaneously measuring upper- and lower-half plasmas of LHD, respectively. The radial profile of local emissivity is reconstructed from the measured vertical profile in the overlapped wavelength range of 30-130 Å and the up-down asymmetry is examined against the local emissivity profiles of WXXVIII in the unresolved transition array spectrum. The result shows a nearly symmetric profile, suggesting a good availability in the present diagnostic method for the impurity asymmetry study.

Destruction of Sun-Grazing Comet C-2011 N3 (SOHO) Within the Low Solar Corona

NASA Technical Reports Server (NTRS)

Schrijver, C. J.; Brown, J. C.; Battams, K.; Saint-Hilaire, P.; Liu, W.; Hudson, H.; Pesnell, W. D.

2012-01-01

Observations of comets in Sun-grazing orbits that survive solar insolation long enough to penetrate into the Suns inner corona provide information on the solar atmosphere and magnetic field as well as on the makeup of the comet. On 6 July 2011, the Solar Dynamics Observatory (SDO) observed the demise of comet C2011 N3 (SOHO) within the low solar corona in five wavelength bands in the extreme ultraviolet (EUV). The comet penetrated to within 0.146 solarradius (100,000 kilometers) of the solar surface before its EUV signal disappeared.

Charge coupled devices vs. microchannel plates in the extreme and far ultraviolet - A comparison based on the latest laboratory measurements

NASA Technical Reports Server (NTRS)

Vallerga, J.; Lampton, M.

1988-01-01

While microchannel plates (MCPs) have been established as imaging photon counters in the EUV and FUV for some years, CCDs are associated with low light level sensing at visible and near-IR wavelengths. Attention is presently given to recent proposals for CCDs' use as EUV and FUV detectors with quantum efficiencies sometimes exceeding those of MCPs; quantum resolution, format size, dynamic range, and long-term stability are also used as bases of comparison, for the cases of both space-based astronomical and spectroscopic applications.

Normal incidence spectrophotometer using high density transmission grating technology and highly efficiency silicon photodiodes for absolute solar EUV irradiance measurements

NASA Technical Reports Server (NTRS)

Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Korde, R.

1992-01-01

New developments in transmission grating and photodiode technology now make it possible to realize spectrometers in the extreme ultraviolet (EUV) spectral region (wavelengths less than 1000 A) which are expected to be virtually constant in their diffraction and detector properties. Time dependent effects associated with reflection gratings are eliminated through the use of free standing transmission gratings. These gratings together with recently developed and highly stable EUV photodiodes have been utilized to construct a highly stable normal incidence spectrophotometer to monitor the variability and absolute intensity of the solar 304 A line. Owing to its low weight and compactness, such a spectrometer will be a valuable tool for providing absolute solar irradiance throughout the EUV. This novel instrument will also be useful for cross-calibrating other EUV flight instruments and will be flown on a series of Hitchhiker Shuttle Flights and on SOHO. A preliminary version of this instrument has been fabricated and characterized, and the results are described.

LASER APPLICATIONS AND OTHER TOPICS IN QUANTUM ELECTRONICS: Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits

NASA Astrophysics Data System (ADS)

Borisov, V. M.; Vinokhodov, A. Yu; Ivanov, A. S.; Kiryukhin, Yu B.; Mishchenko, V. A.; Prokof'ev, A. V.; Khristoforov, O. B.

2009-10-01

The development of high-power discharge sources emitting in the 13.5±0.135-nm spectral band is of current interest because they are promising for applications in industrial EUV (extreme ultraviolet) lithography for manufacturing integrated circuits according to technological precision standards of 22 nm and smaller. The parameters of EUV sources based on a laser-induced discharge in tin vapours between rotating disc electrodes are investigated. The properties of the discharge initiation by laser radiation at different wavelengths are established and the laser pulse parameters providing the maximum energy characteristics of the EUV source are determined. The EUV source developed in the study emits an average power of 276 W in the 13.5±0.135-nm spectral band on conversion to the solid angle 2π sr in the stationary regime at a pulse repetition rate of 3000 Hz.

Solar Imaging UV/EUV Spectrometers Using TVLS Gratings

NASA Technical Reports Server (NTRS)

Thomas, Roger J.

2003-01-01

It is a particular challenge to develop a stigmatic spectrograph for UV, EUV wavelengths since the very low normal-incidence reflectance of standard materials most often requires that the design be restricted to a single optical element which must simultaneously provide both reimaging and spectral dispersion. This problem has been solved in the past by the use of toroidal gratings with uniform line-spaced rulings (TULS). A number of solar extreme ultraviolet (EUV) spectrometers have been based on such designs, including SOHO/CDS, Solar-B/EIS, and the sounding rockets Solar Extreme ultraviolet Research Telescope and Spectrograph (SERTS) and Extreme Ultraviolet Normal Incidence Spectrograph (EUNIS). More recently, Kita, Harada, and collaborators have developed the theory of spherical gratings with varied line-space rulings (SVLS) operated at unity magnification, which have been flown on several astronomical satellite missions. We now combine these ideas into a spectrometer concept that puts varied-line space rulings onto toroidal gratings. Such TVLS designs are found to provide excellent imaging even at very large spectrograph magnifications and beam-speeds, permitting extremely high-quality performance in remarkably compact instrument packages. Optical characteristics of three new solar spectrometers based on this concept are described: SUMI and RAISE, two sounding rocket payloads, and NEXUS, currently being proposed as a Small-Explorer (SMEX) mission.

Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography

NASA Astrophysics Data System (ADS)

Wang, L.; Kirk, E.; Wäckerlin, C.; Schneider, C. W.; Hojeij, M.; Gobrecht, J.; Ekinci, Y.

2014-06-01

We present fabrication and characterization of high-resolution and nearly amorphous Mo1 - xNx transmission gratings and their use as masks for extreme ultraviolet (EUV) interference lithography. During sputter deposition of Mo, nitrogen is incorporated into the film by addition of N2 to the Ar sputter gas, leading to suppression of Mo grain growth and resulting in smooth and homogeneous thin films with a negligible grain size. The obtained Mo0.8N0.2 thin films, as determined by x-ray photoelectron spectroscopy, are characterized to be nearly amorphous using x-ray diffraction. We demonstrate a greatly reduced Mo0.8N0.2 grating line edge roughness compared with pure Mo grating structures after e-beam lithography and plasma dry etching. The amorphous Mo0.8N0.2 thin films retain, to a large extent, the benefits of Mo as a phase grating material for EUV wavelengths, providing great advantages for fabrication of highly efficient diffraction gratings with extremely low roughness. Using these grating masks, well-resolved dense lines down to 8 nm half-pitch are fabricated with EUV interference lithography.

Selected highlights from the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1995-01-01

We present a few scientific highlights from the Extreme Ultraviolet Explorer (EUVE) all-sky and deep surveys, from the EUVE Righ Angle Program, and from the EUVE Guest Observer Program. The First EUVE Source Catalog includes 410 extreme ultraviolet (EUV) sources detected in the initial processing of the EUVE all-sky data. A program of optical identification indicates that counterparts include cool star coronae, flare stars, hot white dwarfs, central stars of planetary nebulae, B star photospheres and winds, an X-ray binary, extragalactic objects (active galactic nuclei, BL Lacertae), solar system objects (Moon, Mars, Io,), supernova remnants, and two novae.

Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy.

PubMed

Lin, Jingquan; Weber, Nils; Escher, Matthias; Maul, Jochen; Han, Hak-Seung; Merkel, Michael; Wurm, Stefan; Schönhense, Gerd; Kleineberg, Ulf

2008-09-29

A photoemission electron microscope based on a new contrast mechanism "interference contrast" is applied to characterize extreme ultraviolet lithography mask blank defects. Inspection results show that positioning of interference destructive condition (node of standing wave field) on surface of multilayer in the local region of a phase defect is necessary to obtain best visibility of the defect on mask blank. A comparative experiment reveals superiority of the interference contrast photoemission electron microscope (Extreme UV illumination) over a topographic contrast one (UV illumination with Hg discharge lamp) in detecting extreme ultraviolet mask blank phase defects. A depth-resolved detection of a mask blank defect, either by measuring anti-node peak shift in the EUV-PEEM image under varying inspection wavelength condition or by counting interference fringes with a fixed illumination wavelength, is discussed.

Extreme Ultraviolet Explorer Bright Source List

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

1994-01-01

Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

Detection of a stellar flare at extreme ultraviolet wavelengths

NASA Technical Reports Server (NTRS)

Barstow, M. A.; Denby, M.; Pye, J. P.; Pankiewicz, G. S.; Bromage, G. E.; Gonzalez-Riestra, R.

1991-01-01

During the all-sky survey conducted by the Rosat Wide Field Camera, the binary flare star system BY Draconis was monitored with coverage by the IUE satellite far-UV and optical observations and by the Rosat X-ray telescope for part of the time. A stellar flare was detected in all four wavebands. This is the first unambiguous EUV detection of a flare and one of the widest simultaneous wavelength-range coverages obtained. The peak luminosity and total energy of this flare in the photon energy range 0.08-0.18 keV are comparable with the values obtained for a number of flares integrated over a larger energy range by Exosat satellite observations in 1983-86. It is concluded that radiation in the EUV carries away a substantial fraction of the total flare energy.

Overlying extreme-ultraviolet arcades preventing eruption of a filament observed by AIA/SDO

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, Huadong; Ma, Suli; Zhang, Jun, E-mail: hdchen@upc.edu.cn

2013-11-20

Using the multi-wavelength data from the Atmospheric Imaging Assembly/Solar Dynamic Observatory (AIA/SDO) and the Sun Earth Connection Coronal and Heliospheric Investigation/Solar Terrestrial Relations Observatory (SECCHI/STEREO), we report a failed filament eruption in NOAA AR 11339 on 2011 November 3. The eruption was associated with an X1.9 flare, but without any coronal mass ejection (CME), coronal dimming, or extreme ultraviolet (EUV) waves. Some magnetic arcades above the filament were observed distinctly in EUV channels, especially in the AIA 94 Å and 131 Å wavebands, before and during the filament eruption process. Our results show that the overlying arcades expanded along withmore » the ascent of the filament at first until they reached a projected height of about 49 Mm above the Sun's surface, where they stopped. The following filament material was observed to be confined by the stopped EUV arcades and not to escape from the Sun. After the flare, a new filament formed at the low corona where part of the former filament remained before its eruption. These results support that the overlying arcades play an important role in preventing the filament from successfully erupting outward. We also discuss in this paper the EUV emission of the overlying arcades during the flare. It is rare for a failed filament eruption to be associated with an X1.9 class flare, but not with a CME or EUV waves. Therefore, this study also provides valuable insight into the triggering mechanism of the initiation of CMEs and EUV waves.« less

A Sounding Rocket Mission Concept to Acquire High-Resolution Radiometric Spectra Spanning the 9 nm - 31 nm Wavelength Range

NASA Technical Reports Server (NTRS)

Krause, L. Habash; Cirtain, Jonathan; McGuirck, Michael; Pavelitz, Steven; Weber, Ed.; Winebarger, Amy

2012-01-01

When studying Solar Extreme Ultraviolet (EUV) emissions, both single-wavelength, two- dimensional (2D) spectroheliograms and multi-wavelength, one-dimensional (1D) line spectra are important, especially for a thorough understanding of the complex processes in the solar magnetized plasma from the base of the chromosphere through the corona. 2D image data are required for a detailed study of spatial structures, whereas radiometric (i.e., spectral) data provide information on relevant atomic excitation/ionization state densities (and thus temperature). Using both imaging and radiometric techniques, several satellite missions presently study solar dynamics in the EUV, including the Solar Dynamics Observatory (SDO), Hinode, and the Solar-Terrestrial Relations Observatory (STEREO). The EUV wavelengths of interest typically span 9 nm to 31 nm, with the shorter wavelengths being associated with the hottest features (e.g., intense flares and bright points) and the longer wavelengths associated with cooler features (e.g., coronal holes and filaments). Because the optical components of satellite instruments degrade over time, it is not uncommon to conduct sounding rocket underflights for calibration purposes. The authors have designed a radiometric sounding rocket payload that could serve as both a calibration underflight for and a complementary scientific mission to the upcoming Solar Ultraviolet Imager (SUVI) mission aboard the GOES-R satellite (scheduled for a 2015 launch). The challenge to provide quality radiometric line spectra over the 9-31 nm range covered by SUVI was driven by the multilayer coatings required to make the optical components, including mirrors and gratings, reflective over the entire range. Typically, these multilayers provide useful EUV reflectances over bandwidths of a few nm. Our solution to this problem was to employ a three-telescope system in which the optical components were coated with multilayers that spanned three wavelength ranges to cover the three pairs of SUVI bands. The complete system was designed to fit within the Black Brandt-IX 22.-diameter payload skin envelope. The basic optical path is that of a simple parabolic telescope in which EUV light is focused onto a slit and shutter assembly and imaged onto a normal-incidence diffraction grating, which then disperses the light onto a 2048 2048 CCD sensor. The CCD thus records 1D spatial information along one axis and spectral information along the other. The slit spans 40 arc-minutes in length, thus covering a solar diameter out to +/- 1.3 solar radii. Our operations concept includes imaging at three distinct positions: the north-south meridian, the northeast-southwest diagonal, and real-time pointing at an active region. Six 10-second images will be obtained at each position. Fine pointing is provided by the SPARCS-VII attitude control system typically employed on Black Brandt solar missions. Both before and after launch, all three telescopes will be calibrated with the EUV line emission source and monochromater system at NASA's Stray Light Facility at Marshall Spaceflight Center. Details of the payload design, operations concept, and data application will be presented.

Extreme Ultraviolet Explorer. Long look at the next window

NASA Technical Reports Server (NTRS)

Maran, Stephen P.

1991-01-01

The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

Extreme ultraviolet quantum efficiency of opaque alkali halide photocathodes on microchannel plates

NASA Technical Reports Server (NTRS)

Siegmund, O. H. W.; Everman, E.; Vallerga, J. V.; Lampton, M.

1988-01-01

Comprehensive measurements are presented for the quantum detection efficiency (QDE) of the microchannel plate materials CsI, KBr, KCl, and MgF2, over the 44-1800 A wavelength range. QDEs in excess of 40 percent are achieved by several materials in specific wavelength regions of the EUV. Structure is noted in the wavelength dependence of the QDE that is directly related to the valence-band/conduction-band gap energy and the onset of atomic-like resonant transitions. A simple photocathode model allows interpretation of these features, together with the QDE efficiency variation, as a function of illumination angle.

Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

NASA Technical Reports Server (NTRS)

Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

1989-01-01

The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application

DOEpatents

Barbee, Jr., Troy W.; Bajt, Sasa

2002-01-01

The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B.sub.4 C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers

Surface evaluation of the grazing incidence mirrors for the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Green, James; Finley, David S.; Bowyer, Stuart; Malina, Roger F.

1987-01-01

The EUV scattering from the Wolter-Schwarzschild type I short wavelength scanner mirror aboard the Extreme Ultraviolet Explorer is measured, and the results are used to evaluate the surface microroughness of the mirror. It is found that the most likely values for the mirror surface are sigma = 20 A, and rho = 40 microns. These results are consistent with previous estimates, but with a higher degree of certainty. The full-scale simulation presented here allows over 99 percent of the light distribution to be reasonably modeled.

An extreme ultraviolet telescope with no soft X-ray response

NASA Technical Reports Server (NTRS)

Finley, David S.; Jelinsky, Patrick; Bowyer, Stuart; Malina, Roger F.

1986-01-01

While EUV grazing incidence telescopes of conventional design exhibit a substantial X-ray response as well as an extreme UV response, and existing bandpass filters for the transmission of radiation longward of 400 A also transmit soft X-rays, the grazing incidence telescope presented suppresses this soft X-ray throughput through the incorporation of a Wolter Schwarzschild Type II mirror with large graze angles. The desirable features of an EUV photometric survey telescope are retained. An instrument of this design will be flown on the EUE mission, in order to make a survey of the sky at wavelengths longer than 400 A.

Calibration techniques and results in the soft X-ray and extreme ultraviolet for components of the Extreme Ultraviolet Explorer Satellite

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Jelinsky, Patrick; Bowyer, Stuart

1986-01-01

The calibration facilities and techniques for the Extreme Ultraviolet Explorer (EUVE) from 44 to 2500 A are described. Key elements include newly designed radiation sources and a collimated monochromatic EUV beam. Sample results for the calibration of the EUVE filters, detectors, gratings, collimators, and optics are summarized.

Automated Identification of Coronal Holes from Synoptic EUV Maps

NASA Astrophysics Data System (ADS)

Hamada, Amr; Asikainen, Timo; Virtanen, Ilpo; Mursula, Kalevi

2018-04-01

Coronal holes (CHs) are regions of open magnetic field lines in the solar corona and the source of the fast solar wind. Understanding the evolution of coronal holes is critical for solar magnetism as well as for accurate space weather forecasts. We study the extreme ultraviolet (EUV) synoptic maps at three wavelengths (195 Å/193 Å, 171 Å and 304 Å) measured by the Solar and Heliospheric Observatory/Extreme Ultraviolet Imaging Telescope (SOHO/EIT) and the Solar Dynamics Observatory/Atmospheric Imaging Assembly (SDO/AIA) instruments. The two datasets are first homogenized by scaling the SDO/AIA data to the SOHO/EIT level by means of histogram equalization. We then develop a novel automated method to identify CHs from these homogenized maps by determining the intensity threshold of CH regions separately for each synoptic map. This is done by identifying the best location and size of an image segment, which optimally contains portions of coronal holes and the surrounding quiet Sun allowing us to detect the momentary intensity threshold. Our method is thus able to adjust itself to the changing scale size of coronal holes and to temporally varying intensities. To make full use of the information in the three wavelengths we construct a composite CH distribution, which is more robust than distributions based on one wavelength. Using the composite CH dataset we discuss the temporal evolution of CHs during the Solar Cycles 23 and 24.

Interferometric at-wavelength flare characterization of EUV optical systems

DOEpatents

Naulleau, Patrick P.; Goldberg, Kenneth Alan

2001-01-01

The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.

Plasma-based EUV light source

DOEpatents

Shumlak, Uri; Golingo, Raymond; Nelson, Brian A.

2010-11-02

Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

On the Absence of EUV Emission from Comet C/2012 S1 (ISON)

NASA Technical Reports Server (NTRS)

Bryans, Paul; Pesnell, W. Dean

2016-01-01

When the sungrazing comet C2012 S1 (ISON) made its perihelion passage within two solar radii of the Sun's surface, it was expected to be a bright emitter at extreme ultraviolet (EUV) wavelengths. However, despite solar EUV telescopes repointing to track the orbit of the comet, no emission was detected. This null result is interesting in its own right, offering the possibility of placing limits on the size and composition of the nucleus. We explain the lack of detection by considering the properties of the comet and the solar atmosphere that determine the intensity of EUV emission from sungrazing comets. By comparing these properties with those of sungrazing comet C2011 W3 (Lovejoy), which did emit in the EUV, we conclude that the primary factor resulting in non-detectable EUV emission from C2012 S1 (ISON) was an insufficiently large nucleus. We conclude that the radius of C2012 S1 (ISON) was at least a factor of four less than that of C2011 W3 (Lovejoy). This is consistent with white-light observations in the days before perihelion that suggested the comet was dramatically reducing in size on approach.

The EUV Helium Spectrum in the Quiet Sun: A By-Product of Coronal Emission?

NASA Technical Reports Server (NTRS)

Andretta, Vincenzo; DelZanna, Giulio; Jordan, Stuart D.; Oegerle, William (Technical Monitor)

2002-01-01

In this paper we test one of the mechanisms proposed to explain the intensities and other observed properties of the solar helium spectrum, and in particular of its Extreme-Ultraviolet (EUV) resonance lines. The so-called Photoionisation-Recombination (P-R) mechanism involves photoionisation of helium atoms and ions by EUV coronal radiation, followed by recombination cascades. We present calibrated measurements of EUV flux obtained with the two CDS spectrometers on board SOHO, in quiescent solar regions. We were able to obtain an essentially complete estimate of the total photoionizing flux in the wavelength range below 504 A (the photoionisation threshold for He(I)), as well as simultaneous measurements with the same instruments of the intensities of the strongest EUV helium lines: He(II) lambda304, He(I) lambda584, and He(I) lambda537. We find that there are not enough EUV photons to account for the observed helium line intensities. More specifically, we conclude that He(II) intensities cannot be explained by the P-R mechanism. Our results, however, leave open the possibility that the He(I) spectrum could be formed by the P-R mechanism, with the He(II) lambda304 line as a significant photoionizating source.

ON THE ABSENCE OF EUV EMISSION FROM COMET C/2012 S1 (ISON)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bryans, Paul; Pesnell, W. Dean

2016-05-10

When the sungrazing comet C/2012 S1 (ISON) made its perihelion passage within two solar radii of the Sun’s surface, it was expected to be a bright emitter at extreme ultraviolet (EUV) wavelengths. However, despite solar EUV telescopes repointing to track the orbit of the comet, no emission was detected. This “null result” is interesting in its own right, offering the possibility of placing limits on the size and composition of the nucleus. We explain the lack of detection by considering the properties of the comet and the solar atmosphere that determine the intensity of EUV emission from sungrazing comets. Bymore » comparing these properties with those of sungrazing comet C/2011 W3 (Lovejoy), which did emit in the EUV, we conclude that the primary factor resulting in non-detectable EUV emission from C/2012 S1 (ISON) was an insufficiently large nucleus. We conclude that the radius of C/2012 S1 (ISON) was at least a factor of four less than that of C/2011 W3 (Lovejoy). This is consistent with white-light observations in the days before perihelion that suggested the comet was dramatically reducing in size on approach.« less

Spectral lines and characteristic of temporal variations in photoionized plasmas induced with laser-produced plasma extreme ultraviolet source

NASA Astrophysics Data System (ADS)

Saber, I.; Bartnik, A.; Wachulak, P.; Skrzeczanowski, W.; Jarocki, R.; Fiedorowicz, H.

2017-11-01

Spectral lines for Kr/Ne/H2 photoionized plasma in the ultraviolet and visible (UV/Vis) wavelength ranges have been created using a laser-produced plasma (LPP) EUV source. The source is based on a double-stream gas puff target irradiated with a commercial Nd:YAG laser. The laser pulses were focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Spectral lines from photoionization in neutral Kr/Ne/H2 and up to few charged states were observed. The intense emission lines were associated with the Kr transition lines. Experimental and theoretical investigations on intensity variations for some ionic lines are presented. A decrease in the intensity with the delay time between the laser pulse and the spectrum acquisition was revealed. Electron temperature and electron density in the photoionized plasma have been estimated from the characteristic emission lines. Temperature was obtained using Boltzmann plot method, assuming that the population density of atoms and ions are considered in a local thermodynamic equilibrium (LTE). Electron density was calculated from the Stark broadening profile. The temporal evaluation of the plasma and the way of optimizing the radiation intensity of LPP EUV sources is discussed.

Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography.

PubMed

Wang, L; Kirk, E; Wäckerlin, C; Schneider, C W; Hojeij, M; Gobrecht, J; Ekinci, Y

2014-06-13

We present fabrication and characterization of high-resolution and nearly amorphous Mo1 - xNx transmission gratings and their use as masks for extreme ultraviolet (EUV) interference lithography. During sputter deposition of Mo, nitrogen is incorporated into the film by addition of N2 to the Ar sputter gas, leading to suppression of Mo grain growth and resulting in smooth and homogeneous thin films with a negligible grain size. The obtained Mo0.8N0.2 thin films, as determined by x-ray photoelectron spectroscopy, are characterized to be nearly amorphous using x-ray diffraction. We demonstrate a greatly reduced Mo0.8N0.2 grating line edge roughness compared with pure Mo grating structures after e-beam lithography and plasma dry etching. The amorphous Mo0.8N0.2 thin films retain, to a large extent, the benefits of Mo as a phase grating material for EUV wavelengths, providing great advantages for fabrication of highly efficient diffraction gratings with extremely low roughness. Using these grating masks, well-resolved dense lines down to 8 nm half-pitch are fabricated with EUV interference lithography.

High sensitivity microchannel plate detectors for space extreme ultraviolet missions.

PubMed

Yoshioka, K; Homma, T; Murakami, G; Yoshikawa, I

2012-08-01

Microchannel plate (MCP) detectors have been widely used as two-dimensional photon counting devices on numerous space EUV (extreme ultraviolet) missions. Although there are other choices for EUV photon detectors, the characteristic features of MCP detectors such as their light weight, low dark current, and high spatial resolution make them more desirable for space applications than any other detector. In addition, it is known that the photocathode can be tailored to increase the quantum detection efficiency (QDE) especially for longer UV wavelengths (100-150 nm). There are many types of photocathode materials available, typically alkali halides. In this study, we report on the EUV (50-150 nm) QDE evaluations for MCPs that were coated with Au, MgF(2), CsI, and KBr. We confirmed that CsI and KBr show 2-100 times higher QDEs than the bare photocathode MCPs, while Au and MgF(2) show reduced QDEs. In addition, the optimal geometrical parameters for the CsI deposition were also studied experimentally. The best CsI thickness was found to be 150 nm, and it should be deposited on the inner wall of the channels only where the EUV photons initially impinge. We will also discuss the techniques and procedures for reducing the degradation of the photocathode while it is being prepared on the ground before being deployed in space, as adopted by JAXA's EXCEED mission which will be launched in 2013.

The Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.; Lampton, M.; Finley, D.; Paresce, F.; Penegor, G.; Heetderks, H.

1982-01-01

The Extreme Ultraviolet Explorer Mission is described. The purpose of this mission is to search the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation (100 to 1000 A). The search will be accomplished with the use of three EUV telescopes, each sensitive to different bands within the EUV band. A fourth telescope will perform a higher sensitivity search of a limited sample of the sky in a single EUV band. In six months, the entire sky will be scanned at a sensitivity level comparable to existing surveys in other more traditional astronomical bandpasses.

Responses of Solar Irradiance and the Ionosphere to an Intense Activity Region

NASA Astrophysics Data System (ADS)

Chen, Yiding; Liu, Libo; Le, Huijun; Wan, Weixing

2018-03-01

Solar rotation (SR) variation dominates solar extremely ultraviolet (EUV) changes on the timescale of days. The F10.7 index is usually used as an indicator for solar EUV. The SR variation of F10.7 significantly enhanced during the 2008th-2009th Carrington rotations (CRs) owing to an intense active region; F10.7 increased about 180 units during that SR period. That was the most prominent SR variation of F10.7 during solar cycle 23. In this paper, global electron content (GEC) is used to investigate ionospheric response to that strong variation of solar irradiance indicated by F10.7. The variation of GEC with F10.7 was anomalous (GEC-F10.7 slope significantly decreased) during the 2008th-2009th CRs; however, GEC versus EUV variation during that period was consistent with that during adjacent time intervals when using Solar Heliospheric Observatory/Solar EUV Monitor 26-34 nm EUV measurements. The reason is that F10.7 response to that intense active region was much stronger than EUV response; thus, the EUV-F10.7 slope decreased. We confirmed decreased EUV-F10.7 slope during the 2008th-2009th CRs for different wavelengths within 27-120 nm using Thermosphere, Ionosphere, Mesosphere Energetics and Dynamics/Solar EUV Experiment high spectral resolution EUV measurements. And on the basis of Solar Heliospheric Observatory/Solar EUV Monitor EUV measurements during solar cycle 23, we further presented that EUV-F10.7 slope statistically tends to decrease when the SR variation of F10.7 significantly enhances. Moreover, we found that ionospheric time lag effect to EUV is exaggerated when using F10.7, owing to the time lag effect of EUV to F10.7.

Exploring EUV Spicules Using 304 Angstrom He II Data from SDO AIA

NASA Technical Reports Server (NTRS)

Snyder, Ian R.; Sterling, Alphonse C.; Falconer, David A.; Moore, Ron L.

2014-01-01

We present results from a statistical study of He II 304 Angstrom Extreme Ultraviolet (EUV) spicules at the limb of the Sun. We also measured properties of one macrospicule; macrospicules are longer than most spicules, and much broader in width than spicules. We use high-cadence (12 second) and high-resolution (0.6 arcseconds pixels) resolution data from the Atmospheric Imaging Array (AIA) instrument on the Solar Dynamic Observatory (SDO). All of the observed events occurred near the solar north pole, where quiet Sun or coronal hole environments ensued. We examined the maximum lengths, maximum rise velocities, and lifetimes of 33 Extreme Ultraviolet (EUV) spicules and the macrospicule. For the bulk of the Extreme Ultraviolet (EUV) spicules these quantities are, respectively, approximately 10,000-40,000 kilometers, 20-100 kilometers per second, and approximately 100- approximately 1000 seconds. For the macrospicule the corresponding quantities were respectively approximately 60,000 kilometers, approximately 130 kilometers per second, approximately 1800 seconds, which is typical of macrospicules measured by other workers. Therefore macrospicules are taller, longer-lived, and faster than most Extreme Ultraviolet (EUV) spicules. The rise profiles of both the spicules and the macrospicules match well a second-order ("parabolic" ) trajectory, although the acceleration was often weaker than that of solar gravity in the profiles fitted to the trajectories. Our macrospicule also had an obvious brightening at its base at birth, while such brightening was not apparent for the Extreme Ultraviolet (EUV) spicules. Most of the Extreme Ultraviolet (EUV) spicules remained visible during their descent back to the solar surface, although a small percentage of the spicules and the macrospicule faded out before falling back to the surface. Our sample of macrospicules is not yet large enough to determine whether their initiation mechanism is identical to that of Extreme Ultraviolet (EUV) spicules.

Extreme ultraviolet interferometry

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goldberg, Kenneth A.

EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical dimension and smaller. In order to achieve diffraction-limited performance, all-reflective multilayer-coated lithographic imaging systems operating near 13-nm wavelength and 0.1 NA have system wavefront tolerances of 0.27 nm, or 0.02 waves RMS. Owing to the highly-sensitive resonant reflective properties of multilayer mirrors and extraordinarily tight tolerances set forth for their fabrication, EUV optical systems require at-wavelength EUV interferometry for final alignment and qualification. This dissertation discusses the development and successful implementation of high-accuracy EUV interferometric techniques. Proof-of-principle experiments with a prototype EUV point-diffraction interferometer for themore » measurement of Fresnel zoneplate lenses first demonstrated sub-wavelength EUV interferometric capability. These experiments spurred the development of the superior phase-shifting point-diffraction interferometer (PS/PDI), which has been implemented for the testing of an all-reflective lithographic-quality EUV optical system. Both systems rely on pinhole diffraction to produce spherical reference wavefronts in a common-path geometry. Extensive experiments demonstrate EUV wavefront-measuring precision beyond 0.02 waves RMS. EUV imaging experiments provide verification of the high-accuracy of the point-diffraction principle, and demonstrate the utility of the measurements in successfully predicting imaging performance. Complementary to the experimental research, several areas of theoretical investigation related to the novel PS/PDI system are presented. First-principles electromagnetic field simulations of pinhole diffraction are conducted to ascertain the upper limits of measurement accuracy and to guide selection of the pinhole diameter. Investigations of the relative merits of different PS/PDI configurations accompany a general study of the most significant sources of systematic measurement errors. To overcome a variety of experimental difficulties, several new methods in interferogram analysis and phase-retrieval were developed: the Fourier-Transform Method of Phase-Shift Determination, which uses Fourier-domain analysis to improve the accuracy of phase-shifting interferometry; the Fourier-Transform Guided Unwrap Method, which was developed to overcome difficulties associated with a high density of mid-spatial-frequency blemishes and which uses a low-spatial-frequency approximation to the measured wavefront to guide the phase unwrapping in the presence of noise; and, finally, an expedient method of Gram-Schmidt orthogonalization which facilitates polynomial basis transformations in wave-front surface fitting procedures.« less

In Charon's Shadow: Analysis of the UV Solar Occultation from New Horizons

NASA Astrophysics Data System (ADS)

Kammer, Joshua A.; Stern, S. A.; Weaver, H. A.; Young, L. A.; Ennico, K. A.; Olkin, C. B.; Gladstone, G. R.; Summers, M. E.; Greathouse, T. K.; Retherford, K. D.; Versteeg, M. H.; Parker, J. W.; Steffl, A. J.; Schindhelm, E.; Strobel, D. F.; Linscott, I. R.; Hinson, D. P.; Tyler, G. L.; Woods, W. W.

2015-11-01

Observations of Charon, Pluto's largest moon, have so far yielded no evidence for a substantial atmosphere. However, during the flyby of New Horizons through the Pluto-Charon system, the Alice ultraviolet spectrograph successfully acquired the most sensitive measurements to date during an occultation of the sun as New Horizons passed through Charon's shadow. These observations include wavelength coverage in the extreme- and far-ultraviolet (EUV and FUV) from 52 nm to 187 nm. We will present these results from Alice, and discuss their implications for an atmosphere on Charon.This work was supported by NASA's New Horizons project.

Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings

DOEpatents

Montcalm, Claude; Mirkarimi, Paul B.

2001-01-01

A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

High reflectance-low stress Mo-Si multilayer reflective coatings

DOEpatents

Montcalm, Claude; Mirkarimi, Paul B.

2000-01-01

A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

Dual-domain lateral shearing interferometer

DOEpatents

Naulleau, Patrick P.; Goldberg, Kenneth Alan

2004-03-16

The phase-shifting point diffraction interferometer (PS/PDI) was developed to address the problem of at-wavelength metrology of extreme ultraviolet (EUV) optical systems. Although extremely accurate, the fact that the PS/PDI is limited to use with coherent EUV sources, such as undulator radiation, is a drawback for its widespread use. An alternative to the PS/PDI, with relaxed coherence requirements, is lateral shearing interferometry (LSI). The use of a cross-grating, carrier-frequency configuration to characterize a large-field 4.times.-reduction EUV lithography optic is demonstrated. The results obtained are directly compared with PS/PDI measurements. A defocused implementation of the lateral shearing interferometer in which an image-plane filter allows both phase-shifting and Fourier wavefront recovery. The two wavefront recovery methods can be combined in a dual-domain technique providing suppression of noise added by self-interference of high-frequency components in the test-optic wavefront.

Discovery of superluminal velocities of X-rays and Bharat Radiation challenging the validity of Einstein's formula E= mc2

NASA Astrophysics Data System (ADS)

Rao, M. A. Padmanabha

2013-09-01

The current paper reports discovery of superluminal velocities of X-rays, and Bharat Radiation in 12.87 to 31 nm range from solar spectra. The discovery challenges the 100 year old Albert Einstein's assertion that nothing can go faster than velocity of light c in vacuum while formulating E = mc2 in his special theory of relativity reported in 1905 [1]. Several solar spectra recorded at various wavelengths by Woods et al in 2011 demonstrated GOES X-rays arriving earlier than 13.5 nm emission, which in turn arriving earlier than 33.5 nm emission [2]. Finally, the investigators faced difficulty in concluding that short wavelengths traveled fast because of lack of information whether all the three emissions originated from the same source and at the same time. Very recently the author has reported GOES X-rays (7.0 nm) cause 13.5 nm (Bharat Radiation), which in turn causes 33.5 nm Extreme ultraviolet (EUV) emission from same excited atoms present in solar flare by Padmanabha Rao Effect [3, 4]. Based on these findings, the author succeeded in explaining how the solar spectral findings provide direct evidences on superluminal velocities of GOES X-ray and 13.5 nm Bharat Radiation emissions, when 33.5 nm EUV emission is considered travelling at velocity of light c. Among X-ray wavelengths, the short wavelength 7.0 nm X-rays traveled faster than 9.4 nm X-rays, while X-rays go at superluminal velocities. Among Bharat radiation wavelengths, short wavelengths showed fast travel, while Bharat Radiation goes at superluminal velocities as compared to 33.5 EUV emission.

The extreme ultraviolet explorer mission

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.

1988-01-01

The science design goals and engineering implementation for the Extreme Ultraviolet Explorer (EUVE) science payload are discussed. The primary scientific goal of the EUVE payload is to carry out an all-sky survey in the 100- to 900-A band of the spectrum. Another goal of the mission is to demonstrate the use of a scientific platform in near-earth orbit. EUVE data will be used to study the distribution of EUV stars in the neighborhood of the sun and the emission physics responsible for the EUV mission.

Line analysis of EUV Spectra from Molybdenum and Tungsten Injected with Impurity Pellets in LHD

NASA Astrophysics Data System (ADS)

Chowdhuri, Malay Bikas; Morita, Shigeru; Goto, Motoshi; Nishimura, Hiroaki; Nagai, Keiji; Fujioka, Shinsuke

Spectroscopic data on high-Z materials for impurity diagnostics are important due to its possible use as a plasma facing component in the next generation fusion device. For this purpose molybdenum and tungsten are injected by an impurity pellet injector into the large helical device (LHD) plasmas. Emissions from such highly ionized elements mostly fall in extreme ultraviolet (EUV) and soft X-ray ranges. The EUV spectra in a range of 20-500 Å are recorded using a flat-field EUV spectrometer. The observed emissions are identified with the help of its temporal evolution and detailed analysis is done with electron temperature profiles. At high central electron temperature (˜2.2 keV) molybdenum appears as an Al-, Mg- and Na-like ionization stages. Typical examples of identified transitions are Mo XXXI 190.46 Å (3 s2 1S-3s3p 3P) and Mo XXXII 176.63 Å (3s 2S-3p 2P). For tungsten, on the other hand, three well-separated bands appear in wavelength range of 24-80 Å. The transitions around 33 Å have been tentatively identified with the help of calculated values. Most of the isolated lines on the top of pseudo-continuum bands around 50 and 60 Å are identified, and the wavelengths are compared with previous experimental studies and also with calculated values.

Flat-field anastigmatic mirror objective for high-magnification extreme ultraviolet microscopy

NASA Astrophysics Data System (ADS)

Toyoda, Mitsunori

2015-08-01

To apply high-definition microscopy to the extreme ultraviolet (EUV) region in practice, i.e. to enable in situ observation of living tissue and the at-wavelength inspection of lithography masks, we constructed a novel reflective objective made of three multilayer mirrors. This objective is configured as a two-stage imaging system made of a Schwarzschild two-mirror system as the primary objective and an additional magnifier with a single curved mirror. This two-stage configuration can provide a high magnification of 1500, which is suitable for real-time observation with an EUV charge coupled device (CCD) camera. Besides, since off-axis aberrations can be corrected by the magnifier, which provides field flattener optics, we are able to configure the objective as a flat-field anastigmatic system, in which we will have a diffraction-limited spatial resolution over a large field-of-view. This paper describes in detail the optical design of the present objective. After calculating the closed-form equations representing the third-order aberrations of the objective, we apply these equations to practical design examples with a numerical aperture of 0.25 and an operation wavelength of 13.5 nm. We also confirm the imaging performances of this novel design by using the numerical ray-tracing method.

Contamination control approach for the Extreme Ultraviolet Explorer satellite instrumentation

NASA Technical Reports Server (NTRS)

Mrowka, Stan; Jelinsky, Sharon; Jelinsky, Patrick; Malina, Roger F.

1987-01-01

The Extreme Ultraviolet Explorer will perform an all-sky survey and spectroscopic observations over the wavelength range 80-900A. Hydrocarbon and particulate contamination will potentially affect the throughput and signal to noise ratio of the signal detected by the instruments. A witness sample program is here used to investigate and monitor the effects of specific contaminants on EUV reflectivity. Witness samples were intentionally contaminated with thin layers of pump oil. An oil layer 150 A thick was applied and found to evaporate over 8 hours. The EUV reflectivity and imaging properties were then measured and found to be acceptable for grazing angles between 5 and 30 deg. In a second test, layers 500 A thick were deposited and then allowed to evaporate in vacuum; once the oil had evaporated to at least 350 A, the final sample reflectivity was degraded less than 10 percent, but the image was degraded severely by scattering. An outline of the contamination control program is also presented.

Estimation of optimum density and temperature for maximum efficiency of tin ions in Z discharge extreme ultraviolet sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Masnavi, Majid; Nakajima, Mitsuo; Hotta, Eiki

Extreme ultraviolet (EUV) discharge-based lamps for EUV lithography need to generate extremely high power in the narrow spectrum band of 13.5{+-}0.135 nm. A simplified collisional-radiative model and radiative transfer solution for an isotropic medium were utilized to investigate the wavelength-integrated light outputs in tin (Sn) plasma. Detailed calculations using the Hebrew University-Lawrence Livermore atomic code were employed for determination of necessary atomic data of the Sn{sup 4+} to Sn{sup 13+} charge states. The result of model is compared with experimental spectra from a Sn-based discharge-produced plasma. The analysis reveals that considerably larger efficiency compared to the so-called efficiency of amore » black-body radiator is formed for the electron density {approx_equal}10{sup 18} cm{sup -3}. For higher electron density, the spectral efficiency of Sn plasma reduces due to the saturation of resonance transitions.« less

Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons

NASA Astrophysics Data System (ADS)

Kyser, David F.; Eib, Nicholas K.; Ritchie, Nicholas W. M.

2016-07-01

The absorbed energy density (eV/cm3) deposited by extreme ultraviolet (EUV) photons and electron beam (EB) high-keV electrons is proposed as a metric for characterizing the sensitivity of EUV resist films. Simulations of energy deposition are used to calculate the energy density as a function of the incident aerial flux (EUV: mJ/cm2, EB: μC/cm2). Monte Carlo calculations for electron exposure are utilized, and a Lambert-Beer model for EUV absorption. The ratio of electron flux to photon flux which results in equivalent energy density is calculated for a typical organic chemically amplified resist film and a typical inorganic metal-oxide film. This ratio can be used to screen EUV resist materials with EB measurements and accelerate advances in EUV resist systems.

Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

DOEpatents

Ruffner, Judith Alison

1999-01-01

A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method results in a product with minimum feature sizes of less than 0.10-.mu.m for the shortest wavelength (13.4-nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R.sup.2 factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates.

“Dandelion” Filament Eruption and Coronal Waves Associated with a Solar Flare on 2011 February 16

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cabezas, Denis P.; Ishitsuka, Mutsumi; Ishitsuka, José K.

Coronal disturbances associated with solar flares, such as H α Moreton waves, X-ray waves, and extreme ultraviolet (EUV) coronal waves, are discussed herein in relation to magnetohydrodynamic fast-mode waves or shocks in the corona. To understand the mechanism of coronal disturbances, full-disk solar observations with high spatial and temporal resolution over multiple wavelengths are of crucial importance. We observed a filament eruption, whose shape is like a “dandelion,” associated with the M1.6 flare that occurred on 2011 February 16 in H α images taken by the Flare Monitoring Telescope at Ica University, Peru. We derive the three-dimensional velocity field ofmore » the erupting filament. We also identify winking filaments that are located far from the flare site in the H α images, whereas no Moreton wave is observed. By comparing the temporal evolution of the winking filaments with those of the coronal wave seen in the EUV images data taken by the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory and by the Extreme Ultraviolet Imager on board the Solar Terrestrial Relations Observatory-Ahead , we confirm that the winking filaments were activated by the EUV coronal wave.« less

High-harmonic generation by field enhanced femtosecond pulses in metal-sapphire nanostructure

PubMed Central

Han, Seunghwoi; Kim, Hyunwoong; Kim, Yong Woo; Kim, Young-Jin; Kim, Seungchul; Park, In-Yong; Kim, Seung-Woo

2016-01-01

Plasmonic high-harmonic generation (HHG) drew attention as a means of producing coherent extreme ultraviolet (EUV) radiation by taking advantage of field enhancement occurring in metallic nanostructures. Here a metal-sapphire nanostructure is devised to provide a solid tip as the HHG emitter, replacing commonly used gaseous atoms. The fabricated solid tip is made of monocrystalline sapphire surrounded by a gold thin-film layer, and intended to produce EUV harmonics by the inter- and intra-band oscillations of electrons driven by the incident laser. The metal-sapphire nanostructure enhances the incident laser field by means of surface plasmon polaritons, triggering HHG directly from moderate femtosecond pulses of ∼0.1 TW cm−2 intensities. The measured EUV spectra exhibit odd-order harmonics up to ∼60 nm wavelengths without the plasma atomic lines typically seen when using gaseous atoms as the HHG emitter. This experimental outcome confirms that the plasmonic HHG approach is a promising way to realize coherent EUV sources for nano-scale near-field applications in spectroscopy, microscopy, lithography and atto-second physics. PMID:27721374

A double-stream Xe:He jet plasma emission in the vicinity of 6.7 nm

NASA Astrophysics Data System (ADS)

Chkhalo, N. I.; Garakhin, S. A.; Golubev, S. V.; Lopatin, A. Ya.; Nechay, A. N.; Pestov, A. E.; Salashchenko, N. N.; Toropov, M. N.; Tsybin, N. N.; Vodopyanov, A. V.; Yulin, S.

2018-05-01

We present the results of investigations of extreme ultraviolet (EUV) light emission in the range from 5 to 10 nm. The light source was a pulsed "double-stream" Xe:He gas jet target irradiated by a laser beam with a power density of ˜1011 W/cm2. The radiation spectra were measured with a Czerny-Turner monochromator with a plane diffraction grating. The conversion efficiency of the laser energy into EUV radiation caused by Xe+14…+16 ion emission in the range of 6-8 nm was measured using a calibrated power meter. The conversion efficiency of the laser radiation into EUV in the vicinity of 6.7 nm was (2.17 ± 0.13)% in a 1 nm spectral band. In the spectral band of the real optical system (0.7% for La/B multilayer mirrors) emitted into the half-space, it was (0.1 ± 0.006)%. The results of this study provide an impetus for further research on laser plasma sources for maskless EUV lithography at a wavelength of 6.7 nm.

CCD imaging system for the EUV solar telescope

NASA Astrophysics Data System (ADS)

Gong, Yan; Song, Qian; Ye, Bing-Xun

2006-01-01

In order to develop the detector adapted to the space solar telescope, we have built a CCD camera system capable of working in the extra ultraviolet (EUV) band, which is composed of one phosphor screen, one intensified system using a photocathode/micro-channel plate(MCP)/ phosphor, one optical taper and one chip of front-illuminated (FI) CCD without screen windows. All of them were stuck one by one with optical glue. The working principle of the camera system is presented; moreover we have employed the mesh experiment to calibrate and test the CCD camera system in 15~24nm, the position resolution of about 19 μm is obtained at the wavelength of 17.1nm and 19.5nm.

Atomic processes and equation of state of high Z plasmas for EUV sources and their effects on the spatial and temporal evolution of the plasmas

NASA Astrophysics Data System (ADS)

Sasaki, Akira; Sunahara, Atushi; Furukawa, Hiroyuki; Nishihara, Katsunobu; Nishikawa, Takeshi; Koike, Fumihiro

2016-03-01

Laser-produced plasma (LPP) extreme ultraviolet (EUV) light sources have been intensively investigated due to potential application to next-generation semiconductor technology. Current studies focus on the atomic processes and hydrodynamics of plasmas to develop shorter wavelength sources at λ = 6.x nm as well as to improve the conversion efficiency (CE) of λ = 13.5 nm sources. This paper examines the atomic processes of mid-z elements, which are potential candidates for λ = 6.x nm source using n=3-3 transitions. Furthermore, a method to calculate the hydrodynamics of the plasmas in terms of the initial interaction between a relatively weak prepulse laser is presented.

Multi-Spectral Solar Telescope Array. IV - The soft X-ray and extreme ultraviolet filters

NASA Technical Reports Server (NTRS)

Lindblom, Joakim F.; O'Neal, Ray H.; Walker, Arthur B. C., Jr.; Powell, Forbes R.; Barbee, Troy W., Jr.; Hoover, Richard B.

1991-01-01

NASA's Multi-Spectral Solar Telescope Array uses various combinations of thin foil filters composed of Al, C, Te, Be, Mo, Rh, and phthalocyanine to achieve the requisite radiation-rejection characteristics. Such rejection is demanded by the presence of strong EUV radiation at longer wavelengths where the specular reflectivity of multilayer mirrors can cause 'contamination' of the image in the narrow band defined by the Bragg condition.

Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

NASA Technical Reports Server (NTRS)

Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

1994-01-01

We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

X ray, extreme and far ultraviolet optical thin films for space applications

NASA Technical Reports Server (NTRS)

Zukic, Muamer; Torr, Douglas G.; Kim, Jongmin

1993-01-01

Far and extreme ultraviolet optical thin film filters find many uses in space astronomy, space astrophysics, and space aeronomy. Spacebased spectrographs are used for studying emission and absorption features of the earth, planets, sun, stars, and the interstellar medium. Most of these spectrographs use transmission or reflection filters. This requirement has prompted a search for selective filtering coatings with high throughput in the FUV and EUV spectral region. Important progress toward the development of thin film filters with improved efficiency and stability has been made in recent years. The goal for this field is the minimization of absorption to get high throughput and enhancement of wavelength selection. The Optical Aeronomy Laboratory (OAL) at the University of Alabama in Huntsville has recently developed the technology to determine optical constants of bulk and film materials for wavelengths extending from x-rays (0.1 nm) to the FUV (200 nm), and several materials have been identified that were used for designs of various optical devices which previously have been restricted to space application in the visible and near infrared. A new design concept called the Pi-multilayer was introduced and applied to the design of optical coatings for wavelengths extending from x-rays to the FUV. Section 3 of this report explains the Pi-multilayer approach and demonstrates its application for the design and fabrication of the FUV coatings. Two layer Pi-stacks have been utilized for the design of reflection filters in the EUV wavelength range from 70 - 100 nm. In order to eliminate losses due to the low reflection of the imaging optics and increase throughput and out-of-band rejection of the EUV instrumentation we introduced a self-filtering camera concept. In the FUV region, MgF2 and LiF crystals are known to be birefringent. Transmission polarizers and quarterwave retarders made of MgF2 or LiF crystals are commercially available but the performances are poor. New techniques for the design of the EUV and FUV polarizers and quarterwave retarders are described in Section 5. X- and gamma-ray detectors rely on a measurement of the electron which is effected when a ray interacts with matter. The design of an x- and gamma-ray telescope to operate in a particular region of the spectrum is, therefore, largely dictated by the mechanism through which the rays interact. Energy selection and the focusing of the incident high energy rays can be achieved with spectrally selective high reflective multilayers. The design and spectral performance of narrowband reflective x-ray Pi-multilayers are presented in section 6.

Simultaneous Extreme-Ultraviolet Explorer and Optical Observations of Ad Leonis: Evidence for Large Coronal Loops and the Neupert Effect in Stellar Flares

NASA Technical Reports Server (NTRS)

Hawley, Suzanne L.; Fisher, George H.; Simon, Theodore; Cully, Scott L.; Deustua, Susana E.; Jablonski, Marek; Johns-Krull, Christopher; Pettersen, Bjorn R.; Smith, Verne; Spiesman, William J.;

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

DOE Office of Scientific and Technical Information (OSTI.GOV)

Oyama, Tomoko Gowa, E-mail: ohyama.tomoko@qst.go.jp; Oshima, Akihiro; Tagawa, Seiichi, E-mail: tagawa@sanken.osaka-u.ac.jp

2016-08-15

It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, wemore » calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).« less

Contamination Effects on EUV Optics

NASA Technical Reports Server (NTRS)

Tveekrem, J.

1999-01-01

During ground-based assembly and upon exposure to the space environment, optical surfaces accumulate both particles and molecular condensibles, inevitably resulting in degradation of optical instrument performance. Currently, this performance degradation (and the resulting end-of-life instrument performance) cannot be predicted with sufficient accuracy using existing software tools. Optical design codes exist to calculate instrument performance, but these codes generally assume uncontaminated optical surfaces. Contamination models exist which predict approximate end-of-life contamination levels, but the optical effects of these contamination levels can not be quantified without detailed information about the optical constants and scattering properties of the contaminant. The problem is particularly pronounced in the extreme ultraviolet (EUV, 300-1,200 A) and far (FUV, 1,200-2,000 A) regimes due to a lack of data and a lack of knowledge of the detailed physical and chemical processes involved. Yet it is in precisely these wavelength regimes that accurate predictions are most important, because EUV/FUV instruments are extremely sensitive to contamination.

Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering

NASA Astrophysics Data System (ADS)

Soltwisch, Victor; Wernecke, Jan; Haase, Anton; Probst, Jürgen; Schoengen, Max; Krumrey, Michael; Scholze, Frank; Pomplun, Jan; Burger, Sven

2014-09-01

Non-imaging techniques like X-ray scattering are supposed to play an important role in the further development of CD metrology for the semiconductor industry. Grazing Incidence Small Angle X-ray Scattering (GISAXS) provides directly assessable information on structure roughness and long-range periodic perturbations. The disadvantage of the method is the large footprint of the X-ray beam on the sample due to the extremely shallow angle of incidence. This can be overcome by using wavelengths in the extreme ultraviolet (EUV) spectral range, EUV small angle scattering (EUVSAS), which allows for much steeper angles of incidence but preserves the range of momentum transfer that can be observed. Generally, the potentially higher momentum transfer at shorter wavelengths is counterbalanced by decreasing diffraction efficiency. This results in a practical limit of about 10 nm pitch for which it is possible to observe at least the +/- 1st diffraction orders with reasonable efficiency. At the Physikalisch-Technische Bundesanstalt (PTB), the available photon energy range extends from 50 eV up to 10 keV at two adjacent beamlines. PTB commissioned a new versatile Ellipso-Scatterometer which is capable of measuring 6" square substrates in a clean, hydrocarbon-free environment with full flexibility regarding the direction of the incident light polarization. The reconstruction of line profiles using a geometrical model with six free parameters, based on a finite element method (FEM) Maxwell solver and a particle swarm based least-squares optimization yielded consistent results for EUV-SAS and GISAXS. In this contribution we present scatterometry data for line gratings and consistent reconstruction results of the line geometry for EUV-SAS and GISAXS.

Imaging observation of quasi-periodic disturbances' amplitudes increasing with height in the polar region of the solar corona

DOE Office of Scientific and Technical Information (OSTI.GOV)

Su, J. T.; Priya, T. G.; Liu, Y.

At present, there have been few extreme ultraviolet (EUV) imaging observations of spatial variations of the density perturbations due to the slow magnetoacoustic waves (SMWs) propagating along the solar coronal magnetic fields. In this paper, we present such observations taken from the polar region of the corona with the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory and investigate the amplitude of quasi-periodic propagating disturbances that increase with height in the lower corona (0-9 Mm over the solar limb). We statistically determined the following parameters associated with the disturbances: pressure scale height, period, and wavelength in AIA 171more » Å, 193 Å, and 211 Å channels. The scale height and wavelength are dependent of temperature, while the period is independent of temperature. The acoustic velocities inferred from the scale height highly correlate with the ratios of wavelength to period, i.e., phase speeds. They provide evidence that the propagating disturbances in the lower corona are likely SMWs and the spatial variations in EUV intensity in the polar region likely reflects the density compressional effect by the propagating SMWs.« less

Improvements in resist performance towards EUV HVM

NASA Astrophysics Data System (ADS)

Yildirim, Oktay; Buitrago, Elizabeth; Hoefnagels, Rik; Meeuwissen, Marieke; Wuister, Sander; Rispens, Gijsbert; van Oosten, Anton; Derks, Paul; Finders, Jo; Vockenhuber, Michaela; Ekinci, Yasin

2017-03-01

Extreme ultraviolet (EUV) lithography with 13.5 nm wavelength is the main option for sub-10nm patterning in the semiconductor industry. We report improvements in resist performance towards EUV high volume manufacturing. A local CD uniformity (LCDU) model is introduced and validated with experimental contact hole (CH) data. Resist performance is analyzed in terms of ultimate printing resolution (R), line width roughness (LWR), sensitivity (S), exposure latitude (EL) and depth of focus (DOF). Resist performance of dense lines at 13 nm half-pitch and beyond is shown by chemical amplified resist (CAR) and non-CAR (Inpria YA Series) on NXE scanner. Resolution down to 10nm half pitch (hp) is shown by Inpria YA Series resist exposed on interference lithography at the Paul Sherrer Institute. Contact holes contrast and consequent LCDU improvement is achieved on a NXE:3400 scanner by decreasing the pupil fill ratio. State-of-the-art imaging meets 5nm node requirements for CHs. A dynamic gas lock (DGL) membrane is introduced between projection optics box (POB) and wafer stage. The DGL membrane will suppress the negative impact of resist outgassing on the projection optics by 100%, enabling a wider range of resist materials to be used. The validated LCDU model indicates that the imaging requirements of the 3nm node can be met with single exposure using a high-NA EUV scanner. The current status, trends, and potential roadblocks for EUV resists are discussed. Our results mark the progress and the improvement points in EUV resist materials to support EUV ecosystem.

Stability and imaging of the ASML EUV alpha demo tool

NASA Astrophysics Data System (ADS)

Hermans, Jan V.; Baudemprez, Bart; Lorusso, Gian; Hendrickx, Eric; van Dijk, Andre; Jonckheere, Rik; Goethals, Anne-Marie

2009-03-01

Extreme Ultra-Violet (EUV) lithography is the leading candidate for semiconductor manufacturing of the 22nm technology node and beyond, due to the very short wavelength of 13.5nm. However, reducing the wavelength adds complexity to the lithographic process. The impact of the EUV specific conditions on lithographic performance needs to be understood, before bringing EUV lithography into pre-production. To provide early learning on EUV, an EUV fullfield scanner, the Alpha Demo Tool (ADT) from ASML was installed at IMEC, using a Numerical Aperture (NA) of 0.25. In this paper we report on different aspects of the ADT: the imaging and overlay performance and both short and long-term stability. For 40nm dense Lines-Spaces (LS), the ADT shows an across field overlapping process window of 270nm Depth Of Focus (DOF) at 10% Exposure Latitude (EL) and a wafer CD Uniformity (CDU) of 3nm 3σ, without any corrections for process or reticle. The wafer CDU is correlated to different factors that are known to influence the CD fingerprint from traditional lithography: slit intensity uniformity, focus plane deviation and reticle CD error. Taking these contributions into account, the CD through slit fingerprint for 40nm LS is simulated with excellent agreement to experimental data. The ADT shows good CD stability over 9 months of operation, both intrafield and across wafer. The projection optics reflectivity has not degraded over 9 months. Measured overlay performance with respect to a dry tool shows |Mean|+3σ below 20nm with more correction potential by applying field-by-field corrections (|Mean|+3σ <=10nm). For 22nm SRAM application, both contact hole and metal layer were printed in EUV with 10% CD and 15nm overlay control. Below 40nm, the ADT shows good wafer CDU for 30nm dense and isolated lines (on the same wafer) and 38nm dense Contact Holes (CH). First 28nm dense line CDU data are achieved. The results indicate that the ADT can be used effectively for EUV process development before installation of the pre-production tool, the ASML NXE Gen. 1 at IMEC.

Effects of cloud, aerosol, and ozone on surface spectral Ultraviolet and total irradiance observed in Seoul, Korea

NASA Astrophysics Data System (ADS)

Lee, Hana; Kim, Jhoon; Kim, Woogyung; Lee, Yun Gon; Cho, Hi Ku

2015-04-01

In recent years, there have been substantial attempts to model the radiative transfer for climatological and biological purposes. However, the incorporation of clouds, aerosols and ozone into the modeling process is one of the difficult tasks due to their variable transmission in both temporal and space domains. In this study we quantify the atmospheric transmissions by clouds, aerosol optical depth (AOD at 320 nm) and total ozone (Ozone) together with all skies in three solar radiation components of the global solar (GS 305-2800nm), total ultraviolet (TUV 290-363nm) and the erythemal weighted ultraviolet (EUV 290-325nm) irradiances with statistical methods using the data at Seoul. The purpose of this study also is to clarify the different characteristics between cloud, AOD and Ozone in the wavelength-dependent solar radiation components. The ozone, EUV and TUV used in this study (March 2003 - February 2014) have been measured with Dobson Spectrophotometer (Beck #124) and Brewer Spectrophotometer (SCI-TEC#148) at Yonsei University, respectively. GS, Cloud Cover (CC) are available from the Korean Meteorological Agency. The measured total (effect of cloud, aerosol, and ozone) transmissions on annual average showed 74%, 76% and 80% of GS, TUV and EUV irradiance, respectively. For the comparison of the measured values with modeled, we have also constructed a multiple linear regression model for the total transmission. The average ratio of measured to modeled total transmission were 0.94, 0.96 and 0.96 with higher measured than modeled value in the three components, respectively, The individual transmission by clouds under the constant AOD and Ozone atmosphere on average showed 68%, 71% and 76% and further the overcast clouds reduced the transmissions to the 45%, 54% and 59% of the clear sky irradiance in the GS, TUV and EUV, respectively. The annual transmissions by AOD showed on average 67%, 70% and 74% and further the high loadings 2.5-4.0 AOD reduced the transmission to 50%, 52% and 55% of clear sky irradiance under the contact cloud and ozone atmosphere in the GS, TUV and EUV, respectively. And annual average EUV transmission by Ozone was 75 % of the clear-sky value under the constant CC and AOD. In future study, we are compare OMI data with ground-based instruments in order to use measured data for scientific studies.

Performance of 100-W HVM LPP-EUV source

NASA Astrophysics Data System (ADS)

Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Soumagne, Georg; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

2015-08-01

At Gigaphoton Inc., we have developed unique and original technologies for a carbon dioxide laser-produced tin plasma extreme ultraviolet (CO2-Sn-LPP EUV) light source, which is the most promising solution for high-power high-volume manufacturing (HVM) EUV lithography at 13.5 nm. Our unique technologies include the combination of a pulsed CO2 laser with Sn droplets, the application of dual-wavelength laser pulses for Sn droplet conditioning, and subsequent EUV generation and magnetic field mitigation. Theoretical and experimental data have clearly shown the advantage of our proposed strategy. Currently, we are developing the first HVM light source, `GL200E'. This HVM light source will provide 250-W EUV power based on a 20-kW level pulsed CO2 laser. The preparation of a high average-power CO2 laser (more than 20 kW output power) has been completed in cooperation with Mitsubishi Electric Corporation. Recently, we achieved 140 W at 50 kHz and 50% duty cycle operation as well as 2 h of operation at 100 W of power level. Further improvements are ongoing. We will report the latest status and the challenge to reach stable system operation of more than 100 W at about 4% conversion efficiency with 20-μm droplets and magnetic mitigation.

Ptychographic imaging with partially coherent plasma EUV sources

NASA Astrophysics Data System (ADS)

Bußmann, Jan; Odstrčil, Michal; Teramoto, Yusuke; Juschkin, Larissa

2017-12-01

We report on high-resolution lens-less imaging experiments based on ptychographic scanning coherent diffractive imaging (CDI) method employing compact plasma sources developed for extreme ultraviolet (EUV) lithography applications. Two kinds of discharge sources were used in our experiments: a hollow-cathode-triggered pinch plasma source operated with oxygen and for the first time a laser-assisted discharge EUV source with a liquid tin target. Ptychographic reconstructions of different samples were achieved by applying constraint relaxation to the algorithm. Our ptychography algorithms can handle low spatial coherence and broadband illumination as well as compensate for the residual background due to plasma radiation in the visible spectral range. Image resolution down to 100 nm is demonstrated even for sparse objects, and it is limited presently by the sample structure contrast and the available coherent photon flux. We could extract material properties by the reconstruction of the complex exit-wave field, gaining additional information compared to electron microscopy or CDI with longer-wavelength high harmonic laser sources. Our results show that compact plasma-based EUV light sources of only partial spatial and temporal coherence can be effectively used for lens-less imaging applications. The reported methods may be applied in combination with reflectometry and scatterometry for high-resolution EUV metrology.

EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development.

PubMed

Gaballah, A E H; Nicolosi, P; Ahmed, Nadeem; Jimenez, K; Pettinari, G; Gerardino, A; Zuppella, P

2018-01-01

The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.

Three new extreme ultraviolet spectrometers on NSTX-U for impurity monitoring

DOE Office of Scientific and Technical Information (OSTI.GOV)

Weller, M. E., E-mail: weller4@llnl.gov; Beiersdorfer, P.; Soukhanovskii, V. A.

2016-11-15

Three extreme ultraviolet (EUV) spectrometers have been mounted on the National Spherical Torus Experiment–Upgrade (NSTX-U). All three are flat-field grazing-incidence spectrometers and are dubbed X-ray and Extreme Ultraviolet Spectrometer (XEUS, 8–70 Å), Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS, 190–440 Å), and Metal Monitor and Lithium Spectrometer Assembly (MonaLisa, 50–220 Å). XEUS and LoWEUS were previously implemented on NSTX to monitor impurities from low- to high-Z sources and to study impurity transport while MonaLisa is new and provides the system increased spectral coverage. The spectrometers will also be a critical diagnostic on the planned laser blow-off system for NSTX-U, which will bemore » used for impurity edge and core ion transport studies, edge-transport code development, and benchmarking atomic physics codes.« less

Joint observations of solar corona in space projects ARKA and KORTES

NASA Astrophysics Data System (ADS)

Vishnyakov, Eugene A.; Bogachev, Sergey A.; Kirichenko, Alexey S.; Reva, Anton A.; Loboda, Ivan P.; Malyshev, Ilya V.; Ulyanov, Artem S.; Dyatkov, Sergey Yu.; Erkhova, Nataliya F.; Pertsov, Andrei A.; Kuzin, Sergey V.

2017-05-01

ARKA and KORTES are two upcoming solar space missions in extreme ultraviolet and X-ray wavebands. KORTES is a sun-oriented mission designed for the Russian segment of International Space Station. KORTES consists of several imaging and spectroscopic instruments that will observe the solar corona in a number of wavebands, covering EUV and X-ray ranges. The surveillance strategy of KORTES is to cover a wide range of observations including simultaneous imaging, spectroscopic and polarization measurements. ARKA is a small satellite solar mission intended to take highresolution images of the Sun at the extreme ultraviolet wavelengths. ARKA will be equipped with two high-resolution EUV telescopes designed to collect images of the Sun with approximately 150 km spatial resolution in the field of view of about 10'×10'. The scientific results of the mission may have a significant impact on the theory of coronal heating and may help to clarify the physics of small-scale solar structures and phenomena including oscillations of fine coronal structures and the physics of micro- and nanoflares.

Optical coating technology for the EUV

NASA Astrophysics Data System (ADS)

Osantowski, J. F.; Keski-Kuha, R. A. M.; Herzig, H.; Toft, A. R.; Gum, J. S.; Fleetwood, C. M.

Adavaces in optical coating and materials technology are one of the key motivators for the development of missions such as the Far Ultraviolet Spectroscopic Explorer recently selected by NASA for an Explorer class mission in the mid 1990's. The performance of a range of candidate coatings are reviewed for normal-incidence and glancing-incidence applications, and attention is given to strengths and problem areas for their use in space. The importance of recent developments in multilayer films, chemical-vapor deposited SiC (CVD-SiC) mirrors, and SiC films are discussed in the context of EUV instrumentation design. For example, the choice of optical coatings is a design driver for the selection of the average glancing angle for the FUSE telescope, and impacts efficiency, short-wavelength cut-off, and physical size.

Optical coating technology for the EUV

NASA Technical Reports Server (NTRS)

Osantowski, J. F.; Keski-Kuha, R. A. M.; Herzig, H.; Toft, A. R.; Gum, J. S.; Fleetwood, C. M.

1991-01-01

Advances in optical coating and materials technology are one of the key motivators for the development of missions such as the Far Ultraviolet Spectroscopic Explorer recently selected by NASA for an Explorer class mission in the mid 1990's. The performance of a range of candidate coatings are reviewed for normal-incidence and glancing-incidence applications, and attention is given to strengths and problem areas for their use in space. The importance of recent developments in multilayer films, chemical-vapor deposited SiC (CVD-SiC) mirrors, and SiC films are discussed in the context of EUV instrumentation design. For example, the choice of optical coatings is a design driver for the selection of the average glancing angle for the FUSE telescope, and impacts efficiency, short-wavelength cut-off, and physical size.

Challenges of anamorphic high-NA lithography and mask making

NASA Astrophysics Data System (ADS)

Hsu, Stephen D.; Liu, Jingjing

2017-06-01

Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10.1117/12.2086074). To ensure no assist feature printing, the assist feature sizes need to be scaled with λ/NA. The extremely small SRAF width (below 25 nm on the reticle) is difficult to fabricate across the full reticle. In this paper, we introduce an innovative `attenuated SRAF' to improve SRAF manufacturability and still maintain the process window benefit. A new mask fabrication process is proposed to use existing mask-making capability to manufacture the attenuated SRAFs. The high-NA EUV system utilizes anamorphic reduction; 4× in the horizontal (slit) direction and 8× in the vertical (scanning) direction (J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150; B. Kneer, S. Migura, W. Kaiser, J. T. Neumann, J. van Schoot, in `Proc. SPIE9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94221G (2015) doi: 10.1117/12.2175488). For an anamorphic system, the magnification has an angular dependency, and thus, familiar mask specifications such as mask error factor (MEF) need to be redefined. Similarly, mask-manufacturing rule check (MRC) needs to consider feature orientation.

Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

DOEpatents

Ruffner, J.A.

1999-06-15

A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet (DUV) and Extreme Ultra-Violet (EUV) wavelengths. The method results in a product with minimum feature sizes of less than 0.10 [micro]m for the shortest wavelength (13.4 nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R[sup 2] factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates. 15 figs.

Low-cost method for producing extreme ultraviolet lithography optics

DOEpatents

Folta, James A [Livermore, CA; Montcalm, Claude [Fort Collins, CO; Taylor, John S [Livermore, CA; Spiller, Eberhard A [Mt. Kisco, NY

2003-11-21

Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

DOEpatents

Menoni, Carmen S [Fort Collins, CO; Rocca, Jorge J [Fort Collins, CO; Vaschenko, Georgiy [San Diego, CA; Bloom, Scott [Encinitas, CA; Anderson, Erik H [El Cerrito, CA; Chao, Weilun [El Cerrito, CA; Hemberg, Oscar [Stockholm, SE

2011-04-26

Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

Characterization of extreme ultraviolet laser ablation mass spectrometry for actinide trace analysis and nanoscale isotopic imaging

DOE Office of Scientific and Technical Information (OSTI.GOV)

Green, Tyler; Kuznetsov, Ilya; Willingham, David

The purpose of this research was to characterize Extreme Ultraviolet Time-of-Flight (EUV TOF) Laser Ablation Mass Spectrometry for high spatial resolution elemental and isotopic analysis. We compare EUV TOF results with Secondary Ionization Mass Spectrometry (SIMS) to orient the EUV TOF method within the overall field of analytical mass spectrometry. Using the well-characterized NIST 61x glasses, we show that the EUV ionization approach produces relatively few molecular ion interferences in comparison to TOF SIMS. We demonstrate that the ratio of element ion to element oxide ion is adjustable with EUV laser pulse energy and that the EUV TOF instrument hasmore » a sample utilization efficiency of 0.014%. The EUV TOF system also achieves a lateral resolution of 80 nm and we demonstrate this lateral resolution with isotopic imaging of closely spaced particles or uranium isotopic standard materials.« less

Sparkling extreme-ultraviolet bright dots observed with Hi-C

DOE Office of Scientific and Technical Information (OSTI.GOV)

Régnier, S.; Alexander, C. E.; Walsh, R. W.

Observing the Sun at high time and spatial scales is a step toward understanding the finest and fundamental scales of heating events in the solar corona. The high-resolution coronal (Hi-C) instrument has provided the highest spatial and temporal resolution images of the solar corona in the EUV wavelength range to date. Hi-C observed an active region on 2012 July 11 that exhibits several interesting features in the EUV line at 193 Å. One of them is the existence of short, small brightenings 'sparkling' at the edge of the active region; we call these EUV bright dots (EBDs). Individual EBDs havemore » a characteristic duration of 25 s with a characteristic length of 680 km. These brightenings are not fully resolved by the SDO/AIA instrument at the same wavelength; however, they can be identified with respect to the Hi-C location of the EBDs. In addition, EBDs are seen in other chromospheric/coronal channels of SDO/AIA, which suggests a temperature between 0.5 and 1.5 MK. Based on their frequency in the Hi-C time series, we define four different categories of EBDs: single peak, double peak, long duration, and bursty. Based on a potential field extrapolation from an SDO/HMI magnetogram, the EBDs appear at the footpoints of large-scale, trans-equatorial coronal loops. The Hi-C observations provide the first evidence of small-scale EUV heating events at the base of these coronal loops, which have a free magnetic energy of the order of 10{sup 26} erg.« less

EUV high resolution imager on-board solar orbiter: optical design and detector performances

NASA Astrophysics Data System (ADS)

Halain, J. P.; Mazzoli, A.; Rochus, P.; Renotte, E.; Stockman, Y.; Berghmans, D.; BenMoussa, A.; Auchère, F.

2017-11-01

The EUV high resolution imager (HRI) channel of the Extreme Ultraviolet Imager (EUI) on-board Solar Orbiter will observe the solar atmospheric layers at 17.4 nm wavelength with a 200 km resolution. The HRI channel is based on a compact two mirrors off-axis design. The spectral selection is obtained by a multilayer coating deposited on the mirrors and by redundant Aluminum filters rejecting the visible and infrared light. The detector is a 2k x 2k array back-thinned silicon CMOS-APS with 10 μm pixel pitch, sensitive in the EUV wavelength range. Due to the instrument compactness and the constraints on the optical design, the channel performance is very sensitive to the manufacturing, alignments and settling errors. A trade-off between two optical layouts was therefore performed to select the final optical design and to improve the mirror mounts. The effect of diffraction by the filter mesh support and by the mirror diffusion has been included in the overall error budget. Manufacturing of mirror and mounts has started and will result in thermo-mechanical validation on the EUI instrument structural and thermal model (STM). Because of the limited channel entrance aperture and consequently the low input flux, the channel performance also relies on the detector EUV sensitivity, readout noise and dynamic range. Based on the characterization of a CMOS-APS back-side detector prototype, showing promising results, the EUI detector has been specified and is under development. These detectors will undergo a qualification program before being tested and integrated on the EUI instrument.

On the Failure of Standard Emission Measure Analysis for Solar Extreme-Ultraviolet and Ultraviolet Irradiance Spectra

NASA Astrophysics Data System (ADS)

Judge, P. G.; Woods, T. N.; Brekke, P.; Rottman, G. J.

1995-12-01

We perform emission measure analysis of new and accurate UV ( lambda > 1200 A) and extreme-ultraviolet (EUV) ( lambda <= 1200 A) irradiance ("Sun-as-a-star") emission-line spectra of the Sun. Our data consist of (1) daily averaged UV irradiances from the SOLSTICE on the UARS spacecraft and (2) EUV irradiances obtained on the same date from a \\frac {1}{4} m spectrograph flown on a sounding rocket. Both instruments have a spectral resolution of roughly 1 A. The absolute uncertainties in these data are at most +/-15% (+/-2 sigma ), one of the highest photometric accuracies yet achieved. We find large, highly significant and systematic discrepancies in the emission measure analysis of transition region lines which can only be accounted for by a breakdown of one or more standard assumptions. All strong lines above 1000 A, which are from the Li and Na isoelectronic sequences, are too strong by factors of between 2.5 and 7 compared with their counterparts in the EUV region. Previous studies were tantalizingly close to finding these discrepancies, but those data lacked the wavelength coverage and relative photometric precision necessary for definitive conclusions. We argue that either dynamical effects, inaccurate treatments of atomic processes, and/or Lyman continuum absorption are the culprits. However, we favor the former explanation. In any event, this study should have implications for models of the solar transition region, for observing programs with the CDS and SUMER instruments on SOHO, and for analysis of UV spectra for stars across the cool half of the H-R diagram. Finally, the discrepancy is not seen for the "coronal" Li-like ions.

A New Relationship Between Soft X-Rays and EUV Flare Light Curves

NASA Astrophysics Data System (ADS)

Thiemann, Edward

2016-05-01

Solar flares are the result of magnetic reconnection in the solar corona which converts magnetic energy into kinetic energy resulting in the rapid heating of solar plasma. As this plasma cools, it emits radiation at different EUV wavelengths when the dropping temperature passes a line’s temperature of formation. This results in a delay in the emissions from cooler EUV lines relative to hotter EUV lines. Therefore, characterizing how this hot plasma cools is important for understanding how the corresponding geo-effective extreme ultraviolet (EUV) irradiance evolves in time. I present a simple new framework in which to study flare cooling by using a Lumped Element Thermal Model (LETM). LETM is frequently used in science and engineering to simplify a complex multi-dimensional thermal system by reducing it to a 0-D thermal circuit. For example, a structure that conducts heat out of a system is simplified with a resistive element and a structure that allows a system to store heat is simplified with a capacitive element. A major advantage of LETM is that the specific geometry of a system can be ignored, allowing for an intuitive analysis of the major thermal processes. I show that LETM is able to accurately reproduce the temporal evolution of cooler flare emission lines based on hotter emission line evolution. In particular, it can be used to predict the evolution of EUV flare light curves using the NOAA X-Ray Sensor (XRS).

Removal of Tin from Extreme Ultraviolet Collector Optics by an In-Situ Hydrogen Plasma

NASA Astrophysics Data System (ADS)

Elg, Daniel Tyler

Throughout the 1980s and 1990s, as the semiconductor industry upheld Moore's Law and continuously shrank device feature sizes, the wavelength of the lithography source remained at or below the resolution limit of the minimum feature size. Since 2001, however, the light source has been the 193nm ArF excimer laser. While the industry has managed to keep up with Moore's Law, shrinking feature sizes without shrinking the lithographic wavelength has required extra innovations and steps that increase fabrication time, cost, and error. These innovations include immersion lithography and double patterning. Currently, the industry is at the 14 nm technology node. Thus, the minimum feature size is an order of magnitude below the exposure wavelength. For the 10 nm node, triple and quadruple patterning have been proposed, causing potentially even more cost, fabrication time, and error. Such a trend cannot continue indefinitely in an economic fashion, and it is desirable to decrease the wavelength of the lithography sources. Thus, much research has been invested in extreme ultraviolet lithography (EUVL), which uses 13.5 nm light. While much progress has been made in recent years, some challenges must still be solved in order to yield a throughput high enough for EUVL to be commercially viable for high-volume manufacturing (HVM). One of these problems is collector contamination. Due to the 92 eV energy of a 13.5 nm photon, EUV light must be made by a plasma, rather than by a laser. Specifically, the industrially-favored EUV source topology is to irradiate a droplet of molten Sn with a laser, creating a dense, hot laser-produced plasma (LPP) and ionizing the Sn to (on average) the +10 state. Additionally, no materials are known to easily transmit EUV. All EUV light must be collected by a collector optic mirror, which cannot be guarded by a window. The plasmas used in EUV lithography sources expel Sn ions and neutrals, which degrade the quality of collector optics. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1-10 keV) of the ion debris. Debris mitigation methods have largely managed to reduce this problem by using collisions with H2 buffer gas to slow down the energetic ions. However, deposition can take place at all ion and neutral energies, and no mitigation method can deterministically deflect all neutrals away from the collector. Thus, deposition still takes place, lowering the collector reflectivity and increasing the time needed to deliver enough EUV power to pattern a wafer. Additionally, even once EUV reaches HVM insertion, source power will need to be continually increased as feature sizes continue to shrink; this increase in source power may potentially come at a cost of increased debris. Thus, debris mitigation solutions that work for the initial generation of commercial EUVL systems may not be adequate for future generations. An in-situ technology to clean collector optics without source downtime is required. which will require an in-situ technology to clean collector optics. The novel cleaning solution described in this work is to create the radicals directly on the collector surface by using the collector itself to drive a capacitively-coupled hydrogen plasma. This allows for radical creation at the desired location without requiring any delivery system and without requiring any source downtime. Additionally, the plasma provides energetic radicals that aid in the etching process. This work will focus on two areas. First, it will focus on experimental collector cleaning and EUV reflectivity restoration. Second, it will focus on developing an understanding of the fundamental processes governing Sn removal. It will be shown that this plasma technique can clean an entire collector optic and restore EUV reflectivity to MLMs without damaging them. Additionally, it will be shown that, within the parameter space explored, the limiting factor in Sn etching is not hydrogen radical flux or SnH4 decomposition but ion energy flux. This will be backed up by experimental measurements, as well as a plasma chemistry model of the radical density and a 3D model of SnH4 transport and redeposition.

Jupiter's Auroral Energy Input Observed by Hisaki/EXCEED and its Modulations by Io's Volcanic Activity

NASA Astrophysics Data System (ADS)

Tao, C.; Kimura, T.; Tsuchiya, F.; Murakami, G.; Yoshioka, K.; Kita, H.; Yamazaki, A.; Kasaba, Y.; Yoshikawa, I.; Fujimoto, M.

2016-12-01

Aurora is an important indicator representing the momentum transfer from the fast-rotating outer planet to the magnetosphere and the energy input into the atmosphere through the magnetosphere-ionosphere coupling. Long-term monitoring of Jupiter's northern aurora was achieved by the Extreme Ultraviolet (EUV) spectrometer called EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) onboard JAXA's Earth-orbiting planetary space telescope Hisaki until today after its launch in September 2013. We have proceeded the statistical survey of the Jupiter's auroral energy input into the upper atmosphere. The auroral electron energy is estimated using a hydrocarbon color ratio (CR) adopted for the wavelength range of EXCEED, and the emission power in the long wavelength range 138.5-144.8 nm is used as an indicator of total emitted power before hydrocarbon absorption and auroral electron energy flux. Temporal dynamic variation of the auroral intensity was detected when Io's volcanic activity and thus EUV emission from the Io plasma torus are enhanced in the early 2015. Average of the total input power over 80 days increases by 10% with sometimes sporadically more than a factor of 3 upto 7, while the CR indicates the auroral electron energy decrease by 20% during the volcanic event compared to the other period. This indicates much more increase in the current system and Joule heating which contributes heating of the upper atmosphere. We will discuss the impact of this event on the upper atmosphere and ionosphere.

Efficient high-harmonic generation from a stable and compact ultrafast Yb-fiber laser producing 100 μJ, 350 fs pulses based on bendable photonic crystal fiber

NASA Astrophysics Data System (ADS)

Feehan, James S.; Price, Jonathan H. V.; Butcher, Thomas J.; Brocklesby, William S.; Frey, Jeremy G.; Richardson, David J.

2017-01-01

The development of an Yb3+-fiber-based chirped-pulse amplification system and the performance in the generation of extreme ultraviolet (EUV) radiation by high-harmonic generation is reported. The fiber laser produced 100 μJ, 350 fs output pulses with diffraction-limited beam quality at a repetition rate of 16.7 kHz. The system used commercial single-mode, polarization maintaining fiber technology. This included a 40 μm core, easily packaged, bendable final amplifier fiber in order to enable a compact system, to reduce cost, and provide reliable and environmentally stable long-term performance. The system enabled the generation of 0.4 μW of EUV at wavelengths between 27 and 80 nm with a peak at 45 nm using xenon gas. The EUV flux of 1011 photons per second for a driving field power of 1.67 W represents state-of-the-art generation efficiency for single-fiber amplifier CPA systems, corresponding to a maximum calculated energy conversion efficiency of 2.4 × 10-7 from the infrared to the EUV. The potential for high average power operation at increased repetition rates and further suggested technical improvements are discussed. Future applications could include coherent diffractive imaging in the EUV, and high-harmonic spectroscopy.

Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chai, Kil-Byoung; Bellan, Paul M.

2013-12-15

An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

The creation of radiation dominated plasmas using laboratory extreme ultra-violet lasers

NASA Astrophysics Data System (ADS)

Tallents, G. J.; Wilson, S.; West, A.; Aslanyan, V.; Lolley, J.; Rossall, A. K.

2017-06-01

Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet (EUV) lasers is examined. Free electron degeneracy effects on ionization in the presence of a high EUV flux of radiation is shown to be important. Overlap of the physics of such plasmas with plasma material under compression in indirect inertial fusion is explored. The design of the focusing optics needed to achieve high irradiance (up to 1014 Wcm-2) using an EUV capillary laser is presented.

High-resolution measurements in the EUV on NSTX

NASA Astrophysics Data System (ADS)

Beiersdorfer, P.; Bitter, M.; Lepson, J. K.; Gu, M.-F.

2005-10-01

The extreme ultraviolet (EUV) wavelength band is rich in lines useful as plasma diagnostics. This fact is being used by the Chandra and XMM-Newton satellites for studying stellar coronae and galactic nuclei. We have installed a new grating spectrometer on the NSTX tokamak that allows us to study emission lines in the EUV with similar spectral resolution. We have observed the K-shell lines of heliumlike and hydrogenlike boron, carbon, and oxygen. Moreover, we have measured the L-shell spectra of neonlike Ar, Fe, and Ni. All elements except argon were intrinsic to NSTX plasmas. Many of these spectra are of great interest to astrophysics. Our measurements provide line lists and calibrate density-sensitive line ratios in a density regime not accessible by other laboratory sources. Moreover, we were able to measure the temperature dependence of several iron lines needed to address puzzling results from stellar flare plasmas. This work was performed under the auspices of the U.S. DOE by UC-LLNL under contract W-7405-Eng-48 and by PPPL under contract DE-AC02-76CHO3073.

Final Report, January 1991 - July 1992

NASA Astrophysics Data System (ADS)

Ferrara, Jon

1992-07-01

This report covers final schedules, expenses and billings, monthly reports, testing, and deliveries for this contract. The goal of the detector development program for the Solar and Heliospheric Spacecraft (SOHO) EUV Imaging Telescope (EIT) is an Extreme UltraViolet (EUV) CCD (Change Collecting Device) camera. As a part of the CCD screening effort, the quantum efficiency (QE) of a prototype CCD has been measured in the NRL EUV laboratory over the wavelength range of 256 to 735 Angstroms. A simplified model has been applied to these QE measurements to illustrate the relevant physical processes that determine the performance of the detector. The charge transfer efficiency (CTE) characteristics of the Tektronix 1024 X 1024 CCD being developed for STIS/SOHO space imaging applications have been characterized at different signal levels, operating conditions, and temperatures using a variety of test methods. A number of CCD's have been manufactured using processing techniques developed to improve CTE, and test results on these devices will be used in determining the final chip design. In this paper, we discuss the CTE test methods used and present the results and conclusions of these tests.

Plans for the extreme ultraviolet explorer data base

NASA Technical Reports Server (NTRS)

Marshall, Herman L.; Dobson, Carl A.; Malina, Roger F.; Bowyer, Stuart

1988-01-01

The paper presents an approach for storage and fast access to data that will be obtained by the Extreme Ultraviolet Explorer (EUVE), a satellite payload scheduled for launch in 1991. The EUVE telescopes will be operated remotely from the EUVE Science Operation Center (SOC) located at the University of California, Berkeley. The EUVE science payload consists of three scanning telescope carrying out an all-sky survey in the 80-800 A spectral region and a Deep Survey/Spectrometer telescope performing a deep survey in the 80-250 A spectral region. Guest Observers will remotely access the EUVE spectrometer database at the SOC. The EUVE database will consist of about 2 X 10 to the 10th bytes of information in a very compact form, very similar to the raw telemetry data. A history file will be built concurrently giving telescope parameters, command history, attitude summaries, engineering summaries, anomalous events, and ephemeris summaries.

Extreme ultraviolet spectra of Venusian airglow observed by EXCEED

NASA Astrophysics Data System (ADS)

Nara, Yusuke; Yoshikawa, Ichiro; Yoshioka, Kazuo; Murakami, Go; Kimura, Tomoki; Yamazaki, Atsushi; Tsuchiya, Fuminori; Kuwabara, Masaki; Iwagami, Naomoto

2018-06-01

Extreme ultraviolet (EUV) spectra of Venus in the wavelength range 520 - 1480 Å with 3 - 4 Å resolutions were obtained in March 2014 by an EUV imaging spectrometer EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) on the HISAKI spacecraft. Due to its high sensitivity and long exposure time, many new emission lines and bands were identified. Already known emissions such as the O II 834 Å, O I 989 Å, H ILy - β 1026 Å, and the C I 1277 Å lines (Broadfoot et al., 1974; Bertaux et al., 1980; Feldman et al., 2000) are also detected in the EXCEED spectrum. In addition, N2 band systems such as the Lyman-Birge-Hopfield (a 1Πg - X 1Σg+) (2, 0), (2, 1), (3, 1), (3, 2) and (5, 3) bands, the Birge-Hopfield (b1Πu - X 1 Σg+) (1, 3) band, and the Carroll-Yoshino (c 4‧ 1 Σu+ - X 1Σg+) (0, 0) and (0, 1) bands together are identified for the first time in the Venusian airglow. We also identified the CO Hopfield-Birge (B 1Σ+ - X 1Σ+) (1, 0) band in addition to the already known (0, 0) band, and the CO Hopfield-Birge (C 1Σ+ - X 1Σ+) (0, 1), (0, 2) bands in addition to the already known (0, 0) band (Feldman et al., 2000; Gérard et al., 2011).

Extreme ultraviolet spectroscopy diagnostics of low-temperature plasmas based on a sliced multilayer grating and glass capillary optics.

PubMed

Kantsyrev, V L; Safronova, A S; Williamson, K M; Wilcox, P; Ouart, N D; Yilmaz, M F; Struve, K W; Voronov, D L; Feshchenko, R M; Artyukov, I A; Vinogradov, A V

2008-10-01

New extreme ultraviolet (EUV) spectroscopic diagnostics of relatively low-temperature plasmas based on the application of an EUV spectrometer and fast EUV diodes combined with glass capillary optics is described. An advanced high resolution dispersive element sliced multilayer grating was used in the compact EUV spectrometer. For monitoring of the time history of radiation, filtered fast EUV diodes were used in the same spectral region (>13 nm) as the EUV spectrometer. The radiation from the plasma was captured by using a single inexpensive glass capillary that was transported onto the spectrometer entrance slit and EUV diode. The use of glass capillary optics allowed placement of the spectrometer and diodes behind the thick radiation shield outside the direction of a possible hard x-ray radiation beam and debris from the plasma source. The results of the testing and application of this diagnostic for a compact laser plasma source are presented. Examples of modeling with parameters of plasmas are discussed.

An extreme ultraviolet spectrometer experiment for the Shuttle Get Away Special Program

NASA Technical Reports Server (NTRS)

Conway, R. R.; Mccoy, R. P.; Meier, R. R.; Mount, G. H.; Prinz, D. K.; Young, J. M.; Carruthers, G. R.

1984-01-01

An extreme ultraviolet (EUV) spectrometer experiment operated successfully during the STS-7 mission in an experiment to measure the global and diurnal variation of the EUV airglow. The spectrometer is an F 3.5 Wadsworth mount with mechanical collimator, a 75 x 75 mm grating, and a bare microchannel plate detector providing a spectral resolution of 7 X FWHM. Read-out of the signal is through discrete channels or resistive anode techniques. The experiment includes a microcomputer, 20 Mbit tape recorder, and a 28V, 40 Ahr silver-zinc battery. It is the first GAS payload to use an opening door. The spectrometer's 0.1 x 4.2 deg field of view is pointed vertically out of the shuttle bay. During the STS-7 flight data were acquired continuously for a period of 5 hours and 37 minutes, providing spectra of the 570 A to 850 A wavelength region of the airglow. Five diurnal cycles of the 584 A emission of neutral helium and the 834 A emission of ionized atomic oxygen were recorded. The experiment also recorded ion events and pressure pulses associated with thruster firings. The experiment is to fly again on Mission 41-F.

Prospective EUV observations of hot DA white dwarfs with the EUV Explorer

NASA Technical Reports Server (NTRS)

Finley, David S.; Malina, Roger F.; Bowyer, Stuart

1987-01-01

The Extreme Ultraviolet Explorer (EUVE) will perform a high sensitivity EUV all-sky survey. A major category of sources which will be detected with the EUVE instruments consists of hot white dwarfs. Detailed preliminary studies of synthetic EUV observations of white dwarfs have been carried out using the predicted EUVE instrumental response functions. Using available information regarding space densities of white dwarfs and the distribution of neutral hydrogen in the interstellar medium, the numbers of DA white dwarfs which will be detectable in the different EUV bandpasses have been estimated.

EUV emission spectra in collisions of highly charged tantalum ions with nitrogen and oxygen molecules

NASA Astrophysics Data System (ADS)

Tanuma, Hajime; Numadate, Naoki; Uchikura, Yoshiyuki; Shimada, Kento; Akutsu, Takuto; Long, Elaine; O'Sullivan, Gerry

2017-10-01

We have performed ion beam collision experiments using multiply charged tantalum ions and observed EUV (extreme ultra-violet) emission spectra in collisions of ions with molecular targets, N2 and O2. Broad UTAs (un-resolved transition arrays) from multiply charged Ta ions were observed, and the mean wavelengths of the UTAs shifted and became shorter at higher charge statea of Ta ions. These UTAs may be attributed to the 4f-5d and 4f-5g transitions. Not only the UTA emission from incident ions, but also the sharp emission lines from multiply charged fragment atomic ions were observed. Production of temporary highly charged molecular ions, their kinetic energy and fragmentation processes have been investigated with coincident detection technique. However, the observation of emission from the fragments might be for the first time. The formation mechanisms of the multiply charged fragment atomic ions from target molecules are discussed.

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

NASA Astrophysics Data System (ADS)

Huang, Qiushi; Medvedev, Viacheslav; van de Kruijs, Robbert; Yakshin, Andrey; Louis, Eric; Bijkerk, Fred

2017-03-01

Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

NEW Fe IX LINE IDENTIFICATIONS USING SOLAR AND HELIOSPHERIC OBSERVATORY/SOLAR ULTRAVIOLET MEASUREMENT OF EMITTED RADIATION AND HINODE/EIS JOINT OBSERVATIONS OF THE QUIET SUN

DOE Office of Scientific and Technical Information (OSTI.GOV)

Landi, E.; Young, P. R.

2009-12-20

In this work, we study joint observations of Hinode/EUV Imaging Spectrometer (EIS) and Solar and Heliospheric Observatory/Solar Ultraviolet Measurement of Emitted Radiation of Fe IX lines emitted by the same level of the high energy configuration 3s {sup 2}3p {sup 5}4p. The intensity ratios of these lines are dependent on atomic physics parameters only and not on the physical parameters of the emitting plasma, so that they are excellent tools to verify the relative intensity calibration of high-resolution spectrometers that work in the 170-200 A and 700-850 A wavelength ranges. We carry out extensive atomic physics calculations to improve themore » accuracy of the predicted intensity ratio, and compare the results with simultaneous EIS-SUMER observations of an off-disk quiet Sun region. We were able to identify two ultraviolet lines in the SUMER spectrum that are emitted by the same level that emits one bright line in the EIS wavelength range. Comparison between predicted and measured intensity ratios, wavelengths and energy separation of Fe IX levels confirms the identifications we make. Blending and calibration uncertainties are discussed. The results of this work are important for cross-calibrating EIS and SUMER, as well as future instrumentation.« less

SUMER: Solar Ultraviolet Measurements of Emitted Radiation

NASA Technical Reports Server (NTRS)

Wilhelm, K.; Axford, W. I.; Curdt, W.; Gabriel, A. H.; Grewing, M.; Huber, M. C. E.; Jordan, S. D.; Kuehne, M.; Lemaire, P.; Marsch, E.

1992-01-01

The experiment Solar Ultraviolet Measurements of Emitted Radiation (SUMER) is designed for the investigations of plasma flow characteristics, turbulence and wave motions, plasma densities and temperatures, structures and events associated with solar magnetic activity in the chromosphere, the transition zone and the corona. Specifically, SUMER will measure profiles and intensities of Extreme Ultraviolet (EUV) lines emitted in the solar atmosphere ranging from the upper chromosphere to the lower corona; determine line broadenings, spectral positions and Doppler shifts with high accuracy, provide stigmatic images of selected areas of the Sun in the EUV with high spatial, temporal and spectral resolution and obtain full images of the Sun and the inner corona in selectable EUV lines, corresponding to a temperature from 10,000 to more than 1,800,000 K.

Monolithic pattern-sensitive detector

DOEpatents

Berger, Kurt W.

2000-01-01

Extreme ultraviolet light (EUV) is detected using a precisely defined reference pattern formed over a shallow junction photodiode. The reference pattern is formed in an EUV absorber preferably comprising nickel or other material having EUV- and other spectral region attenuating characteristics. An EUV-transmissive energy filter is disposed between a passivation oxide layer of the photodiode and the EUV transmissive energy filter. The device is monolithically formed to provide robustness and compactness.

Understanding the Early Evolution of M dwarf Extreme Ultraviolet Radiation

NASA Astrophysics Data System (ADS)

Peacock, Sarah; Barman, Travis; Shkolnik, Evgenya

2015-11-01

The chemistry and evolution of planetary atmospheres depends on the evolution of high-energy radiation emitted by its host star. High levels of extreme ultraviolet (EUV) radiation can drastically alter the atmospheres of terrestrial planets through ionizing, heating, expanding, chemically modifying and eroding them during the first few billion years of a planetary lifetime. While there is evidence that stars emit their highest levels of far and near ultraviolet (FUV; NUV) radiation in the earliest stages of their evolution, we are currently unable to directly measure the EUV radiation. Most previous stellar atmosphere models under-predict FUV and EUV emission from M dwarfs; here we present new models for M stars that include prescriptions for the hot, lowest density atmospheric layers (chromosphere, transition region and corona), from which this radiation is emitted. By comparing our model spectra to GALEX near and far ultraviolet fluxes, we are able to predict the evolution of EUV radiation for M dwarfs from 10 Myr to a few Gyr. This research is the next major step in the HAZMAT (HAbitable Zones and M dwarf Activity across Time) project to analyze how the habitable zone evolves with the evolving properties of stellar and planetary atmospheres.

Surface roughness control by extreme ultraviolet (EUV) radiation

NASA Astrophysics Data System (ADS)

Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

2017-10-01

Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

Complete spectral energy distribution of the hot, helium-rich white dwarf RX J0503.9-2854

NASA Astrophysics Data System (ADS)

Hoyer, D.; Rauch, T.; Werner, K.; Kruk, J. W.; Quinet, P.

2017-02-01

Context. In the line-of-sight toward the DO-type white dwarf RX J0503.9-2854, the density of the interstellar medium (ISM) is very low, and thus the contamination of the stellar spectrum almost negligible. This allows us to identify many metal lines in a wide wavelength range from the extreme ultraviolet to the near infrared. Aims: In previous spectral analyses, many metal lines in the ultraviolet spectrum of RX J0503.9-2854 have been identified. A complete line list of observed and identified lines is presented here. Methods: We compared synthetic spectra that had been calculated from model atmospheres in non-local thermodynamical equilibrium, with observations. Results: In total, we identified 1272 lines (279 of them were newly assigned) in the wavelength range from the extreme ultraviolet to the near infrared. 287 lines remain unidentified. A close inspection of the EUV shows that still no good fit to the observed shape of the stellar continuum flux can be achieved although He, C, N, O, Al, Si, P, S, Ca, Sc, Ti, V, Cr, Mn, Fe, Cr, Ni Zn, Ga, Ge, As, Kr, Zr, Mo, Sn, Xe, and Ba are included in the stellar atmosphere models. Conclusions: There are two possible reasons for the deviation between observed and synthetic flux in the EUV. Opacities from hitherto unconsidered elements in the model-atmosphere calculation may be missing, and/or the effective temperature is slightly lower than previously determined. Based on observations with the NASA/ESA Hubble Space Telescope, obtained at the Space Telescope Science Institute, which is operated by the Association of Universities for Research in Astronomy, Inc., under NASA contract NAS5-26666.Based on observations made with the NASA-CNES-CSA Far Ultraviolet Spectroscopic Explorer.Based on observations made with ESO Telescopes at the La Silla Paranal Observatory under program IDs 072.D-0362, 165.H-0588, and 167.D-0407.Tables A.1-A.5 are only available at the CDS via anonymous ftp to http://cdsarc.u-strasbg.fr (http://130.79.128.5) or via http://cdsarc.u-strasbg.fr/viz-bin/qcat?J/A+A/598/A135

Extreme Ultraviolet Variability Experiment (EVE) on the Solar Dynamics Observatory (SDO): Overview of Science Objectives, Instrument Design, Data Products, and Model Developments

NASA Technical Reports Server (NTRS)

Woods, T. N.; Eparvier, F. G.; Hock, R.; Jones, A. R.; Woodraska, D.; Judge, D.; Didkovsky, L.; Lean, J.; Mariska, J.; Warren, H.;

An investigation of solar erythemal ultraviolet radiation at two sites in tourist attraction areas of Thailand

NASA Astrophysics Data System (ADS)

Buntoung, Sumaman; Pattarapanitchai, Somjet; Wattan, Rungrat; Masiri, Itsara; Promsen, Worrapass; Tohsing, Korntip; Janjai, Serm

2013-05-01

Islands on the southern coasts of Thailand are famous attractions for local and foreign tourists. Tourists usually expose their skins to solar radiation for tanning. Thus information on solar ultraviolet radiation (UV) is of importance for tourists to protect themselves from adverse effects of UV. In this work, solar erythemal ultraviolet radiation (EUV) at two touristic sites namely Samui island (9.451°N, 100.033°E) and Phuket island (8.104°N, 98.304°E) was investigated. In investigating EUV, broadband UV radiometers (Kipp & Zonen, model UVS-B-C) were installed at existing meteorological stations in Samui and Phuket islands. A one-year period of EUV data from these two sites was analyzed. The level of UV index at these sites was studied. The values of UV index higher than 12 at noon time of clear days are usually found in the summer at both sites. Seasonal variation of EUV at both sites was investigated. It was found that the tropical monsoons have strong influence on this variation. Finally, global broadband radiation measured at the sites was also used to establish a correlation between EUV and global broadband radiation. Higher correlation was found for the case of clear sky, as compared to the case of cloudy sky. The correlation obtained from this analysis can be used to estimate EUV from global broadband radiation at these two sites.

EUVE observations of the Moon

NASA Technical Reports Server (NTRS)

Gladstone, G. R.; Mcdonald, J. S.; Boyd, W. T.

1993-01-01

During its all-sky survey, the Extreme Ultraviolet Explorer (EUVE) satellite observed the Moon several times at first and last quarters, and once near the Dec. 10, 1992 lunar eclipse. We present a preliminary reduction and analysis of this data, in the form of EUV images of the Moon and derived albedos.

The Extreme Ultraviolet Explorer mission - Overview and initial results

NASA Technical Reports Server (NTRS)

Haisch, B.; Bowyer, S.; Malina, R. F.

1993-01-01

The history of extreme ultraviolet (EUV) astronomy is briefly reviewed, and an overview of the Extreme Ultraviolet Explorer mission, launched into a near-earth (550 km) orbit on June 7, 1992, is presented. First, the principal objective of the mission are summarized. The instrumentation and operation of the mission are then described, with particular attention given to the sky survey instruments, the deep survey instrument, and the spectrometers. The discussion also covers the current view of the interstellar medium, early results from the mission, and future prospects for EUV astronomy.

Extreme ultraviolet reflection efficiencies of diamond-turned aluminum, polished nickel, and evaporated gold surfaces. [for telescope mirrors

NASA Technical Reports Server (NTRS)

Malina, R. F.; Cash, W.

1978-01-01

Measured reflection efficiencies are presented for flat samples of diamond-turned aluminum, nickel, and evaporated gold surfaces fabricated by techniques suited for EUV telescopes. The aluminum samples were 6.2-cm-diameter disks of 6061-T6, the electroless nickel samples were formed by plating beryllium disks with 7.5-microns of Kanigen. Gold samples were produced by coating the aluminum and nickel samples with 5 strips of evaporated gold. Reflection efficiencies are given for grazing angles in the 5-75 degree range. The results indicate that for wavelengths over about 100 A, the gold-coated nickel samples yield highest efficiencies. For shorter wavelengths, the nickel samples yield better efficiencies. 500 A is found to be the optimal gold thickness.

Design considerations of 10 kW-scale extreme ultraviolet SASE FEL for lithography

NASA Astrophysics Data System (ADS)

Pagani, C.; Saldin, E. L.; Schneidmiller, E. A.; Yurkov, M. V.

2001-05-01

The semiconductor industry growth is driven to a large extent by steady advancements in microlithography. According to the newly updated industry roadmap, the 70 nm generation is anticipated to be available in the year 2008. However, the path to get there is not obvious. The problem of construction of Extreme Ultraviolet (EUV) quantum laser for lithography is still unsolved: progress in this field is rather moderate and we cannot expect a significant break through in the near future. Nevertheless, there is clear path for optical lithography to take us to sub- 100 nm dimensions. Theoretical and experimental work in free electron laser (FEL) and accelerator physics and technology over the last 10 years has pointed to the possibility of generation of high-power optical beams with laser-like characteristics in the EUV spectral range. Recently, there have been important advances in demonstrating a high-gain self-amplified spontaneous emission (SASE) FEL at 100 nm wavelength (Andruszkov et al., Phys. Rev. Lett. 85 (2000), 3825). In the SASE FEL powerful, coherent radiation is produced by the electron beam during single-pass of the undulator, thus there are no apparent limitations which would prevent operation at very short wavelength range and to increase the average output power of this device up to 10 kW level. The use of superconducting energy-recovery linac could produce a major, cost-effective facility with wall plug power to output optical power efficiency of about 1%. A 10-kW-scale transversely coherent radiation source with narrow bandwidth (0.5%) and variable wavelength could be an excellent tool for manufacturing computer chips with the minimum feature size below 100 nm. All components of the proposed SASE FEL equipment (injector, driver accelerator structure, energy-recovery system, undulator, etc.) have been demonstrated in practice. This is guaranteed success in the time schedule requirement.

Design considerations of 10 kW-scale, extreme ultraviolet SASE FEL for lithography

NASA Astrophysics Data System (ADS)

Pagani, C.; Saldin, E. L.; Schneidmiller, E. A.; Yurkov, M. V.

2001-12-01

The semiconductor industry growth is driven to a large extent by steady advancements in microlithography. According to the newly updated industry road map, the 70 nm generation is anticipated to be available in the year 2008. However, the path to get there is not clear. The problem of construction of extreme ultraviolet (EUV) quantum lasers for lithography is still unsolved: progress in this field is rather moderate and we cannot expect a significant breakthrough in the near future. Nevertheless, there is clear path for optical lithography to take us to sub-100 nm dimensions. Theoretical and experimental work in Self-Amplified Spontaneous Emission (SASE) Free Electron Lasers (FEL) physics and the physics of superconducting linear accelerators over the last 10 years has pointed to the possibility of the generation of high-power optical beams with laser-like characteristics in the EUV spectral range. Recently, there have been important advances in demonstrating a high-gain SASE FEL at 100 nm wavelength (J. Andruszkov, et al., Phys. Rev. Lett. 85 (2000) 3821). The SASE FEL concept eliminates the need for an optical cavity. As a result, there are no apparent limitations which would prevent operating at very short wavelength range and increasing the average output power of this device up to 10-kW level. The use of super conducting energy-recovery linac could produce a major, cost-efficient facility with wall plug power to output optical power efficiency of about 1%. A 10-kW scale transversely coherent radiation source with narrow bandwidth (0.5%) and variable wavelength could be excellent tool for manufacturing computer chips with the minimum feature size below 100 nm. All components of the proposed SASE FEL equipment (injector, driver accelerator structure, energy recovery system, undulator, etc.) have been demonstrated in practice. This is guaranteed success in the time-schedule requirement.

Pluto's Ultraviolet Airglow and Detection of Ions in the Upper Atmosphere

NASA Astrophysics Data System (ADS)

Steffl, A.; Young, L. A.; Kammer, J.; Gladstone, R.; Hinson, D. P.; Summers, M. E.; Strobel, D. F.; Stern, S. A.; Weaver, H. A., Jr.; Olkin, C.; Ennico Smith, K.

2017-12-01

In July 2015, the Alice ultraviolet spectrograph aboard the New Horizons spacecraft made numerous observations of Pluto and its atmosphere. We present here the far ultraviolet reflectance spectrum of Pluto and airglow emissions from its atmosphere. At wavelengths greater than 1400Å, Pluto's spectrum is dominated by sunlight reflected from the surface of the planet. Various hydrocarbon species such as C2H4 are detected in absorption of the solar continuum. Below 1400Å, Pluto's atmosphere is opaque and the surface cannot be detected. However, after carefully removing various sources of background light, we see extremely faint airglow emissions (<0.05 Rayleighs/Ångstrom) from Pluto's atmosphere. All of the emissions are produced by nitrogen in various forms: molecular, atomic, and singly ionized. The detection of N+ at 1086Å is the first, and thus far only, direct detection of ions in Pluto's atmosphere. This N+ emission line is produced primarily by dissociative photoionization of molecular N2 by solar EUV photons (energy > 34.7 eV; wavelength < 360Å). Notably absent from Pluto's spectrum are emission lines from argon at 1048 and 1067Å. We place upper limits on the amount of argon in Pluto's atmosphere above the tau=1 level (observed to be at 750km tangent altitude) that are significantly lower than pre-encounter atmospheric models.

The far ultraviolet spectrum of Pluto and the discovery of its ionosphere

NASA Astrophysics Data System (ADS)

Steffl, A.; Stern, A.; Gladstone, R.; Parker, J. W.; Greathouse, T. K.; Retherford, K. D.; Young, L. A.; Schindhelm, E.; Kammer, J.; Strobel, D. F.; Summers, M. E.; Versteeg, M.; Olkin, C.; Weaver, H. A., Jr.; Hinson, D. P.; Linscott, I.

2016-12-01

During the New Horizons spacecraft's encounter with Pluto in July 2015, the Alice far ultraviolet spectrograph made numerous observations of Pluto and its atmosphere. We present here the far ultraviolet spectrum of Pluto. We observe faint emission (<0.01 Rayleighs/Ångstrom) from singly ionized nitrogen at 108.6 nm-the first detection of an ionosphere at Pluto. This N+ line is produced primarily by dissociative photoionization of molecular N2 by solar EUV photons (energy > 34.7 eV; wavelength < 36nm). Notably absent from Pluto's spectrum are emission lines from argon at 104.8 and 106.7 nm. We place upper limits on the amount of argon in Pluto's atmosphere above the tau=1 level (observed to be at 750km tangent altitude) that are significantly lower than previous models. We also identify and derive column densities for various hydrocarbon species such as C2H4 through their absorption of sunlight reflected from Pluto's surface.

Telescience - Concepts and contributions to the Extreme Ultraviolet Explorer mission

NASA Technical Reports Server (NTRS)

Marchant, Will; Dobson, Carl; Chakrabarti, Supriya; Malina, Roger F.

1987-01-01

It is shown how the contradictory goals of low-cost and fast data turnaround characterizing the Extreme Ultraviolet Explorer (EUVE) mission can be achieved via the early use of telescience style transparent tools and simulations. The use of transparent tools reduces the parallel development of capability while ensuring that valuable prelaunch experience is not lost in the operations phase. Efforts made to upgrade the 'EUVE electronics' simulator are described.

Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy.

PubMed

Schriever, G; Mager, S; Naweed, A; Engel, A; Bergmann, K; Lebert, R

1998-03-01

Extended ultraviolet (EUV) emission characteristics of a laser-produced lithium plasma are determined with regard to the requirements of x-ray photoelectron spectroscopy. The main features of interest are spectral distribution, photon flux, bandwidth, source size, and emission duration. Laser-produced lithium plasmas are characterized as emitters of intense narrow-band EUV radiation. It can be estimated that the lithium Lyman-alpha line emission in combination with an ellipsoidal silicon/molybdenum multilayer mirror is a suitable EUV source for an x-ray photoelectron spectroscopy microscope with a 50-meV energy resolution and a 10-mum lateral resolution.

Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source.

PubMed

Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

2007-03-01

A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 microm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2 x 10(11) Wcm(2) with a spot diameter of 175 microm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

2007-03-01

A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 μm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2×1011 W/cm2 with a spot diameter of 175 μm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

Microchannel plate EUV detectors for the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Siegmund, O. H. W.; Malina, R. F.; Coburn, K.; Werthimer, D.

1984-01-01

The design and operating characteristics of the prototype imaging microchannel plate (MCP) detector for the Extreme Ultraviolet Explorer (EUVE) Satellite are discussed. It is shown that this detector has achieved high position resolution performance (greater than 512 x 512 pixels) and has low (less than one percent) image distortion. In addition, the channel plate scheme used has tight pulse height distributions (less than 40 percent FWHM) for UV radiation and displays low (less than 0.2 cnt/sq cm-s) dark background counting rates. Work that has been done on EUV filters in relation to the envisaged filter and photocathode complement is also described.

Quality control of EUVE databases

NASA Technical Reports Server (NTRS)

John, L. M.; Drake, J.

1992-01-01

The publicly accessible databases for the Extreme Ultraviolet Explorer include: the EUVE Archive mailserver; the CEA ftp site; the EUVE Guest Observer Mailserver; and the Astronomical Data System node. The EUVE Performance Assurance team is responsible for verifying that these public EUVE databases are working properly, and that the public availability of EUVE data contained therein does not infringe any data rights which may have been assigned. In this poster, we describe the Quality Assurance (QA) procedures we have developed from the approach of QA as a service organization, thus reflecting the overall EUVE philosophy of Quality Assurance integrated into normal operating procedures, rather than imposed as an external, post facto, control mechanism.

HOMOLOGOUS SOLAR EVENTS ON 2011 JANUARY 27: BUILD-UP AND PROPAGATION IN A COMPLEX CORONAL ENVIRONMENT

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pick, M.; Démoulin, P.; Zucca, P.

2016-05-20

In spite of the wealth of imaging observations at the extreme-ultraviolet (EUV), X-ray, and radio wavelengths, there are still relatively few cases where all of the imagery is available to study the full development of a coronal mass ejection (CME) event and its associated shock. The aim of this study is to contribute to the understanding of the role of the coronal environment in the development of CMEs and the formation of shocks, and their propagation. We have analyzed the interactions of a couple of homologous CME events with ambient coronal structures. Both events were launched in a direction farmore » from the local vertical, and exhibited a radical change in their direction of propagation during their progression from the low corona into higher altitudes. Observations at EUV wavelengths from the Atmospheric Imaging Assembly instrument on board the Solar Dynamic Observatory were used to track the events in the low corona. The development of the events at higher altitudes was followed by the white-light coronagraphs on board the Solar and Heliospheric Observatory . Radio emissions produced during the development of the events were well recorded by the Nançay solar instruments. Thanks to their detection of accelerated electrons, the radio observations are an important complement to the EUV imaging. They allowed us to characterize the development of the associated shocks, and helped to unveil the physical processes behind the complex interactions between the CMEs and ambient medium (e.g., compression, reconnection).« less

Application of Laser Plasma Sources of Soft X-rays and Extreme Ultraviolet (EUV) in Imaging, Processing Materials and Photoionization Studies

NASA Astrophysics Data System (ADS)

Fiedorowicz, H.; Bartnik, A.; Wachulak, P. W.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Ahad, I. U.; Fok, T.; Szczurek, A.; Wȩgrzyński, Ł.

In the paper we present new applications of laser plasma sources of soft X-rays and extreme ultraviolet (EUV) in various areas of plasma physics, nanotechnology and biomedical engineering. The sources are based on a gas puff target irradiated with nanosecond laser pulses from commercial Nd: YAG lasers, generating pulses with time duration from 1 to 10 ns and energies from 0.5 to 10 J at a 10 Hz repetition rate. The targets are produced with the use of a double valve system equipped with a special nozzle to form a double-stream gas puff target which allows for high conversion efficiency of laser energy into soft X-rays and EUV without degradation of the nozzle. The sources are equipped with various optical systems to collect soft X-ray and EUV radiation and form the radiation beam. New applications of these sources in imaging, including EUV tomography and soft X-ray microscopy, processing of materials and photoionization studies are presented.

Pattern Inspection of EUV Masks Using DUV Light

NASA Astrophysics Data System (ADS)

Liang, Ted; Tejnil, Edita; Stivers, Alan R.

2002-12-01

Inspection of extreme ultraviolet (EUV) lithography masks requires reflected light and this poses special challenges for inspection tool suppliers as well as for mask makers. Inspection must detect all the printable defects in the absorber pattern as well as printable process-related defects. Progress has been made under the NIST ATP project on "Intelligent Mask Inspection Systems for Next Generation Lithography" in assessing the factors that impact the inspection tool sensitivity. We report in this paper the inspection of EUV masks with programmed absorber defects using 257nm light. All the materials of interests for masks are highly absorptive to EUV light as compared to deep ultraviolet (DUV) light. Residues and contamination from mask fabrication process and handling are prone to be printable. Therefore, it is critical to understand their EUV printability and optical inspectability. Process related defects may include residual buffer layer such as oxide, organic contaminants and possible over-etch to the multilayer surface. Both simulation and experimental results will be presented in this paper.

Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mirkarimi, Paul B.; Bajt, Sasa; Wall, Mark A.

2000-04-01

Multilayer-coated Zerodur optics are expected to play a pivotal role in an extreme-ultraviolet (EUV) lithography tool. Zerodur is a multiphase, multicomponent material that is a much more complicated substrate than commonly used single-crystal Si or fused-silica substrates. We investigate the effect of Zerodur substrates on the performance of high-EUV reflectance Mo/Si and Mo/Be multilayer thin films. For Mo/Si the EUV reflectance had a nearly linear dependence on substrate roughness for roughness values of 0.06-0.36 nm rms, and the FWHM of the reflectance curves (spectral bandwidth) was essentially constant over this range. For Mo/Be the EUV reflectance was observed to decreasemore » more steeply than Mo/Si for roughness values greater than approximately 0.2-0.3 nm. Little difference was observed in the EUV reflectivity of multilayer thin films deposited on different substrates as long as the substrate roughness values were similar. (c) 2000 Optical Society of America.« less

Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.

PubMed

Mirkarimi, P B; Bajt, S; Wall, M A

2000-04-01

Multilayer-coated Zerodur optics are expected to play a pivotal role in an extreme-ultraviolet (EUV) lithography tool. Zerodur is a multiphase, multicomponent material that is a much more complicated substrate than commonly used single-crystal Si or fused-silica substrates. We investigate the effect of Zerodur substrates on the performance of high-EUV reflectance Mo/Si and Mo/Be multilayer thin films. For Mo/Si the EUV reflectance had a nearly linear dependence on substrate roughness for roughness values of 0.06-0.36 nm rms, and the FWHM of the reflectance curves (spectral bandwidth) was essentially constant over this range. For Mo/Be the EUV reflectance was observed to decrease more steeply than Mo/Si for roughness values greater than approximately 0.2-0.3 nm. Little difference was observed in the EUV reflectivity of multilayer thin films deposited on different substrates as long as the substrate roughness values were similar.

Solar Flare Impulsive Phase Observations from SDO and Other Observatories

NASA Technical Reports Server (NTRS)

Chamberlin, Phillip C.; Woods, Thomas N.; Schrijver, Karel; Warren, Harry; Milligan, Ryan; Christe, Steven; Brosius, Jeffrey W.

2010-01-01

With the start of normal operations of the Solar Dynamics Observatory in May 2010, the Extreme ultraviolet Variability Experiment (EVE) and the Atmospheric Imaging Assembly (AIA) have been returning the most accurate solar XUV and EUV measurements every 10 and 12 seconds, respectively, at almost 100% duty cycle. The focus of the presentation will be the solar flare impulsive phase observations provided by EVE and AIA and what these observations can tell us about the evolution of the initial phase of solar flares. Also emphasized throughout is how simultaneous observations with other instruments, such as RHESSI, SOHO-CDS, and HINODE-EIS, will help provide a more complete characterization of the solar flares and the evolution and energetics during the impulsive phase. These co-temporal observations from the other solar instruments can provide information such as extending the high temperature range spectra and images beyond that provided by the EUV and XUV wavelengths, provide electron density input into the lower atmosphere at the footpoints, and provide plasma flows of chromospheric evaporation, among other characteristics.

Osmium coated diffraction grating in the Space Shuttle environment - Performance

NASA Technical Reports Server (NTRS)

Torr, M. R.

1985-01-01

Samples coated with osmium were flown on the early Shuttle test flights, and on the return of these samples, the osmium coating was found to have disappeared, evidently due to the oxidation of the material in the atomic oxygen atmosphere. An instrument flown on the Spacelab 1 mission comprised an array of five spectrometers covering the extreme ultraviolet (EUV) to near-IR wavelengths. The EUV spectrometer contained an osmium-coated reflective grating located fairly deep within the instruments. Here, results of an assessment of the reflectivity and stability of the osmium surface over the course of the ten-day mission are reported. It is concluded that the osmium reflective coating remained stable relative to the spectrometer coated with MgF2 over the course of the mission. In addition, the ratio of sensitivity of these two spectrometers did not change in any major way from the time of the laboratory calibration until the time of flight two years later. Any changes are within the 50-percent calibration uncertainty.

Extreme Ultraviolet Explorer Science Operation Center

NASA Technical Reports Server (NTRS)

Wong, G. S.; Kronberg, F. A.; Meriwether, H. D.; Wong, L. S.; Grassi, C. L.

1993-01-01

The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution microjet target by use of dual laser pulses

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Dojyo, Naoto; Hamada, Masaya; Kawasaki, Keita; Sasaki, Wataru; Kubodera, Shoichi

2006-03-01

We demonstrated a debris-free, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO II) nano-particles. By using a low SnO II concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.

Low-debris, efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide (SnO2) nanoparticles

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Dojyo, Naoto; Hamada, Masaya; Sasaki, Wataru; Kubodera, Shoichi

2006-05-01

We demonstrated a low-debris, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO2) nanoparticles. By using a low SnO2 concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.

State-of-the-art EUV materials and processes for the 7nm node and beyond

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Vockenhuber, Michaela; Mochi, Iacopo; Fallica, Roberto; Tasdemir, Zuhal; Ekinci, Yasin

2017-03-01

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) being the most likely candidate to manufacture electronic devices for future technology nodes is to be introduced in high volume manufacturing (HVM) at the 7 nm logic node, at least at critical lithography levels. With this impending introduction, it is clear that excellent resist performance at ultra-high printing resolutions (below 20 nm line/space L/S) is ever more pressing. Nonetheless, EUVL has faced many technical challenges towards this paradigm shift to a new lithography wavelength platform. Since the inception of chemically amplified resists (CARs) they have been the base upon which state-of-the art photoresist technology has been developed from. Resist performance as measured in terms of printing resolution (R), line edge roughness (LER), sensitivity (D or exposure dose) and exposure latitude (EL) needs to be improved but there are well known trade-off relationships (LRS trade-off) among these parameters for CARs that hamper their simultaneous enhancement. Here, we present some of the most promising EUVL materials tested by EUV interference lithography (EUV-IL) with the aim of resolving features down to 11 nm half-pitch (HP), while focusing on resist performance at 16 and 13 nm HP as needed for the 7 and 5 nm node, respectively. EUV-IL has enabled the characterization and development of new resist materials before commercial EUV exposure tools become available and is therefore a powerful research and development tool. With EUV-IL, highresolution periodic images can be printed by the interference of two or more spatially coherent beams through a transmission-diffraction grating mask. For this reason, our experiments have been performed by EUV-IL at Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI). Having the opportunity to test hundreds of EUVL materials from vendors and research partners from all over the world, PSI is able to give a global update on some of the most promising materials tested.

Extreme ultraviolet spectral irradiance measurements since 1946

NASA Astrophysics Data System (ADS)

Schmidtke, G.

2015-03-01

In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial irradiance camera (STI-Cam) and also be used investigating real-time space weather effects and deriving more detailed correction procedures for the evaluation of Global Navigation Satellite System (GNSS) signals. Progress in physics goes with achieving higher accuracy in measurements. This review historically guides the reader on the ways of exploring the impact of the variable solar radiation in the extreme ultraviolet spectral region on our upper atmosphere in the altitude regime from 80 to 1000 km.

Broadband extreme ultraviolet probing of transient gratings in vanadium dioxide

DOE PAGES

Sistrunk, Emily; Grilj, Jakob; Jeong, Jaewoo; ...

2015-02-11

Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553 (2009)). The study demonstrate a step on this path showing core-valence sensitivity in transient grating spectroscopy with EUV probing. We study the optically induced insulator-to-metal transition (IMT) of a VO 2 film with EUV diffraction from the optically excited sample. The VO 2 exhibits a change in the 3p-3d resonance of V accompanied by an acoustic response. Due to the broadband probing we are able to separatemore » the two features.« less

Update on EUV radiometry at PTB

NASA Astrophysics Data System (ADS)

Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Haase, Anton; Knorr, Florian; Mentzel, Heiko; Puls, Jana; Schönstedt, Anja; Sintschuk, Michael; Soltwisch, Victor; Stadelhoff, Christian; Scholze, Frank

2016-03-01

The development of technology infrastructure for EUV Lithography (EUVL) still requires higher levels of technology readiness in many fields. A large number of new materials will need to be introduced. For example, development of EUV compatible pellicles to adopt an approved method from optical lithography for EUVL needs completely new thin membranes which have not been available before. To support these developments, PTB with its decades of experience [1] in EUV metrology [2] provides a wide range of actinic and non actinic measurements at in-band EUV wavelengths as well as out of band. Two dedicated, complimentary EUV beamlines [3] are available for radiometric [4,5] characterizations benefiting from small divergence or from adjustable spot size respectively. The wavelength range covered reaches from below 1 nm to 45 nm [6] for the EUV beamlines [7] to longer wavelengths if in addition the VUV beamline is employed. The standard spot size is 1 mm by 1 mm with an option to go as low as 0.1 mm to 0.1 mm. A separate beamline offers an exposure setup. Exposure power levels of 20 W/cm2 have been employed in the past, lower fluencies are available by attenuation or out of focus exposure. Owing to a differential pumping stage, the sample can be held under defined gas conditions during exposure. We present an updated overview on our instrumentation and analysis capabilities for EUV metrology and provide data for illustration.

Spectra of W19 +-W32 + observed in the EUV region between 15 and 55 Å with an electron-beam ion trap

NASA Astrophysics Data System (ADS)

Sakaue, H. A.; Kato, D.; Yamamoto, N.; Nakamura, N.; Murakami, I.

2015-07-01

We present extreme ultraviolet spectra of highly charged tungsten ions (W19 +-W32 + ) in the wavelength range of 15 -55 Å obtained with a compact electron-beam ion trap (CoBIT) and a grazing-incidence spectrometer at the National Institute for Fusion Science. The electron energy dependence of the spectra was investigated for electron energies from 490 to 1320 eV . Identification of the observed lines was aided by collisional-radiative (CR) modeling of CoBIT plasma. Good quantitative agreement was obtained between the CR-modeling results and the experimental observations. The ion charge dependence of the 6 g -4 f ,5 g -4 f ,5 f -4 d ,5 p -4 d , and 4 f -4 d transition wavelengths were measured.

EUV wavefront metrology system in EUVA

NASA Astrophysics Data System (ADS)

Hasegawa, Takayuki; Ouchi, Chidane; Hasegawa, Masanobu; Kato, Seima; Suzuki, Akiyoshi; Sugisaki, Katsumi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito

2004-05-01

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

The extreme ultraviolet explorer archive

NASA Astrophysics Data System (ADS)

Polomski, E.; Drake, J. J.; Dobson, C.; Christian, C.

1993-09-01

The Extreme Ultrviolet Explorer (EUVE) public archive was created to handle the storage, maintenance, and distribution of EUVE data and ancillary documentation, information, and software. Access to the archive became available to the public on July 17, 1992, only 40 days after the launch of the EUVE satellite. A brief overview of the archive's contents and the various methods of access will be described.

High-resolution crystal spectrometer for the 10-60 (angstrom) EUV region

DOE Office of Scientific and Technical Information (OSTI.GOV)

Beiersdorfer, P; Brown, G V; Goddard, R

2004-02-20

A vacuum crystal spectrometer with nominal resolving power approaching 1000 is described for measuring emission lines with wavelength in the extreme ultraviolet region up to 60 Angstroms. The instrument utilizes a flat octadecyl hydrogen maleate (OHM) crystal and a thin-window 1-D position-sensitive gas proportional detector. This detector employs a 1 {micro}m-thick 100 x8 mm{sup 2} aluminized polyimide window and operates at one atmosphere pressure. The spectrometer has been implemented on the Livermore electron beam ion traps. The performance of the instrument is illustrated in measurements of the newly discovered magnetic field-sensitive line in Ar{sup 8+}.

Contamination control program results from three years of ground operations on the Extreme Ultraviolet Explorer instruments

NASA Technical Reports Server (NTRS)

Ray, David C.; Jelinsky, Sharon; Welsh, Barry Y.; Malina, Roger F.

1990-01-01

A stringent contamination-control plan has been developed for the optical components of the Extreme Ultraviolet Explorer instruments, whose performance in the 80-900 A wavelength range is highly sensitive to particulate and molecular contamination. The contamination-control program has been implemented over the last three years during assembly, test and calibration phases of the instrument. These phases have now been completed and the optics cavities of the instruments have been sealed until deployment in space. Various approaches are discussed which have been used during ground operations to meet optics' contamination goals within the project schedule and budget. The measured optical properties of EUV witness mirrors are also presented which remained with the flight mirrors during ground operations. These were used to track optical degradation due to contamination from the cleanroom and high-vacuum test-chamber environments.

EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

NASA Astrophysics Data System (ADS)

Attwood, David

2004-12-01

The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical issue of available EUV power from electrical discharge pinch plasmas and laser produced plasmas, including the roots of these requirements, the relevant plasma and radiation physics, and current state-of-the-art commercial technology. In the first paper of the cluster, Vadim Banine and Roel Moors of ASML in the Netherlands provide a detailed review of the required EUV power based on an economically viable throughput of one hundred 300 mm diameter wafers per hour, projected resist sensitivity, number of finite reflectivity multilayer coated surfaces and their collective spectral bandwidth, and a collection solid angle set by optical phase-space constraints and plasma source size. Thomas Krücken and his colleagues from Philips and the Fraunhofer Institute in Aachen present a theoretical model of radiation generation and transport based on model density and temperature profiles in an electrical discharge plasma, providing valuable insights into radiation physics and the limits to achievable power. Kenneth Fahy and his colleagues at UCD in Dublin and NIST in the US, in their paper, describe in detail atomic physics calculations of emission from relevant lines and unresolved transition arrays (UTAs) of candidate xenon and tin ions, each of which radiate strongly within the acceptance bandwidth of the multilayer coatings. The different elements, Xe and Sn, however, raise significantly different implications for source debris production and thus of requisite debris mitigation requirements. Björn Hannson and Hans Hertz of KTH University in Stockholm present a substantial review of laser produced plasmas for the EUV, including those based on liquid jet technologies, leading to a path of mass limited target material, and significant stand-off distance from the solid nozzle, which maximize EUV power generation while minimizing debris production. In addition to an extensive review of EUV source related literature, they describe experiments with laser irradiated droplets and filaments, for both Xe and Sn. The embodiment of electrical discharge plasmas and laser-produced plasmas into commercially available EUV sources, with EUV powers that project to suitable levels, is presented in the fifth paper by Uwe Stamm of XTREME Technologies in Göttingen. For discharge produced plasmas, thermal loading and electrode erosion are significant issues. Vladimir Borisov and his colleagues, at the Troitsk Institute outside Moscow, address these issues and provide novel ideas for the multiplexing of several discharge plasmas feeding a single optical system. Igor Fomenkov and his colleagues at Cymer in San Diego describe issues associated with a dense plasma focus pinch, including a comparison of operations with both positive and negative polarity. In the eighth paper, Malcolm McGeoch of Plex in Massachusetts provides a theoretical description of the vaporization and ionization of spherical tin droplets in discharge plasma. Together this cluster of papers provides a broad review of the current status of high power EUV plasma sources for semiconductor manufacturing. This very current topic, of intense interest worldwide, is considered further in a book [4] of collected papers to become available in mid-2005. Additionally, a special journal issue emphasizing coherent EUV sources, albeit at lower average powers, is soon to appear [5]. References [1] http://public.itrsr.net [2] Attwood D 2000 Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge: Cambridge University Press) www.coe.Berkeley.edu/AST/sxreuv [3] Moore G E 1965 Cramming More Components onto Integrated Circuits Electronics Magazine 114 Moore G E 1995 Lithography and the Future of Moore's Law SPIE 243 2 [4] Bakshi V ed 2005 EUV Sources for Lithography (Bellingham WA:SPIE) at press [5] IEEE J. Special Topics in Quantum Electronics, Short Wavelength and EUV Lasers 10 Dec 2004 at press

Well-defined EUV wave associated with a CME-driven shock

NASA Astrophysics Data System (ADS)

Cunha-Silva, R. D.; Selhorst, C. L.; Fernandes, F. C. R.; Oliveira e Silva, A. J.

2018-05-01

Aims: We report on a well-defined EUV wave observed by the Extreme Ultraviolet Imager (EUVI) on board the Solar Terrestrial Relations Observatory (STEREO) and the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The event was accompanied by a shock wave driven by a halo CME observed by the Large Angle and Spectrometric Coronagraph (LASCO-C2/C3) on board the Solar and Heliospheric Observatory (SOHO), as evidenced by the occurrence of type II bursts in the metric and dekameter-hectometric wavelength ranges. We investigated the kinematics of the EUV wave front and the radio source with the purpose of verifying the association between the EUV wave and the shock wave. Methods: The EUV wave fronts were determined from the SDO/AIA images by means of two appropriate directions (slices). The heights (radial propagation) of the EUV wave observed by STEREO/EUVI and of the radio source associated with the shock wave were compared considering the whole bandwidth of the harmonic lane of the radio emission, whereas the speed of the shock was estimated using the lowest frequencies of the harmonic lane associated with the undisturbed corona, using an appropriate multiple of the Newkirk (1961, ApJ, 133, 983) density model and taking into account the H/F frequency ratio fH/fF = 2. The speed of the radio source associated with the interplanetary shock was determined using the Mann et al. (1999, A&A, 348, 614) density model. Results: The EUV wave fronts determined from the SDO/AIA images revealed the coexistence of two types of EUV waves, a fast one with a speed of 560 km s-1, and a slower one with a speed of 250 km s-1, which corresponds approximately to one-third of the average speed of the radio source ( 680 km s-1). The radio signature of the interplanetary shock revealed an almost constant speed of 930 km s-1, consistent with the linear speed of the halo CME (950 km s-1) and with the values found for the accelerating coronal shock ( 535-823 km s-1), taking into account the gap between the radio emissions.

An Extreme-ultraviolet Wave Generating Upward Secondary Waves in a Streamer-like Solar Structure

NASA Astrophysics Data System (ADS)

Zheng, Ruisheng; Chen, Yao; Feng, Shiwei; Wang, Bing; Song, Hongqiang

2018-05-01

Extreme-ultraviolet (EUV) waves, spectacular horizontally propagating disturbances in the low solar corona, always trigger horizontal secondary waves (SWs) when they encounter the ambient coronal structure. We present the first example of upward SWs in a streamer-like structure after the passing of an EUV wave. This event occurred on 2017 June 1. The EUV wave happened during a typical solar eruption including a filament eruption, a coronal mass ejection (CME), and a C6.6 flare. The EUV wave was associated with quasi-periodic fast propagating (QFP) wave trains and a type II radio burst that represented the existence of a coronal shock. The EUV wave had a fast initial velocity of ∼1000 km s‑1, comparable to high speeds of the shock and the QFP wave trains. Intriguingly, upward SWs rose slowly (∼80 km s‑1) in the streamer-like structure after the sweeping of the EUV wave. The upward SWs seemed to originate from limb brightenings that were caused by the EUV wave. All of the results show that the EUV wave is a fast-mode magnetohydrodynamic (MHD) shock wave, likely triggered by the flare impulses. We suggest that part of the EUV wave was probably trapped in the closed magnetic fields of the streamer-like structure, and upward SWs possibly resulted from the release of slow-mode trapped waves. It is believed that the interplay of the strong compression of the coronal shock and the configuration of the streamer-like structure is crucial for the formation of upward SWs.

Kr photoionized plasma induced by intense extreme ultraviolet pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bartnik, A., E-mail: andrzej.bartnik@wat.edu.pl; Wachulak, P.; Fiedorowicz, H.

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Krmore » plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.« less

Kr photoionized plasma induced by intense extreme ultraviolet pulses

NASA Astrophysics Data System (ADS)

Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

2016-04-01

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

Modeling of thermomechanical changes of extreme-ultraviolet mask and their dependence on absorber variation

NASA Astrophysics Data System (ADS)

Ban, Chung-Hyun; Park, Eun-Sang; Park, Jae-Hun; Oh, Hye-Keun

2018-06-01

Thermal and structural deformation of extreme-ultraviolet lithography (EUVL) masks during the exposure process may become important issues as these masks are subject to rigorous image placement and flatness requirements. The reflective masks used for EUVL absorb energy during exposure, and the temperature of the masks rises as a result. This can cause thermomechanical deformation that can reduce the pattern quality. The use of very thick low-thermal-expansion substrate materials (LTEMs) may reduce energy absorption, but they do not completely eliminate mask deformation. Therefore, it is necessary to predict and optimize the effects of energy transferred from the extreme-ultraviolet (EUV) light source and the resultant patterns of structured EUV masks with complex multilayers. Our study shows that heat accumulates in the masks as exposure progresses. It has been found that a higher absorber ratio (pattern density) applied to the patterning of EUV masks exacerbates the problem, especially in masks with more complex patterns.

Extreme ultraviolet explorer satellite observation of Jupiter's Io plasma torus

NASA Technical Reports Server (NTRS)

Hall, D. T; Gladstone, G. R.; Moos, H. W.; Bagenal, F.; Clarke, J. T.; Feldman, P. D.; Mcgrath, M. A.; Schneider, N. M.; Shemansky, D. E.; Strobel, D. F.

1994-01-01

We present the first Extreme Ultraviolet Explorer (EUVE) satellite observation of the Jupiter system, obtained during the 2 day period 1993 March 30 through April 1, which shows a rich emission-line spectrum from the Io plasma torus spanning wavelengths 370 to 735 A. The emission features correspond primarily to known multiplets of oxygen and sulfur ions, but a blended feature near 372 A is a plausible Na II transition. The summed detected energy flux of (7.2 +/- 0.2) x 10(exp -11) ergs/sq cm(s) corresponds to a radiated power of approximately equal to 4 x 10(exp 11) W in this spectral range. All ansa emissions show a distinct dawn-dusk brightness asymmetry and the measured dusk/dawn ratio of the bright S III lambda-680 feature is 2.3 +/- 0.3, significantly larger than the ratio measured by the Voyager spacecraft ultraviolet (UV) instruments. A preliminary estimate of ion partitioning indicates that the oxygen/sulfur ion ratio is approximately equal to 2, compared to the value approximately equal to 1.3 measured by Voyager, and that (Na(+))/(e) greater than 0.01.

Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film

NASA Astrophysics Data System (ADS)

Hijikata, Hayato; Kozawa, Takahiro; Tagawa, Seiichi; Takei, Satoshi

2009-06-01

A bottom extreme-ultraviolet-sensitive coating (BESC) for evaluation of the absorption coefficients of ultrathin films such as extreme ultraviolet (EUV) resists was developed. This coating consists of a polymer, crosslinker, acid generator, and acid-responsive chromic dye and is formed by a conventional spin-coating method. By heating the film after spin-coating, a crosslinking reaction is induced and the coating becomes insoluble. A typical resist solution can be spin-coated on a substrate covered with the coating film. The evaluation of the linear absorption coefficients of polymer films was demonstrated by measuring the EUV absorption of BESC substrates on which various polymers were spin-coated.

Ultraviolet Views of Enceladus, Tethys, and Dione

NASA Technical Reports Server (NTRS)

Hansen, C. J.; Hendrix, A. R.

2005-01-01

The Cassini Ultraviolet Imaging Spectrograph (UVIS) has collected ultraviolet observations of many of Saturn's icy moons since Cassini's insertion into orbit around Saturn. We will report on results from Enceladus, Tethys and Dione, orbiting in the Saturn system at distances of 3.95, 4.88 and 6.26 Saturn radii, respectively. Icy satellite science objectives of the UVIS include investigations of surface age and evolution, surface composition and chemistry, and tenuous exospheres. We address these objectives by producing albedo maps, and reflection and emission spectra, and observing stellar occultations. UVIS has four channels: EUV: Extreme Ultraviolet (55 nm to 110 nm), FUV: Far Ultraviolet (110 to 190 nm), HSP: High Speed Photometer, and HDAC: Hydrogen-Deuterium Absorption Cell. The EUV and FUV spectrographs image onto a 2-dimensional detector, with 64 spatial rows by 1024 spectral columns. To-date we have focused primarily on the far ultraviolet data acquired with the low resolution slit width (4.8 angstrom spectral resolution). Additional information is included in the original extended abstract.

Extreme ultraviolet patterning of tin-oxo cages

NASA Astrophysics Data System (ADS)

Haitjema, Jarich; Zhang, Yu; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Brouwer, Albert M.

2017-07-01

We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages. These cage molecules were already known to function as a negative tone photoresist for EUV radiation, but in this work, we significantly optimized their performance. Our results show that sensitivity and resolution are only meaningful photoresist parameters if the process conditions are optimized. We focus on contrast curves of the materials using large area EUV exposures and patterning of the cages using EUV interference lithography. It is shown that baking steps, such as postexposure baking, can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. A layer thickness increase reduced the necessary dose to induce a solubility change but decreased the patterning quality. The patterning experiments were affected by minor changes in processing conditions such as an increased rinsing time. In addition, we show that the anions of the cage can influence the sensitivity and quality of the patterning, probably through their effect on physical properties of the materials.

Ultimate waveform reproducibility of extreme-ultraviolet pulses by high-harmonic generation in quartz

NASA Astrophysics Data System (ADS)

Garg, M.; Kim, H. Y.; Goulielmakis, E.

2018-05-01

Optical waveforms of light reproducible with subcycle precision underlie applications of lasers in ultrafast spectroscopies, quantum control of matter and light-based signal processing. Nonlinear upconversion of optical pulses via high-harmonic generation in gas media extends these capabilities to the extreme ultraviolet (EUV). However, the waveform reproducibility of the generated EUV pulses in gases is inherently sensitive to intensity and phase fluctuations of the driving field. We used photoelectron interferometry to study the effects of intensity and carrier-envelope phase of an intense single-cycle optical pulse on the field waveform of EUV pulses generated in quartz nanofilms, and contrasted the results with those obtained in gas argon. The EUV waveforms generated in quartz were found to be virtually immune to the intensity and phase of the driving field, implying a non-recollisional character of the underlying emission mechanism. Waveform-sensitive photonic applications and precision measurements of fundamental processes in optics will benefit from these findings.

Materials Properties and Solvated Electron Dynamics of Isolated Nanoparticles and Nanodroplets Probed with Ultrafast Extreme Ultraviolet Beams.

PubMed

Ellis, Jennifer L; Hickstein, Daniel D; Xiong, Wei; Dollar, Franklin; Palm, Brett B; Keister, K Ellen; Dorney, Kevin M; Ding, Chengyuan; Fan, Tingting; Wilker, Molly B; Schnitzenbaumer, Kyle J; Dukovic, Gordana; Jimenez, Jose L; Kapteyn, Henry C; Murnane, Margaret M

2016-02-18

We present ultrafast photoemission measurements of isolated nanoparticles in vacuum using extreme ultraviolet (EUV) light produced through high harmonic generation. Surface-selective static EUV photoemission measurements were performed on nanoparticles with a wide array of compositions, ranging from ionic crystals to nanodroplets of organic material. We find that the total photoelectron yield varies greatly with nanoparticle composition and provides insight into material properties such as the electron mean free path and effective mass. Additionally, we conduct time-resolved photoelectron yield measurements of isolated oleylamine nanodroplets, observing that EUV photons can create solvated electrons in liquid nanodroplets. Using photoemission from a time-delayed 790 nm pulse, we observe that a solvated electron is produced in an excited state and subsequently relaxes to its ground state with a lifetime of 151 ± 31 fs. This work demonstrates that femotosecond EUV photoemission is a versatile surface-sensitive probe of the properties and ultrafast dynamics of isolated nanoparticles.

HST-COS Observations of AGNs. III. Spectral Constraints in the Lyman Continuum from Composite COS/G140L Data

NASA Astrophysics Data System (ADS)

Tilton, Evan M.; Stevans, Matthew L.; Shull, J. Michael; Danforth, Charles W.

2016-01-01

The rest-frame ultraviolet (UV) spectra of active galactic nuclei (AGNs) are important diagnostics of both accretion disk physics and their contribution to the metagalactic ionizing UV background. Though the mean AGN spectrum is well characterized with composite spectra at wavelengths greater than 912 Å, the shorter-wavelength extreme-UV (EUV) remains poorly studied. In this third paper in a series on the spectra of AGNs, we combine 11 new spectra taken with the Cosmic Origins Spectrograph on the Hubble Space Telescope with archival spectra to characterize the typical EUV spectral slope of AGNs from λrest ˜ 850 Å down to λrest ˜ 425 Å. Parameterizing this slope as a power law, we obtain Fν ∝ ν-0.72±0.26, but we also discuss the limitations and systematic uncertainties of this model. We identify broad emission features in this spectral region, including emission due to ions of O, Ne, Mg, and other species, and we limit the intrinsic He I 504 Å photoelectric absorption edge opacity to τHe I < 0.047. Based on observations made with the NASA/ESA Hubble Space Telescope, obtained from the data archive at the Space Telescope Science Institute. STScI is operated by the Association of Universities for Research in Astronomy, Inc., under NASA contract NAS5-26555.

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

NASA Astrophysics Data System (ADS)

Kozawa, Takahiro; Oizumi, Hiroaki; Itani, Toshiro; Tagawa, Seiichi

2010-11-01

The development of extreme ultraviolet (EUV) lithography has progressed owing to worldwide effort. As the development status of EUV lithography approaches the requirements for the high-volume production of semiconductor devices with a minimum line width of 22 nm, the extraction of resist parameters becomes increasingly important from the viewpoints of the accurate evaluation of resist materials for resist screening and the accurate process simulation for process and mask designs. In this study, we demonstrated that resist parameters (namely, quencher concentration, acid diffusion constant, proportionality constant of line edge roughness, and dissolution point) can be extracted from the scanning electron microscopy (SEM) images of patterned resists without the knowledge on the details of resist contents using two types of latest EUV resist.

Characteristics of extreme ultraviolet emission from high-Z plasmas

NASA Astrophysics Data System (ADS)

Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

2016-03-01

We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

Feasibility of using Extreme Ultraviolet Explorer (EUVE) reaction wheels to satisfy Space Infrared Telescope Facility (SIRTF) maneuver requirements

NASA Technical Reports Server (NTRS)

Lightsey, W. D.

1990-01-01

A digital computer simulation is used to determine if the extreme ultraviolet explorer (EUVE) reaction wheels can provide sufficient torque and momentum storage capability to meet the space infrared telescope facility (SIRTF) maneuver requirements. A brief description of the pointing control system (PCS) and the sensor and actuator dynamic models used in the simulation is presented. A model to represent a disturbance such as fluid sloshing is developed. Results developed with the simulation, and a discussion of these results are presented.

PECULIAR STATIONARY EUV WAVE FRONTS IN THE ERUPTION ON 2011 MAY 11

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chandra, R.; Fulara, A.; Chen, P. F.

We present and interpret the observations of extreme ultraviolet (EUV) waves associated with a filament eruption on 2011 May 11. The filament eruption also produces a small B-class two ribbon flare and a coronal mass ejection. The event is observed by the Solar Dynamic Observatory with high spatio-temporal resolution data recorded by the Atmospheric Imaging Assembly. As the filament erupts, we observe two types of EUV waves (slow and fast) propagating outwards. The faster EUV wave has a propagation velocity of ∼500 km s{sup −1} and the slower EUV wave has an initial velocity of ∼120 km s{sup −1}. Wemore » report, for the first time, that not only does the slower EUV wave stop at a magnetic separatrix to form bright stationary fronts, but also the faster EUV wave transits a magnetic separatrix, leaving another stationary EUV front behind.« less

Investigation of large format microchannel plate Z configurations

NASA Technical Reports Server (NTRS)

Siegmund, O. H. W.; Coburn, K.; Malina, R. F.

1985-01-01

The performance of triplet (Z) stacks of microchannel plates (MCPs) has been studied as a part of the instrument development for the Extreme Ultraviolet Explorer (EUVE) satellite mission. Relatively large MCPs with a 60-mm diameter and having a large 80:1 channel length to diameter (L:D) ratio were used in several configurations. The MCPs were used in the EUVE prototype imaging detector to provide more than 512 x 512 pixels with low image distortion (less than 1 percent). The gain and pulse height characteristics of the MCPs were examined, showing that both high gains (more than 2 x 10 to the 7th) and tight output pulse height distributions (less than 30 percent FWHM) may be achieved. Simple distribution techniques have also allowed low intrinsic background event rates (less than 0.15 events per sq cm/s) to be obtained. Variation of the quantum efficiency of the MCPs over the wavelength range 160-1216 A has been investigated for a range of angles of incidence. The effect of temperature variations on MCP operating characteristics has also been evaluated.

EUV Spectroscopy of High-redshift X-ray Objects

NASA Astrophysics Data System (ADS)

Kowalski, Michael Paul; Wolff, M. T.; Wood, K. S.; Barbee, T. W., Jr.

2010-03-01

As astronomical observations are pushed to cosmological distances (z>3) the spectral energy distributions of X-ray objects, AGNs for example, will have their maxima redshifted into the EUV waveband ( 90-912 Å/0.1-0.01 keV). Consequently, a wealth of spectral diagnostics, provided by, for example, the Fe L-shell complex ( 60-6 Å/0.2-2.0 keV) and the O VII/VIII lines ( 20 Å/0.5 keV), will be lost to X-ray instruments operating at traditional ( 0.5-10 keV) and higher X-ray energies. There are precedents in other wavebands. For example, HST evolutionary studies will become largely the province of JWST. Despite the successes of EUVE, the ROSAT WFC, and the Chandra LETG, the EUV continues to be unappreciated and under-utilized, partly because of a preconception that absorption by neutral galactic Hydrogen in the ISM prevents any useful extragalactic measurements at all EUV wavelengths and, until recently, by a lack of a suitable enabling technology. Thus, if future planned X-ray missions (e.g., IXO, Gen-X) are optimized again for traditional X-ray energies, their performance (effective area, resolving power) will be cut off at ultrasoft X-ray energies or at best be radically reduced in the EUV. This opens up a critical gap in performance located right at short EUV wavelengths, where the critical X-ray spectral transitions occur in high-z objects. However, normal-incidence multilayer-grating technology, which performs best precisely at such wavelengths, together with advanced nano-laminate fabrication techniques have been developed and are now mature to the point where advanced EUV instrument designs with performance complementary to IXO and Gen-X are practical. Such EUV instruments could be flown either independently or as secondary instruments on these X-ray missions. We present here a critical examination of the limits placed on extragalactic EUV measurements by ISM absorption, the range where high-z measurements are practical, and the requirements this imposes on next-generation instrument designs.

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

NASA Astrophysics Data System (ADS)

Fomenkov, Igor; Brandt, David; Ershov, Alex; Schafgans, Alexander; Tao, Yezheng; Vaschenko, Georgiy; Rokitski, Slava; Kats, Michael; Vargas, Michael; Purvis, Michael; Rafac, Rob; La Fontaine, Bruno; De Dea, Silvia; LaForge, Andrew; Stewart, Jayson; Chang, Steven; Graham, Matthew; Riggs, Daniel; Taylor, Ted; Abraham, Mathew; Brown, Daniel

2017-06-01

Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requirements in the following critical areas: power, dose stability, etendue, spectral content, and lifetime. Currently, development of second-generation laser-produced plasma (LPP) light sources for the ASML's NXE:3300B EUV scanner is complete, and first units are installed and operational at chipmaker customers. We describe different aspects and performance characteristics of the sources, dose stability results, power scaling, and availability data for EUV sources and also report new development results.

Prototype through-pellicle coherent imaging using a 30nm tabletop EUV source

NASA Astrophysics Data System (ADS)

Bevis, Charles S.; Karl, Robert M.; Wang, Bin; Esashi, Yuka; Tanksalvala, Michael; Porter, Christina L.; Johnsen, Peter; Adams, Daniel E.; Murnane, Margaret M.; Kapteyn, Henry C.

2018-03-01

We present preliminary through-pellicle imaging using a 30nm tabletop extreme ultraviolet (EUV) coherent diffractive imaging microscope. We show that even in a non-optimized setup, this technique enables through-pellicle imaging of a sample with no detectable impact on image fidelity or resolution.

EUV Irradiance Inputs to Thermospheric Density Models: Open Issues and Path Forward

NASA Astrophysics Data System (ADS)

Vourlidas, A.; Bruinsma, S.

2018-01-01

One of the objectives of the NASA Living With a Star Institute on "Nowcasting of Atmospheric Drag for low Earth orbit (LEO) Spacecraft" was to investigate whether and how to increase the accuracy of atmospheric drag models by improving the quality of the solar forcing inputs, namely, extreme ultraviolet (EUV) irradiance information. In this focused review, we examine the status of and issues with EUV measurements and proxies, discuss recent promising developments, and suggest a number of ways to improve the reliability, availability, and forecast accuracy of EUV measurements in the next solar cycle.

Carbon contamination topography analysis of EUV masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fan, Y.-J.; Yankulin, L.; Thomas, P.

2010-03-12

The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

NASA Astrophysics Data System (ADS)

Bartnik, A.

2015-06-01

In this work a review of investigations concerning interaction of intense extreme ultraviolet (EUV) and soft X-ray (SXR) pulses with matter is presented. The investigations were performed using laser-produced plasma (LPP) EUV/SXR sources based on a double stream gas puff target. The sources are equipped with dedicated collectors allowing for efficient focusing of the EUV/SXR radiation pulses. Intense radiation in a wide spectral range, as well as a quasi-monochromatic radiation can be produced. In the paper different kinds of LPP EUV/SXR sources developed in the Institute of Optoelectronics, Military University of Technology are described. Radiation intensities delivered by the sources are sufficient for different kinds of interaction experiments including EUV/SXR induced ablation, surface treatment, EUV fluorescence or photoionized plasma creation. A brief review of the main results concerning this kind of experiments performed by author of the paper are presented. However, since the LPP sources cannot compete with large scale X-ray sources like synchrotrons, free electron lasers or high energy density plasma sources, it was indicated that some investigations not requiring extreme irradiation parameters can be performed using the small scale installations. Some results, especially concerning low temperature photoionized plasmas are very unique and could be hardly obtained using the large facilities.

Method and apparatus for inspecting an EUV mask blank

DOEpatents

Goldberg, Kenneth A.

2005-11-08

An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wavelength qualification of large mask areas, and can be self-calibrating or be calibrated to well-characterized reference samples. It can further check for spatial variation of mask reflectivity or for global differences among masks. The apparatus and method is particularly suited for inspection of coating uniformity and quality and can detect defects in the order of 50 .mu.m and above.

Response of the upper atmosphere to variations in the solar soft x-ray irradiance. Ph.D. Thesis

NASA Technical Reports Server (NTRS)

Bailey, Scott Martin

1995-01-01

Terrestrial far ultraviolet (FUV) airglow emissions have been suggested as a means for remote sensing the structure of the upper atmosphere. The energy which leads to the excitation of FUV airglow emissions is solar irradiance at extreme ultraviolet (EUV) and soft x-ray wavelengths. Solar irradiance at these wavelengths is known to be highly variable; studies of nitric oxide (NO) in the lower thermosphere have suggested a variability of more than an order of magnitude in the solar soft x-ray irradiance. To properly interpret the FUV airflow, the magnitude of the solar energy deposition must be known. Previous analyses have used the electron impact excited Lyman-Birge-Hopfield (LBH) bands of N2 to infer the flux of photoelectrons in the atmosphere and thus to infer the magnitude of the solar irradiance. This dissertation presents the first simultaneous measurements of the FUV airglow, the major atmospheric constituent densities, and the solar EUV and soft x-ray irradiances. The measurements were made on three flights of an identical sounding rocket payload at different levels of solar activity. The linear response in brightness of the LBH bands to variations in solar irradiance is demonstrated. In addition to the N2 LBH bands, atomic oxygen lines at 135.6 and 130.4 nm are also studied. Unlike the LBH bands, these emissions undergo radiative transfer effects in the atmosphere. The OI emission at 135.6 nm is found to be well modeled using a radiative transfer calculation and the known excitation processes. Unfortunately, the assumed processes leading to OI 130.4 nm excitation are found to be insufficient to reproduce the observed variability of this emission. Production of NO in the atmosphere is examined; it is shown that a lower than previously reported variability in the solar soft x-ray irradiance is required to explain the variability of NO.

A Change in the Solar He II EUV Global Network Structure as an Indicator of the Geo-Effectiveness of Solar Minima

NASA Technical Reports Server (NTRS)

Didkovsky, L.; Gurman, J. B.

2013-01-01

Solar activity during 2007 - 2009 was very low, causing anomalously low thermospheric density. A comparison of solar extreme ultraviolet (EUV) irradiance in the He II spectral band (26 to 34 nm) from the Solar Extreme ultraviolet Monitor (SEM), one of instruments on the Charge Element and Isotope Analysis System (CELIAS) on board the Solar and Heliospheric Observatory (SOHO) for the two latest solar minima showed a decrease of the absolute irradiance of about 15 +/- 6 % during the solar minimum between Cycles 23 and 24 compared with the Cycle 22/23 minimum when a yearly running-mean filter was used. We found that some local, shorter-term minima including those with the same absolute EUV flux in the SEM spectral band show a higher concentration of spatial power in the global network structure from the 30.4 nm SOHO/Extreme ultraviolet Imaging Telescope (EIT) images for the local minimum of 1996 compared with the minima of 2008 - 2011.We interpret this higher concentration of spatial power in the transition region's global network structure as a larger number of larger-area features on the solar disk. These changes in the global network structure during solar minima may characterize, in part, the geo-effectiveness of the solar He II EUV irradiance in addition to the estimations based on its absolute levels.

Discovery of Strong EUV-induced Balmer Emission in the New WD+dM Binary EUVE J2013+40.0 (RE 2013+400)

NASA Astrophysics Data System (ADS)

Thorstensen, J. R.; Vennes, S.

1993-12-01

The binary system EUVE J2013+40.0 (= RE 2013+400) was discovered in the EUV-selected sample of white dwarfs identified in the course of the ROSAT Wide Field Camera (WFC) all-sky survey (Pounds et al. 1993, MNRAS, 260, 77). The intense extreme ultraviolet (EUV) emission from the hot white dwarf (DAO type) was also detected in the course of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (Bowyer et al. 1993, ApJ, submitted), and the subsequent optical identification campaign suggested the association of EUVE J2013+40.0 with the Feige 24 class of binary systems (see Vennes & Thorstensen, these proceedings). Such systems consist of a hot H-rich white dwarf (DA/DAO) and a red dwarf companion (dM) and are characterized by strong, narrow, variable Balmer emission. We obtained spectroscopy with 4 Angstroms resolution at the Michigan-Dartmouth-MIT Hiltner 2.4 m, covering the Hα and Hβ range. The Hα emission line velocity and equivalent widths varied with a period of 0.708 +/- 0.003 d; the velocity semiamplitude is 89 +/- 3 km s(-1) . The emission equivalent width reaches maximum strength 0.251 +/- 0.007 cycle after maximum emission-line velocity, that is, when the emission source reaches superior conjunction. This is just as expected if the emission arises from reprocessing of the EUV radiation incident upon the face of the dM star facing the white dwarf, as proposed for Feige 24 by Thorstensen et al. (1978, ApJ, 223, 260). EUVE J2013+40.0 is one of a handful of WD+dM binary systems in which the illumination effect is observed with unambiguous clarity. By comparing Feige 24 and EUVE J2013+40.0, and modelling the white dwarf EUV emission and red dwarf Balmer emission, we constrain the orbital inclinations. Additional spectroscopy of EUVE J2013+40.0 is being scheduled to determine the component masses. These are important input data for the study of the close binary systems which arise from common envelope evolution. This work is supported by a forthcoming NASA Guest Observer grant.

Production and condensation of organic gases in the atmosphere of Titan

NASA Technical Reports Server (NTRS)

Sagan, C.; Thompson, W. R.

1982-01-01

The rates and altitudes for the dissociation of atmospheric constituents on Titan are calculated for solar ultraviolet radiation, the solar wind, Saturn magnetospheric particles, the Saturn co-rotating plasma, and cosmic rays. Laboratory experiments show that a variety of simple gas phase organic molecules and more complex organic solids called tholins are produced by such irradiations of simulated Titanian atmospheres. Except for ultraviolet wavelengths longward of the methane photodissociation continuum, most dissociation events occur between about 3100 and 3600 km altitude, corresponding well to the region of EUV opacity detected by Voyager. For a wide variety of simple to moderately complex organic gases in the Titanian atmosphere, condensation occurs below the top of the main cloud deck at about 2825 km. It is proposed that such condensates, beginning with CH4 at about 2615 km, comprise the principal mass of the Titan clouds. There is a distinct tendency for the atmosphere of Titan to act as a fractional distillation device, molecules of greater complexity condensing out at higher altitudes.

Evidence for a New Class of Extreme Ultraviolet Sources

NASA Technical Reports Server (NTRS)

Maoz, Dan; Ofek, Eran O.; Shemi, Amotz

1997-01-01

Most of the sources detected in the extreme ultraviolet (EUV; 100-600 A) by the ROSAT/WFC and EUVE all-sky surveys have been identified with active late-type stars and hot white dwarfs that are near enough to the Earth to escape absorption by interstellar gas. However, about 15 per cent of EUV sources are as yet unidentified with any optical counterparts. We examine whether the unidentified EUV sources may consist of the same population of late-type stars and white dwarfs. We present B and R photometry of stars in the fields of seven of the unidentified EUV sources. We detect in the optical the entire main-sequence and white dwarf population out to the greatest distances where they could still avoid absorption. We use color-magnitude diagrams to demonstrate that, in most of the fields, none of the observed stars has the colours and magnitudes of late-type dwarfs at distances less than 100 pc. Similarly, none of the observed stars is a white dwarf within 500 pc that is hot enough to be a EUV emitter. The unidentified EUV sources we study are not detected in X-rays, while cataclysmic variables, X-ray binaries, and active galactic nuclei generally are. We conclude that some of the EUV sources may be a new class of nearby objects, which are either very faint at optical bands or which mimic the colours and magnitudes of distant late-type stars or cool white dwarfs. One candidate for optically faint objects is isolated old neutron stars, slowly accreting interstellar matter. Such neutron stars are expected to be abundant in the Galaxy, and have not been unambiguously detected.

EUV efficiency of a 6000-grooves per mm diffraction grating

NASA Technical Reports Server (NTRS)

Hurwitz, Mark; Bowyer, Stuart; Edelstein, Jerry; Harada, Tatsuo; Kita, Toshiaki

1990-01-01

In order to explore whether grooves ruled mechanically at a density of 6000 per mm can perform well at EUV wavelengths, a sample grating is measured with this density in an EUV calibration facility. Measurements are presented of the planar uniform line-space diffraction grating's efficiency and large-angle scattering.

Extreme ultraviolet photoionization of aldoses and ketoses

NASA Astrophysics Data System (ADS)

Shin, Joong-Won; Dong, Feng; Grisham, Michael E.; Rocca, Jorge J.; Bernstein, Elliot R.

2011-04-01

Gas phase monosaccharides (2-deoxyribose, ribose, arabinose, xylose, lyxose, glucose galactose, fructose, and tagatose), generated by laser desorption of solid sample pellets, are ionized with extreme ultraviolet photons (EUV, 46.9 nm, 26.44 eV). The resulting fragment ions are analyzed using a time of flight mass spectrometer. All aldoses yield identical fragment ions regardless of size, and ketoses, while also generating same ions as aldoses, yields additional features. Extensive fragmentation of the monosaccharides is the result the EUV photons ionizing various inner valence orbitals. The observed fragmentation patterns are not dependent upon hydrogen bonding structure or OH group orientation.

Soft x-ray microscopy and extreme ultraviolet lithography: Imaging in the 20-50 nm regime (abstract) (invited)

NASA Astrophysics Data System (ADS)

Attwood, David

2002-03-01

Advances in short wavelength optics, covering the range from 1 to 14 nm, are providing new results and new opportunities. Zone plate lenses [E. Anderson et al., J. Vac. Sci. Techno. B 18, 2970 (2000)] for soft x-ray microscopy [G. Denbeaux, Rev. Sci. Instrum. (these proceedings); W. Chao, Proc. SPIE 4146, 171 (2000)] are now made to high accuracy with outer zone widths of 25 nm, and demonstrated resolution of 23 nm with proper illumination and stability. These permit important advances in the study of protein specific transport and structure in the life sciences [C. Larabell (private communication); W. Meyer-Ilse et al., J. Microsc. 201, 395 (2001)] and the study of magnetic materials [P. Fischer et al., J. Synchrotron. Radiat. 8, 325 (2001)] with elemental sensitivity at the resolution of individual domains. Major corporations (members of the EUV Limited Liability Company are Intel, Motorola, AMD, Micron, Infineon, and IBM) are now preparing the path for the fabrication of future computer chips, in the years 2007 and beyond, using multilayer coated reflective optics, which achieve reflectivities of 70% in the 11-14 nm region [T. Barbee et al., Appl. Opt. 24, 883 (1985); C. Montcalm et al., Proc. SPIE 3676, 710 (1999)]. These coated optics are to be incorporated in extreme ultraviolet (EUV) print cameras, known as "steppers." Electronic patterns with features in the range of 50-70 nm have been printed. The first alpha tool stepper recently demonstrated all critical technologies [D. Tichenor et al., Proc. SPIE 4343, 19 (2001)] needed for EUV lithography. Preproduction beta tools are targeted for delivery by leading suppliers [ASML, the Netherlands, at the SPIE Microlithography Conference, Santa Clara, CA, March 2001] in 2004, with high volume production tools available in late 2006 for manufacturing in 2007. New results in these two areas will be discussed in the context of the synergy of science and technology.

Normal-incidence EXtreme-Ultraviolet imaging Spectrometer - NEXUS

NASA Astrophysics Data System (ADS)

Dere, K. P.

2003-05-01

NEXUS is the result of a breakthrough optical design that incorporates new technologies to achieve high optical throughput at high spatial (1 arcsec) and spectral (1-2 km s-1) resolution over a wide field of view in an optimal extreme-ultraviolet spectral band. This achievement was made possible primarily by two technical developments. First, a coating of boron-carbide deposited onto a layer of iridium provided a greatly enhanced reflectivity at EUV wavelengths that would enable NEXUS to observe the Sun over a wide temperature range at high cadence. The reflectivity of these coatings have been measured and demonstrated in the laboratory. The second key development was the use of a variable-line-spaced toroidal grating spectrometer. The spectrometer design allowed the Sun to be imaged at high spatial and spectral resolution along a 1 solar radius-long slit and over a wavelength range from 450 to 800 Å, nearly an entire spectral order. Because the spectrograph provided a magnification of about a factor of 6, only 2 optical elements are required to achieved the desired imaging performance. Throughput was enhanced by the use of only 2 reflections. The could all be accomodated within a total instrument length of 1.5m. We would like to acknowledge support from ONR

How calibration and reference spectra affect the accuracy of absolute soft X-ray solar irradiance measured by the SDO/EVE/ESP during high solar activity

NASA Astrophysics Data System (ADS)

Didkovsky, Leonid; Wieman, Seth; Woods, Thomas

2016-10-01

The Extreme ultraviolet Spectrophotometer (ESP), one of the channels of SDO's Extreme ultraviolet Variability Experiment (EVE), measures solar irradiance in several EUV and soft x-ray (SXR) bands isolated using thin-film filters and a transmission diffraction grating, and includes a quad-diode detector positioned at the grating zeroth-order to observe in a wavelength band from about 0.1 to 7.0 nm. The quad diode signal also includes some contribution from shorter wavelength in the grating's first-order and the ratio of zeroth-order to first-order signal depends on both source geometry, and spectral distribution. For example, radiometric calibration of the ESP zeroth-order at the NIST SURF BL-2 with a near-parallel beam provides a different zeroth-to-first-order ratio than modeled for solar observations. The relative influence of "uncalibrated" first-order irradiance during solar observations is a function of the solar spectral irradiance and the locations of large Active Regions or solar flares. We discuss how the "uncalibrated" first-order "solar" component and the use of variable solar reference spectra affect determination of absolute SXR irradiance which currently may be significantly overestimated during high solar activity.

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis

NASA Astrophysics Data System (ADS)

Park, Eun-Sang; Ban, Chung-Hyun; Park, Jae-Hun; Oh, Hye-Keun

2017-10-01

The analysis of the thermal stress and the extreme-ultraviolet (EUV) pellicle is important since the pellicle could be easily damaged since the thickness of the pellicle is 50 nm thin due to 90% required EUV transmission. One of the solution is using a high emissivity metallic material on the both sides of the pellicle and it can lower the thermal stress. However, using a metallic coating on pellicle core which is usually consist of silicon group can decrease the EUV transmission compared to using a single core layer pellicle only. Therefore, we optimized thermal and optical properties of the pellicle and elect three types of the pellicle. In this paper we simulated our optimized pellicles with 500W source power. The result shows that the difference of the thermal stress is small for each case. Therefore, our result also shows that using a high emissivity coating is necessary since the cooling of the pellicle strongly depends on emissivity and it can lower the stress effectively even at high EUV source power.

Cleaning process for EUV optical substrates

DOEpatents

Weber, Frank J.; Spiller, Eberhard A.

1999-01-01

A cleaning process for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.

Slowly varying component of extreme ultraviolet solar radiation and its relation to solar radio radiation

NASA Technical Reports Server (NTRS)

Chapman, R. D.; Neupert, W. M.

1974-01-01

A study of the correlations between solar EUV line fluxes and solar radio fluxes has been carried out. A calibration for the Goddard Space Flight Center EUV spectrum is suggested. The results are used to obtain an equation for the absolute EUV flux for several lines in the 150- to 400-A region and the total flux of 81 intense lines in the region, the 2800-MHz radio flux being used as independent variable.

The Extreme Ultraviolet Flux of Very Low Mass Stars

NASA Astrophysics Data System (ADS)

Drake, Jeremy

2017-09-01

The X-ray and EUV emission of stars is vital for understanding the atmospheres and evolution of their planets. The coronae of dwarf stars later than M6 behave differently to those of earlier spectral types and are more X-ray dim and radio bright. Too faint to have been observed by EUVE, their EUV behavior is currently highly uncertain. We propose to observe a small sample of late M dwarfs using the off-axis HRC-S thin Al" filter that is sensitive to EUV emission in the 50-200 A range. The measured fluxes will be used to understand the amount of cooler coronal plasma present, and extend X-ray-EUV flux relations to the latest stellar types.

Surface Inhomogeneities of the White Dwarf in the Binary EUVE J2013+400

NASA Astrophysics Data System (ADS)

Vennes, Stephane

We propose to study the white dwarf in the binary EUVE J2013+400. The object is paired with a dMe star and new extreme ultraviolet (EUV) observations will offer critical insights into the properties of the white dwarf. The binary behaves, in every other aspects, like its siblings EUVE J0720-317 and EUVE J1016-053 and new EUV observations will help establish their class properties; in particular, EUV photometric variations in 0720-317 and 1016-053 over a period of 11 hours and 57 minutes, respectively, are indicative of surface abundance inhomogeneities coupled with the white dwarfs rotation period. These variations and their large photospheric helium abundance are best explained by a diffusion-accretion model in which time-variable accretion and possible coupling to magnetic poles contribute to abundance variations across the surface and possibly as a function of depth. EUV spectroscopy will also enable a study of the helium abundance as a function of depth and a detailed comparison with theoretical diffusion profile.

The extreme ultraviolet spectra of low-redshift radio-loud quasars

NASA Astrophysics Data System (ADS)

Punsly, Brian; Reynolds, Cormac; Marziani, Paola; O'Dea, Christopher P.

2016-07-01

This paper reports on the extreme ultraviolet (EUV) spectrum of three low-redshift (z ˜ 0.6) radio-loud quasars, 3C 95, 3C 57 and PKS 0405-123. The spectra were obtained with the Cosmic Origins Spectrograph of the Hubble Space Telescope. The bolometric thermal emission, Lbol, associated with the accretion flow is a large fraction of the Eddington limit for all of these sources. We estimate the long-term time-averaged jet power, overline{Q}, for the three sources. overline{Q}/L_{bol}, is shown to lie along the correlation of overline{Q}/L_{bol}, and αEUV found in previous studies of the EUV continuum of intermediate and high-redshift quasars, where the EUV continuum flux density between 1100 and 700 Å is defined by F_{ν } ˜ ν ^{-α _{EUV}}. The high Eddington ratios of the three quasars extend the analysis into a wider parameter space. Selecting quasars with high Eddington ratios has accentuated the statistical significance of the partial correlation analysis of the data. Namely, the correlation of overline{Q}/L_{bol} and αEUV is fundamental, and the correlation of overline{Q} and αEUV is spurious at a very high statistical significance level (99.8 per cent). This supports the regulating role of ram pressure of the accretion flow in magnetically arrested accretion models of jet production. In the process of this study, we use multifrequency and multiresolution Very Large Array radio observations to determine that one of the bipolar jets in 3C 57 is likely frustrated by galactic gas that keeps the jet from propagating outside the host galaxy.

SoFAST: Automated Flare Detection with the PROBA2/SWAP EUV Imager

NASA Astrophysics Data System (ADS)

Bonte, K.; Berghmans, D.; De Groof, A.; Steed, K.; Poedts, S.

2013-08-01

The Sun Watcher with Active Pixels and Image Processing (SWAP) EUV imager onboard PROBA2 provides a non-stop stream of coronal extreme-ultraviolet (EUV) images at a cadence of typically 130 seconds. These images show the solar drivers of space-weather, such as flares and erupting filaments. We have developed a software tool that automatically processes the images and localises and identifies flares. On one hand, the output of this software tool is intended as a service to the Space Weather Segment of ESA's Space Situational Awareness (SSA) program. On the other hand, we consider the PROBA2/SWAP images as a model for the data from the Extreme Ultraviolet Imager (EUI) instrument prepared for the future Solar Orbiter mission, where onboard intelligence is required for prioritising data within the challenging telemetry quota. In this article we present the concept of the software, the first statistics on its effectiveness and the online display in real time of its results. Our results indicate that it is not only possible to detect EUV flares automatically in an acquired dataset, but that quantifying a range of EUV dynamics is also possible. The method is based on thresholding of macropixelled image sequences. The robustness and simplicity of the algorithm is a clear advantage for future onboard use.

The solar flare extreme ultraviolet to hard X-ray ratio

NASA Technical Reports Server (NTRS)

Mcclymont, A. N.; Canfield, R. C.

1986-01-01

Simultaneous measurements of the peak 10-1030 A extreme ultraviolet (EUV) flux enhancement and more than 10 keV hard X-ray (HXR) peak flux of many solar flare bursts, ranging over about four orders of magnitude in HXR intensity, are studied. A real departure from linearity is found in the relationship between the peak EUV and HXR fluxes in impulsive flare bursts. This relationship is well described by a given power law. Comparison of the predictions of the impulsive nonthermal thick-target electron beam model with observations shows that the model satisfactorily predicts the observed time differences between the HXR and EUV peaks and explains the data very well under given specific assumptions. It is concluded that the high-energy fluxes implied by the invariant area thick-target model cannot be completely ruled out, while the invariant area model with smaller low cutoff requires impossibly large beam densities. A later alternative thick-target model is suggested.

Extreme Ultraviolet Fractional Orbital Angular Momentum Beams from High Harmonic Generation

PubMed Central

Turpin, Alex; Rego, Laura; Picón, Antonio; San Román, Julio; Hernández-García, Carlos

2017-01-01

We investigate theoretically the generation of extreme-ultraviolet (EUV) beams carrying fractional orbital angular momentum. To this end, we drive high-order harmonic generation with infrared conical refraction (CR) beams. We show that the high-order harmonic beams emitted in the EUV/soft x-ray regime preserve the characteristic signatures of the driving beam, namely ringlike transverse intensity profile and CR-like polarization distribution. As a result, through orbital and spin angular momentum conservation, harmonic beams are emitted with fractional orbital angular momentum, and they can be synthesized into structured attosecond helical beams –or “structured attosecond light springs”– with rotating linear polarization along the azimuth. Our proposal overcomes the state of the art limitations for the generation of light beams far from the visible domain carrying non-integer orbital angular momentum and could be applied in fields such as diffraction imaging, EUV lithography, particle trapping, and super-resolution imaging. PMID:28281655

Plasmaspheric Erosion via Plasmasphere Coupling to Ring Current Plasmas: EUV Observations and Modeling

NASA Technical Reports Server (NTRS)

Adrian, M. L.; Gallagher, D. L.; Khazanov, G. V.; Chsang, S. W.; Liemohn, M. W.; Perez, J. D.; Green, J. L.; Sandel, B. R.; Mitchell, D. G.; Mende, S. B.;

Response of inorganic materials to laser - plasma EUV radiation focused with a lobster eye collector

NASA Astrophysics Data System (ADS)

Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Miroslaw; Havlikova, Radka; Pína, Ladislav; Švéda, Libor; Inneman, Adolf

2007-05-01

A single photon of EUV radiation carries enough energy to break any chemical bond or excite electrons from inner atomic shells. It means that the radiation regardless of its intensity can modify chemical structure of molecules. It is the reason that the radiation even with low intensity can cause fragmentation of long chains of organic materials and desorption of small parts from their surface. In this work interaction of EUV radiation with inorganic materials was investigated. Different inorganic samples were irradiated with a 10 Hz laser - plasma EUV source based on a gas puff target. The radiation was focused on a sample surface using a lobster eye collector. Radiation fluence at the surface reached 30 mJ/cm2 within a wavelength range 7 - 20 nm. In most cases there was no surface damage even after several minutes of irradiation. In some cases there could be noticed discolouration of an irradiated surface or evidences of thermal effects. In most cases however luminescent and scattered radiation was observed. The luminescent radiation was emitted in different wavelength ranges. It was recorded in a visible range of radiation and also in a wide wavelength range including UV, VUV and EUV. The radiation was especially intense in a case of non-metallic chemical compounds.

Comparison of Helioseismic Far-Side Active Region Detections with STEREO Far-Side EUV Observations of Solar Activity

NASA Astrophysics Data System (ADS)

Liewer, P. C.; Qiu, J.; Lindsey, C.

2017-10-01

Seismic maps of the Sun's far hemisphere, computed from Doppler data from the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory (SDO) are now being used routinely to detect strong magnetic regions on the far side of the Sun (http://jsoc.stanford.edu/data/farside/). To test the reliability of this technique, the helioseismically inferred active region detections are compared with far-side observations of solar activity from the Solar TErrestrial RElations Observatory (STEREO), using brightness in extreme-ultraviolet light (EUV) as a proxy for magnetic fields. Two approaches are used to analyze nine months of STEREO and HMI data. In the first approach, we determine whether new large east-limb active regions are detected seismically on the far side before they appear Earth side and study how the detectability of these regions relates to their EUV intensity. We find that while there is a range of EUV intensities for which far-side regions may or may not be detected seismically, there appears to be an intensity level above which they are almost always detected and an intensity level below which they are never detected. In the second approach, we analyze concurrent extreme-ultraviolet and helioseismic far-side observations. We find that 100% (22) of the far-side seismic regions correspond to an extreme-ultraviolet plage; 95% of these either became a NOAA-designated magnetic region when reaching the east limb or were one before crossing to the far side. A low but significant correlation is found between the seismic signature strength and the EUV intensity of a far-side region.

Characterization of hot dense plasma with plasma parameters

NASA Astrophysics Data System (ADS)

Singh, Narendra; Goyal, Arun; Chaurasia, S.

2018-05-01

Characterization of hot dense plasma (HDP) with its parameters temperature, electron density, skin depth, plasma frequency is demonstrated in this work. The dependence of HDP parameters on temperature and electron density is discussed. The ratio of the intensities of spectral lines within HDP is calculated as a function of electron temperature. The condition of weakly coupled for HDP is verified by calculating coupling constant. Additionally, atomic data such as transition wavelength, excitation energies, line strength, etc. are obtained for Be-like ions on the basis of MCDHF method. In atomic data calculations configuration interaction and relativistic effects QED and Breit corrections are newly included for HDP characterization and this is first result of HDP parameters from extreme ultraviolet (EUV) radiations.

SEMI-EMPIRICAL MODELING OF THE PHOTOSPHERE, CHROMOPSHERE, TRANSITION REGION, AND CORONA OF THE M-DWARF HOST STAR GJ 832

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fontenla, J. M.; Linsky, Jeffrey L.; Witbrod, Jesse

Stellar radiation from X-rays to the visible provides the energy that controls the photochemistry and mass loss from exoplanet atmospheres. The important extreme ultraviolet (EUV) region (10–91.2 nm) is inaccessible and should be computed from a reliable stellar model. It is essential to understand the formation regions and physical processes responsible for the various stellar emission features to predict how the spectral energy distribution varies with age and activity levels. We compute a state-of-the-art semi-empirical atmospheric model and the emergent high-resolution synthetic spectrum of the moderately active M2 V star GJ 832 as the first of a series of modelsmore » for stars with different activity levels. We construct a one-dimensional simple model for the physical structure of the star’s chromosphere, chromosphere-corona transition region, and corona using non-LTE radiative transfer techniques and many molecular lines. The synthesized spectrum for this model fits the continuum and lines across the UV-to-optical spectrum. Particular emphasis is given to the emission lines at wavelengths that are shorter than 300 nm observed with the Hubble Space Telescope , which have important effects on the photochemistry of the exoplanet atmospheres. The FUV line ratios indicate that the transition region of GJ 832 is more biased to hotter material than that of the quiet Sun. The excellent agreement of our computed EUV luminosity with that obtained by two other techniques indicates that our model predicts reliable EUV emission from GJ 832. We find that the unobserved EUV flux of GJ 832, which heats the outer atmospheres of exoplanets and drives their mass loss, is comparable to the active Sun.« less

EUV Solar Instrument Development at the Marshall Space Flight Center

NASA Astrophysics Data System (ADS)

Kobayashi, K.; Cirtain, J. W.; Davis, J. M.; West, E.; Golub, L.; Korreck, K. E.; Tsuneta, S.; Bando, T.

2009-12-01

The three sounding rocket instrument programs currently underway at the NASA Marshall Space Flight Center represent major advances in solar observations, made possible by improvements in EUV optics and detector technology. The Solar Ultraviolet Magnetograph Instrument (SUMI) is an EUV spectropolarimeter designed to measure the Zeeman splitting of two chromospheric EUV lines, the 280 nm MgII and 155 nm CIV lines. SUMI directly observes the magnetic field in the low-beta region where most energetic phenomena are though to originate. In conjunction with visible-light magnetographs, this observation allows us to track the evolution of the magnetic field as it evolves from the photosphere to the upper chromosphere. SUMI incorporates a normal incidence Cassegrain telescope, a MgF2 double-Wollaston polarizing beam splitter and two TVLS (toroidal varied line space) gratings, and is capable of observing two orthogonal polarizations in two wavelength bands simultaneously. SUMI has been fully assembled and tested, and currently scheduled for launch in summer of 2010. The High-resolution Coronal Imager is a normal-incidence EUV imaging telescope designed to achieve 0.2 arcsecond resolution, with a pixel size of 0.1 arcsecond. This is a factor of 25 improvement in aerial resolution over the Transition Region And Coronal Explorer (TRACE). Images obtained by TRACE indicate presence of unresolved structures; higher resolution images will reveal the scale and topology of structures that make up the corona. The telescope mirrors are currently being fabricated, and the instrument has been funded for flight. In addition, a Lyman alpha spectropolarimeter is under development in collaboration with the National Astronomical Observatory of Japan. This aims to detect the linear polarization in the chromosphere caused by the Hanle effect. Horizontal magnetic fields in the chromosphere are expected to be detectable as polarization near disk center, and off-limb observations will reveal the magnetic field structure of filaments and prominences. Laboratory tests of candidate optical components are currently underway.

Using the ionospheric response to the solar eclipse on 20 March 2015 to detect spatial structure in the solar corona

PubMed Central

Bradford, J.; Bell, S. A.; Wilkinson, J.; Smith, D.; Tudor, S.

2016-01-01

The total solar eclipse that occurred over the Arctic region on 20 March 2015 was seen as a partial eclipse over much of Europe. Observations of this eclipse were used to investigate the high time resolution (1 min) decay and recovery of the Earth’s ionospheric E-region above the ionospheric monitoring station in Chilton, UK. At the altitude of this region (100 km), the maximum phase of the eclipse was 88.88% obscuration of the photosphere occurring at 9:29:41.5 UT. In comparison, the ionospheric response revealed a maximum obscuration of 66% (leaving a fraction, Φ, of uneclipsed radiation of 34±4%) occurring at 9:29 UT. The eclipse was re-created using data from the Solar Dynamics Observatory to estimate the fraction of radiation incident on the Earth’s atmosphere throughout the eclipse from nine different emission wavelengths in the extreme ultraviolet (EUV) and X-ray spectrum. These emissions, having varying spatial distributions, were each obscured differently during the eclipse. Those wavelengths associated with coronal emissions (94, 211 and 335 Å) most closely reproduced the time varying fraction of unobscured radiation observed in the ionosphere. These results could enable historic ionospheric eclipse measurements to be interpreted in terms of the distribution of EUV and X-ray emissions on the solar disc. This article is part of the themed issue ‘Atmospheric effects of solar eclipses stimulated by the 2015 UK eclipse’. PMID:27550766

Using the ionospheric response to the solar eclipse on 20 March 2015 to detect spatial structure in the solar corona.

PubMed

Scott, C J; Bradford, J; Bell, S A; Wilkinson, J; Barnard, L; Smith, D; Tudor, S

2016-09-28

The total solar eclipse that occurred over the Arctic region on 20 March 2015 was seen as a partial eclipse over much of Europe. Observations of this eclipse were used to investigate the high time resolution (1 min) decay and recovery of the Earth's ionospheric E-region above the ionospheric monitoring station in Chilton, UK. At the altitude of this region (100 km), the maximum phase of the eclipse was 88.88% obscuration of the photosphere occurring at 9:29:41.5 UT. In comparison, the ionospheric response revealed a maximum obscuration of 66% (leaving a fraction, Φ, of uneclipsed radiation of 34±4%) occurring at 9:29 UT. The eclipse was re-created using data from the Solar Dynamics Observatory to estimate the fraction of radiation incident on the Earth's atmosphere throughout the eclipse from nine different emission wavelengths in the extreme ultraviolet (EUV) and X-ray spectrum. These emissions, having varying spatial distributions, were each obscured differently during the eclipse. Those wavelengths associated with coronal emissions (94, 211 and 335 Å) most closely reproduced the time varying fraction of unobscured radiation observed in the ionosphere. These results could enable historic ionospheric eclipse measurements to be interpreted in terms of the distribution of EUV and X-ray emissions on the solar disc.This article is part of the themed issue 'Atmospheric effects of solar eclipses stimulated by the 2015 UK eclipse'. © 2016 The Author(s).

DOE Office of Scientific and Technical Information (OSTI.GOV)

Naulleau, Patrick

With demonstrated resist resolution of 20 nm half pitch, the SEMATECH Berkeley BUV microfield exposure tool continues to push crucial advances in the areas of BUY resists and masks. The ever progressing shrink in computer chip feature sizes has been fueled over the years by a continual reduction in the wavelength of light used to pattern the chips. Recently, this trend has been threatened by unavailability of lens materials suitable for wavelengths shorter than 193 nm. To circumvent this roadblock, a reflective technology utilizing a significantly shorter extreme ultraviolet (EUV) wavelength (13.5 nm) has been under development for the pastmore » decade. The dramatic wavelength shrink was required to compensate for optical design limitations intrinsic in mirror-based systems compared to refractive lens systems. With this significant reduction in wavelength comes a variety of new challenges including developing sources of adequate power, photoresists with suitable resolution, sensitivity, and line-edge roughness characteristics, as well as the fabrication of reflection masks with zero defects. While source development can proceed in the absence of available exposure tools, in order for progress to be made in the areas of resists and masks it is crucial to have access to advanced exposure tools with resolutions equal to or better than that expected from initial production tools. These advanced development tools, however, need not be full field tools. Also, implementing such tools at synchrotron facilities allows them to be developed independent of the availability of reliable stand-alone BUY sources. One such tool is the SEMATECH Berkeley microfield exposure tool (MET). The most unique attribute of the SEMA TECH Berkeley MET is its use of a custom-coherence illuminator made possible by its implementation on a synchrotron beamline. With only conventional illumination and conventional binary masks, the resolution limit of the 0.3-NA optic is approximately 25 nm, however, with EUV not expected in production before the 22-nm half pitch node even finer resolution capabilities are now required from development tools. The SEMATECH Berkeley MET's custom-coherence illuminator allows it to be used with aggressive modified illumination enabling kJ factors as low as 0.25. Noting that the lithographic resolution of an exposure tool is defined as k{sub 1}{lambda}/NA, yielding an ultimate resolution limit of 11 nm. To achieve sub-20-nm aerial-image resolution while avoiding forbidden pitches on Manhattan-geometry features with the centrally-obscured MET optic, a 45-degree oriented dipole pupil fill is used. Figure 1 shows the computed aerial-image contrast as a function of half pitch for a dipole pupil fill optimized to print down to the 19-nm half pitch level. This is achieved with relatively uniform performance at larger dimensions. Using this illumination, printing down to the 20-nm half pitch level has been demonstrated in chemically amplified resists as shown in Fig. 2. The SEMATECH Berkeley MET tool plays a crucial role in the advancement of EUV resists. The unique programmable coherence properties of this tool enable it to achieve higher resolution than other EUV projection tools. As presented here, over the past year the tool has been used to demonstrate resist resolutions of 20 half pitch. Although not discussed here, because the Berkeley MET tool is a true projection lithography tool, it also plays a crucial role in advanced EUV mask research. Examples of the work done in this area include defect printability, mask architecture, and phase shift masks.« less

Active galaxies observed during the Extreme Ultraviolet Explorer all-sky survey

NASA Technical Reports Server (NTRS)

Marshall, H. L.; Fruscione, A.; Carone, T. E.

1995-01-01

We present observations of active galactic nuclei (AGNs) obtained with the Extreme Ultraviolet Explorer (EUVE) during the all-sky survey. A total of 13 sources were detected at a significance of 2.5 sigma or better: seven Seyfert galaxies, five BL Lac objects, and one quasar. The fraction of BL Lac objects is higher in our sample than in hard X-ray surveys but is consistent with the soft X-ray Einstein Slew Survey, indicating that the main reason for the large number of BL Lac objects in the extreme ulktraviolet (EUV) and soft X-ray bands is their steeper X-ray spectra. We show that the number of AGNs observed in both the EUVE and ROSAT Wide Field Camera surveys can readily be explained by modelling the EUV spectra with a simple power law in the case of BL Lac objects and with an additional EUV excess in the case of Seyferts and quasars. Allowing for cold matter absorption in Seyfert galaxy hosts drive up the inferred average continuum slope to 2.0 +/- 0.5 (at 90% confidence), compared to a slope of 1.0 usually found from soft X-ray data. If Seyfert galaxies without EUV excesses form a significant fraction of the population, then the average spectrum of those with bumps should be even steeper. We place a conservative limit on neutral gas in BL Lac objects: N(sub H) less than 10(exp 20)/sq cm.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Leeson, Michael; Caudillo, Roman; Bacuita, Terence; Shah, Uday; Chandhok, Manish

2011-04-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. According to recent assessments made at the 2010 EUVL Symposium, the readiness of EUV materials remains one of the top risk items for EUV adoption. The main development issue regarding EUV resists has been how to simultaneously achieve high resolution, high sensitivity, and low line width roughness (LWR). This paper describes our strategy, the current status of EUV materials, and the integrated post-development LWR reduction efforts made at Intel Corporation. Data collected utilizing Intel's Micro- Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <=11.3mJ/cm2 with <=3nm LWR.

Single-expose patterning development for EUV lithography

NASA Astrophysics Data System (ADS)

De Silva, Anuja; Petrillo, Karen; Meli, Luciana; Shearer, Jeffrey C.; Beique, Genevieve; Sun, Lei; Seshadri, Indira; Oh, Taehwan; Han, Seulgi; Saulnier, Nicole; Lee, Joe; Arnold, John C.; Hamieh, Bassem; Felix, Nelson M.; Furukawa, Tsuyoshi; Singh, Lovejeet; Ayothi, Ramakrishnan

2017-03-01

Initial readiness of EUV (extreme ultraviolet) patterning was demonstrated in 2016 with IBM Alliance's 7nm device technology. The focus has now shifted to driving the 'effective' k1 factor and enabling the second generation of EUV patterning. With the substantial cost of EUV exposure there is significant interest in extending the capability to do single exposure patterning with EUV. To enable this, emphasis must be placed on the aspect ratios, adhesion, defectivity reduction, etch selectivity, and imaging control of the whole patterning process. Innovations in resist materials and processes must be included to realize the full entitlement of EUV lithography at 0.33NA. In addition, enhancements in the patterning process to enable good defectivity, lithographic process window, and post etch pattern fidelity are also required. Through this work, the fundamental material challenges in driving down the effective k1 factor will be highlighted.

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Chandhok, Manish; Frasure, Kent

2009-03-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 32nm half-pitch node and beyond. Readiness of EUV materials is currently one high risk area according to assessments made at the 2008 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data is presented utilizing Intel's Micro-Exposure Tool (MET) examining the feasibility of establishing a resist process that simultaneously exhibits <=30nm half-pitch (HP) L/S resolution at <=10mJ/cm2 with <=4nm LWR.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Caudillo, Roman; Chandhok, Manish

2010-04-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. Readiness of EUV materials is currently one high risk area according to recent assessments made at the 2009 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data collected utilizing Intel's Micro-Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <= 12.5mJ/cm2 with <= 4nm LWR.

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Higashiguchi, Takeshi, E-mail: higashi@cc.utsunomiya-u.ac.jp; Yamaguchi, Mami; Otsuka, Takamitsu

2014-09-15

Emission spectra from multiply charged potassium ions ranging from K{sup 3+} to K{sup 5+} have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8−12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

MoRu/Be multilayers for extreme ultraviolet applications

DOEpatents

Bajt, Sasa C.; Wall, Mark A.

2001-01-01

High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

Design, fabrication and performance of two grazing incidence telescopes for celestial extreme ultraviolet astronomy

NASA Technical Reports Server (NTRS)

Lampton, M.; Cash, W.; Malina, R. F.; Bowyer, S.

1977-01-01

The design and performance of grazing incidence telescopes for celestial extreme ultraviolet (EUV) astronomy are described. The telescopes basically consist of a star tracker, collimator, grazing incidence mirror, vacuum box lid, vacuum housing, filters, a ranicon detector, an electronics box, and an aspect camera. For the survey mirror a Wolter-Schwarzschild type II configuration was selected. Diamond-turning was used for mirror fabrication, a technique which machines surfaces to the order of 10 microns over the required dimensions. The design of the EUV spectrometer is discussed with particular reference to the optics for a primarily spectroscopic application and the fabrication of the f/10 optics.

EXTREME ULTRAVIOLET EXPLORER OBSERVATIONS OF HERCULES X-1 OVER A 35 DAY CYCLE

DOE Office of Scientific and Technical Information (OSTI.GOV)

Leahy, D. A.; Dupuis, Jean, E-mail: leahy@ucalgary.c

2010-06-01

Observations of Hercules X-1 by the Extreme Ultraviolet Explorer covering most of the 35 day cycle are reported here. This is the only long extreme ultraviolet (EUV) observation of Her X-1. Simultaneous X-ray observations with the Rossi X-ray Timing Explorer All-Sky Monitor (RXTE/ASM) X-ray show that Her X-1 is in an X-ray anomalous low state. The first 4 days are also observed with the RXTE proportional counter array (PCA), which shows that the X-ray properties are nearly the same as for normal low states in Her X-1 with flux reduced by a factor of 2. In contrast, the EUV emissionmore » from Her X-1 is reduced by a factor of {approx}4 compared to normal low states. The twisted-tilted accretion disk responsible for the normal 35 day X-ray cycle can be modified to explain this behavior. An increased disk twist reduces the X-ray illumination of HZ Her by a factor of {approx}2 and of the disk surface by a somewhat larger factor, leading to a larger reduction in EUV flux compared to X-ray flux.« less

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

NASA Astrophysics Data System (ADS)

Musgrave, Christopher S. A.; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

2017-03-01

With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

EUV spectroscopy of high-redshift x-ray objects

NASA Astrophysics Data System (ADS)

Kowalski, M. P.; Wolff, M. T.; Wood, K. S.; Barbee, T. W., Jr.; Barstow, M. A.

2010-07-01

As astronomical observations are pushed to cosmological distances (z>3) the spectral energy distributions of X-ray objects, AGN for example, will be redshifted into the EUV waveband. Consequently, a wealth of critical spectral diagnostics, provided by, for example, the Fe L-shell complex and the O VII/VIII lines, will be lost to future planned X-ray missions (e.g., IXO, Gen-X) if operated at traditional X-ray energies. This opens up a critical gap in performance located at short EUV wavelengths, where critical X-ray spectral transitions occur in high-z objects. However, normal-incidence multilayer-grating technology, which performs best precisely at such wavelengths, together with advanced nanolaminate replication techniques have been developed and are now mature to the point where advanced EUV instrument designs with performance complementary to IXO and Gen-X are practical. Such EUV instruments could be flown either independently or as secondary instruments on these X-ray missions. We present here a critical examination of the limits placed on extragalactic EUV measurements by ISM absorption, the range where high-z measurements are practical, and the requirements this imposes on next-generation instrument designs. We conclude with a discussion of a breakthrough technology, nanolaminate replication, which enables such instruments.

Optical element for full spectral purity from IR-generated EUV light sources

NASA Astrophysics Data System (ADS)

van den Boogaard, A. J. R.; Louis, E.; van Goor, F. A.; Bijkerk, F.

2009-03-01

Laser produced plasma (LLP) sources are generally considered attractive for high power EUV production in next generation lithography equipment. Such plasmas are most efficiently excited by the relatively long, infrared wavelengths of CO2-lasers, but a significant part of the rotational-vibrational excitation lines of the CO2 radiation will be backscattered by the plasma's critical density surface and consequently will be present as parasitic radiation in the spectrum of such sources. Since most optical elements in the EUV collecting and imaging train have a high reflection coefficient for IR radiation, undesirable heating phenomena at the resist level are likely to occur. In this study a completely new principle is employed to obtain full separation of EUV and IR radiation from the source by a single optical component. While the application of a transmission filter would come at the expense of EUV throughput, this technique potentially enables wavelength separation without loosing reflectance compared to a conventional Mo/Si multilayer coated element. As a result this method provides full spectral purity from the source without loss in EUV throughput. Detailed calculations on the principal of functioning are presented.

Mechanisms of EUV exposure: electrons and holes

NASA Astrophysics Data System (ADS)

Narasimhan, Amrit; Grzeskowiak, Steven; Ackerman, Christian; Flynn, Tracy; Denbeaux, Greg; Brainard, Robert L.

2017-03-01

In extreme ultraviolet (EUV) lithography, 92 eV photons are used to expose photoresists. Current EUV photoresists are composed of photoacid generators (PAGs) in polymer matrices. Secondary electrons (2 - 80 eV) created in resists during EUV exposure play large role in acid-production. There are several proposed mechanisms for electron-resist interactions: internal excitation, electron trapping, and hole-initiated chemistry. Here, we will address two central questions in EUV resist research: (1) How many electrons are generated per EUV photon absorption? (2) By which mechanisms do these electrons interact and react with molecules in the resist? We will use this framework to evaluate the contributions of electron trapping and hole initiated chemistry to acid production in chemically amplified photoresists, with specific emphasis on the interdependence of these mechanisms. We will show measurements of acid yield from direct bulk electrolysis of PAGs and EUV exposures of PAGs in phenolic and nonphenolic polymers to narrow down the mechanistic possibilities in chemically amplified resists.

THE INFLUENCE OF THE EXTREME ULTRAVIOLET SPECTRAL ENERGY DISTRIBUTION ON THE STRUCTURE AND COMPOSITION OF THE UPPER ATMOSPHERE OF EXOPLANETS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Guo, J. H.; Ben-Jaffel, Lotfi, E-mail: guojh@ynao.ac.cn, E-mail: bjaffel@iap.fr

2016-02-20

By varying the profiles of stellar extreme ultraviolet (EUV) spectral energy distributions (SEDs), we tested the influences of stellar EUV SEDs on the physical and chemical properties of an escaping atmosphere. We apply our model to study four exoplanets: HD 189733b, HD 209458b, GJ 436b, and Kepler-11b. We find that the total mass loss rates of an exoplanet, which are determined mainly by the integrated fluxes, are moderately affected by the profiles of the EUV SED, but the composition and species distributions in the atmosphere can be dramatically modified by the different profiles of the EUV SED. For exoplanets withmore » a high hydrodynamic escape parameter (λ), the amount of atomic hydrogen produced by photoionization at different altitudes can vary by one to two orders of magnitude with the variation of stellar EUV SEDs. The effect of photoionization of H is prominent when the EUV SED is dominated by the low-energy spectral region (400–900 Å), which pushes the transition of H/H{sup +} to low altitudes. In contrast, the transition of H/H{sup +} moves to higher altitudes when most photons are concentrated in the high-energy spectral region (50–400 Å). For exoplanets with a low λ, the lower temperatures of the atmosphere make many chemical reactions so important that photoionization alone can no longer determine the composition of the escaping atmosphere. For HD 189733b, it is possible to explain the time variability of Lyα between 2010 and 2011 by a change in the EUV SED of the host K-type star, yet invoking only thermal H i in the atmosphere.« less

Atomic structure calculations and identification of EUV and SXR spectral lines in Sr XXX

NASA Astrophysics Data System (ADS)

Goyal, Arun; Khatri, Indu; Aggarwal, Sunny; Singh, A. K.; Mohan, Man

2015-08-01

We report an extensive theoretical study of atomic data for Sr XXX in a wide range with L-shell electron excitations to the M-shell. We have calculated energy levels, wave-function compositions and lifetimes for lowest 113 fine structure levels and wavelengths of an extreme Ultraviolet (EUV) and soft X-ray (SXR) transitions. We have employed multi-configuration Dirac Fock method (MCDF) approach within the framework of Dirac-Coulomb Hamiltonian including quantum electrodynamics (QED) and Breit corrections. We have also presented the radiative data for electric and magnetic dipole (E1, M1) and quadrupole (E2, M2) transitions from the ground state. We have made comparisons with available energy levels compiled by NIST and achieve good agreement. But due to inadequate data in the literature, analogous relativistic distorted wave calculations have also been performed using flexible atomic code (FAC) to assess the reliability and accuracy of our results. Additionally, we have provided new atomic data for Sr XXX which is not published elsewhere in the literature and we believe that our results may be beneficial in fusion plasma research and astrophysical investigations and applications.

Prospect of space-based interferometry at EUV and soft X-ray wavelengths

NASA Technical Reports Server (NTRS)

Welsh, Barry Y.; Chakrabarti, Supriya

1992-01-01

We review the current capabilities of high-resolution, spectroscopic, space-borne instrumentation available for both solar and stellar observations in the EUV and soft X-ray wavelength regimes, and describe the basic design of a compact, all-reflection interferometer based on the spatial heterodyne technique; this is capable of producing a resolving power (lambda/Delta-lambda) of about 20,000 in the 100-200 A region using presently available multilayer optical components. Such an instrument can be readily constructed with existing technology. Due to its small size and lack of moving parts, it is ideally suited to spaceborne applications. Based on best estimates of the efficiency of this instrument at soft X-ray wavelengths, we review the possible use of this high-resolution interferometer in obtaining high-resolution full-disk spectroscopy of the sun. We also discuss its possible use for observations of diffuse sources such as the EUV interstellar background radiation.

Spectral characteristics of quantum-cascade laser operating at 10.6 μm wavelength for a seed application in laser-produced-plasma extreme UV source.

PubMed

Nowak, Krzysztof M; Ohta, Takeshi; Suganuma, Takashi; Yokotsuka, Toshio; Fujimoto, Junichi; Mizoguchi, Hakaru; Endo, Akira

2012-11-15

In this Letter, we investigate, for the first time to our knowledge, the spectral properties of a quantum-cascade laser (QCL) from a point of view of a new application as a laser seeder for a nanosecond-pulse high-repetition frequency CO(2) laser operating at 10.6 μm wavelength. The motivation for this work is a renewed interest in such a pulse format and wavelength driven by a development of extreme UV (EUV) laser-produced-plasma (LPP) sources. These sources use pulsed multikilowatt CO(2) lasers to drive the EUV-emitting plasmas. Basic spectral performance characteristics of a custom-made QCL chip are measured, such as tuning range and chirp rate. The QCL is shown to have all essential qualities of a robust seed source for a high-repetition nanosecond-pulsed CO(2) laser required by EUV LPP sources.

Progress in coherent lithography using table-top extreme ultraviolet lasers

NASA Astrophysics Data System (ADS)

Li, Wei

Nanotechnology has drawn a wide variety of attention as interesting phenomena occurs when the dimension of the structures is in the nanometer scale. The particular characteristics of nanoscale structures had enabled new applications in different fields in science and technology. Our capability to fabricate these nanostructures routinely for sure will impact the advancement of nanoscience. Apart from the high volume manufacturing in semiconductor industry, a small-scale but reliable nanofabrication tool can dramatically help the research in the field of nanotechnology. This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In chapter II, a brief review of the main characteristics of table-top EUV lasers will be addressed concentrating on its high power and large coherence radius that enable the lithography application described herein. The development of a Talbot EUV lithography system which is capable of printing 50nm half pitch nanopatterns will be illustrated in chapter III. A detailed discussion of its resolution limit will be presented followed by the development of X-Y-Z positioning stage, the fabrication protocol for diffractive EUV mask, and the pattern transfer using self- developed ion beam etching, and the dose control unit. In addition, this dissertation demonstrated the capability to fabricate functional periodic nanostructures using Talbot EUV lithography. After that, resolution enhancement techniques like multiple exposure, displacement Talbot EUV lithography, fractional Talbot EUV lithography, and Talbot lithography using 18.9nm amplified spontaneous emission laser will be demonstrated. Chapter IV will describe a hybrid EUV lithography which combines the Talbot imaging and interference lithography rendering a high resolution interference pattern whose lattice is modified by a custom designed Talbot mask. In other words, this method enables filling the arbitrary Talbot cell with ultra-fine interference nanofeatures. Detailed optics modeling, system design and experiment results using He-Ne laser and table top EUV laser are included. The last part of chapter IV will analyze its exclusive advantages over traditional Talbot or interference lithography.

Particle protection capability of SEMI-compliant EUV-pod carriers

NASA Astrophysics Data System (ADS)

Huang, George; He, Long; Lystad, John; Kielbaso, Tom; Montgomery, Cecilia; Goodwin, Frank

2010-04-01

With the projected rollout of pre-production extreme ultraviolet lithography (EUVL) scanners in 2010, EUVL pilot line production will become a reality in wafer fabrication companies. Among EUVL infrastructure items that must be ready, EUV mask carriers remain critical. To keep non-pellicle EUV masks free from particle contamination, an EUV pod concept has been extensively studied. Early prototypes demonstrated nearly particle-free results at a 53 nm PSL equivalent inspection sensitivity during EUVL mask robotic handling, shipment, vacuum pump-purge, and storage. After the passage of SEMI E152, which specifies the EUV pod mechanical interfaces, standards-compliant EUV pod prototypes, including a production version inner pod and prototype outer pod, were built and tested. Their particle protection capability results are reported in this paper. A state-of-the-art blank defect inspection tool was used to quantify their defect protection capability during mask robotic handling, shipment, and storage tests. To ensure the availability of an EUV pod for 2010 pilot production, the progress and preliminary test results of pre-production EUV outer pods are reported as well.

Berkeley extreme-ultraviolet airglow rocket spectrometer - BEARS

NASA Technical Reports Server (NTRS)

Cotton, D. M.; Chakrabarti, S.

1992-01-01

The Berkeley EUV airglow rocket spectrometer (BEARS) instrument is described. The instrument was designed in particular to measure the dominant lines of atomic oxygen in the FUV and EUV dayglow at 1356, 1304, 1027, and 989 A, which is the ultimate source of airglow emissions. The optical and mechanical design of the instrument, the detector, electronics, calibration, flight operations, and results are examined.

Concept Study Report: Extreme-Ultraviolet Imaging Spectrometer Solar-B

NASA Technical Reports Server (NTRS)

Doschek, George, A.; Brown, Charles M.; Davila, Joseph M.; Dere, Kenneth P.; Korendyke, Clarence M.; Mariska, John T.; Seely, John F.

1999-01-01

We propose a next generation Extreme-ultraviolet Imaging Spectrometer (EIS) that for the first time combines high spectral, spatial, and temporal resolution in a single solar spectroscopic instrument. The instrument consists of a multilayer-coated off-axis telescope mirror and a multilayer-coated grating spectrometer. The telescope mirror forms solar images on the spectrometer entrance slit assembly. The spectrometer forms stigmatic spectra of the solar region located at the slit. This region is selected by the articulated telescope mirror. Monochromatic images are obtained either by rastering the solar region across a narrow entrance slit, or by using a very wide slit (called a slot) in place of the slit. Monochromatic images of the region centered on the slot are obtained in a single exposure. Half of each optic is coated to maximize reflectance at 195 Angstroms; the other half to maximize reflectance at 270 Angstroms. The two Extreme Ultraviolet (EUV) wavelength bands have been selected to maximize spectral and dynamical and plasma diagnostic capabilities. Spectral lines are observed that are formed over a temperature range from about 0.1 MK to about 20 MK. The main EIS instrument characteristics are: wavelength bands - 180 to 204 Angstroms; 250 to 290 Angstroms; spectral resolution - 0.0223 Angstroms/pixel (34.3km/s at 195 Angstroms and 23.6 km/s at 284 Angstroms); slit dimensions - 4 slits, two currently specified dimensions are 1" x 1024" and 50" x 1024" (the slot); largest spatial field of view in a single exposure - 50" x 1024"; highest time resolution for active region velocity studies - 4.4 s.

Emission spectra of photoionized plasmas induced by intense EUV pulses: Experimental and theoretical investigations

NASA Astrophysics Data System (ADS)

Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemysław; Jarocki, Roman; Fiedorowicz, Henryk

2017-03-01

Experimental measurements and numerical modeling of emission spectra in photoionized plasma in the ultraviolet and visible light (UV/Vis) range for noble gases have been investigated. The photoionized plasmas were created using laser-produced plasma (LPP) extreme ultraviolet (EUV) source. The source was based on a gas puff target; irradiated with 10ns/10J/10Hz Nd:YAG laser. The EUV radiation pulses were collected and focused using grazing incidence multifoil EUV collector. The laser pulses were focused on a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Irradiation of gases resulted in a formation of low temperature photoionized plasmas emitting radiation in the UV/Vis spectral range. Atomic photoionized plasmas produced this way consisted of atomic and ionic with various ionization states. The most dominated observed spectral lines originated from radiative transitions in singly charged ions. To assist in a theoretical interpretation of the measured spectra, an atomic code based on Cowan's programs and a collisional-radiative PrismSPECT code have been used to calculate the theoretical spectra. A comparison of the calculated spectral lines with experimentally obtained results is presented. Electron temperature in plasma is estimated using the Boltzmann plot method, by an assumption that a local thermodynamic equilibrium (LTE) condition in the plasma is validated in the first few ionization states. A brief discussion for the measured and computed spectra is given.

The Production of Titan's Ultraviolet Nitrogen Airglow

NASA Astrophysics Data System (ADS)

Stevens, Michael H.; Gustin, J.; Ajello, J. M.; Evans, J. S.; Meier, R. R.; Stewart, A. I. F.; Esposito, L. W.; McClintock, W. E.; Stephan, A. W.

2010-10-01

The Cassini Ultraviolet Imaging Spectrograph (UVIS) observed Titan's dayside limb on 22 June, 2009, obtaining high quality extreme ultraviolet (EUV) and far ultraviolet (FUV) spectra from a distance of only 60,000 km (23 Titan radii). The observations reveal the same EUV and FUV emissions arising from photoelectron excitation and photofragmentation of molecular nitrogen (N2) on Earth but with the altitude of peak emission much higher on Titan near 1000 km altitude. In the EUV, emission bands from the photoelectron excited N2 Carroll-Yoshino c4'-X system and N I and N II multiplets arising from photofragmentation of N2 dominate, with no detectable c4'(0,0) emission near 958 Å, contrary to many interpretations of the lower resolution Voyager 1 Ultraviolet Spectrometer data. The FUV is dominated by emission bands from the N2 Lyman-Birge-Hopfield a-X system and additional N I multiplets. We also identify several N2 Vegard-Kaplan A-X bands between 1500-1900 Å, two of which are located near 1561 and 1657 Å where C I multiplets were previously identified from a separate UVIS disk observation. We compare these limb emissions to predictions from a terrestrial airglow model adapted to Titan that uses a solar spectrum appropriate for these June, 2009 observations. Volume production rates and limb radiances are calculated, including extinction by methane and allowance for multiple scattering within the readily excited c4'(0,v') system, and compared to UVIS observations. We find that for these airglow data only emissions arising from processes involving N2 are present.

Research in extreme ultraviolet and far ultraviolet astronomy

NASA Technical Reports Server (NTRS)

Bowyer, C. S.

1985-01-01

The Far Ultraviolet imager (FUVI) was flown on the Aries class sounding rocket 24.015, producing outstanding results. The diffuse extreme ultraviolet (EUV) background spectrometer which is under construction is described. It will be launched on the Black Brant sounding rocket flight number 27.086. Ongoing design studies of a high resolution spectrometer are discussed. This instrument incorporates a one meter normal incidence mirror and will be suitable for an advanced Spartan mission.

Earth-orbiting extreme ultraviolet spectroscopic mission: SPRINT-A/EXCEED

NASA Astrophysics Data System (ADS)

Yoshikawa, I.; Tsuchiya, F.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.; Ishii, H.; Uji, K.

2012-09-01

The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series being developed by ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). Advantage of remote sensing observation is to take a direct picture of the plasma dynamics and distinguish between spatial and temporal variability explicitly. One of the primary observation targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. Previous observations have shown a few percents of the hot electron population in the inner magnetosphere whose temperature is 100 times higher than the background thermal electrons. Though the hot electrons have a significant impact on the energy balance in the inner magnetosphere, their generation process has not yet been elucidated. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter's inner magnetosphere. The EXCEED spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another primary objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. Although there have been some in-situ observations by orbiters, our knowledge is still limited. The EXCEED mission plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The instrument's field of view (FOV) is so wide that we can get an image from the interaction region between the solar wind and planetary plasmas down to the tail region at one time. This will provide us with information about outward-flowing plasmas, e.g., their composition, rate, and dependence on solar activity. EXCEED has two mission instruments: the EUV spectrograph and a target guide camera that is sensitive to visible light. The EUV spectrograph is designed to have a wavelength range of 55-145 nm with a spectral resolution of 0.4-1.0 nm. The spectrograph slits have a FOV of 400 x 140 arcseconds (maximum). The optics of the instrument consists of a primary mirror with a diameter of 20cm, a laminar type grating, and a 5-stage micro-channel plate assembly with a resistive anode encoder. To achieve high efficiencies, the surfaces of the primary mirror and the grating are coated with CVD-SiC. Because of the large primary mirror and high efficiencies, good temporal resolution and complete spatial coverage for Io plasma torus observation is expected. Based on a feasibility study using the spectral diagnosis method, it is shown that EXCEED can determine the Io plasma torus parameters, such as the electron density, temperatures, hot electron fraction and so on, using an exposure time of 50 minutes. The target guide camera will be used to capture the target and guide the observation area of interest to the slit. Emissions from outside the slit's FOV will be reflected by the front of the slit and guided to the target guide camera. The guide camera's FOV is 240" x 240". The camera will take an image every 3 seconds and the image is sent to a mission data processor (MDP), which calculates the centroid of the image. During an observation, the bus system controls the attitude to keep the centroid position of the target in the guide camera with an accuracy of ±5 arc-seconds. With the help of the target guide camera, we will take spectral images with a long exposure time of 50 minutes and good spatial resolution of 20 arc-seconds.

EUV spectroscopy in astrophysics: The role of compact objects

NASA Astrophysics Data System (ADS)

Wood, K. S.; Kowalski, M. P.; Cruddace, R. G.; Barstow, M. A.

2006-01-01

The bulk of radiation from million-degree plasmas is emitted at EUV wavelengths. Such plasmas are ubiquitous in astrophysics, and examples include the atmospheres of white dwarfs, accretion phenomena in cataclysmic variables (CVs) and some active galactic nuclei (AGN), the coronae of active stars, and the interstellar medium (ISM) of our own galaxy as well as of others. Internally, white dwarfs are formally analogous to neutron stars, being stellar configurations where the thermal contribution to support is secondary. Both stellar types have various intrinsic and environmental parameters. Comparison of such analogous systems using scaled parameters can be fruitful. Source class characterization is mature enough that such analogies can be used to compare theoretical ideas across a wide dynamic range in parameters, one example being theories of quasiperiodic oscillations. However, the white dwarf side of this program is limited by the available photometry and spectroscopy at EUV wavelengths, where there exist critical spectral features that contain diagnostic information often not available at other wavelengths. Moreover, interstellar absorption makes EUV observations challenging. Results from an observation of the hot white dwarf G191-B2B are presented to demonstrate the promise of high-resolution EUV spectroscopy. Two types of CVs, exemplified by AM Her and EX Hya, are used to illustrate blending of spectroscopy and timing measurements. Dynamical timescales and envisioned performance parameters of next-generation EUV satellites (effective area >20 cm 2, spectral resolution >10,000) make possible a new level of source modeling. The importance of the EUV cannot be overlooked given that observations are continually being pushed to cosmological distances, where the spectral energy distributions of X-ray bright AGNs, for example, will have their maxima redshifted into the EUV. Sometimes wrongly dismissed for limitations of small bandwidth or local view from optical depth limitations, the EUV is instead a gold mine of information bearing upon key issues in compact objects, but it is information that must be won through the triple combination of high-spectral resolution, large area, and application of advanced theory.

Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

NASA Astrophysics Data System (ADS)

Svalgaard, Leif

2016-11-01

Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

The EUVE Proposal Database

NASA Astrophysics Data System (ADS)

Christian, C. A.; Olson, E. C.

1993-01-01

The proposal database and scheduling system for the Extreme Ultraviolet Explorer is described. The proposal database has been implemented to take input for approved observations selected by the EUVE Peer Review Panel and output target information suitable for the scheduling system to digest. The scheduling system is a hybrid of the SPIKE program and EUVE software which checks spacecraft constraints, produces a proposed schedule and selects spacecraft orientations with optimal configurations for acquiring star trackers, etc. This system is used to schedule the In Orbit Calibration activities that took place this summer, following the EUVE launch in early June 1992. The strategy we have implemented has implications for the selection of approved targets, which have impacted the Peer Review process. In addition, we will discuss how the proposal database, founded on Sybase, controls the processing of EUVE Guest Observer data.

Spectroscopy and Photometry of EUVE J1429-38.0:An Eclipsing Magnetic Cataclysmic Variable

NASA Astrophysics Data System (ADS)

Howell, Steve B.; Craig, Nahide; Roberts, Bryce; McGee, Paddy; Sirk, Martin

1997-06-01

EUVE J1429-38.0 was originally discovered as a variable source by the Extreme Ultraviolet Explorer (EUVE) satellite. We present new optical observations which unambiguously confirm this star to be an eclipsing magnetic system with an orbital period of 4() h 46() m. The photometric data are strongly modulated by ellipsoidal variations during low states which allow a system inclination of near 80 degrees to be determined. Our time-resolved optical spectra, which cover only about one-third of the orbital cycle, indicate the clear presence of a gas stream. During high states, EUVE J1429-38.0 shows ~ 1 mag deep eclipses and the apparent formation of a partial accretion disk. EUVE J1429-38.0 presents the observer with properties of both the AM Herculis and the DQ Herculis types of magnetic cataclysmic variable.

Ultrahigh resolution photographic films for X-ray/EUV/FUV astronomy

NASA Technical Reports Server (NTRS)

Hoover, Richard B.; Walker, Arthur B. C., Jr.; Deforest, Craig E.; Watts, Richard; Tarrio, Charles

1993-01-01

The quest for ultrahigh resolution full-disk images of the sun at soft X-ray/EUV/FUV wavelengths has increased the demand for photographic films with broad spectral sensitivity, high spatial resolution, and wide dynamic range. These requirements were made more stringent by the recent development of multilayer telescopes and coronagraphs capable of operating at normal incidence at soft X-ray/EUV wavelengths. Photographic films are the only detectors now available with the information storage capacity and dynamic range such as is required for recording images of the solar disk and corona simultaneously with sub arc second spatial resolution. During the Stanford/MSFC/LLNL Rocket X-Ray Spectroheliograph and Multi-Spectral Solar Telescope Array (MSSTA) programs, we utilized photographic films to obtain high resolution full-disk images of the sun at selected soft X-ray/EUV/FUV wavelengths. In order to calibrate our instrumentation for quantitative analysis of our solar data and to select the best emulsions and processing conditions for the MSSTA reflight, we recently tested several photographic films. These studies were carried out at the NIST SURF II synchrotron and the Stanford Synchrotron Radiation Laboratory. In this paper, we provide the results of those investigations.

The Solar Chromosphere/Corona Interface. I. Far-Ultraviolet to Extreme-Ultraviolet Observations and Modeling of Unresolved Coronal Funnels

NASA Technical Reports Server (NTRS)

Martinez-Galarce, Dennis S.; Walker, Arthur C., III; Barbee, Troy W., II; Hoover, Richard B.

2003-01-01

A coronal funnel model, developed by D. Rabin, was tested against a calibrated spectroheliogram recorded in the 170-1 75 A bandpass. This image was recorded on board a sounding-rocket experiment flown on 1994 November 3, called the Multi-Spectral Solar Telescope Array II (MSSTA II). MSSTA, a joint project of Stanford University, the NASA Marshall Space Flight Center, and the Lawrence Livermore National Laboratory' is an observing platform composed of a set of normal-incidence, multilayer-coated optics designed to obtain narrow-bandpass, high-resolution images (1 sec.- 3 sec.) at selected far-ultraviolet (FUV), extreme-ultraviolet (EUV), and soft X-ray wavelengths (44-1550 A). Using full disk images centered at 1550 A (C IV) and 173 A (Fe IX/X), the funnel model, which is based on coronal back-heating, was tested against the data incorporating observed constraints on global coverage and measured flux. Found was a class of funnel models that could account for the quiescent, globally diffuse and unresolved emission seen in the 171-175 A bandpass, where the funnels are assumed to be rooted in the C IV supergranular network. These models, when incorporated with the CHIANTI spectral code, suggest that this emission is mostly of upper transition region origin and primarily composed of Fe IX plasma. The funnels are found to have constrictions, Gamma approx. 6-20, which is in good agreement with the observations. Further, the fitted models simultaneously satisfy global areal constraints seen in both images; namely,that a global network of funnels must cover approx. 700 - 95% of the total solar surface area seen in the 171-175 A image, and a 5% of the disk area seen in the 1550 A bandpass. These findings support the configuration of the EUV magnetic network as suggested by Reeves et al. and put forth in more detail by Gabriel. Furthermore, the models are in good agreement with differential emission measure estimates made of the transition region by J. C. Raymond & J. G. Doyle for temperatures 250,000 K less than or = T less than or = 650,000 K, based on full-disk observations made on board Skylab.

Optical to extreme ultraviolet reddening curves for normal AGN dust and for dust associated with high-velocity outflows

NASA Astrophysics Data System (ADS)

Singh, Japneet; Gaskell, Martin; Gill, Jake

2017-01-01

We use mid-IR (WIRE), optical (SDSS), and ultraviolet (GALEX) photometry of over 80,000 AGNs to derive mean attenuation curves from the optical to the rest frame extreme ultraviolet (EUV) for (i) “normal” AGN dust dominating the optical reddening of AGNs and (ii) “BAL dust” - the dust causing the additional extinction in AGNs observed to have broad absorption lines (BALs). Our method confirms that the attenuation curve of “normal” AGN dust is flat in the ultraviolet, as found by Gaskell et al. (2004). In striking contrast to this, the attenuation curve for BAL dust is well fit by a steeply-rising, SMC-like curve. We confirm the shape of the theoretical Weingartner & Draine (2001) SMC curve out to 700 Angstroms but the drop in attenuation to still shorter wavelengths (400 Angstroms) seems to be less than predicted. We find identical attenuation curves for high-ionization and low-ionization BALQSOs. We suggest that attenuation curves appearing to be steeper than the SMC are due to differences in underlying spectra and partial covering by BAL dust. This work was This work was performed under the auspices of the Science Internship Program (SIP) of the University of California at Santa Cruz performed under the auspices of the Science Internship Program (SIP) of the University of California at Santa Cruz.

Laboratory Data for X-Ray Astronomy

NASA Technical Reports Server (NTRS)

Beiersdorfer, P.; Brown, G. V.; Chen, H.; Gu, M.-F.; Kahn, S. M.; Lepson, J. K.; Savin, D. W.; Utter, S. B.

2000-01-01

Laboratory facilities have made great strides in producing large sets of reliable data for X-ray astronomy, which include ionization and recombination cross sections needed for charge balance calculations as well as the atomic data needed for interpreting X-ray line formation. We discuss data from the new generation sources and pay special attention to the LLNL electron beam ion trap experiment, which is unique in its ability to provide direct laboratory access to spectral data under precisely controlled conditions that simulate those found in many astrophysical plasmas. Examples of spectral data obtained in the 1-160 A wavelength range are given illustrating the type of laboratory X-ray data produced in support of such missions as Chandra, X-Ray Multi-Mirror telescope (XMM), Advanced Satellite for Cosmology and Astrophysics (ASCA) and Extreme Ultraviolet Explorer Satellite (EUVE).

The Harvard experiment on OSO-6 - Instrumentation, calibration, operation, and description of observations.

NASA Technical Reports Server (NTRS)

Huber, M. C. E.; Dupree, A. K.; Goldberg, L.; Parkinson, W. H.; Reeves, E. M.; Withbroe, G. L.; Noyes, R. W.

1973-01-01

The Harvard experiment carried by OSO-6 was an extreme-ultraviolet (EUV) spectrometer-spectroheliometer with a wavelength range of 285 to 1385 A, a spatial and spectral bandwidth of 35 x 35(arc sec) squared and 3 A, respectively. The instrument acquired data that have been deposited with the National Space Science Data Center and World Data Center A at the Goddard Space Flight Center in Greenbelt, Maryland, and are now available in their entirety to the scientific community. Aspects of the experiment that are relevant to potential users of the data are described - namely, instrument configuration and parameters, laboratory and inflight calibrations, as well as operational capabilities and procedures. The observations obtained are reported, and the nature, number, and dates of observation, where relevant, are listed.

The Extreme Ultraviolet Explorer mission

NASA Technical Reports Server (NTRS)

Malina, R. F.; Battel, S. J.

1989-01-01

The Extreme Ultraviolet Explorer (EUVE) mission will be the first user of NASA's new Explorer platform. The instrumentation included on this mission consists of three grazing incidence scanning telescopes, a deep survey instrument and an EUV spectrometer. The bandpass covered is 80 to 900 A. During the first six months of the mission, the scanning telescopes will be used to make all-sky maps in four bandpasses; astronomical sources wil be detected and their positions determined to an accuracy of 0.1 deg. The deep survey instrument will survey the sky with higher sensitivity along the ecliptic in two bandpasses between 80 and 500 A. Engineering and design aspects of the science payload and features of the instrument design are described.

Analytical techniques for mechanistic characterization of EUV photoresists

NASA Astrophysics Data System (ADS)

Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

2017-03-01

Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

Coater/developer based techniques to improve high-resolution EUV patterning defectivity

NASA Astrophysics Data System (ADS)

Hontake, Koichi; Huli, Lior; Lemley, Corey; Hetzer, Dave; Liu, Eric; Ko, Akiteru; Kawakami, Shinichiro; Shimoaoki, Takeshi; Hashimoto, Yusaku; Tanaka, Koichiro; Petrillo, Karen; Meli, Luciana; De Silva, Anuja; Xu, Yongan; Felix, Nelson; Johnson, Richard; Murray, Cody; Hubbard, Alex

2017-10-01

Extreme ultraviolet lithography (EUVL) technology is one of the leading candidates under consideration for enabling the next generation of devices, for 7nm node and beyond. As the focus shifts to driving down the 'effective' k1 factor and enabling the full scaling entitlement of EUV patterning, new techniques and methods must be developed to reduce the overall defectivity, mitigate pattern collapse, and eliminate film-related defects. In addition, CD uniformity and LWR/LER must be improved in terms of patterning performance. Tokyo Electron Limited (TEL™) and IBM Corporation are continuously developing manufacturing quality processes for EUV. In this paper, we review the ongoing progress in coater/developer based processes (coating, developing, baking) that are required to enable EUV patterning.

Nanoparticle photoresist studies for EUV lithography

NASA Astrophysics Data System (ADS)

Kasahara, Kazuki; Xu, Hong; Kosma, Vasiliki; Odent, Jeremy; Giannelis, Emmanuel P.; Ober, Christopher K.

2017-03-01

EUV (extreme ultraviolet) lithography is one of the most promising candidates for next generation lithography. The main challenge for EUV resists is to simultaneously satisfy resolution, LWR (line-width roughness) and sensitivity requirements according to the ITRS roadmap. Though polymer type CAR (chemically amplified resist) is the currently standard photoresist, entirely new resist platforms are required due to the performance targets of smaller process nodes. In this paper, recent progress in nanoparticle photoresists which Cornell University has intensely studied is discussed. Lithography performance, especially scum elimination, improvement studies with the dissolution rate acceleration concept and new metal core applications are described.

Mars Thermospheric Temperature Sensitivity to Solar EUV Forcing from the MAVEN EUV Monitor

NASA Astrophysics Data System (ADS)

Thiemann, Ed; Eparvier, Francis; Andersson, Laila; Pilinski, Marcin; Chamberlin, Phillip; Fowler, Christopher; MAVEN Extreme Ultraviolet Monitor Team, MAVEN Langmuir Probe and Waves Team

2017-10-01

Solar extreme ultraviolet (EUV) radiation is the primary heat source for the Mars thermosphere, and the primary source of long-term temperature variability. The Mars obliquity, dust cycle, tides and waves also drive thermospheric temperature variability; and it is important to quantify the role of each in order to understand processes in the upper atmosphere today and, ultimately, the evolution of Mars climate over time. Although EUV radiation is the dominant heating mechanism, accurately measuring the thermospheric temperature sensitivity to EUV forcing has remained elusive, in part, because Mars thermospheric temperature varies dramatically with latitude and local time (LT), ranging from 150K on the nightside to 300K on the dayside. It follows that studies of thermospheric variability must control for location.Instruments onboard the Mars Atmosphere and Volatile EvolutioN (MAVEN) orbiter have begun to characterize thermospheric temperature sensitivity to EUV forcing. Bougher et al. [2017] used measurements from the Imaging Ultraviolet Spectrograph (IUVS) and the Neutral Gas and Ion Mass Spectrometer (NGIMS) to characterize solar activity trends in the thermosphere with some success. However, aside from restricting measurements to solar zenith angles (SZAs) below 75 degrees, they were unable to control for latitude and LT because repeat-track observations from either instrument were limited or unavailable.The MAVEN EUV Monitor (EUVM) has recently demonstrated the capability to measure thermospheric density from 100 to 200 km with solar occultations of its 17-22 nm channel. These new density measurements are ideal for tracking the long-term thermospheric temperature variability because they are inherently constrained to either 06:00 or 18:00 LT, and the orbit has precessed to include a range of ecliptic latitudes, a number of which have been revisited multiple times over 2.5 years. In this study we present, for the first-time, measurements of thermospheric temperature sensitivity to EUV forcing derived from the EUVM measurements. These results include sensitives measured at the poles and near the equator for both terminators; therefore, we will also discuss the role of latitude on EUV temperature sensitivity.

Detection of Quasi-Periodic Pulsations in Solar EUV Time Series

NASA Astrophysics Data System (ADS)

Dominique, M.; Zhukov, A. N.; Dolla, L.; Inglis, A.; Lapenta, G.

2018-04-01

Quasi-periodic pulsations (QPPs) are intrinsically connected to the mechanism of solar flares. They are regularly observed in the impulsive phase of flares since the 1970s. In the past years, the studies of QPPs regained interest with the advent of a new generation of soft X-ray/extreme ultraviolet radiometers that pave the way for statistical surveys. Since the amplitude of QPPs in these wavelengths is rather small, detecting them implies that the overall trend of the time series needs to be removed before applying any Fourier or wavelet transform. This detrending process is known to produce artificial detection of periods that must then be distinguished from real ones. In this paper, we propose a set of criteria to help identify real periods and discard artifacts. We apply these criteria to data taken by the Extreme Ultraviolet Variability Experiment (EVE)/ESP onboard the Solar Dynamics Observatory (SDO) and the Large Yield Radiometer (LYRA) onboard the PRoject for On-Board Autonomy 2 (PROBA2) to search for QPPs in flares stronger than M5.0 that occurred during Solar Cycle 24.

Measurements of density dependent intensity ratios of extreme ultraviolet line emission from Fe X, XI, and XII

NASA Astrophysics Data System (ADS)

Shimizu, Erina; Ali, Safdar; Tsuda, Takashi; Sakaue, Hiroyuki A.; Kato, Daiji; Murakami, Izumi; Hara, Hirohisa; Watanabe, Tetsuya; Nakamura, Nobuyuki

2017-05-01

We report high-resolution density dependent intensity ratio measurements for middle charge states of iron in the extreme ultraviolet (EUV) spectral wavelength range of 160-200 Å. The measurements were performed at the Tokyo EBIT laboratory by employing a flat-field grazing incidence spectrometer installed on a low energy compact electron beam ion trap. The intensity ratios for several line pairs stemming from Fe X, Fe XI and Fe XII were extracted from spectra collected at the electron beam energies of 340 and 400 eV by varying the beam current between 7.5 and 12 mA at each energy. In addition, the effective electron densities were obtained experimentally by imaging the electron beam profile and ion cloud size with a pinhole camera and visible spectrometer, respectively. In this paper, the experimental results are compared with previous data from the literature and with the present calculations performed using a collisional-radiative model. Our experimental results show a rather good agreement with the calculations and previous reported results.

In orbit degradation of EUV optical components in the wavelength range 10-40 nm AO 138-3

NASA Technical Reports Server (NTRS)

Delaboudiniere, J. P.; Carabetian, C.; Hochedez, J. F.

1993-01-01

A complement of EUV optical components, including mirrors and thin film filters, was flown as part of the Long Duration Exposure Facility (LDEF) AO 138-3. The most original amongst these components were multilayered interference reflectors for the 10-40 nm wavelength range. Very moderate degradation was observed for those components which were exposed to the sun. The degradation is compatible with the deposition of a few nanometers of absorbing material on the surface of the samples.

AWARE - The Automated EUV Wave Analysis and REduction algorithm

NASA Astrophysics Data System (ADS)

Ireland, J.; Inglis; A. R.; Shih, A. Y.; Christe, S.; Mumford, S.; Hayes, L. A.; Thompson, B. J.

2016-10-01

Extreme ultraviolet (EUV) waves are large-scale propagating disturbances observed in the solar corona, frequently associated with coronal mass ejections and flares. Since their discovery over two hundred papers discussing their properties, causes and physics have been published. However, their fundamental nature and the physics of their interactions with other solar phenomena are still not understood. To further the understanding of EUV waves, and their relation to other solar phenomena, we have constructed the Automated Wave Analysis and REduction (AWARE) algorithm for the detection of EUV waves over the full Sun. The AWARE algorithm is based on a novel image processing approach to isolating the bright wavefront of the EUV as it propagates across the corona. AWARE detects the presence of a wavefront, and measures the distance, velocity and acceleration of that wavefront across the Sun. Results from AWARE are compared to results from other algorithms for some well known EUV wave events. Suggestions are also give for further refinements to the basic algorithm presented here.

``Big Bang" for NASA's Buck: Nearly Three Years of EUVE Mission Operations at UCB

NASA Astrophysics Data System (ADS)

Stroozas, B. A.; Nevitt, R.; McDonald, K. E.; Cullison, J.; Malina, R. F.

1999-12-01

After over seven years in orbit, NASA's Extreme Ultraviolet Explorer (EUVE) satellite continues to perform flawlessly and with no significant loss of science capabilities. EUVE continues to produce important and exciting science results and, with reentry not expected until 2003-2004, many more such discoveries await. In the nearly three years since the outsourcing of EUVE from NASA's Goddard Space Flight Center, the small EUVE operations team at the University of California at Berkeley (UCB) has successfully conducted all aspects of the EUVE mission -- from satellite operations, science and mission planning, and data processing, delivery, and archival, to software support, systems administration, science management, and overall mission direction. This paper discusses UCB's continued focus on automation and streamlining, in all aspects of the Project, as the means to maximize EUVE's overall scientific productivity while minimizing costs. Multitasking, non-traditional work roles, and risk management have led to expanded observing capabilities while achieving significant cost reductions and maintaining the mission's historical 99 return. This work was funded under NASA Cooperative Agreement NCC5-138.

Grazing incidence extreme ultraviolet spectrometer fielded with time resolution in a hostile z-pinch environment.

PubMed

Williamson, K M; Kantsyrev, V L; Safronova, A S; Wilcox, P G; Cline, W; Batie, S; LeGalloudec, B; Nalajala, V; Astanovitsky, A

2011-09-01

This recently developed diagnostic was designed to allow for time-gated spectroscopic study of the EUV radiation (4 nm < λ < 15 nm) present during harsh wire array z-pinch implosions. The spectrometer utilizes a 25 μm slit, an array of 3 spherical blazed gratings at grazing incidence, and a microchannel plate (MCP) detector placed in an off-Rowland position. Each grating is positioned such that its diffracted radiation is cast over two of the six total independently timed frames of the MCP. The off-Rowland configuration allows for a much greater spectral density on the imaging plate but only focuses at one wavelength per grating. The focal wavelengths are chosen for their diagnostic significance. Testing was conducted at the Zebra pulsed-power generator (1 MA, 100 ns risetime) at the University of Nevada, Reno on a series of wire array z-pinch loads. Within this harsh z-pinch environment, radiation yields routinely exceed 20 kJ in the EUV and soft x-ray. There are also strong mechanical shocks, high velocity debris, sudden vacuum changes during operation, energic ion beams, and hard x-ray radiation in excess of 50 keV. The spectra obtained from the precursor plasma of an Al double planar wire array contained lines of Al IX and AlX ions indicating a temperature near 60 eV during precursor formation. Detailed results will be presented showing the fielding specifications and the techniques used to extract important plasma parameters using this spectrometer. © 2011 American Institute of Physics

EUV spectroscopy of highly charged high Z ions in the Large Helical Device plasmas

NASA Astrophysics Data System (ADS)

Suzuki, C.; Koike, F.; Murakami, I.; Tamura, N.; Sudo, S.; Sakaue, H. A.; Nakamura, N.; Morita, S.; Goto, M.; Kato, D.; Nakano, T.; Higashiguchi, T.; Harte, C. S.; OʼSullivan, G.

2014-11-01

We present recent results on the extreme ultraviolet (EUV) spectroscopy of highly charged high Z ions in plasmas produced in the Large Helical Device (LHD) at the National Institute for Fusion Science. Tungsten, bismuth and lanthanide elements have recently been studied in the LHD in terms of their importance in fusion research and EUV light source development. In relatively low temperature plasmas, quasicontinuum emissions from open 4d or 4f subshell ions are predominant in the EUV region, while the spectra tend to be dominated by discrete lines from open 4s or 4p subshell ions in higher temperature plasmas. Comparative analyses using theoretical calculations and charge-separated spectra observed in an electron beam ion trap have been performed to achieve better agreement with the spectra measured in the LHD. As a result, databases on Z dependence of EUV spectra in plasmas have been widely extended.

EUV mask pilot line at Intel Corporation

NASA Astrophysics Data System (ADS)

Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

2004-12-01

The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

A chain of winking (oscillating) filaments triggered by an invisible extreme-ultraviolet wave

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shen, Yuandeng; Tian, Zhanjun; Zhao, Ruijuan

2014-05-10

Winking (oscillating) filaments have been observed for many years. However, observations of successive winking filaments in one event have not yet been reported. In this paper, we present the observations of a chain of winking filaments and a subsequent jet that are observed right after the X2.1 flare in AR11283. The event also produced an extreme-ultraviolet (EUV) wave that has two components: an upward dome-like wave (850 km s{sup –1}) and a lateral surface wave (554 km s{sup –1}) that was very weak (or invisible) in imaging observations. By analyzing the temporal and spatial relationships between the oscillating filaments andmore » the EUV waves, we propose that all the winking filaments and the jet were triggered by the weak (or invisible) lateral surface EUV wave. The oscillation of the filaments last for two or three cycles, and their periods, Doppler velocity amplitudes, and damping times are 11-22 minutes, 6-14 km s{sup –1}, and 25-60 minutes, respectively. We further estimate the radial component magnetic field and the maximum kinetic energy of the filaments, and they are 5-10 G and ∼10{sup 19} J, respectively. The estimated maximum kinetic energy is comparable to the minimum energy of ordinary EUV waves, suggesting that EUV waves can efficiently launch filament oscillations on their path. Based on our analysis results, we conclude that the EUV wave is a good agent for triggering and connecting successive but separated solar activities in the solar atmosphere, and it is also important for producing solar sympathetic eruptions.« less

SLOW PATCHY EXTREME-ULTRAVIOLET PROPAGATING FRONTS ASSOCIATED WITH FAST CORONAL MAGNETO-ACOUSTIC WAVES IN SOLAR ERUPTIONS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Guo, Y.; Ding, M. D.; Chen, P. F., E-mail: guoyang@nju.edu.cn

2015-08-15

Using the high spatiotemporal resolution extreme ultraviolet (EUV) observations of the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory, we conduct a statistical study of the observational properties of the coronal EUV propagating fronts. We find that it might be a universal phenomenon for two types of fronts to coexist in a large solar eruptive event. It is consistent with the hybrid model of EUV propagating fronts, which predicts that coronal EUV propagating fronts consist of both a fast magneto-acoustic wave and a nonwave component. We find that the morphologies, propagation behaviors, and kinematic features of the two EUVmore » propagating fronts are completely different from each other. The fast magneto-acoustic wave fronts are almost isotropic. They travel continuously from the flaring region across multiple magnetic polarities to global distances. On the other hand, the slow nonwave fronts appear as anisotropic and sequential patches of EUV brightening. Each patch propagates locally in the magnetic domains where the magnetic field lines connect to the bottom boundary and stops at the magnetic domain boundaries. Within each magnetic domain, the velocities of the slow patchy nonwave component are an order of magnitude lower than that of the fast-wave component. However, the patches of the slow EUV propagating front can jump from one magnetic domain to a remote one. The velocities of such a transit between different magnetic domains are about one-third to one-half of those of the fast-wave component. The results show that the velocities of the nonwave component, both within one magnetic domain and between different magnetic domains, are highly nonuniform due to the inhomogeneity of the magnetic field in the lower atmosphere.« less

Experience from the in-flight calibration of the Extreme Ultraviolet Explorer (EUVE) and Upper Atmosphere Research Satellite (UARS) fixed head star trackers (FHSTs)

NASA Technical Reports Server (NTRS)

Lee, Michael

1995-01-01

Since the original post-launch calibration of the FHSTs (Fixed Head Star Trackers) on EUVE (Extreme Ultraviolet Explorer) and UARS (Upper Atmosphere Research Satellite), the Flight Dynamics task has continued to analyze the FHST performance. The algorithm used for inflight alignment of spacecraft sensors is described and the equations for the errors in the relative alignment for the simple 2 star tracker case are shown. Simulated data and real data are used to compute the covariance of the relative alignment errors. Several methods for correcting the alignment are compared and results analyzed. The specific problems seen on orbit with UARS and EUVE are then discussed. UARS has experienced anomalous tracker performance on an FHST resulting in continuous variation in apparent tracker alignment. On EUVE, the FHST residuals from the attitude determination algorithm showed a dependence on the direction of roll during survey mode. This dependence is traced back to time tagging errors and the original post launch alignment is found to be in error due to the impact of the time tagging errors on the alignment algorithm. The methods used by the FDF (Flight Dynamics Facility) to correct for these problems is described.

LPP-EUV light source for HVM lithography

NASA Astrophysics Data System (ADS)

Saito, T.; Ueno, Y.; Yabu, T.; Kurosawa, A.; Nagai, S.; Yanagida, T.; Hori, T.; Kawasuji, Y.; Abe, T.; Kodama, T.; Nakarai, H.; Yamazaki, T.; Mizoguchi, H.

2017-01-01

We have been developing a laser produced plasma extremely ultra violet (LPP-EUV) light source for a high volume manufacturing (HVM) semiconductor lithography. It has several unique technologies such as the high power short pulse carbon dioxide (CO2) laser, the short wavelength solid-state pre-pulse laser and the debris mitigation technology with the magnetic field. This paper presents the key technologies for a high power LPP-EUV light source. We also show the latest performance data which is 188W EUV power at intermediate focus (IF) point with 3.7% conversion efficiency (CE) at 100 kHz.

Plasma-assisted oxide removal from ruthenium-coated EUV optics

NASA Astrophysics Data System (ADS)

Dolgov, A.; Lee, C. J.; Bijkerk, F.; Abrikosov, A.; Krivtsun, V. M.; Lopaev, D.; Yakushev, O.; van Kampen, M.

2018-04-01

An experimental study of oxide reduction at the surface of ruthenium layers on top of multilayer mirrors and thin Ru/Si films is presented. Oxidation and reduction processes were observed under conditions close to those relevant for extreme ultraviolet lithography. The oxidized ruthenium surface was exposed to a low-temperature hydrogen plasma, similar to the plasma induced by extreme ultraviolet radiation. The experiments show that hydrogen ions are the main reducing agent. Furthermore, the addition of hydrogen radicals increases the reduction rate beyond that expected from simple flux calculations. We show that low-temperature hydrogen plasmas can be effective for reducing oxidized top surfaces. Our proof-of-concept experiments show that an in situ, EUV-generated plasma cleaning technology is feasible.

Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target

NASA Astrophysics Data System (ADS)

Ueno, Yoshifumi; Ariga, Tatsuya; Soumagne, George; Higashiguchi, Takeshi; Kubodera, Shoichi; Pogorelsky, Igor; Pavlishin, Igor; Stolyarov, Daniil; Babzien, Marcus; Kusche, Karl; Yakimenko, Vitaly

2007-05-01

We demonstrated efficacy of a CO2-laser-produced xenon plasma in the extreme ultraviolet (EUV) spectral region at 13.5nm at variable laser pulse widths between 200ps and 25ns. The plasma target was a 30μm liquid xenon microjet. To ensure the optimum coupling of CO2 laser energy with the plasma, they applied a prepulse yttrium aluminum garnet laser. The authors measured the conversion efficiency (CE) of the 13.5nm EUV emission for different pulse widths of the CO2 laser. A maximum CE of 0.6% was obtained for a CO2 laser pulse width of 25ns at an intensity of 5×1010W/cm2.

A stand-alone compact EUV microscope based on gas-puff target source.

PubMed

Torrisi, Alfio; Wachulak, Przemyslaw; Węgrzyński, Łukasz; Fok, Tomasz; Bartnik, Andrzej; Parkman, Tomáš; Vondrová, Šárka; Turňová, Jana; Jankiewicz, Bartłomiej J; Bartosewicz, Bartosz; Fiedorowicz, Henryk

2017-02-01

We report on a very compact desk-top transmission extreme ultraviolet (EUV) microscope based on a laser-plasma source with a double stream gas-puff target, capable of acquiring magnified images of objects with a spatial (half-pitch) resolution of sub-50 nm. A multilayer ellipsoidal condenser is used to focus and spectrally narrow the radiation from the plasma, producing a quasi-monochromatic EUV radiation (λ = 13.8 nm) illuminating the object, whereas a Fresnel zone plate objective forms the image. Design details, development, characterization and optimization of the EUV source and the microscope are described and discussed. Test object and other samples were imaged to demonstrate superior resolution compared to visible light microscopy. © 2016 The Authors Journal of Microscopy © 2016 Royal Microscopical Society.

OBSERVATIONS OF ENHANCED EXTREME ULTRAVIOLET CONTINUA DURING AN X-CLASS SOLAR FLARE USING SDO/EVE

DOE Office of Scientific and Technical Information (OSTI.GOV)

Milligan, Ryan O.; Mathioudakis, Mihalis; Keenan, Francis P.

2012-03-20

Observations of extreme ultraviolet (EUV) emission from an X-class solar flare that occurred on 2011 February 15 at 01:44 UT are presented, obtained using the EUV Variability Experiment (EVE) on board the Solar Dynamics Observatory. The complete EVE spectral range covers the free-bound continua of H I (Lyman continuum), He I, and He II, with recombination edges at 91.2, 50.4, and 22.8 nm, respectively. By fitting the wavelength ranges blueward of each recombination edge with an exponential function, light curves of each of the integrated continua were generated over the course of the flare, as was emission from the free-freemore » continuum (6.5-37 nm). The He II 30.4 nm and Ly{alpha} 121.6 nm lines, and soft X-ray (SXR; 0.1-0.8 nm) emission from GOES are also included for comparison. Each free-bound continuum was found to have a rapid rise phase at the flare onset similar to that seen in the 25-50 keV light curves from RHESSI, suggesting that they were formed by recombination with free electrons in the chromosphere. However, the free-free emission exhibited a slower rise phase seen also in the SXR emission from GOES, implying a predominantly coronal origin. By integrating over the entire flare the total energy emitted via each process was determined. We find that the flare energy in the EVE spectral range amounts to at most a few percent of the total flare energy, but EVE gives us a first comprehensive look at these diagnostically important continuum components.« less

Segmentation of photospheric magnetic elements corresponding to coronal features to understand the EUV and UV irradiance variability

NASA Astrophysics Data System (ADS)

Zender, J. J.; Kariyappa, R.; Giono, G.; Bergmann, M.; Delouille, V.; Damé, L.; Hochedez, J.-F.; Kumara, S. T.

2017-09-01

Context. The magnetic field plays a dominant role in the solar irradiance variability. Determining the contribution of various magnetic features to this variability is important in the context of heliospheric studies and Sun-Earth connection. Aims: We studied the solar irradiance variability and its association with the underlying magnetic field for a period of five years (January 2011-January 2016). We used observations from the Large Yield Radiometer (LYRA), the Sun Watcher with Active Pixel System detector and Image Processing (SWAP) on board PROBA2, the Atmospheric Imaging Assembly (AIA), and the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory (SDO). Methods: The Spatial Possibilistic Clustering Algorithm (SPoCA) is applied to the extreme ultraviolet (EUV) observations obtained from the AIA to segregate coronal features by creating segmentation maps of active regions (ARs), coronal holes (CHs) and the quiet sun (QS). Further, these maps are applied to the full-disk SWAP intensity images and the full-disk (FD) HMI line-of-sight (LOS) magnetograms to isolate the SWAP coronal features and photospheric magnetic counterparts, respectively. We then computed full-disk and feature-wise averages of EUV intensity and line of sight (LOS) magnetic flux density over ARs/CHs/QS/FD. The variability in these quantities is compared with that of LYRA irradiance values. Results: Variations in the quantities resulting from the segmentation, namely the integrated intensity and the total magnetic flux density of ARs/CHs/QS/FD regions, are compared with the LYRA irradiance variations. We find that the EUV intensity over ARs/CHs/QS/FD is well correlated with the underlying magnetic field. In addition, variations in the full-disk integrated intensity and magnetic flux density values are correlated with the LYRA irradiance variations. Conclusions: Using the segmented coronal features observed in the EUV wavelengths as proxies to isolate the underlying magnetic structures is demonstrated in this study. Sophisticated feature identification and segmentation tools are important in providing more insights into the role of various magnetic features in both the short- and long-term changes in the solar irradiance. The movie associated to Fig. 2 is available at http://www.aanda.org

Multi-instrument observations of sub-minute quasi-periodic pulsations in solar flares

NASA Astrophysics Data System (ADS)

Dominique, Marie; Zhukov, Andrei; Dolla, Laurent

2017-08-01

Since a decade, quasi-periodic pulsations (QPPs) have been regularly reported to be observed in EUV and SXR during solar flares, while they were previously mostly observed in HXR and radio wavelengths. These new detections can be credited to a new generation of EUV space radiometers (SDO/EVE, PROBA2/LYRA, etc.) that significantly enhanced the instrument performances in terms of signal-to-noise ratio and time resolution. These new instruments allow us to perform statistical analysis of QPPs, which could ultimately help solving the long-debated question of their origin. However, recently, the methods (mainly the way to pre-process data and to account for the noise) used to detect QPPs in those wavelengths were questioned. In this presentation, we will discuss our current understanding of QPPs and the difficulties inherent to their detection. I will particularly address the sub-minute QPPs in the EUV and analyze them in the broader picture of multi-wavelength detection. How do they compare to the pulsations observed in other wavelength ranges? Are sub-minute QPPs and QPPs with longer periods produced by the same processes? What can we learn from the analysis of QPPs? Possible answers to these questions will be presented and discussed.

The discrete and localized nature of the variable emission from active regions

NASA Technical Reports Server (NTRS)

Arndt, Martina Belz; Habbal, Shadia Rifai; Karovska, Margarita

1994-01-01

Using data from the Extreme Ultraviolet (EUV) Spectroheliometer on Skylab, we study the empirical characteristics of the variable emission in active regions. These simultaneous multi-wavelength observations clearly confirm that active regions consist of a complex of loops at different temperatures. The variable emission from this complex has very well-defined properties that can be quantitatively summarized as follows: (1) It is localized predominantly around the footpoints where it occurs at discrete locations. (2) The strongest variability does not necessarily coincide with the most intense emission. (3) The fraction of the area of the footpoints, (delta n)/N, that exhibits variable emission, varies by +/- 15% as a function of time, at any of the wavelengths measured. It also varies very little from footpoint to footpoint. (4) This fractional variation is temperature dependent with a maximum around 10(exp 5) K. (5) The ratio of the intensity of the variable to the average background emission, (delta I)/(bar-I), also changes with temperature. In addition, we find that these distinctive characteristics persist even when flares occur within the active region.

SOLAR - ASTRONOMY

NASA Image and Video Library

1973-09-09

S73-33788 (10 June 1973) --- The solar eruption of June 10, 1973, is seen in this spectroheliogram obtained during the first manned Skylab mission (Skylab 2), with the SO82A experiment, an Apollo Telescope Mount (ATM) component covering the wavelength region from 150 to 650 angstroms (EUV). The solid disk in the center was produced from 304 angstrom ultraviolet light from He + ions. At the top of this image a great eruption is visible extending more than one-third of a solar radius from the sun's surface. This eruption preceded the formation of an enormous coronal bubble which extended a distance of several radii from the sun's surface, and which was observed with the coronagraph aboard Skylab. In contrast, the Fe XV image at 285 angstrom just to the right of the 304 angstrom image does not show this event. Instead, it shows the bright emission from a magnetic region in the lower corona. In this picture, solar north is to the right, and east is up. The wavelength scale increases to the left. The U.S. Naval Research Laboratory is principal investigator in charge of the SO82 experiment. Photo credit: NASA

Short-wavelength out-of-band EUV emission from Sn laser-produced plasma

NASA Astrophysics Data System (ADS)

Torretti, F.; Schupp, R.; Kurilovich, D.; Bayerle, A.; Scheers, J.; Ubachs, W.; Hoekstra, R.; Versolato, O. O.

2018-02-01

We present the results of spectroscopic measurements in the extreme ultraviolet regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3 J, 60 ns Nd:YAG laser pulse. The strong 13.5 nm emission from this laser-produced plasma (LPP) is of relevance for next-generation nanolithography machines. Here, we focus on the shorter wavelength features between 7 and 12 nm which have so far remained poorly investigated despite their diagnostic relevance. Using flexible atomic code calculations and local thermodynamic equilibrium arguments, we show that the line features in this region of the spectrum can be explained by transitions from high-lying configurations within the Sn{}8+-Sn{}15+ ions. The dominant transitions for all ions but Sn{}8+ are found to be electric-dipole transitions towards the n = 4 ground state from the core-excited configuration in which a 4p electron is promoted to the 5s subshell. Our results resolve some long-standing spectroscopic issues and provide reliable charge state identification for Sn LPP, which could be employed as a useful tool for diagnostic purposes.

MAMA detector systems - A status report

NASA Technical Reports Server (NTRS)

Timothy, J. Gethyn; Morgan, Jeffrey S.; Slater, David C.; Kasle, David B.; Bybee, Richard L.

1989-01-01

Third-generation, 224 x 960 and 360 x 1024-pixel multianode microchannel (MAMA) detectors are under development for satellite-borne FUV and EUV observations, using pixel dimensions of 25 x 25 microns. An account is presently given of the configurations, modes of operation, and recent performance data of these systems. At UV and visible wavelengths, these MAMAs employ a semitransparent, proximity-focused photocathode structure. At FUV and EUV wavelengths below about 1500 A, opaque alkali-halide photocathodes deposited directly on the front surface of the MCP furnish the best detective quantum efficiencies.

Million Degree Plasmas in Extreme Ultraviolet (EUV) Astrophysics. White Paper in Response to Astro2010 Science Call

DTIC Science & Technology

2010-01-01

photometry , timing measurements of suitable cadence, and advanced theory are the keys to understanding the physics of million degree plasmas in...Disentangling these components requires time - and phase- resolved spectroscopic observations of a sample that spans a range of mass accretion rates...many narrow lines, or a continuum with strong, broad absorption features. Key Objective: Obtaining time - and phase- resolved high-resolution EUV

Actinic defect counting statistics over 1-cm2 area of EUVL mask blank

NASA Astrophysics Data System (ADS)

Jeong, Seongtae; Lai, Chih-wei; Rekawa, Senajith; Walton, Christopher C.; Bokor, Jeffrey

2000-07-01

As a continuation of comparison experiments between EUV inspection and visible inspection of defects on EUVL mask blanks, we report on the result of an experiment where the EUV defect inspection tool is used to perform at-wavelength defect counting over 1 cm2 of EUVL mask blank. Initial EUV inspection found five defects over the scanned area and the subsequent optical scattering inspection was able to detect all of the five defects. Therefore, if there are any defects that are only detectable by EUV inspection, the density is lower than the order of unity per cm2. An upgrade path to substantially increase the overall throughput of the EUV inspection system is also identified in the manuscript.

Observations and Operational Products from the Special Sensor Ultraviolet Limb Imager (SSULI)

NASA Astrophysics Data System (ADS)

Dandenault, Patrick; Nicholas, Andrew C.; Coker, Clayton; Budzien, Scott A.; Chua, Damien H.; Finne, Ted T.; Metzler, Christopher A.; Dymond, Kenneth F.

The Naval Research Laboratory (NRL) has developed five ultraviolet remote sensing instru-ments for the Air Force Defense Meteorological Satellite Program (DMSP). These instruments known as SSULI (Special Sensor Ultraviolet Limb Imager) are on the DMSP block of 5D3 satellites, which first launched in 2003. The DMSP satellites are launched in a near-polar, sun-synchronous orbit at an altitude of approximately 830 km. SSULI measures vertical profiles of the natural airglow radiation from atoms, molecules and ions in the upper atmosphere and ionosphere by viewing the earth's limb at a tangent altitude of approximately 50 km to 750 km. Limb observations are made from the extreme ultraviolet (EUV) to the far ultraviolet (FUV) over the wavelength range of 80 nm to 170 nm, with 1.8 nm resolution. An extensive operational data processing system, the SSULI Ground Data Analysis Software (GDAS), has been developed to generate environmental data products from SSULI spectral data in near-real time for use at the Air Force Weather Agency (AFWA). The operational software uses advanced science algorithms developed at NRL and was designed to calibrate data from USAF Raw Sensor Data Records (RSDR) and generate Environmental Data Records (EDRs). Data products from SSULI observations include vertical profiles of electron (Ne) densities, N2, O2, O, O+, Temperature and also vertical Total Electron Content (TEC). On October 18, 2009, the third SSULI sensor launched from Vandenberg Air Force Base, aboard the DMSP F18 spacecraft. An overview of the SSULI operational program and the status of the F18 sensor will be discussed.

Estimation of soft X-ray and EUV transition radiation power emitted from the MIRRORCLE-type tabletop synchrotron.

PubMed

Toyosugi, N; Yamada, H; Minkov, D; Morita, M; Yamaguchi, T; Imai, S

2007-03-01

The tabletop synchrotron light sources MIRRORCLE-6X and MIRRORCLE-20SX, operating at electron energies E(el) = 6 MeV and E(el) = 20 MeV, respectively, can emit powerful transition radiation (TR) in the extreme ultraviolet (EUV) and the soft X-ray regions. To clarify the applicability of these soft X-ray and EUV sources, the total TR power has been determined. A TR experiment was performed using a 385 nm-thick Al foil target in MIRRORCLE-6X. The angular distribution of the emitted power was measured using a detector assembly based on an NE102 scintillator, an optical bundle and a photomultiplier. The maximal measured total TR power for MIRRORCLE-6X is P(max) approximately equal 2.95 mW at full power operation. Introduction of an analytical expression for the lifetime of the electron beam allows calculation of the emitted TR power by a tabletop synchrotron light source. Using the above measurement result, and the theoretically determined ratio between the TR power for MIRRORCLE-6X and MIRRORCLE-20SX, the total TR power for MIRRORCLE-20SX can be obtained. The one-foil TR target thickness is optimized for the 20 MeV electron energy. P(max) approximately equal 810 mW for MIRRORCLE-20SX is obtained with a single foil of 240 nm-thick Be target. The emitted bremsstrahlung is negligible with respect to the emitted TR for optimized TR targets. From a theoretically known TR spectrum it is concluded that MIRRORCLE-20SX can emit 150 mW of photons with E > 500 eV, which makes it applicable as a source for performing X-ray lithography. The average wavelength, \\overline\\lambda = 13.6 nm, of the TR emission of MIRRORCLE-20SX, with a 200 nm Al target, could provide of the order of 1 W EUV.

Extreme Ultraviolet Explorer observations of the magnetic cataclysmic variable RE 1938-461

NASA Technical Reports Server (NTRS)

Warren, John K.; Vallerga, John V.; Mauche, Christopher W.; Mukai, Koji; Siegmund, Oswald H. W.

1993-01-01

The magnetic cataclysmic variable RE 1938-461 was observed by the Extreme Ultraviolet Explorer (EUVE) Deep Survey instrument on 1992 July 8-9 during in-orbit calibration. It was detected in the Lexan/ boron (65-190 A) band, with a quiescent count rate of 0.0062 +/- 0.0017/s, and was not detected in the aluminum/carbon (160-360 A) band. The Lexan/boron count rate is lower than the corresponding ROSAT wide-field camera Lexan/boron count rate. This is consistent with the fact that the source was in a low state during an optical observation performed just after the EUVE observation, whereas it was in an optical high state during the ROSAT observation. The quiescent count rates are consistent with a virtual cessation of accretion. Two transient events lasting about 1 hr occurred during the Lexan/boron pointing, the second at a count rate of 0.050 +/- 0.006/s. This appears to be the first detection of an EUV transient during the low state of a magnetic cataclysmic variable. We propose two possible explanations for the transient events.

Alternate charging profiles for the onboard nickel cadmium batteries of the Explorer Platform/Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Rao, Gopalakrishna M.; Prettyman-Lukoschek, Jill S.

1995-01-01

The Explorer Platform/Extreme Ultraviolet Explorer (EP/EUVE) spacecraft power is provided by the Modular Power Subsystems (MPS) which contains three 50 ampere-hour Nickel Cadmium (NiCd) batteries. The batteries were fabricated by McDonnell Douglas Electronics Systems Company, with the cells fabricated by Gates Aerospace Batteries (GAB), Gainesville, Florida. Shortly following launch, the battery performance characteristics showed similar signatures as the anomalous performance observed on both the Upper Atmosphere Research Satellite (UARS) and the Compton Gamma Ray Observatory (CGRO). This prompted the development and implementation of alternate charging profiles to optimize the spacecraft battery performance. The Flight Operations Team (FOT), under the direction of Goddard Space Flight Center's (GSFC) EP/EUVE Project and Space Power Applications Branch have monitored and managed battery performance through control of the battery Charge to Discharge (C/D) ratio and implementation of a Solar Array (SA) offset. This paper provides a brief overview of the EP/EUVE mission, the MPS, the FOT's battery management for achieving the alternate charging profile, and the observed spacecraft battery performance.

Influence of cloud fraction and snow cover to the variation of surface UV radiation at King Sejong station, Antarctica

NASA Astrophysics Data System (ADS)

Lee, Yun Gon; Koo, Ja-Ho; Kim, Jhoon

2015-10-01

This study investigated how cloud fraction and snow cover affect the variation of surface ultraviolet (UV) radiation by using surface Erythemal UV (EUV) and Near UV (NUV) observed at the King Sejong Station, Antarctica. First the Radiative Amplification Factor (RAF), the relative change of surface EUV according to the total-column ozone amount, is compared for different cloud fractions and solar zenith angles (SZAs). Generally, all cloudy conditions show that the increase of RAF as SZA becomes larger, showing the larger effects of vertical columnar ozone. For given SZA cases, the EUV transmission through mean cloud layer gradually decreases as cloud fraction increases, but sometimes the maximum of surface EUV appears under partly cloudy conditions. The high surface EUV transmittance under broken cloud conditions seems due to the re-radiation of scattered EUV by cloud particles. NUV transmission through mean cloud layer also decreases as cloud amount increases but the sensitivity to the cloud fraction is larger than EUV. Both EUV and NUV radiations at the surface are also enhanced by the snow cover, and their enhancement becomes higher as SZA increases implying the diurnal variation of surface albedo. This effect of snow cover seems large under the overcast sky because of the stronger interaction between snow surface and cloudy sky.

Optical Technologies for UV Remote Sensing Instruments

NASA Technical Reports Server (NTRS)

Keski-Kuha, R. A. M.; Osantowski, J. F.; Leviton, D. B.; Saha, T. T.; Content, D. A.; Boucarut, R. A.; Gum, J. S.; Wright, G. A.; Fleetwood, C. M.; Madison, T. J.

1993-01-01

Over the last decade significant advances in technology have made possible development of instruments with substantially improved efficiency in the UV spectral region. In the area of optical coatings and materials, the importance of recent developments in chemical vapor deposited (CVD) silicon carbide (SiC) mirrors, SiC films, and multilayer coatings in the context of ultraviolet instrumentation design are discussed. For example, the development of chemically vapor deposited (CVD) silicon carbide (SiC) mirrors, with high ultraviolet (UV) reflectance and low scatter surfaces, provides the opportunity to extend higher spectral/spatial resolution capability into the 50-nm region. Optical coatings for normal incidence diffraction gratings are particularly important for the evolution of efficient extreme ultraviolet (EUV) spectrographs. SiC films are important for optimizing the spectrograph performance in the 90 nm spectral region. The performance evaluation of the flight optical components for the Solar Ultraviolet Measurements of Emitted Radiation (SUMER) instrument, a spectroscopic instrument to fly aboard the Solar and Heliospheric Observatory (SOHO) mission, designed to study dynamic processes, temperatures, and densities in the plasma of the upper atmosphere of the Sun in the wavelength range from 50 nm to 160 nm, is discussed. The optical components were evaluated for imaging and scatter in the UV. The performance evaluation of SOHO/CDS (Coronal Diagnostic Spectrometer) flight gratings tested for spectral resolution and scatter in the DGEF is reviewed and preliminary results on resolution and scatter testing of Space Telescope Imaging Spectrograph (STIS) technology development diffraction gratings are presented.

Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

NASA Astrophysics Data System (ADS)

Kandel, Yudhishthir; Chandonait, Jonathan; Melvin, Lawrence S.; Marokkey, Sajan; Yan, Qiliang; Grzeskowiak, Steven; Painter, Benjamin; Denbeaux, Gregory

2017-03-01

Extreme ultraviolet (EUV) lithography at 13.5 nm stands at the crossroads of next generation patterning technology for high volume manufacturing of integrated circuits. Photo resist models that form the part of overall pattern transform model for lithography play a vital role in supporting this effort. The physics and chemistry of these resists must be understood to enable the construction of accurate models for EUV Optical Proximity Correction (OPC). In this study, we explore the possibility of improving EUV photo-resist models by directly correlating the parameters obtained from experimentally measured atomic scale physical properties; namely, the effect of interaction of EUV photons with photo acid generators in standard chemically amplified EUV photoresist, and associated electron energy loss events. Atomic scale physical properties will be inferred from the measurements carried out in Electron Resist Interaction Chamber (ERIC). This study will use measured physical parameters to establish a relationship with lithographically important properties, such as line edge roughness and CD variation. The data gathered from these measurements is used to construct OPC models of the resist.

High efficiency spectrographs for the EUV and soft X-rays

NASA Technical Reports Server (NTRS)

Cash, W.

1983-01-01

The use of grazing incidence optics and reflection grating designs is shown to be a method that improves the performance of spectrographs at wavelengths shorter than 1200 A. Emphasis is laid on spectroscopic designs for X ray and EUV astronomy, with sample designs for an objective reflection grating spectrograph (ORGS) and an echelle spectrograph for wavelengths longer than 100 A. Conical diffraction allows operations at grazing incidence in the echelle spectrograph. In ORGS, the extreme distance of X ray objects aids in collimating the source radiation, which encounters conical diffraction within the instrument, proceeds parallel to the optical axis, and arrives at the detector. A series of gratings is used to achieve the effect. A grazing echelle is employed for EUV observations, and offers a resolution of 20,000 over a 300 A bandpass.

Inter-Comparison between July 24, 2014 EUV Data from NASA Sounding Rocket 36.289 and Concurrent Measurements from Orbital Solar Observatories

NASA Astrophysics Data System (ADS)

Didkovsky, L. V.; Wieman, S. R.; Judge, D. L.

2014-12-01

Sounding rocket mission NASA 36.289 Didkovsky provided solar EUV irradiance measurements from four instruments built at the USC Space Sciences Center: the Rare Gas Ionization Cell (RGIC), the Solar Extreme ultraviolet Monitor (SEM), the Dual Grating Spectrometer (DGS), and the Optics-Free Spectrometer (OFS), thus meeting the mission comprehensive success criteria. These sounding rocket data allow us to inter-compare the observed absolute EUV irradiance with the data taken at the same time from the SOHO and SDO solar observatories. The sounding rocket data from the two degradation-free instruments (DGS and OFS) can be used to verify the degradation rates of SOHO and SDO EUV channels and serve as a flight-proven prototypes for future improvements of degradation-free instrumentation for solar physics.

EUVL masks: paving the path for commercialization

NASA Astrophysics Data System (ADS)

Mangat, Pawitter J. S.; Hector, Scott D.

2001-09-01

Optical projection lithography has been the principal vehicle of semiconductor manufacturing for more than 20 years and is marching aggressively to satisfy the needs of semiconductor manufacturers for 100nm devices. However, the complexity of optical lithography continues to increase as wavelength reduction continues to 157nm. Extreme Ultraviolet Lithography (EUVL), with wavelength from 13-14 nm, is evolving as a leading next generation lithography option for semiconductor industry to stay on the path laid by Moore's Law. Masks are a critical part of the success of any technology and are considered to be high risk both for optical lithography and NGL technologies for sub-100nm lithography. Two key areas of EUV mask fabrication are reflective multilayer deposition and absorber patterning. In the case of reflective multilayers, delivering defect free multilayers for mask blanks is the biggest challenge. Defect mitigation is being explored as a possible option to smooth the multilayer defects in addition to optimization of the deposition process to reduce defect density. The mask patterning process needs focus on the defect-free absorber stack patterning process, mask cleaning, inspection and repair. In addition, there is considerable effort to understand by simulations, the defect printability, thermal and mechanical distortions, and non-telecentric illumination, to mention a few. To protect the finished mask from defects added during use, a removable pellicle strategy combined with thermophoretic protection during exposure is being developed. Recent migration to square form factor using low thermal expansion material (LTEM) is advantageous as historical developments in optical masks can be applied to EUV mask patterning. This paper addresses recent developments in the EUV mask patterning and highlights critical manufacturing process controls needed to fabricate defect-free full field masks with CD and image placement specifications for sub-70nm node lithography. No technology can be implemented without establishing the commercial infrastructure. The rising cost seems to be a major issue affecting the technology development. With respect to mask fabrication for commercial availability, a virtual mask shop analysis is presented that indicates that the process cost for EUVL masks are comparable to the high end optical mask with a reasonable yield. However, the cost for setting up a new mask facility is considerably high.

EUVE GO Survey: High Levels of User Satisfaction

NASA Astrophysics Data System (ADS)

Stroozas, B. A.

2000-12-01

This paper describes the results of a detailed customer survey of Guest Observers (GOs) for NASA's Extreme Ultraviolet Explorer (EUVE) astronomy satellite observatory. The purpose of the research survey was to (1) measure the levels of GO customer satisfaction with respect to EUVE observing services, and (2) compare the observing experiences of EUVE GOs with their experiences using other satellite observatories. This survey was conducted as a business research project -- part of the author's graduate work as an MBA candidate. A total sample of 38 respondents, from a working population of 101 "active" EUVE GOs, participated in this survey. The results, which provided a profile of the "typical" EUVE GO, showed in a statistically significant fashion that these GOs were more than satisfied with the available EUVE observing services. In fact, the sample GOs generally rated their EUVE observing experiences to be better than average as compared to their experiences as GOs on other missions. These relatively high satisfaction results are particularly pleasing to the EUVE Project which, given its significantly reduced staffing environment at U.C. Berkeley, has continued to do more with less. This paper outlines the overall survey process: the relevant background and previous research, the survey design and methodology, and the final results and their interpretation. The paper also points out some general limitations and weaknesses of the study, along with some recommended actions for the EUVE Project and for NASA in general. This work was funded by NASA/UCB Cooperative Agreement NCC5-138.

Fundamentals of EUV resist-inorganic hardmask interactions

NASA Astrophysics Data System (ADS)

Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

2017-03-01

High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (<5nm) inorganic HMs can provide higher etch selectivity, lower post-etch LWR, decreased defectivity and wet strippability compared to spin-on hybrid HMs (e.g., SiARC), however such novel layers can induce resist adhesion failure and resist residue. Therefore, a fundamental understanding of EUV resist-inorganic HM interactions is needed in order to optimize the EUV resist interfacial behavior. In this paper, novel materials and processing techniques are introduced to characterize and improve the EUV resist-inorganic HM interface. HM surface interactions with specific EUV resist components are evaluated for open-source experimental resist formulations dissected into its individual additives using EUV contrast curves as an effective characterization method to determine post-development residue formation. Separately, an alternative adhesion promoter platform specifically tailored for a selected ultrathin inorganic HM based on amorphous silicon (aSi) is presented and the mitigation of resist delamination is exemplified for the cases of positive-tone and negative-tone development (PTD, NTD). Additionally, original wafer priming hardware for the deposition of such novel adhesion promoters is unveiled. The lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

GOES-R SUVI EUV Flatfields Generated Using Boustrophedon Scans

NASA Astrophysics Data System (ADS)

Shing, L.; Edwards, C.; Mathur, D.; Vasudevan, G.; Shaw, M.; Nwachuku, C.

2017-12-01

The Solar Ultraviolet Imager (SUVI) is mounted on the Solar Pointing Platform (SPP) of the Geostationary Operational Environmental Satellite, GOES-R. SUVI is a Generalized Cassegrain telescope with a large field of view that employs multilayer coatings optimized to operate in six extreme ultraviolet (EUV) narrow bandpasses centered at 9.4, 13.1, 17.1, 19.5, 28.4 and 30.4 nm. The SUVI CCD flatfield response was determined using two different techniques; The Kuhn-Lin-Lorentz (KLL) Raster and a new technique called, Dynamic Boustrophedon Scans. The new technique requires less time to collect the data and is also less sensitive to Solar features compared with the KLL method. This paper presents the flatfield results of the SUVI using this technique during Post Launch Testing (PLT).

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Komuro, Yoshitaka; Yamamoto, Hiroki; Kobayashi, Kazuo; Ohomori, Katsumi; Kozawa, Takahiro

2015-03-01

Extreme ultraviolet (EUV) lithography is the most promising candidate for the high-volume production of semiconductor devices with half-pitches of sub 10nm. An anion-bound polymer(ABP), in which at the anion part of onium salts is polymerized, has attracted much attention from the viewpoint of the control of acid diffusion. In this study, the acid generation mechanism in ABP films was investigated using γ and EUV radiolysis. On the basis of experimental results, the acid generation mechanism in anion-bound chemically amplified resists was proposed. The protons of acids are considered to be mainly generated through the reaction of phenyl radicals with diphenylsulfide radical cations that are produced through the hole transfer to the decomposition products of onium salts.

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Komuro, Yoshitaka; Yamamoto, Hiroki; Kobayashi, Kazuo; Utsumi, Yoshiyuki; Ohomori, Katsumi; Kozawa, Takahiro

2014-11-01

Extreme ultraviolet (EUV) lithography is the most promising candidate for the high-volume production of semiconductor devices with half-pitches of sub-10 nm. An anion-bound polymer (ABP), in which the anion part of onium salts is polymerized, has attracted much attention from the viewpoint of the control of acid diffusion. In this study, the acid generation mechanism in ABP films was investigated using electron (pulse), γ, and EUV radiolyses. On the basis of experimental results, the acid generation mechanism in anion-bound chemically amplified resists was proposed. The major path for proton generation in the absence of effective proton sources is considered to be the reaction of phenyl radicals with diphenylsulfide radical cations that are produced through hole transfer to the decomposition products of onium salts.

EB and EUV lithography using inedible cellulose-based biomass resist material

NASA Astrophysics Data System (ADS)

Takei, Satoshi; Hanabata, Makoto; Oshima, Akihiro; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi

2016-03-01

The validity of our approach of inedible cellulose-based resist material derived from woody biomass has been confirmed experimentally for the use of pure water in organic solvent-free water spin-coating and tetramethylammonium hydroxide(TMAH)-free water-developable techniques of eco-conscious electron beam (EB) and extreme-ultraviolet (EUV) lithography. The water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB and EUV lithography was developed for environmental affair, safety, easiness of handling, and health of the working people. The inedible cellulose-based biomass resist material was developed by replacing the hydroxyl groups in the beta-linked disaccharides with EB and EUV sensitive groups. The 50-100 nm line and space width, and little footing profiles of cellulose-based biomass resist material on hardmask and layer were resolved at the doses of 10-30 μC/cm2. The eco-conscious lithography techniques was referred to as green EB and EUV lithography using inedible cellulose-based biomass resist material.

Direct EUV/X-Ray Modulation of the Ionosphere During the August 2017 Total Solar Eclipse

NASA Astrophysics Data System (ADS)

Mrak, Sebastijan; Semeter, Joshua; Drob, Douglas; Huba, J. D.

2018-05-01

The great American total solar eclipse of 21 August 2017 offered a fortuitous opportunity to study the response of the atmosphere and ionosphere using a myriad of ground instruments. We have used the network of U.S. Global Positioning System receivers to examine perturbations in maps of ionospheric total electron content (TEC). Coherent large-scale variations in TEC have been interpreted by others as gravity wave-induced traveling ionospheric disturbances. However, the solar disk had two active regions at that time, one near the center of the disk and one at the edge, which resulted in an irregular illumination pattern in the extreme ultraviolet (EUV)/X-ray bands. Using detailed EUV occultation maps calculated from the National Aeronautics and Space Administration Solar Dynamics Observatory Atmospheric Imaging Assembly images, we show excellent agreement between TEC perturbations and computed gradients in EUV illumination. The results strongly suggest that prominent large-scale TEC disturbances were consequences of direct EUV modulation, rather than gravity wave-induced traveling ionospheric disturbances.

EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation

NASA Astrophysics Data System (ADS)

Pang, Linyong; Hu, Peter; Satake, Masaki; Tolani, Vikram; Peng, Danping; Li, Ying; Chen, Dongxue

2011-11-01

According to the ITRS roadmap, mask defects are among the top technical challenges to introduce extreme ultraviolet (EUV) lithography into production. Making a multilayer defect-free extreme ultraviolet (EUV) blank is not possible today, and is unlikely to happen in the next few years. This means that EUV must work with multilayer defects present on the mask. The method proposed by Luminescent is to compensate effects of multilayer defects on images by modifying the absorber patterns. The effect of a multilayer defect is to distort the images of adjacent absorber patterns. Although the defect cannot be repaired, the images may be restored to their desired targets by changing the absorber patterns. This method was first introduced in our paper at BACUS 2010, which described a simple pixel-based compensation algorithm using a fast multilayer model. The fast model made it possible to complete the compensation calculations in seconds, instead of days or weeks required for rigorous Finite Domain Time Difference (FDTD) simulations. Our SPIE 2011 paper introduced an advanced compensation algorithm using the Level Set Method for 2D absorber patterns. In this paper the method is extended to consider process window, and allow repair tool constraints, such as permitting etching but not deposition. The multilayer defect growth model is also enhanced so that the multilayer defect can be "inverted", or recovered from the top layer profile using a calibrated model.

Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy

NASA Astrophysics Data System (ADS)

Chen, Yulu; Wood, Obert; Rankin, Jed; Gullikson, Eric; Meyer-Ilse, Julia; Sun, Lei; Qi, Zhengqing John; Goodwin, Francis; Kye, Jongwook

2017-03-01

Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet (EUV) radiation requires a reflective mask structure - a multi-layer coating consisting of alternating layers of high-Z (wave impedance) and low-Z materials that provide enhanced reflectivity over a narrow wavelength band peaked at the Bragg wavelength.1 Absorber side wall angle, corner rounding,2 surface roughness,3 and defects4 affect mask performance, but even seemingly simple parameters like bulk reflectivity on mirror and absorber surfaces can have a profound influence on imaging. For instance, using inaccurate reflectivity values at small and large incident angles would diminish the benefits of source mask co-optimization (SMO) and result in larger than expected pattern shifts. The goal of our work is to calculate the variation in mask reflectivity due to various sources of inaccuracies using Monte Carlo simulations. Such calculation is necessary as small changes in the thickness and optical properties of the high-Z and low-Z materials can cause substantial variations in reflectivity. This is further complicated by undesirable intermixing between the two materials used to create the reflector.5 One of the key contributors to mask reflectivity fluctuation is identified to be the intermixing layer thickness. We also investigate the impacts on OPC when the wrong mask information is provided, and evaluate the deterioration of overlapping process window. For a hypothetical N7 via layer, the lack of accurate mask information costs 25% of the depth of focus at 5% exposure latitude. Our work would allow the determination of major contributors to mask reflectivity variation, drive experimental efforts of measuring such contributors, provide strategies to optimize mask reflectivity, and quantize the OPC errors due to imperfect mask modeling.

Novel EUV photoresist for sub-7nm node (Conference Presentation)

NASA Astrophysics Data System (ADS)

Furukawa, Tsuyoshi; Naruoka, Takehiko; Nakagawa, Hisashi; Miyata, Hiromu; Shiratani, Motohiro; Hori, Masafumi; Dei, Satoshi; Ayothi, Ramakrishnan; Hishiro, Yoshi; Nagai, Tomoki

2017-04-01

Extreme ultraviolet (EUV) lithography has been recognized as a promising candidate for the manufacturing of semiconductor devices as LS and CH pattern for 7nm node and beyond. EUV lithography is ready for high volume manufacturing stage. For the high volume manufacturing of semiconductor devices, significant improvement of sensitivity and line edge roughness (LWR) and Local CD Uniformity (LCDU) is required for EUV resist. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). Especially high sensitivity and good roughness is important for EUV lithography high volume manufacturing. We are trying to improve sensitivity and LWR/LCDU from many directions. From material side, we found that both sensitivity and LWR/LCDU are simultaneously improved by controlling acid diffusion length and efficiency of acid generation using novel resin and PAG. And optimizing EUV integration is one of the good solution to improve sensitivity and LWR/LCDU. We are challenging to develop new multi-layer materials to improve sensitivity and LWR/LCDU. Our new multi-layer materials are designed for best performance in EUV lithography system. From process side, we found that sensitivity was substantially improved maintaining LWR applying novel type of chemical amplified resist (CAR) and process. EUV lithography evaluation results obtained for new CAR EUV interference lithography. And also metal containing resist is one possibility to break through sensitivity and LWR trade off. In this paper, we will report the recent progress of sensitivity and LWR/LCDU improvement of JSR novel EUV resist and process.

Multi-wavelength Characterization of Exoplanet Host Stars with the MUSCLES Treasury Survey

NASA Astrophysics Data System (ADS)

France, Kevin; Youngblood, Allison; Loyd, R. O. Parke; Schneider, Christian

2017-01-01

High-energy photons (X-ray to NUV) from exoplanet host stars regulate the atmospheric temperature profiles and photochemistry on orbiting planets, influencing the long-term stability of planetary atmospheres and the production of potential “biomarker” gases. However, relatively few observational and theoretical constraints exist on the high-energy irradiance from typical (i.e., weakly active) M and K dwarf exoplanet host stars. In this talk, I will describe results from a panchromatic survey (Chandra/XMM/Hubble/ground) of M and K dwarf exoplanet hosts. The MUSCLES Treasury Survey (Measurements of the Ultraviolet Spectral Characteristics of Low-mass Exoplanetary Systems) combines UV, X-ray, and optical observations with reconstructed Lyman-alpha and EUV (100-900 Ang) radiation to create 5 Angstrom to 5 micron stellar irradiance spectra that are available as a High-Level Science Product on STScI/MAST. I will discuss how we use multi-wavelength observations to study possible abiotic production of the suggested biomarkers O2 and O3, develop scaling relations to infer the high-energy particle fluxes from these stars based on solar UV flare/particle flux measurements, calibrate visible-wavelength proxies for the high-energy irradiance, and characterize the UV variability and flare frequency of “optically inactive” M dwarfs.

Objective for EUV microscopy, EUV lithography, and x-ray imaging

DOEpatents

Bitter, Manfred; Hill, Kenneth W.; Efthimion, Philip

2016-05-03

Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

Generation of sub-optical-cycle, carrier-envelope-phase--insensitive, extreme-uv pulses via nonlinear stabilization in a waveguide

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sandhu, Arvinder S.; Gagnon, Etienne; Paul, Ariel

2006-12-15

We present evidence for a new regime of high-harmonic generation in a waveguide where bright, sub-optical-cycle, quasimonochromatic, extreme ultraviolet (EUV) light is generated via a mechanism that is relatively insensitive to carrier-envelope phase fluctuations. The interplay between the transient plasma which determines the phase matching conditions and the instantaneous laser intensity which drives harmonic generation gives rise to a new nonlinear stabilization mechanism in the waveguide, localizing the phase-matched EUV emission to within sub-optical-cycle duration. The sub-optical-cycle EUV emission generated by this mechanism can also be selectively optimized in the spectral domain by simple tuning of parameters.

The Extreme Ultraviolet Explorer science instruments development - Lessons learned

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Battel, S.

1991-01-01

The science instruments development project for the Extreme Ultraviolet Explorer (EUVE) satellite is reviewed. Issues discussed include the philosophical basis of the program, the establishment of a tight development team, the approach to planning and phasing activities, the handling of the most difficult technical problems, and the assessment of the work done during the preimplemntation period of the project.

An operations and command systems for the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Muscettola, Nicola; Korsmeyer, David J.; Olson, Eric C.; Wong, Gary

1994-01-01

About 40% of the budget of a scientific spacecraft mission is usually consumed by Mission Operations & Data Analysis (MO&DA) with MO driving these costs. In the current practice, MO is separated from spacecraft design and comes in focus relatively late in the mission life cycle. As a result, spacecraft may be designed that are very difficult to operate. NASA centers have extensive MO expertise but often lessons learned in one mission are not exploited for other parallel or future missions. A significant reduction of MO costs is essential to ensure a continuing and growing access to space for the scientific community. We are addressing some of these issues with a highly automated payload operations and command system for an existing mission, the Extreme Ultraviolet Explorer (EUVE). EUVE is currently operated jointly by the Goddard Space Flight Center (GSFC), responsible for spacecraft operations, and the Center for Extreme Ultraviolet Astrophysics (CEA) of the University of California, Berkeley, which controls the telescopes and scientific instruments aboard the satellite. The new automated system is being developed by a team including personnel from the NASA Ames Research Center (ARC), the Jet Propulsion Laboratory (JPL) and the Center for EUV Astrophysics (CEA). An important goal of the project is to provide AI-based technology that can be easily operated by nonspecialists in AI. Another important goal is the reusability of the techniques for other missions. Models of the EUVE spacecraft need to be built both for planning/scheduling and for monitoring. In both cases, our modeling tools allow the assembly of a spacecraft model from separate sub-models of the various spacecraft subsystems. These sub-models are reusable; therefore, building mission operations systems for another small satellite mission will require choosing pre-existing modules, reparametrizing them with respect to the actual satellite telemetry information, and reassembling them in a new model. We briefly describe the EUVE mission and indicate why it is particularly suitable for the task. Then we briefly outline our current work in mission planning/scheduling and spacecraft and instrument health monitoring.

Vacuum ultraviolet instrumentation for solar irradiance and thermospheric airglow

NASA Technical Reports Server (NTRS)

Woods, Thomas N.; Rottman, Gary J.; Bailey, Scott M.; Solomon, Stanley C.

1993-01-01

A NASA sounding rocket experiment was developed to study the solar extreme ultraviolet (EUV) spectral irradiance and its effect on the upper atmosphere. Both the solar flux and the terrestrial molecular nitrogen via the Lyman-Birge-Hopfield bands in the far ultraviolet (FUV) were measured remotely from a sounding rocket on October 27, 1992. The rocket experiment also includes EUV instruments from Boston University (Supriya Chakrabarti), but only the National Center for Atmospheric Research (NCAR)/University of Colorado (CU) four solar instruments and one airglow instrument are discussed here. The primary solar EUV instrument is a 1/4 meter Rowland circle EUV spectrograph which has flown on three rockets since 1988 measuring the solar spectral irradiance from 30 to 110 nm with 0.2 nm resolution. Another solar irradiance instrument is an array of six silicon XUV photodiodes, each having different metallic filters coated directly on the photodiodes. This photodiode system provides a spectral coverage from 0.1 to 80 nm with about 15 nm resolution. The other solar irradiance instrument is a silicon avalanche photodiode coupled with pulse height analyzer electronics. This avalanche photodiode package measures the XUV photon energy providing a solar spectrum from 50 to 12,400 eV (25 to 0.1 nm) with an energy resolution of about 50 eV. The fourth solar instrument is an XUV imager that images the sun at 17.5 nm with a spatial resolution of 20 arc-seconds. The airglow spectrograph measures the terrestrial FUV airglow emissions along the horizon from 125 to 160 nm with 0.2 nm spectral resolution. The photon-counting CODACON detectors are used for three of these instruments and consist of coded arrays of anodes behind microchannel plates. The one-dimensional and two-dimensional CODACON detectors were developed at CU by Dr. George Lawrence. The pre-flight and post-flight photometric calibrations were performed at our calibration laboratory and at the Synchrotron Ultraviolet Radiation Facility (SURF) at the National Institute of Standards and Technology (NIST) in Gaithersburg, Maryland.

Spectral dependence on the correction factor of erythemal UV for cloud, aerosol, total ozone, and surface properties: A modeling study

NASA Astrophysics Data System (ADS)

Park, Sang Seo; Jung, Yeonjin; Lee, Yun Gon

2016-07-01

Radiative transfer model simulations were used to investigate the erythemal ultraviolet (EUV) correction factors by separating the UV-A and UV-B spectral ranges. The correction factor was defined as the ratio of EUV caused by changing the amounts and characteristics of the extinction and scattering materials. The EUV correction factors (CFEUV) for UV-A [CFEUV(A)] and UV-B [CFEUV(B)] were affected by changes in the total ozone, optical depths of aerosol and cloud, and the solar zenith angle. The differences between CFEUV(A) and CFEUV(B) were also estimated as a function of solar zenith angle, the optical depths of aerosol and cloud, and total ozone. The differences between CFEUV(A) and CFEUV(B) ranged from -5.0% to 25.0% for aerosols, and from -9.5% to 2.0% for clouds in all simulations for different solar zenith angles and optical depths of aerosol and cloud. The rate of decline of CFEUV per unit optical depth between UV-A and UV-B differed by up to 20% for the same aerosol and cloud conditions. For total ozone, the variation in CFEUV(A) was negligible compared with that in CFEUV(B) because of the effective spectral range of the ozone absorption band. In addition, the sensitivity of the CFEUVs due to changes in surface conditions (i.e., surface albedo and surface altitude) was also estimated by using the model in this study. For changes in surface albedo, the sensitivity of the CFEUVs was 2.9%-4.1% per 0.1 albedo change, depending on the amount of aerosols or clouds. For changes in surface altitude, the sensitivity of CFEUV(B) was twice that of CFEUV(A), because the Rayleigh optical depth increased significantly at shorter wavelengths.

Extreme ultraviolet diagnostic upgrades for kink mode control on the HBT-EP tokamak

NASA Astrophysics Data System (ADS)

Levesque, J. P.; Brooks, J. W.; Desanto, S.; Mauel, M. E.; Navratil, G. A.; Page, J. W.; Hansen, C. J.; Delgado-Aparicio, L.

2016-10-01

Optical diagnostics can provide non-invasive measurements of tokamak equilibria and the internal characteristics of MHD mode activity. We present research plans and ongoing progress on upgrading extreme ultraviolet (EUV) diagnostics in the HBT-EP tokamak. Four sets of 16 poloidal views will allow tomographic reconstruction of plasma emissivity and internal kink mode structure. Emission characteristics of naturally-occurring m/n = 2/1, 3/2, and 3/1 tearing and kink modes will be compared with expectations from a synthetic diagnostic. Coupling between internal and external modes leading up to disruptions is studied. The internal plasma response to external magnetic perturbations is investigated, and compared with magnetic response measurements. Correlation between internal emissivity and external magnetic measurements provides a global picture of long-wavelength MHD instabilities. Measurements are input to HBT-EP's GPU-based feedback system, allowing active feedback for kink modes using only optical sensors and both magnetic and edge current actuators. A separate two-color, 16-chord tangential system will be installed next year to allow reconstruction of temperature profiles and their fluctuations versus time. Supported by U.S. DOE Grant DE-FG02-86ER53222.

Extreme ultraviolet lithography machine

DOEpatents

Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

2000-01-01

An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

Extreme ultraviolet and soft x-ray diagnostics of high-temperature plasmas. Annual progress report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Moos, H W; Armstrong, L Jr

1980-01-01

The work performed from mid-January 1979 through 1980 is described. EUV diagnostic studies have been performed at the Alcator A and C Tokamaks, and on TMX. A toroidal asymmetry has been found in the low density phase of Alcator A. The confinement time of impurities has been measured on Alcator A. Impurity concentrations in the center cell of TMX have been studied using EUV spectroscopic techniques. A time resolving spectrograph with 1024 detector elements is essentially complete.

Designing a Small-Sized Engineering Model of Solar EUV Telescopr for a Korean Satellite

NASA Astrophysics Data System (ADS)

Han, Jung-Hoon; Jang, Min-Hwan; Kim, Sang-Joon

2001-11-01

For the research of solar EUV (extreme ultraviolet) radiation, we have designed a small-sized engineering model of solar EUV telescope, which is suitable for a Korean satellite. The EUV solar telescope was designed to observe the sun at 584.3Å (He¥°) and 629.7Å (O¥´). The optical system is an f/8 Ritchey-Chrètien, and the effective diameter and focal length are 80§® and 640§®, respectively. The He¥°and O¥´ filters are loaded in a filter wheel. In the detection part, the MCP (MicroChannel Plate) type is Z-stack, and the channel-to-diameter ratio is 40:1. MCP and CCD are connected by fiber optic taper. A commercial optical design software is used for the analysis of the optical system design.

Seasonal variability of Martian ion escape through the plume and tail from MAVEN observations

NASA Astrophysics Data System (ADS)

Dong, Y.; Fang, X.; Brain, D. A.; McFadden, J. P.; Halekas, J. S.; Connerney, J. E. P.; Eparvier, F.; Andersson, L.; Mitchell, D.; Jakosky, B. M.

2017-04-01

We study the Mars Atmosphere and Volatile Evolution spacecraft observations of Martian planetary ion escape during two time periods: 11 November 2014 to 19 March 2015 and 4 June 2015 to 24 October 2015, with the focus on understanding the seasonal variability of Martian ion escape in response to the solar extreme ultraviolet (EUV) flux. We organize the >6 eV O+ ion data by the upstream electric field direction to estimate the escape rates through the plume and tail. To investigate the ion escape dependence on the solar EUV flux, we constrain the solar wind dynamic pressure and interplanetary magnetic filed strength and compare the ion escape rates through the plume and tail in different energy ranges under high and low EUV conditions. We found that the total >6 eV O+ escape rate increases from 2 to 3 × 1024 s-1 as the EUV irradiance increases by almost the same factor, mostly on the <1 keV tailward escape. The plume escape rate does not vary significantly with EUV. The relative contribution from the plume to the total escape varies between 30% and 20% from low to high EUV. Our results suggest that the Martian ion escape is sensitive to the seasonal EUV variation, and the contribution from plume escape becomes more important under low EUV conditions.

Protection efficiency of a standard compliant EUV reticle handling solution

NASA Astrophysics Data System (ADS)

He, Long; Lystad, John; Wurm, Stefan; Orvek, Kevin; Sohn, Jaewoong; Ma, Andy; Kearney, Patrick; Kolbow, Steve; Halbmaier, David

2009-03-01

For successful implementation of extreme ultraviolet lithography (EUVL) technology for late cycle insertion at 32 nm half-pitch (hp) and full introduction for 22 nm hp high volume production, the mask development infrastructure must be in place by 2010. The central element of the mask infrastructure is contamination-free reticle handling and protection. Today, the industry has already developed and balloted an EUV pod standard for shipping, transporting, transferring, and storing EUV masks. We have previously demonstrated that the EUV pod reticle handling method represents the best approach in meeting EUVL high volume production requirements, based on then state-of-the-art inspection capability at ~53nm polystyrene latex (PSL) equivalent sensitivity. In this paper, we will present our latest data to show defect-free reticle handling is achievable down to 40 nm particle sizes, using the same EUV pod carriers as in the previous study and the recently established world's most advanced defect inspection capability of ~40 nm SiO2 equivalent sensitivity. The EUV pod is a worthy solution to meet EUVL pilot line and pre-production exposure tool development requirements. We will also discuss the technical challenges facing the industry in refining the EUV pod solution to meet 22 nm hp EUVL production requirements and beyond.

Study of extreme-ultraviolet emission and properties of a coronal streamer from PROBA2/SWAP, HINODE/EIS and Mauna Loa Mk4 observations

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goryaev, F.; Slemzin, V.; Vainshtein, L.

2014-02-01

Wide-field extreme-ultraviolet (EUV) telescopes imaging in spectral bands sensitive to 1 MK plasma on the Sun often observe extended, ray-like coronal structures stretching radially from active regions to distances of 1.5-2 R {sub ☉}, which represent the EUV counterparts of white-light streamers. To explain this phenomenon, we investigated the properties of a streamer observed on 2010 October 20 and 21, by the PROBA2/SWAP EUV telescope together with the Hinode/EIS (HOP 165) and the Mauna Loa Mk4 white-light coronagraph. In the SWAP 174 Å band comprising the Fe IX-Fe XI lines, the streamer was detected to a distance of 2 Rmore » {sub ☉}. We assume that the EUV emission is dominated by collisional excitation and resonant scattering of monochromatic radiation coming from the underlying corona. Below 1.2 R {sub ☉}, the plasma density and temperature were derived from the Hinode/EIS data by a line-ratio method. Plasma conditions in the streamer and in the background corona above 1.2 R {sub ☉} from the disk center were determined by forward-modeling the emission that best fit the observational data in both EUV and white light. It was found that the plasma in the streamer above 1.2 R {sub ☉} is nearly isothermal, with a temperature of T = 1.43 ± 0.08 MK. The hydrostatic scale-height temperature determined from the evaluated density distribution was significantly higher (1.72 ± 0.08 MK), which suggests the existence of outward plasma flow along the streamer. We conclude that, inside the streamer, collisional excitation provided more than 90% of the observed EUV emission, whereas, in the background corona, the contribution of resonance scattering became comparable with that of collisions at R ≳ 2 R {sub ☉}.« less

EUV multilayer mirrors with enhanced stability

NASA Astrophysics Data System (ADS)

Benoit, Nicolas; Yulin, Sergiy; Feigl, Torsten; Kaiser, Norbert

2006-08-01

The application of multilayer optics in EUV lithography requires not only the highest possible normal-incidence reflectivity but also a long-term thermal and radiation stability at operating temperatures. This requirement is most important in the case of the collector mirror of the illumination system close to the EUV source where a short-time decrease in reflectivity is most likely. Mo/Si multilayer mirrors, designed for high normal reflectivity at the wavelength of 13.5 nm and deposited by dc magnetron sputtering, were directly exposed to EUV radiation without mitigation system. They presented a loss of reflectivity of more than 18% after only 8 hours of irradiation by a Xe-discharge source. Another problem of Mo/Si multilayers is the instability of reflectivity and peak wavelength under high heat load. It becomes especially critical at temperatures above 200°C, where interdiffusion between the molybdenum and the silicon layers is observed. The development of high-temperature multilayers was focused on two alternative Si-based systems: MoSi II/Si and interface engineered Mo/C/Si/C multilayer mirrors. The multilayer designs as well as the deposition parameters of all systems were optimized in terms of high peak reflectivity (>= 60 %) at a wavelength of 13.5 nm and high thermal stability. Small thermally induced changes of the MoSi II/Si multilayer properties were found but they were independent of the annealing time at all temperatures examined. A wavelength shift of -1.7% and a reflectivity drop of 1.0% have been found after annealing at 500°C for 100 hours. The total degradation of optical properties above 650°C can be explained by a recrystallization process of MoSi II layers.

EUV tools: hydrogen gas purification and recovery strategies

NASA Astrophysics Data System (ADS)

Landoni, Cristian; Succi, Marco; Applegarth, Chuck; Riddle Vogt, Sarah

2015-03-01

The technological challenges that have been overcome to make extreme ultraviolet lithography (EUV) a reality have been enormous1. This vacuum driven technology poses significant purity challenges for the gases employed for purging and cleaning the scanner EUV chamber and source. Hydrogen, nitrogen, argon and ultra-high purity compressed dry air (UHPCDA) are the most common gases utilized at the scanner and source level. Purity requirements are tighter than for previous technology node tools. In addition, specifically for hydrogen, EUV tool users are facing not only gas purity challenges but also the need for safe disposal of the hydrogen at the tool outlet. Recovery, reuse or recycling strategies could mitigate the disposal process and reduce the overall tool cost of operation. This paper will review the types of purification technologies that are currently available to generate high purity hydrogen suitable for EUV applications. Advantages and disadvantages of each purification technology will be presented. Guidelines on how to select the most appropriate technology for each application and experimental conditions will be presented. A discussion of the most common approaches utilized at the facility level to operate EUV tools along with possible hydrogen recovery strategies will also be reported.

A Search for EUV Emission from the O4f Star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1996-01-01

We obtained a 140 ks EUVE observation of the O4f star, zeta Puppis. Because of its low ISM column density and highly ionized stellar wind, a unique EUV window is accessible for viewing between 128 to 140 A, suggesting that this star may he the only O star observable with the EUVE. Although no SW spectrometer wavelength bin had a signal to noise greater than 3, a bin at 136 A had a signal to noise of 2.4. This bin is where models predict the brightest line due to OV emission should occur. We present several EUV line emission models. These models were constrained by fitting the ROSAT PSPC X-ray data and our EUVE data. If the OV emission is real, the best fits to the data suggest that there are discrepancies in our current understanding of EUV/X-ray production mechanisms. In particular, the emission measure of the EUV source is found to be much greater than the total wind emission measure, suggesting that the EUV shock must produce a very large density enhancement. In addition, the location of the EUV and X-ray shocks are found to be separated by approx. 0.3 stellar radii, but the EUV emission region is found to be approx. 400 times larger than the X-ray emission region. We also discuss the implications of a null detection and present relevant upper limits.

Solar-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

NASA Technical Reports Server (NTRS)

Doschek, George A.

2002-01-01

This Monthly Progress Report covers the reporting period August 2002 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

NASA Technical Reports Server (NTRS)

Doschek, George A.

2001-01-01

This Monthly Progress Report covers the reporting period through June 2001, Phase C/D, Detailed Design and Development Through Launch Plus Thirty Days, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

NASA Technical Reports Server (NTRS)

Doschek, George A.

2001-01-01

This Monthly Progress Report covers the reporting period July 2001 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme Ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

Experimental station for ultrafast extreme ultraviolet spectroscopy for non-equilibrium dynamics in warm dense matter

NASA Astrophysics Data System (ADS)

Lee, Jong-won; Geng, Xiaotao; Jung, Jae Hyung; Cho, Min Sang; Yang, Seong Hyeok; Jo, Jawon; Lee, Chang-lyoul; Cho, Byoung Ick; Kim, Dong-Eon

2018-07-01

Recent interest in highly excited matter generated by intense femtosecond laser pulses has led to experimental methods that directly investigate ultrafast non-equilibrium electronic and structural dynamics. We present a tabletop experimental station for the extreme ultraviolet (EUV) spectroscopy used to trace L-edge dynamics in warm dense aluminum with a temporal resolution of a hundred femtoseconds. The system consists of the EUV probe generation part via a high-order harmonic generation process of femtosecond laser pulses with atomic clusters, a beamline with high-throughput optics and a sample-refreshment system of nano-foils utilizing the full repetition rate of the probe, and a flat-field EUV spectrograph. With the accumulation of an order of a hundred shots, a clear observation of the change in the aluminum L-shell absorption was achieved with a temporal resolution of 90 fs in a 600-fs window. The signature of a non-equilibrium electron distribution over a 10-eV range and its evolution to a 1-eV Fermi distribution are observed. This demonstrates the capability of this apparatus to capture the non-equilibrium electron-hole dynamics in highly excited warm dense matter conditions.

EUV observation from the Earth-orbiting satellite, EXCEED

NASA Astrophysics Data System (ADS)

Yoshioka, K.; Murakami, G.; Yoshikawa, I.; Ueno, M.; Uemizu, K.; Yamazaki, A.

2010-01-01

An Earth-orbiting small satellite “EXtreme ultraviolet spectrosCope for ExosphEric Dynamics” (EXCEED) which will be launched in 2012 is under development. The mission will carry out spectroscopic and imaging observation of EUV (Extreme Ultraviolet: 60-145 nm) emissions from tenuous plasmas around the planets (Venus, Mars, Mercury, and Jupiter). It is essential for EUV observation to put on an observing site outside the Earth’s atmosphere to avoid the absorption. It is also essential that the detection efficiency must be very high in order to catch the faint signals from those targets. In this mission, we employ cesium iodide coated microchannel plate as a 2 dimensional photon counting devise which shows 1.5-50 times higher quantum detection efficiency comparing with the bared one. We coat the surface of the grating and entrance mirror with silicon carbides by the chemical vapor deposition method in order to archive the high diffraction efficiency and reflectivity. The whole spectrometer is shielded by the 2 mm thick stainless steel to prevent the contamination caused by the high energy electrons from the inner radiation belt. In this paper, we will introduce the mission overview, its instrument, and their performance.

Demonstration of the First 4H-SiC EUV Detector with Large Detection Area

NASA Technical Reports Server (NTRS)

Xin, Xiaobin; Yan, Feng; Koeth, Timothy W.; Hu, Jun; Zhao, Jian H.

2005-01-01

Ultraviolet (UV) and Extreme Ultraviolet (EUV) detectors are very attractive in astronomy, photolithography and biochemical applications. For EUV applications, most of the semiconductor detectors based on PN or PIN structures suffer from the very short penetration depth. Most of the carries are absorbed at the surface and recombined there due to the high surface recombination before reach the depletion region, resulting very low quantum efficiency. On the other hand, for Schottky structures, the active region starts from the surface and carriers generated from the surface can be efficiently collected. 4H-Sic has a bandgap of 3.26eV and is immune to visible light background noise. Also, 4H-Sic detectors usually have very good radiation hardness and very low noise, which is very important for space applications where the signal is very weak. The E W photodiodes presented in this paper are based on Schottky structures. Platinum (Pt) and Nickel (Ni) are selected as the Schottky contact metals, which have the highest electron work functions (5.65eV and 5.15eV, respectively) among all the known metals on 4H-Sic.

High speed reflectometer for EUV mask-blanks

NASA Astrophysics Data System (ADS)

Wies, Christian; Lebert, Rainer; Jagle, Bernhard; Juschkin, L.; Sobel, F.; Seitz, H.; Walter, Ronny; Laubis, C.; Scholze, F.; Biel, W.; Steffens, O.

2005-06-01

AIXUV GmbH and partners have developed a high speed Reflectometer for EUV mask-blanks which is fully compliant with the SEMI-standard P38 for EUV-mask-blank metrology. The system has been installed in June 2004 at SCHOTT Lithotec AG. It features high throughput, high lateral and spectral resolution, high reproducibility and low absolute uncertainty. Using AIXUV's EUV-LAMP and debris mitigation, low cost-of-ownership and high availability is expected. The spectral reflectance of up to 3 mask-blanks per hour can be measured with at least 20 spots each. The system is push button-controlled. Results are stored in CSV file format. For a spot size of 0.1x1 mm2, 2000 spectral channels of 1.6 pm bandwidth are recorded from 11.6 nm to 14.8 nm. The reflectance measurement is based on the comparison of the sample under test to two reference mirrors calibrated at the PTB radiometry laboratory at BESSY II. The three reflection spectra are recorded simultaneously. For each spot more than 107 photons are accumulated in about 20 s, providing statistical reproducibility below 0.2% RMS. The total uncertainty is below 0.5% absolute. Wavelength calibration better than 1 pm RMS over the whole spectral range is achieved by reference to NIST published wavelengths of about 100 xenon emission lines. It is consistent with the wavelength of the krypton 3d-5p absorption resonance at 13.5947 nm to better than 2 pm.

High speed reflectometer for EUV mask-blanks

NASA Astrophysics Data System (ADS)

Wies, C.; Lebert, R.; Jaegle, B.; Juschkin, L.; Sobel, F.; Seitz, H.; Walter, R.; Laubis, C.; Scholze, F.; Biel, W.; Steffens, O.

2005-05-01

AIXUV GmbH and partners have developed a high speed Reflectometer for EUV mask-blanks which is fully compliant with the SEMI-standard P38 for EUV-mask-blank metrology. The system has been installed in June 2004 at SCHOTT Lithotec AG. It features high throughput, high lateral and spectral resolution, high reproduci-bility and low absolute uncertainty. Using AIXUV's EUV-LAMP and debris mitigation, low cost-of-ownership and high availability is expected. The spectral reflectance of up to 3 mask-blanks per hour can be measured with at least 20 spots each. The system is push button-controlled. Results are stored in CSV file format. For a spot size of 0.1×1 mm2, 2000 spectral chan-nels of 1.6 pm bandwidth are recorded from 11.6 nm to 14.8 nm. The reflectance measurement is based on the comparison of the sample under test to two reference mirrors calibrated at the PTB radiometry laboratory at BESSY II. The three reflection spectra are recorded simultaneously. For each spot more than 107 photons are ac-cumulated in about 20 s, providing statistical reproducibility below 0.2 % RMS. The total uncertainty is below 0.5 % absolute. Wavelength calibration better than 1 pm RMS over the whole spectral range is achieved by refe-rence to NIST published wavelengths of about 100 xenon emission lines. It is consistent with the wavelength of the krypton 3d-5p absorption resonance at 13.5947 nm to better than 2 pm.

The extreme ultraviolet emissions of solar flares - A comparison between OSO-6 spectroheliograph observations and SFDs.

NASA Technical Reports Server (NTRS)

Donnelly, R. F.; Wood, A. T., Jr.; Noyes, R. W.

1973-01-01

The time structure and intensity of OSO-6 observations of EUV bursts were studied in relation to the corresponding 10-1030 A enhancements deduced from SFD data. Impulsive EUV emissions from lines normally emitted from either the chromosphere or from the chromosphere-corona transition region rise simultaneously with the 10-1030 A flash, to within the time resolution of the OSO-6 observations. Mg X 625 A also showed concurrent impulsive emissions and a close intensity relation to the 10-1030 A enhancement. The observational results are consistent with the hypothesis that most of the EUV radiation is being produced thermally in a region of chromospheric density, which is being heated by collisional losses of nonthermal electrons.

Production of EUV mask blanks with low killer defects

NASA Astrophysics Data System (ADS)

Antohe, Alin O.; Kearney, Patrick; Godwin, Milton; He, Long; John Kadaksham, Arun; Goodwin, Frank; Weaver, Al; Hayes, Alan; Trigg, Steve

2014-04-01

For full commercialization, extreme ultraviolet lithography (EUVL) technology requires the availability of EUV mask blanks that are free of defects. This remains one of the main impediments to the implementation of EUV at the 22 nm node and beyond. Consensus is building that a few small defects can be mitigated during mask patterning, but defects over 100 nm (SiO2 equivalent) in size are considered potential "killer" defects or defects large enough that the mask blank would not be usable. The current defect performance of the ion beam sputter deposition (IBD) tool will be discussed and the progress achieved to date in the reduction of large size defects will be summarized, including a description of the main sources of defects and their composition.

Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

NASA Astrophysics Data System (ADS)

Sizyuk, V.; Sizyuk, T.; Hassanein, A.; Johnson, K.

2018-01-01

We have developed comprehensive integrated models for detailed simulation of laser-produced plasma (LPP) and laser/target interaction, with potential recycling of the escaping laser and out-of-band plasma radiation. Recycling, i.e., returning the escaping laser and plasma radiation to the extreme ultraviolet (EUV) generation region using retroreflective mirrors, has the potential of increasing the EUV conversion efficiency (CE) by up to 60% according to our simulations. This would result in significantly reduced power consumption and/or increased EUV output. Based on our recently developed models, our High Energy Interaction with General Heterogeneous Target Systems (HEIGHTS) computer simulation package was upgraded for LPP devices to include various radiation recycling regimes and to estimate the potential CE enhancement. The upgraded HEIGHTS was used to study recycling of both laser and plasma-generated radiation and to predict possible gains in conversion efficiency compared to no-recycling LPP devices when using droplets of tin target. We considered three versions of the LPP system including a single CO2 laser, a single Nd:YAG laser, and a dual-pulse device combining both laser systems. The gains in generating EUV energy were predicted and compared for these systems. Overall, laser and radiation energy recycling showed the potential for significant enhancement in source efficiency of up to 60% for the dual-pulse system. Significantly higher CE gains might be possible with optimization of the pre-pulse and main pulse parameters and source size.

Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

NASA Astrophysics Data System (ADS)

Jindal, V.; Kearney, P.; Sohn, J.; Harris-Jones, J.; John, A.; Godwin, M.; Antohe, A.; Teki, R.; Ma, A.; Goodwin, F.; Weaver, A.; Teora, P.

2012-03-01

Extreme ultraviolet lithography (EUVL) is the leading next-generation lithography (NGL) technology to succeed optical lithography at the 22 nm node and beyond. EUVL requires a low defect density reflective mask blank, which is considered to be one of the top two critical technology gaps for commercialization of the technology. At the SEMATECH Mask Blank Development Center (MBDC), research on defect reduction in EUV mask blanks is being pursued using the Veeco Nexus deposition tool. The defect performance of this tool is one of the factors limiting the availability of defect-free EUVL mask blanks. SEMATECH identified the key components in the ion beam deposition system that is currently impeding the reduction of defect density and the yield of EUV mask blanks. SEMATECH's current research is focused on in-house tool components to reduce their contributions to mask blank defects. SEMATECH is also working closely with the supplier to incorporate this learning into a next-generation deposition tool. This paper will describe requirements for the next-generation tool that are essential to realize low defect density EUV mask blanks. The goal of our work is to enable model-based predictions of defect performance and defect improvement for targeted process improvement and component learning to feed into the new deposition tool design. This paper will also highlight the defect reduction resulting from process improvements and the restrictions inherent in the current tool geometry and components that are an impediment to meeting HVM quality EUV mask blanks will be outlined.

EUVE observations of Algol: Detection of a continuum and implications for the coronal (Fe/H) abundance

NASA Technical Reports Server (NTRS)

Stern, Robert A.; Lemen, James R.; Schmitt, Jurgen H. M. M.; Pye, John P.

1995-01-01

We report results from the first extreme ultraviolet spectrum of the prototypical eclipsing binary Algol (beta Per), obtained with the spectrometers on the Extreme Ultraviolet Explorer (EUVE). The Algol spectrum in the 80-350 A range is dominated by emission lines of Fe XVI-XXIV, and the He II 304 A line. The Fe emission is characteristic of high-temperature plasma at temperatures up to at least log T approximately 7.3 K. We have successfully modeled the observed quiescent spectrum using a continuous emission measure distribution with the bulk of the emitting material at log T greater than 6.5. We are able to adequately fit both the coronal lines and continuum data with a cosmic abundance plasma, but only if Algol's quiescent corona is dominated by material at log T greater than 7.5, which is physically ruled out by prior X-ray observations of the quiescent Algol spectrum. Since the coronal (Fe/H) abundance is the principal determinant of the line-to-continuum ratio in the EUV, allowing the abundance to be a free parameter results in models with a range of best-fit abundances approximately = 15%-40% of solar photospheric (Fe/H). Since Algol's photospheric (Fe/H) appears to be near-solar, the anomalous EUV line-to-continuum ratio could either be the result of element segregation in the coronal formation process, or other, less likely mechanisms that may enhance the continuum with respect to the lines.

Extreme ultraviolet observations of HZ 43 and the local H/He ratio with the Hopkins Ultraviolet Telescope

NASA Technical Reports Server (NTRS)

Kimble, Randy A.; Davidsen, Arthur F.; Long, Knox S.; Feldman, Paul D.

1993-01-01

We present a spectrum of the hot DA white dwarf HZ 43 in the EUV, near the 504-A ionization edge of neutral helium, obtained with the Hopkins Ultraviolet Telescope (HUT) during the 1990 December Astro-1 mission. The interstellar column densities derived from this spectrum rule out the anomalous interstellar absorption model proposed by Heise et al.(1991), which required a greater column density of neutral helium than neutral hydrogen toward HZ 43 in order to explain the low EUV flux from HZ 43 reported by EXOSAT. Instead, we find the interstellar neutral H/He ratio toward HZ 43 to be consistent with the canonical cosmic abundance ratio of 10 or with the 11.6 +/- 1.0 ratio measured by HUT along the line of sight toward another DA white dwarf, G191-B2B. The HUT observations suggest that either there is a substantial calibration error in the EXOSAT spectroscopy of HZ 43, or otherwise undetected metals in the nominally pure hydrogen HZ 43 atmosphere suppress its flux between 150 and 300 A, or both.

Study on photochemical analysis system (VLES) for EUV lithography

NASA Astrophysics Data System (ADS)

Sekiguchi, A.; Kono, Y.; Kadoi, M.; Minami, Y.; Kozawa, T.; Tagawa, S.; Gustafson, D.; Blackborow, P.

2007-03-01

A system for photo-chemical analysis of EUV lithography processes has been developed. This system has consists of 3 units: (1) an exposure that uses the Z-Pinch (Energetiq Tech.) EUV Light source (DPP) to carry out a flood exposure, (2) a measurement system RDA (Litho Tech Japan) for the development rate of photo-resists, and (3) a simulation unit that utilizes PROLITH (KLA-Tencor) to calculate the resist profiles and process latitude using the measured development rate data. With this system, preliminary evaluation of the performance of EUV lithography can be performed without any lithography tool (Stepper and Scanner system) that is capable of imaging and alignment. Profiles for 32 nm line and space pattern are simulated for the EUV resist (Posi-2 resist by TOK) by using VLES that hat has sensitivity at the 13.5nm wavelength. The simulation successfully predicts the resist behavior. Thus it is confirmed that the system enables efficient evaluation of the performance of EUV lithography processes.

The Origin of the EUV Emission in Her X-1

NASA Technical Reports Server (NTRS)

Leahy, D. A.; Marshall, H.

1999-01-01

Her X-1 exhibits a strong orbital modulation of its EUV flux with a large decrease around time of eclipse of the neutron star, and a significant dip which appears at different orbital phases at different 35-day phases. We consider observations of Her X-1 in the EUVE by the Extreme Ultraviolet Explorer (EUVE), which includes data from 1995 near the end of the Short High state, and date from 1997 at the start of the Short High state. The observed EUV lightcurve has bright and faint phases. The bright phase can be explained as the low energy tail of the soft x-ray pulse. The faint phase emission has been modeled to understand its origin. We find: the x-ray heated surface of HZ Her is too cool to produce enough emission; the accretion disk does not explain the orbital modulation; however, reflection of x-rays off of HZ Her can produce the observed lightcurve with orbital eclipses. The dip can be explained by shadowing of the companion by the accretion disk. We discuss the constraints on the accretion disk geometry derived from the observed shadowing.

Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source

NASA Astrophysics Data System (ADS)

Inoue, T.; Nica, P. E.; Kaku, K.; Shimoura, A.; Amano, S.; Miyamoto, S.; Mochizuki, T.

2006-03-01

In this paper, characterizations of a cryogenic Xe capillary jet target for a laser-produced plasma extreme ultraviolet (EUV) light source are reported. The capillary jet target is a candidate of fast-supplying targets for mitigating debris generation and target consumption in a vacuum chamber without reducing the EUV conversion efficiency. Xe capillary jets (jet velocity ~ 0.4 m/s) were generated in vacuum by using annular nozzles chilled to ~ 170 K at a Xe backing pressure of ~ 0.7 MPa. Forming mechanisms of the capillary jet targets were studied by using numerical calculations. Furthermore, laser-produced plasma EUV generation was performed by irradiating a Nd:YAG laser (1064 nm, ~ 0.5 J, 10 ns, 120 μmφ, ~ 4×10 11 W/cm2) on a Xe capillary jet target (outer / inner diameter = 100 / 70 μmφ). The angular distribution of EUV generation was approximately uniform around the Xe capillary jet target, and the peak kinetic energy of the fast-ions was evaluated to be ~ 2 keV.

The Longitudinal Properties of a Solar Energetic Particle Event Investigated Using Modern Solar Imaging

NASA Technical Reports Server (NTRS)

Rouillard, A. P.; Sheeley, N.R. Jr.; Tylka, A.; Vourlidas, A.; Ng, C. K.; Rakowski, C.; Cohen, C. M. S.; Mewaldt, R. A.; Mason, G. M.; Reames, D.;

Actinic imaging and evaluation of phase structures on EUV lithography masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mochi, Iacopo; Goldberg, Kenneth; Huh, Sungmin

2010-09-28

The authors describe the implementation of a phase-retrieval algorithm to reconstruct phase and complex amplitude of structures on EUV lithography masks. Many native defects commonly found on EUV reticles are difficult to detect and review accurately because they have a strong phase component. Understanding the complex amplitude of mask features is essential for predictive modeling of defect printability and defect repair. Besides printing in a stepper, the most accurate way to characterize such defects is with actinic inspection, performed at the design, EUV wavelength. Phase defect and phase structures show a distinct through-focus behavior that enables qualitative evaluation of themore » object phase from two or more high-resolution intensity measurements. For the first time, phase of structures and defects on EUV masks were quantitatively reconstructed based on aerial image measurements, using a modified version of a phase-retrieval algorithm developed to test optical phase shifting reticles.« less

Radiation transport in kinetic simulations and the influence of photoemission on electron current in self-sustaining discharges

DOE PAGES

Fierro, Andrew S.; Moore, Christopher Hudson; Scheiner, Brett; ...

2017-01-12

A kinetic description for electronic excitation of helium for principal quantum number nmore » $$\\leqslant $$ 4 has been included into a particle-in-cell (PIC) simulation utilizing direct simulation Monte Carlo (DSMC) for electron-neutral interactions. The excited electronic levels radiate state-dependent photons with wavelengths from the extreme ultraviolet (EUV) to visible regimes. Photon wavelengths are chosen according to a Voigt distribution accounting for the natural, pressure, and Doppler broadened linewidths. This method allows for reconstruction of the emission spectrum for a non-thermalized electron energy distribution function (EEDF) and investigation of high energy photon effects on surfaces, specifically photoemission. A parallel plate discharge with a fixed field (i.e. space charge neglected) is used to investigate the effects of including photoemission for a Townsend discharge. When operating at a voltage near the self-sustaining discharge threshold, it is observed that the electron current into the anode is higher when including photoemission from the cathode than without even when accounting for self-absorption from ground state atoms. As a result, the photocurrent has been observed to account for as much as 20% of the total current from the cathode under steady-state conditions.« less

From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Fallica, Roberto; Fan, Daniel; Karim, Waiz; Vockenhuber, Michaela; van Bokhoven, Jeroen A.; Ekinci, Yasin

2016-09-01

Extreme ultraviolet interference lithography (EUV-IL, λ = 13.5 nm) has been shown to be a powerful technique not only for academic, but also for industrial research and development of EUV materials due to its relative simplicity yet record high-resolution patterning capabilities. With EUV-IL, it is possible to pattern high-resolution periodic images to create highly ordered nanostructures that are difficult or time consuming to pattern by electron beam lithography (EBL) yet interesting for a wide range of applications such as catalysis, electronic and photonic devices, and fundamental materials analysis, among others. Here, we will show state-of the-art research performed using the EUV-IL tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). For example, using a grating period doubling method, a diffraction mask capable of patterning a world record in photolithography of 6 nm half-pitch (HP), was produced. In addition to the description of the method, we will give a few examples of applications of the technique. Well-ordered arrays of suspended silicon nanowires down to 6.5 nm linewidths have been fabricated and are to be studied as field effect transistors (FETs) or biosensors, for instance. EUV achromatic Talbot lithography (ATL), another interference scheme that utilizes a single grating, was shown to yield well-defined nanoparticles over large-areas with high uniformity presenting great opportunities in the field of nanocatalysis. EUV-IL is in addition, playing a key role in the future introduction of EUV lithography into high volume manufacturing (HVM) of semiconductor devices for the 7 and 5 nm logic node (16 nm and 13 nm HP, respectively) and beyond while the availability of commercial EUV-tools is still very much limited for research.

The Dual-channel Extreme Ultraviolet Continuum Experiment: Sounding Rocket EUV Observations of Local B Stars to Determine Their Potential for Supplying Intergalactic Ionizing Radiation

NASA Astrophysics Data System (ADS)

Erickson, Nicholas; Green, James C.; France, Kevin; Stocke, John T.; Nell, Nicholas

2018-06-01

We describe the scientific motivation and technical development of the Dual-channel Extreme Ultraviolet Continuum Experiment (DEUCE). DEUCE is a sounding rocket payload designed to obtain the first flux-calibrated spectra of two nearby B stars in the EUV 650-1150Å bandpass. This measurement will help in understanding the ionizing flux output of hot B stars, calibrating stellar models and commenting on the potential contribution of such stars to reionization. DEUCE consists of a grazing incidence Wolter II telescope, a normal incidence holographic grating, and the largest (8” x 8”) microchannel plate detector ever flown in space, covering the 650-1150Å band in medium and low resolution channels. DEUCE will launch on December 1, 2018 as NASA/CU sounding rocket mission 36.331 UG, observing Epsilon Canis Majoris, a B2 II star.

SDO/AIA AND HINODE/EIS OBSERVATIONS OF INTERACTION BETWEEN AN EUV WAVE AND ACTIVE REGION LOOPS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Liheng; Zhang, Jun; Li, Ting

2013-09-20

We present detailed analysis of an extreme-ultraviolet (EUV) wave and its interaction with active region (AR) loops observed by the Solar Dynamics Observatory/Atmospheric Imaging Assembly and the Hinode EUV Imaging Spectrometer (EIS). This wave was initiated from AR 11261 on 2011 August 4 and propagated at velocities of 430-910 km s{sup –1}. It was observed to traverse another AR and cross over a filament channel on its path. The EUV wave perturbed neighboring AR loops and excited a disturbance that propagated toward the footpoints of these loops. EIS observations of AR loops revealed that at the time of the wavemore » transit, the original redshift increased by about 3 km s{sup –1}, while the original blueshift decreased slightly. After the wave transit, these changes were reversed. When the EUV wave arrived at the boundary of a polar coronal hole, two reflected waves were successively produced and part of them propagated above the solar limb. The first reflected wave above the solar limb encountered a large-scale loop system on its path, and a secondary wave rapidly emerged 144 Mm ahead of it at a higher speed. These findings can be explained in the framework of a fast-mode magnetosonic wave interpretation for EUV waves, in which observed EUV waves are generated by expanding coronal mass ejections.« less

A Comet's Missing Light

NASA Astrophysics Data System (ADS)

Kohler, Susanna

2016-05-01

On 28 November 2013, comet C/2012 S1 better known as comet ISON should have passed within two solar radii of the Suns surface as it reached perihelion in its orbit. But instead of shining in extreme ultraviolet (EUV) wavelengths as it grazed the solar surface, the comet was never detected by EUV instruments. What happened to comet ISON?Missing EmissionWhen a sungrazing comet passes through the solar corona, it leaves behind a trail of molecules evaporated from its surface. Some of these molecules emit EUV light, which can be detected by instruments on telescopes like the space-based Solar Dynamics Observatory (SDO).Comet ISON, a comet that arrived from deep space and was predicted to graze the Suns corona in November 2013, was expected to cause EUV emission during its close passage. But analysis of the data from multiple telescopes that tracked ISON in EUV including SDO reveals no sign of it at perihelion.In a recent study, Paul Bryans and DeanPesnell, scientists from NCARs High Altitude Observatory and NASA Goddard Space Flight Center, try to determine why ISON didnt display this expected emission.Comparing ISON and LovejoyIn December 2011, another comet dipped into the Suns corona: comet Lovejoy. This image, showingthe orbit Lovejoy took around the Sun, is a composite of SDO images of the pre- and post-perihelion phases of the orbit. Click for a closer look! The dashed part of the curve represents where Lovejoy passed out of view behind the Sun. [Bryans Pesnell 2016]This is not the first time weve watched a sungrazing comet with EUV-detecting telescopes: Comet Lovejoy passed similarly close to the Sun in December 2011. But when Lovejoy grazed the solar corona, it emitted brightly in EUV. So why didnt ISON? Bryans and Pesnell argue that there are two possibilities:the coronal conditions experienced by the two comets were not similar, orthe two comets themselves were not similar.To establish which factor is the most relevant, the authors first demonstrate that both comets experienced very similar radiation fields as they passed perihelion. They also show that the properties of the Suns corona experienced by each comet like its density and magnetic field topology were roughly the same.Bryans and Pesnell argue that, as both comets appear to have encountered similar solar conditions, the most likely explanation for ISONs lack of detectable EUV emission is that it didnt deposit as much material in its orbit as Lovejoy did. They show that this would happen if ISONs nucleus were four times smaller in radius than Lovejoys, spanning a mere 5070 meters in comparison to Lovejoys 200300 meters.This conclusion is consistent with white-light observations of ISON that suggest that, though it might have started out significantly larger than Lovejoy, ISON underwent dramatic mass loss as it approached the Sun. By the time it arrived at perihelion, it was likely no longer large enough to create a strong EUV signal resulting in the non-detection of this elusive comet with SDO and other telescopes.CitationPaul Bryans and W. Dean Pesnell 2016 ApJ 822 77. doi:10.3847/0004-637X/822/2/77

Quantitative phase retrieval with arbitrary pupil and illumination

DOE PAGES

Claus, Rene A.; Naulleau, Patrick P.; Neureuther, Andrew R.; ...

2015-10-02

We present a general algorithm for combining measurements taken under various illumination and imaging conditions to quantitatively extract the amplitude and phase of an object wave. The algorithm uses the weak object transfer function, which incorporates arbitrary pupil functions and partially coherent illumination. The approach is extended beyond the weak object regime using an iterative algorithm. Finally, we demonstrate the method on measurements of Extreme Ultraviolet Lithography (EUV) multilayer mask defects taken in an EUV zone plate microscope with both a standard zone plate lens and a zone plate implementing Zernike phase contrast.

Data indexing techniques for the EUVE all-sky survey

NASA Technical Reports Server (NTRS)

Lewis, J.; Saba, V.; Dobson, C.

1992-01-01

This poster describes techniques developed for manipulating large full-sky data sets for the Extreme Ultraviolet Explorer project. The authors have adapted the quatrilateralized cubic sphere indexing algorithm to allow us to efficiently store and process several types of large data sets, such as full-sky maps of photon counts, exposure time, and count rates. A variation of this scheme is used to index sparser data such as individual photon events and viewing times for selected areas of the sky, which are eventually used to create EUVE source catalogs.

Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

DOEpatents

Kubiak, Glenn D.; Bernardez, II, Luis J.

2000-01-04

A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

Contamination control program for the Extreme Ultraviolet Explorer instruments

NASA Technical Reports Server (NTRS)

Ray, David C.; Malina, Roger F.; Welsh, Barry Y.; Austin, James D.; Teti, Bonnie Gray

1989-01-01

A contamination-control program has been instituted for the optical components of the EUV Explorer satellite, whose 80-900 A range performance is easily degraded by particulate and molecular contamination. Cleanliness requirements have been formulated for the design, fabrication, and test phases of these instruments; in addition, contamination-control steps have been taken which prominently include the isolation of sensitive components in a sealed optics cavity. Prelaunch monitoring systems encompass the use of quartz crystal microbalances, particle witness plates, direct flight hardware sampling, and optical witness sampling of EUV scattering and reflectivity.

Extreme ultraviolet (EUV) solar spectral irradiance (SSI) for ionospheric application - history and contemporary state-of-art

NASA Astrophysics Data System (ADS)

Schmidtke, G.; Jacobi, Ch.; Nikutowski, B.; Erhardt, Ch.

2014-11-01

After a historical survey of space related EUV measurements in Germany and the role of Karl Rawer in pursuing this work, we describe present developments in EUV spectroscopy and provide a brief outlook on future activities. The group of Karl Rawer has performed the first scientific space project in Western Europe on 19th October 1954. Then it was decided to include the field of solar EUV spectroscopy in ionospheric investigations. Starting in 1957 an intensified development of instrumentation was going on to explore solar EUV radiation, atmospheric airglow and auroral emissions until the institute had to stop space activities in the early nineteen-eighties. EUV spectroscopy was continued outside of the institute during eight years. This area of work was supported again by the institute developing the Auto-Calibrating Spectrometers (SolACES) for a mission on the International Space Station (ISS). After more than six years in space the instrument is still in operation. Meanwhile the work on the primary task also to validate EUV data available from other space missions has made good progress. The first results of validating those data and combine them into one set of EUV solar spectral irradiance are very promising. It will be recommended for using it by the science and application community. Moreover, a new low-cost type of an EUV spectrometer is presented for monitoring the solar EUV radiation. It shall be further developed for providing EUV-TEC data to be applied in ionospheric models replacing the Covington index F10.7. Applying these data for example in the GNSS signal evaluation a more accurate determination of GNSS receiver positions is expected for correcting the propagation delays of navigation signals traveling through the ionosphere from space to earth. - Latest results in the field of solar EUV spectroscopy are discussed, too.

EUVE/XTE orbit decay study

NASA Technical Reports Server (NTRS)

Richon, K.; Hashmall, J.; Lambertson, M.; Phillips, T.

1988-01-01

The Explorer Platform (EP) program currently comprises two missions, the Extreme Ultraviolet Explorer (EUVE) and the X-ray Timing Explorer (XTE), each of which consists of a scientific payload mounted to the EP. The EP has no orbit maintenance capability. The EP with the EUVE payload will be launched first. At the end of the EUVE mission, the spacecraft will be serviced by the Space Transportation System (STS), and the EUVE instrument will be exchanged for the XTE. The XTE mission will continue until reentry or reservicing by the STS. Because the missions will be using the EP sequentially, the orbit requirements are unusually constrained by orbit decay rates. The initial altitude must be selected so that, by the end of the EUVE mission (2.5 years), the spacecraft will have decayed to an altitude within the STS capabilities. In addition, the payload exchange must occur at an altitude that ensures meeting the minimum XTE mission lifetime (3 years) because no STS reboost will be available. Studies were performed using the Goddard Mission Analysis System to estimate the effects of mass, cross-sectional area, and solar flux on the fulfillment of mission requirements. In addition to results from these studies, conclusions are presented as to the accuracy of the Marshall Space Flight Center solar flux predictions.

EUV lithographic radiation grafting of thermo-responsive hydrogel nanostructures

NASA Astrophysics Data System (ADS)

Farquet, Patrick; Padeste, Celestino; Solak, Harun H.; Gürsel, Selmiye Alkan; Scherer, Günther G.; Wokaun, Alexander

2007-12-01

Nanostructures of the thermoresponsive poly( N-isopropyl acrylamide) (PNIPAAm) and of PNIPAAm-block-poly(acrylic acid) copolymers were produced on poly(tetrafluoroethylene-co-ethyelene) (ETFE) films using extreme ultraviolet (EUV) lithographic exposure with subsequent graft-polymerization. The phase transition of PNIPAAm nanostructures at the low critical solution temperature (LCST) at 32 °C was imaged by atomic force microscopy (AFM) phase contrast measurements in pure water. Results show a higher phase contrast for samples measured below the LCST temperature than for samples above the LCST, proving that the soft PNIPAAm hydrogel transforms into a much more compact conformation above the LCST. EUV lithographic exposures were combined with the reversible addition-fragment chain transfer (RAFT)-mediated polymerization using cyanoisopropyl dithiobenzoate (CPDB) as chain transfer agent to synthesize PNIPAAm block-copolymer nanostructures.

The Nearest Neutron Stars

NASA Technical Reports Server (NTRS)

Halpern, Jules P.

1996-01-01

Extreme Ultraviolet Explorer (EUVE) satellite observations of the Pulsar PSR J0437-4715, the Seyfert Galaxy RX J0437.4-4711, and the Geminga Pulsar are reported on. The main purpose of the PSR J0437-4715 investigation was to examine its soft X-ray flux. The 20 day EUVE observation of RX J0437.4-4711 constitutes a uniformly sampled soft X-ray light curve of a highly variable Seyfert galaxy whose power spectrum can be examined on timescales from 3 hrs. to several days. A unique aspect of the EUVE observation of RX J0437.4-4711 is its long light curve which we have used to measure the power spectrum of soft X-ray variability at low frequencies. Approximately 2100 counts were detected for the Geminga pulsar in a period of 251,000 s by the EUVE Deep Survey instrument. Geminga presents an unusually difficult problem because its multicomponent X-ray spectrum and pulse profile are indicative of a complex distribution of surface emission, and possibly a contribution from nonthermal emission as well.

Free electron lasers for 13nm EUV lithography: RF design strategies to minimise investment and operational costs

NASA Astrophysics Data System (ADS)

Keens, Simon; Rossa, Bernhard; Frei, Marcel

2016-03-01

As the semiconductor industry proceeds to develop ever better sources of extreme ultraviolet (EUV) light for photolithography applications, two distinct technologies have come to prominence: Tin-plasma and free electron laser (FEL) sources. Tin plasma sources have been in development within the industry for many years, and have been widely reported. Meanwhile, FELs represent the most promising alternative to create high power EUV frequencies and, while tin-plasma source development has been ongoing, such lasers have been continuously developed by academic institutions for use in fundamental research programmes in conjunction with universities and national scientific institutions. This paper follows developments in the field of academic FELs, and presents information regarding novel technologies, specifically in the area of RF design strategy, that may be incorporated into future industrial FEL systems for EUV lithography in order to minimize the necessary investment and operational costs. It goes on to try to assess the cost-benefit of an alternate RF design strategy, based upon previous studies.

The constitution of the atmospheric layers and the extreme ultraviolet spectrum of hot hydrogen-rich white dwarfs

NASA Technical Reports Server (NTRS)

Vennes, Stephane

1992-01-01

An analysis is presented of the atmospheric properties of hot, H-rich, DA white dwarfs that is based on optical, UV, and X-ray observations aimed at predicting detailed spectral properties of these stars in the range 80-800 A. The divergences between observations from a sample of 15 hot DA white dwarfs emitting in the EUV/soft X-ray range and pure H synthetic spectra calculated from a grid of model atmospheres characterized by Teff and g are examined. Seven out of 15 DA stars are found to consistently exhibit pure hydrogen atmospheres, the remaining seven stars showing inconsistency between FUV and EUV/soft X-ray data that can be explained by the presence of trace EUV/soft X-ray absorbers. Synthetic data are computed assuming two other possible chemical structures: photospheric traces of radiatively levitated heavy elements and a stratified hydrogen/helium distribution. Predictions about forthcoming medium-resolution observations of the EUV spectrum of selected hot H-rich white dwarfs are made.

How active was solar cycle 22?

NASA Technical Reports Server (NTRS)

Hoegy, W. R.; Pesnell, W. D.; Woods, T. N.; Rottman, G. J.

1993-01-01

Solar EUV observations from the Langmuir probe on Pioneer Venus Orbiter suggest that at EUV wavelengths solar cycle 22 was more active than solar cycle 21. The Langmuir probe, acting as a photodiode, measured the integrated solar EUV flux over a 13 1/2 year period from January 1979 to June 1992, the longest continuous solar EUV measurement. The Ipe EUV flux correlated very well with the SME measurement of L-alpha during the lifetime of SME and with the UARS SOLSTICE L-alpha from October 1991 to June 1992 when the Ipe measurement ceased. Starting with the peak of solar cycle 21, there was good general agreement of Ipe EUV with the 10.7 cm, Ca K, and He 10830 solar indices, until the onset of solar cycle 22. From 1989 to the start of 1992, the 10.7 cm flux exhibited a broad maximum consisting of two peaks of nearly equal magnitude, whereas Ipe EUV exhibited a strong increase during this time period making the second peak significantly higher than the first. The only solar index that exhibits the same increase in solar activity as Ipe EUV and L-alpha during the cycle 22 peak is the total magnetic flux. The case for high activity during this peak is also supported by the presence of very high solar flare intensity.

Photoluminescence emission spectra of Makrofol® DE 1-1 upon irradiation with ultraviolet radiation

NASA Astrophysics Data System (ADS)

El Ghazaly, M.; Aydarous, Abdulkadir

Photoluminescence (PL) emission spectra of Makrofol® DE 1-1 (bisphenol-A based polycarbonate) upon irradiation with ultraviolet radiation of different wavelengths were investigated. The absorption-and attenuation coefficient measurements revealed that the Makrofol® DE 1-1 is characterized by high absorbance in the energy range 6.53-4.43 eV but for a lower energy than 4.43 eV, it is approximately transparent. Makrofol® DE 1-1 samples were irradiated with ultraviolet radiation of wavelength in the range from 250 (4.28 eV) to 400 (3.10 eV) nm in step of 10 nm and the corresponding photoluminescence (PL) emission spectra were measured with a spectrofluorometer. It is found that the integrated counts and the peak height of the photoluminescence emission (PL) bands are strongly correlated with the ultraviolet radiation wavelength. They are increased at the ultraviolet radiation wavelength 280 nm and have maximum at 290 nm, thereafter they decrease and diminish at 360 nm of ultraviolet wavelength. The position of the PL emission band peak was red shifted starting from 300 nm, which increased with the increase the ultraviolet radiation wavelength. The PL bandwidth increases linearly with the increase of the ultraviolet radiation wavelength. When Makrofol® DE 1-1 is irradiated with ultraviolet radiation of short wavelength (UVC), the photoluminescence emission spectra peaks also occur in the UVC but of a relatively longer wavelength. The current new findings should be considered carefully when using Makrofol® DE 1-1 in medical applications related to ultraviolet radiation.

DIFFRACTION, REFRACTION, AND REFLECTION OF AN EXTREME-ULTRAVIOLET WAVE OBSERVED DURING ITS INTERACTIONS WITH REMOTE ACTIVE REGIONS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shen Yuandeng; Liu Yu; Zhao Ruijuan

2013-08-20

We present observations of the diffraction, refraction, and reflection of a global extreme-ultraviolet (EUV) wave propagating in the solar corona. These intriguing phenomena are observed when the wave interacts with two remote active regions, and together they exhibit properties of an EUV wave. When the wave approached AR11465, it became weaker and finally disappeared in the active region, but a few minutes later a new wavefront appeared behind the active region, and it was not concentric with the incoming wave. In addition, a reflected wave was also simultaneously observed on the wave incoming side. When the wave approached AR11459, itmore » transmitted through the active region directly and without reflection. The formation of the new wavefront and the transmission could be explained with diffraction and refraction effects, respectively. We propose that the different behaviors observed during the interactions may be caused by different speed gradients at the boundaries of the two active regions. We find that the EUV wave formed ahead of a group of expanding loops a few minutes after the start of the loops' expansion, which represents the initiation of the associated coronal mass ejection (CME). Based on these results, we conclude that the EUV wave should be a nonlinear magnetosonic wave or shock driven by the associated CME, which propagated faster than the ambient fast mode speed and gradually slowed down to an ordinary linear wave. Our observations support the hybrid model that includes both fast wave and slow non-wave components.« less

Results from a new 193nm die-to-database reticle inspection platform

NASA Astrophysics Data System (ADS)

Broadbent, William H.; Alles, David S.; Giusti, Michael T.; Kvamme, Damon F.; Shi, Rui-fang; Sousa, Weston L.; Walsh, Robert; Xiong, Yalin

2010-05-01

A new 193nm wavelength high resolution reticle defect inspection platform has been developed for both die-to-database and die-to-die inspection modes. In its initial configuration, this innovative platform has been designed to meet the reticle qualification requirements of the IC industry for the 22nm logic and 3xhp memory generations (and shrinks) with planned extensions to the next generation. The 22nm/3xhp IC generation includes advanced 193nm optical lithography using conventional RET, advanced computational lithography, and double patterning. Further, EUV pilot line lithography is beginning. This advanced 193nm inspection platform has world-class performance and the capability to meet these diverse needs in optical and EUV lithography. The architecture of the new 193nm inspection platform is described. Die-to-database inspection results are shown on a variety of reticles from industry sources; these reticles include standard programmed defect test reticles, as well as advanced optical and EUV product and product-like reticles. Results show high sensitivity and low false and nuisance detections on complex optical reticle designs and small feature size EUV reticles. A direct comparison with the existing industry standard 257nm wavelength inspection system shows measurable sensitivity improvement for small feature sizes

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

2016-07-01

Extreme ultraviolet lithography (EUVL, λ=13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high-power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity [S or best energy (BE)], and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (line width roughness, resolution and sensitivity trade-off) among these parameters for chemically amplified resists (CARs). We present early proof-of-principle results for a multiexposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a "Photosensitized Chemically Amplified Resist™" (PSCAR™). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV-flood exposure (λ=365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR, and EL high-performance requirements with the aim of resolving line space (L/S) features for the 7- and 5-nm logic node [16- and 13-nm half-pitch (HP), respectively] for HVM. Several CARs were additionally found to be well resolved down to 12- and 11-nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated was compared to the CAR performance at and below 16-nm HP resolution, demonstrating the need for alternative resist solutions at 13-nm resolution and below. EUV interference lithography (IL) has provided and continues to provide a simple yet powerful platform for academic and industrial research, enabling the characterization and development of resist materials before commercial EUV exposure tools become available. Our experiments have been performed at the EUV-IL set-up in the Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI).

Nanoscale inhomogeneity and photoacid generation dynamics in extreme ultraviolet resist materials

NASA Astrophysics Data System (ADS)

Wu, Ping-Jui; Wang, Yu-Fu; Chen, Wei-Chi; Wang, Chien-Wei; Cheng, Joy; Chang, Vencent; Chang, Ching-Yu; Lin, John; Cheng, Yuan-Chung

2018-03-01

The development of extreme ultraviolet (EUV) lithography towards the 22 nm node and beyond depends critically on the availability of resist materials that meet stringent control requirements in resolution, line edge roughness, and sensitivity. However, the molecular mechanisms that govern the structure-function relationships in current EUV resist systems are not well understood. In particular, the nanoscale structures of the polymer base and the distributions of photoacid generators (PAGs) should play a critical roles in the performance of a resist system, yet currently available models for photochemical reactions in EUV resist systems are exclusively based on homogeneous bulk models that ignore molecular-level details of solid resist films. In this work, we investigate how microscopic molecular organizations in EUV resist affect photoacid generations in a bottom-up approach that describes structure-dependent electron-transfer dynamics in a solid film model. To this end, molecular dynamics simulations and stimulated annealing are used to obtain structures of a large simulation box containing poly(4-hydroxystyrene) (PHS) base polymers and triphenylsulfonium based PAGs. Our calculations reveal that ion-pair interactions govern the microscopic distributions of the polymer base and PAG molecules, resulting in a highly inhomogeneous system with nonuniform nanoscale chemical domains. Furthermore, the theoretical structures were used in combination of quantum chemical calculations and the Marcus theory to evaluate electron transfer rates between molecular sites, and then kinetic Monte Carlo simulations were carried out to model electron transfer dynamics with molecular structure details taken into consideration. As a result, the portion of thermalized electrons that are absorbed by the PAGs and the nanoscale spatial distribution of generated acids can be estimated. Our data reveal that the nanoscale inhomogeneous distributions of base polymers and PAGs strongly affect the electron transfer and the performance of the resist system. The implications to the performances of EUV resists and key engineering requirements for improved resist systems will also be discussed in this work. Our results shed light on the fundamental structure dependence of photoacid generation and the control of the nanoscale structures as well as base polymer-PAG interactions in EVU resist systems, and we expect these knowledge will be useful for the future development of improved EUV resist systems.

EUV mask manufacturing readiness in the merchant mask industry

NASA Astrophysics Data System (ADS)

Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

2017-10-01

As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for the broadest community possible as the technology is implemented first within and then beyond the initial early adopters.

A volume-limited ROSAT survey of extreme ultraviolet emission from all nondegenerate stars within 10 parsecs

NASA Technical Reports Server (NTRS)

Wood, Brian E.; Brown, Alexander; Linsky, Jeffrey L.; Kellett, Barry J.; Bromage, Gordon E.; Hodgkin, Simon T.; Pye, John P.

1994-01-01

We report the results of a volume-limited ROSAT Wide Field Camera (WFC) survey of all nondegenerate stars within 10 pc. Of the 220 known star systems within 10 pc, we find that 41 are positive detections in at least one of the two WFC filter bandpasses (S1 and S2), while we consider another 14 to be marginal detections. We compute X-ray luminosities for the WFC detections using Einstein Imaging Proportional Counter (IPC) data, and these IPC luminosities are discussed along with the WFC luminosities throughout the paper for purposes of comparison. Extreme ultraviolet (EUV) luminosity functions are computed for single stars of different spectral types using both S1 and S2 luminosities, and these luminosity functions are compared with X-ray luminosity functions derived by previous authors using IPC data. We also analyze the S1 and S2 luminosity functions of the binary stars within 10 pc. We find that most stars in binary systems do not emit EUV radiation at levels different from those of single stars, but there may be a few EUV-luminous multiple-star systems which emit excess EUV radiation due to some effect of binarity. In general, the ratio of X-ray luminosity to EUV luminosity increases with increasing coronal emission, suggesting that coronally active stars have higher coronal temperatures. We find that our S1, S2, and IPC luminosities are well correlated with rotational velocity, and we compare activity-rotation relations determined using these different luminosities. Late M stars are found to be significantly less luminous in the EUV than other late-type stars. The most natural explanation for this results is the concept of coronal saturation -- the idea that late-type stars can emit only a limited fraction of their total luminosity in X-ray and EUV radiation, which means stars with very low bolometric luminosities must have relatively low X-ray and EUV luminosities as well. The maximum level of coronal emission from stars with earlier spectral types is studied also. To understand the saturation levels for these stars, we have compiled a large number of IPC luminosities for stars with a wide variety of spectral types and luminosity classes. We show quantitatively that if the Sun were completely covered with X-ray-emitting coronal loops, it would be near the saturation limit implied by this compilation, supporting the idea that stars near upper limits in coronal activity are completely covered with active regions.

New Views of the Solar Corona from STEREO and SDO

NASA Astrophysics Data System (ADS)

Vourlidas, A.

2012-01-01

In the last few years, we have been treated to an unusual visual feast of solar observations of the corona in EUV wavelengths. The observations from the two vantage points of STEREO/SECCHI are now capturing the entire solar atmosphere simultaneously in four wavelengths. The SDO/AIA images provide us with arcsecond resolution images of the full visible disk in ten wavelengths. All these data are captured with cadences of a few seconds to a few minutes. In this talk, I review some intriguing results from our first attempts to deal with these observations which touch upon the problems of coronal mass ejection initiation and solar wind generation. I will also discuss data processing techniques that may help us recover even more information from the images. The talk will contain a generous portion of beautiful EUV images and movies of the solar corona.

Absorption and emission of single attosecond light pulses in an autoionizing gaseous medium dressed by a time-delayed control field

NASA Astrophysics Data System (ADS)

Chu, Wei-Chun; Lin, C. D.

2013-01-01

An extreme ultraviolet (EUV) single attosecond pulse passing through a laser-dressed dense gas is studied theoretically. The weak EUV pulse pumps the helium gas from the ground state to the 2s2p(1P) autoionizing state, which is coupled to the 2s2(1S) autoionizing state by a femtosecond infrared laser with the intensity in the order of 1012 W/cm2. The simulation shows how the transient absorption and emission of the EUV are modified by the coupling laser. A simple analytical expression for the atomic response derived for δ-function pulses reveals the strong modification of the Fano lineshape in the spectra, where these features are quite universal and remain valid for realistic pulse conditions. We further account for the propagation of pulses in the medium and show that the EUV signal at the atomic resonance can be enhanced in the gaseous medium by more than 50% for specifically adjusted laser parameters, and that this enhancement persists as the EUV propagates in the gaseous medium. Our result demonstrates the high-level control of nonlinear optical effects that are achievable with attosecond pulses.

The Fundamental Physical Processes Producing and Controlling Stellar Coronal/Transition Region/Chromospheric Activity and Structure

NASA Technical Reports Server (NTRS)

Ayres, T. R.; Brown, A.

2000-01-01

Our LTSA (Long Term Space Astrophysics) research has utilized current NASA and ESA spacecraft, supporting ground-based IR, radio, and sub-mm telescopes, and the extensive archives of HST (Hubble Space Telescope), IUE (International Ultraviolet Explorer), ROSAT, EUVE (Extreme Ultraviolet Explorer), and other missions. Our research effort has included observational work (with a nonnegligible groundbased component), specialized processing techniques for imaging and spectral data, and semiempirical modelling, ranging from optically thin emission measure studies to simulations of optically thick resonance lines. In our previous LTSA efforts, we have had a number of major successes, including most recently: organizing and carrying out an extensive cool star UV survey in HST cycle eight; obtaining observing time with new instruments, such as Chandra and XMM (X-ray Multi-Mirror) in their first cycles; collaborating with the Chandra GTO program and participating with the Chandra Emission Line Project on multi-wavelength observations of HR 1099 and Capella. These are the main broad-brush themes of our previous investigation: a) Where do Coronae Occur in the Hertzsprung-Russell Diagram? b) Winds of Coronal and Noncoronal Stars; c) Activity, Age, Rotation Relations; d) Atmospheric Inhomogeneities; e) Heating Mechanisms, Subcoronal Flows, and Flares; f) Development of Analysis and Modelling Tools.

SiC-based Photo-detectors for UV, VUV, EUV and Soft X-ray Detection

NASA Technical Reports Server (NTRS)

Yan, Feng

2006-01-01

A viewgraph presentation describing an ideal Silicon Carbide detector for ultraviolet, vacuum ultraviolet, extreme ultraviolet and soft x-ray detection is shown. The topics include: 1) An ideal photo-detector; 2) Dark current density of SiC photodiodes at room temperature; 3) Dark current in SiC detectors; 4) Resistive and capacitive feedback trans-impedance amplifier; 5) Avalanche gain; 6) Excess noise; 7) SNR in single photon counting mode; 8) Structure of SiC single photon counting APD and testing structure; 9) Single photon counting waveform and testing circuit; 10) Amplitude of SiC single photon counter; 11) Dark count of SiC APD photon counters; 12) Temperature-dependence of dark count rate; 13) Reduce the dark count rate by reducing the breakdown electric field; 14) Spectrum range for SiC detectors; 15) QE curves of Pt/4H-SiC photodiodes; 16) QE curve of SiC; 17) QE curves of SiC photodiode vs. penetration depth; 18) Visible rejection of SiC photodiodes; 19) Advantages of SiC photodiodes; 20) Competitors of SiC detectors; 21) Extraterrestrial solar spectra; 22) Visible-blind EUV detection; 23) Terrestrial solar spectra; and 24) Less than 1KeV soft x-ray detection.

Surface modification of polymers for biocompatibility via exposure to extreme ultraviolet radiation.

PubMed

Inam Ul Ahad; Bartnik, Andrzej; Fiedorowicz, Henryk; Kostecki, Jerzy; Korczyc, Barbara; Ciach, Tomasz; Brabazon, Dermot

2014-09-01

Polymeric biomaterials are being widely used for the treatment of various traumata, diseases and defects in human beings due to ease in their synthesis. As biomaterials have direct interaction with the extracellular environment in the biological world, biocompatibility is a topic of great significance. The introduction or enhancement of biocompatibility in certain polymers is still a challenge to overcome. Polymer biocompatibility can be controlled by surface modification. Various physical and chemical methods (e.g., chemical and plasma treatment, ion implantation, and ultraviolet irradiation etc.) are in use or being developed for the modification of polymer surfaces. However an important limitation in their employment is the alteration of bulk material. Different surface and bulk properties of biomaterials are often desirable for biomedical applications. Because extreme ultraviolet (EUV) radiation penetration is quite limited even in low density mediums, it could be possible to use it for surface modification without influencing the bulk material. This article reviews the degree of biocompatibility of different polymeric biomaterials being currently employed in various biomedical applications, the surface properties required to be modified for biocompatibility control, plasma and laser ablation based surface modification techniques, and research studies indicating possible use of EUV for enhancing biocompatibility. © 2013 Wiley Periodicals, Inc.

Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aquila, Andrew Lee

The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes themore » design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs described in this thesis can be extended to higher photon energies, and such designs can be used with those sources to enable new scientific studies, such as molecular bonding, phonon, and spin dynamics.« less

Nanoimaging using soft X-ray and EUV laser-plasma sources

NASA Astrophysics Data System (ADS)

Wachulak, Przemyslaw; Torrisi, Alfio; Ayele, Mesfin; Bartnik, Andrzej; Czwartos, Joanna; Węgrzyński, Łukasz; Fok, Tomasz; Fiedorowicz, Henryk

2018-01-01

In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial resolution and short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range and produces an imprint of the internal structure of the imaged sample in a thin layer of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly for biological samples (CT26 fibroblast cells and Keratinocytes) are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

Data Impact of the DMSP F18 SSULI UV Data on the Operational GAIM Model

NASA Astrophysics Data System (ADS)

Dandenault, P. B.; Metzler, C. A.; Nicholas, A. C.; Coker, C.; Budzien, S. A.; Chua, D. H.; Finne, T. T.; Dymond, K.; Walker, P. W.; Schunk, R. W.; Scherliess, L.; Gardner, L. C.

2011-12-01

The Naval Research Laboratory (NRL) has developed five ultraviolet remote sensing instruments for the United States Air Force (USAF) Defense Meteorological Satellite Program (DMSP). The DMSP satellites are launched in a near-polar, sun-synchronous orbit at an altitude of approximately 830 km. Each Special Sensor Ultraviolet Limb Imager (SSULI) instrument measures vertical profiles of the natural airglow radiation from atoms, molecules and ions in the upper atmosphere and ionosphere by viewing the earth's limb within a tangent altitude range of approximately 50 km to 750 km. Limb observations are made from the extreme ultraviolet (EUV) to the far ultraviolet (FUV) over the wavelength range of 80 nm to 170 nm, with 1.8 nm resolution. Data products from SSULI observations include nightglow and dayglow Sensor Data Records (SDRs), as well as Environmental Data Records (EDRs) which contain vertical profiles of electron (Ne) densities, N2, O2, O, O+, and Temperature, hmF2, NmF2 and vertical Total Electron Content (TEC). On October 18, 2009, the third SSULI sensor launched from Vandenberg Air Force Base aboard the DMSP F18 spacecraft. The Calibration and Validation of the F18 instrument has completed and the SSULI program is scheduled to go operational at the Air Force Weather Agency (AFWA) in Fall 2011. The SSULI F18 data are ingested by the Global Assimilation of Ionospheric Measurements (GAIM) space weather model, which was developed by Utah State University and has been used operationally at AFWA since February 2006. A brief overview of the SSULI F18 SDR data assimilation process with GAIM is provided and the impact of the SSULI 1356 Å emission on the GAIM model is examined for spring and summer 2011 nightside data in the low-latitude region.

Manufacturability improvements in EUV resist processing toward NXE:3300 processing

NASA Astrophysics Data System (ADS)

Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Anne-Marie; Shimura, Satoru

2014-03-01

As the design rule of semiconductor process gets finer, extreme ultraviolet lithography (EUVL) technology is aggressively studied as a process for 22nm half pitch and beyond. At present, the studies for EUV focus on manufacturability. It requires fine resolution, uniform, smooth patterns and low defectivity, not only after lithography but also after the etch process. In the first half of 2013, a CLEAN TRACKTM LITHIUS ProTMZ-EUV was installed at imec for POR development in preparation of the ASML NXE:3300. This next generation coating/developing system is equipped with state of the art defect reduction technology. This tool with advanced functions can achieve low defect levels. This paper reports on the progress towards manufacturing defectivity levels and latest optimizations towards the NXE:3300 POR for both lines/spaces and contact holes at imec.

The Development of a New Model of Solar EUV Irradiance Variability

NASA Technical Reports Server (NTRS)

Warren, Harry; Wagner, William J. (Technical Monitor)

2002-01-01

The goal of this research project is the development of a new model of solar EUV (Extreme Ultraviolet) irradiance variability. The model is based on combining differential emission measure distributions derived from spatially and spectrally resolved observations of active regions, coronal holes, and the quiet Sun with full-disk solar images. An initial version of this model was developed with earlier funding from NASA. The new version of the model developed with this research grant will incorporate observations from SoHO as well as updated compilations of atomic data. These improvements will make the model calculations much more accurate.

A preliminary estimate of the EUVE cumulative distribution of exposure time on the unit sphere. [Extreme Ultra-Violet Explorer

NASA Technical Reports Server (NTRS)

Tang, C. C. H.

1984-01-01

A preliminary study of an all-sky coverage of the EUVE mission is given. Algorithms are provided to compute the exposure of the celestial sphere under the spinning telescopes, taking into account that during part of the exposure time the telescopes are blocked by the earth. The algorithms are used to give an estimate of exposure time at different ecliptic latitudes as a function of the angle of field of view of the telescope. Sample coverage patterns are also given for a 6-month mission.

Photon-counting array detectors for space and ground-based studies at ultraviolet and vacuum ultraviolet /VUV/ wavelengths

NASA Technical Reports Server (NTRS)

Timothy, J. G.; Bybee, R. L.

1981-01-01

The Multi-Anode Microchannel Arrays (MAMAs) are a family of photoelectric photon-counting array detectors, with formats as large as (256 x 1024)-pixels that can be operated in a windowless configuration at vacuum ultraviolet (VUV) and soft X-ray wavelengths or in a sealed configuration at ultraviolet and visible wavelengths. This paper describes the construction and modes of operation of (1 x 1024)-pixel and (24 x 1024)-pixel MAMA detector systems that are being built and qualified for use in sounding-rocket spectrometers for solar and stellar observations at wavelengths below 1300 A. The performance characteristics of the MAMA detectors at ultraviolet and VUV wavelengths are also described.

Ultraviolet Spectroscopy of the Surfaces of the Inner Icy Saturnian Satellites

NASA Astrophysics Data System (ADS)

Hendrix, A. R.; Hansen, C. J.

2008-12-01

The Cassini mission has provided a unique opportunity to make high-resolution, multi-spectral measurements of Saturn's icy moons, to investigate their surface compositions, processes and evolution. Here we present results from the Ultraviolet Imaing Spectrograph (UVIS). This instrument allows for the first measurements of the icy satellites in the extreme ultraviolet (EUV) to far-ultraviolet (FUV) wavelength range. The icy satellites of the Saturn system exhibit a remarkable amount of variability: Dark, battered Phoebe orbiting at a distant 200 RS, black-and-white Iapetus, the wispy streaks of Dione, cratered Rhea and Mimas, bright Tethys and geologically active Enceladus. Phoebe, Iapetus and Hyperion all orbit largely outside Saturn's magnetosphere, while the inner icy satellites Mimas, Enceladus, Dione Tethys and Rhea all orbit within the magnetosphere. Furthermore, the inner icy satellites all orbit within the E-ring - so the extent of exogenic effects on these icy satellites is wide-ranging. We present an overview of UVIS results from Tethys, Dione, Mimas, Enceladus and Rhea, focusing on surface investigations. We expect that the UV signatures of these icy satellites are strongly influenced not only by their water ice composition, but by external effects and magnetospheric environments. We study the FUV reflectance spectra to learn about the surface composition, map out water ice grain size variations, investigate effects of coating by E-ring grains, examine disk-resolved and hemispheric compositional and brightness variations, and investigate the presence of radiation products. This is new work: FUV spectra of surfaces have not been well-studied in the past. Spectra of the inner icy moons have been used to better develop spectral models, to further understand existing lab data of water ice and to help with understanding instrument performance. Analysis is challenged by a lack of laboratory data in this wavelength region, but intriguing results are being found. We find that the FUV albedo is a critical tie- point to understand the composition of these moons -- important absorptions occur in the NUV-visible region. We present disk-integrated hemispherical reflectance spectra, and show that while Tethys and Dione exhibit strong UV leading-trailing differences, Mimas, Enceladus and Rhea do not. In the UV, Mimas is nearly as bright as Enceladus. Tethys is surprisingly dark in the UV. The visible-wavelength leading-trailing hemisphere albedo differences can be attributed to coating by E-ring grains; in the UV, a process appears to darken the trailing hemisphere of Tethys. We also investigate disk-resolved Enceladus spectra to understand spectral differences between the south polar tiger stripe region and elsewhere on the surface.

VUV Testing of Science Cameras at MSFC: QE Measurement of the CLASP Flight Cameras

NASA Technical Reports Server (NTRS)

Champey, Patrick; Kobayashi, Ken; Winebarger, Amy; Cirtain, Jonathan; Hyde, David; Robertson, Bryan; Beabout, Brent; Beabout, Dyana; Stewart, Mike

2015-01-01

The NASA Marshall Space Flight Center (MSFC) has developed a science camera suitable for sub-orbital missions for observations in the UV, EUV and soft X-ray. Six cameras were built and tested for the Chromospheric Lyman-Alpha Spectro-Polarimeter (CLASP), a joint National Astronomical Observatory of Japan (NAOJ) and MSFC sounding rocket mission. The CLASP camera design includes a frame-transfer e2v CCD57-10 512x512 detector, dual channel analog readout electronics and an internally mounted cold block. At the flight operating temperature of -20 C, the CLASP cameras achieved the low-noise performance requirements (less than or equal to 25 e- read noise and greater than or equal to 10 e-/sec/pix dark current), in addition to maintaining a stable gain of approximately equal to 2.0 e-/DN. The e2v CCD57-10 detectors were coated with Lumogen-E to improve quantum efficiency (QE) at the Lyman- wavelength. A vacuum ultra-violet (VUV) monochromator and a NIST calibrated photodiode were employed to measure the QE of each camera. Four flight-like cameras were tested in a high-vacuum chamber, which was configured to operate several tests intended to verify the QE, gain, read noise, dark current and residual non-linearity of the CCD. We present and discuss the QE measurements performed on the CLASP cameras. We also discuss the high-vacuum system outfitted for testing of UV and EUV science cameras at MSFC.

VUV testing of science cameras at MSFC: QE measurement of the CLASP flight cameras

NASA Astrophysics Data System (ADS)

Champey, P.; Kobayashi, K.; Winebarger, A.; Cirtain, J.; Hyde, D.; Robertson, B.; Beabout, B.; Beabout, D.; Stewart, M.

2015-08-01

The NASA Marshall Space Flight Center (MSFC) has developed a science camera suitable for sub-orbital missions for observations in the UV, EUV and soft X-ray. Six cameras were built and tested for the Chromospheric Lyman-Alpha Spectro-Polarimeter (CLASP), a joint MSFC, National Astronomical Observatory of Japan (NAOJ), Instituto de Astrofisica de Canarias (IAC) and Institut D'Astrophysique Spatiale (IAS) sounding rocket mission. The CLASP camera design includes a frame-transfer e2v CCD57-10 512 × 512 detector, dual channel analog readout and an internally mounted cold block. At the flight CCD temperature of -20C, the CLASP cameras exceeded the low-noise performance requirements (<= 25 e- read noise and <= 10 e- /sec/pixel dark current), in addition to maintaining a stable gain of ≍ 2.0 e-/DN. The e2v CCD57-10 detectors were coated with Lumogen-E to improve quantum efficiency (QE) at the Lyman- wavelength. A vacuum ultra-violet (VUV) monochromator and a NIST calibrated photodiode were employed to measure the QE of each camera. Three flight cameras and one engineering camera were tested in a high-vacuum chamber, which was configured to operate several tests intended to verify the QE, gain, read noise and dark current of the CCD. We present and discuss the QE measurements performed on the CLASP cameras. We also discuss the high-vacuum system outfitted for testing of UV, EUV and X-ray science cameras at MSFC.

Contamination of grazing incidence EUV mirrors - An assessment

NASA Technical Reports Server (NTRS)

Osantowski, John F.; Fleetwood, C. F.

1988-01-01

Contamination assessment for space optical systems requires an understanding of the sensitivity of component performance, e.g. mirror reflectance, to materials deposited on the mirror surface. In a previous study, the sensitivity of typical normal incidence mirror coatings to surface deposits of generic hydrocarbons was reported. Recent activity in the development of grazing incidence telescopes for extreme ultraviolet space astronomy has stimulated the need for a similar assessment in the spectral region extending from approximately 100 A to 1000 A. The model used for analysis treats the contamination layer as a continuous thin film deposited on the mirror surface. The mirror surfaces selected for this study are opaque vacuum deposited gold and the uncoated and polished Zerodur. Scatter caused by film irregularities or particulates are not included in this assessment. Parametric evaluations at 100, 500, and 1000 A determine the sensitivity of mirror reflectance to a range of optical constants selected for the generic contaminants. This sensitivity analysis combined with the limited amount of optical data in the EUV for hydrocarbons, is used to select representative optical constants for the three wavelength regions. Reflectance versus contamination layer thickness curves are then calculated and used to determine critical thickness limits based on allowable reflectance change. Initial observations indicate that thickness limits will be highly dependent on the real part of the complex index of refraction of the contaminant film being less than 1.0. Preliminary laboratory measurements of samples contaminated with some commonly encountered hydrocarbons confirm trends indicated in the analytical studies.

EUVS Sounding Rocket Payload

NASA Technical Reports Server (NTRS)

Stern, Alan S.

1996-01-01

During the first half of this year (CY 1996), the EUVS project began preparations of the EUVS payload for the upcoming NASA sounding rocket flight 36.148CL, slated for launch on July 26, 1996 to observe and record a high-resolution (approx. 2 A FWHM) EUV spectrum of the planet Venus. These preparations were designed to improve the spectral resolution and sensitivity performance of the EUVS payload as well as prepare the payload for this upcoming mission. The following is a list of the EUVS project activities that have taken place since the beginning of this CY: (1) Applied a fresh, new SiC optical coating to our existing 2400 groove/mm grating to boost its reflectivity; (2) modified the Ranicon science detector to boost its detective quantum efficiency with the addition of a repeller grid; (3) constructed a new entrance slit plane to achieve 2 A FWHM spectral resolution; (4) prepared and held the Payload Initiation Conference (PIC) with the assigned NASA support team from Wallops Island for the upcoming 36.148CL flight (PIC held on March 8, 1996; see Attachment A); (5) began wavelength calibration activities of EUVS in the laboratory; (6) made arrangements for travel to WSMR to begin integration activities in preparation for the July 1996 launch; (7) paper detailing our previous EUVS Venus mission (NASA flight 36.117CL) published in Icarus (see Attachment B); and (8) continued data analysis of the previous EUVS mission 36.137CL (Spica occultation flight).

Performance of the Multi-Spectral Solar Telescope Array. III - Optical characteristics of the Ritchey-Chretien and Cassegrain telescopes

NASA Astrophysics Data System (ADS)

Hoover, Richard B.; Baker, Phillip C.; Hadaway, James B.; Johnson, R. B.; Peterson, Cynthia; Gabardi, David R.; Walker, Arthur B., Jr.; Lindblom, J. F.; Deforest, Craig; O'Neal, R. H.

1991-12-01

The Multi-Spectral Solar Telescope Array (MSSTA), which is a sounding-rocket-borne observatory for investigating the sun in the soft X-ray/EUV and FUV regimes of the electromagnetic spectrum, utilizes single reflection multilayer coated Herschelian telescopes for wavelengths below 100 A, and five doubly reflecting multilayer coated Ritchey-Chretien and two Cassegrain telescopes for selected wavelengths in the EUV region between 100 and 1000 A. The paper discusses the interferometric alignment, testing, focusing, visible light testing, and optical performance characteristics of the Ritchey-Chretien and Cassegrain telescopes of MSSTA. A schematic diagram of the MSSTA Ritchey-Chretien telescope is presented together with diagrams of the system autocollimation testing.

Method to adjust multilayer film stress induced deformation of optics

DOEpatents

Spiller, Eberhard A.; Mirkarimi, Paul B.; Montcalm, Claude; Bajt, Sasa; Folta, James A.

2000-01-01

Stress compensating systems that reduces/compensates stress in a multilayer without loss in reflectivity, while reducing total film thickness compared to the earlier buffer-layer approach. The stress free multilayer systems contain multilayer systems with two different material combinations of opposite stress, where both systems give good reflectivity at the design wavelengths. The main advantage of the multilayer system design is that stress reduction does not require the deposition of any additional layers, as in the buffer layer approach. If the optical performance of the two systems at the design wavelength differ, the system with the poorer performance is deposited first, and then the system with better performance last, thus forming the top of the multilayer system. The components for the stress reducing layer are chosen among materials that have opposite stress to that of the preferred multilayer reflecting stack and simultaneously have optical constants that allow one to get good reflectivity at the design wavelength. For a wavelength of 13.4 nm, the wavelength presently used for extreme ultraviolet (EUV) lithography, Si and Be have practically the same optical constants, but the Mo/Si multilayer has opposite stress than the Mo/Be multilayer. Multilayer systems of these materials have practically identical reflectivity curves. For example, stress free multilayers can be formed on a substrate using Mo/Be multilayers in the bottom of the stack and Mo/Si multilayers at the top of the stack, with the switch-over point selected to obtain zero stress. In this multilayer system, the switch-over point is at about the half point of the total thickness of the stack, and for the Mo/Be--Mo/Si system, there may be 25 deposition periods Mo/Be to 20 deposition periods Mo/Si.

EUV Waves Driven by the Sudden Expansion of Transequatorial Loops Caused by Coronal Jets

NASA Astrophysics Data System (ADS)

Shen, Yuandeng; Tang, Zehao; Miao, Yuhu; Su, Jiangtao; Liu, Yu

2018-06-01

We present two events to study the driving mechanism of extreme-ultraviolet (EUV) waves that are not associated with coronal mass ejections (CMEs), by using high-resolution observations taken by the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Observational results indicate that the observed EUV waves were accompanied by flares and coronal jets, but not the CMEs that were regarded as drivers of most EUV waves in previous studies. In the first case, it is observed that a coronal jet is ejected along a transequatorial loop system at a plane-of-the-sky (POS) speed of 335 ± 22 km s{}-1; in the meantime, an arc-shaped EUV wave appeared on the eastern side of the loop system. In addition, the EUV wave further interacted with another interconnecting loop system and launched a fast propagating (QFP) magnetosonic wave along the loop system, which had a period of 200 s and a speed of 388 ± 65 km s{}-1, respectively. In the second case, we observed a coronal jet that ejected at a POS speed of 282 ± 44 km s{}-1 along a transequatorial loop system as well as the generation of bright EUV waves on the eastern side of the loop system. Based on the observational results, we propose that the observed EUV waves on the eastern side of the transequatorial loop systems are fast-mode magnetosonic waves and that they are driven by the sudden lateral expansion of the transequatorial loop systems due to the direct impingement of the associated coronal jets, while the QFP wave in the fist case formed due to the dispersive evolution of the disturbance caused by the interaction between the EUV wave and the interconnecting coronal loops. It is noted that EUV waves driven by sudden loop expansions have shorter lifetimes than those driven by CMEs.

LONG DURATION FLARE EMISSION: IMPULSIVE HEATING OR GRADUAL HEATING?

DOE Office of Scientific and Technical Information (OSTI.GOV)

Qiu, Jiong; Longcope, Dana W.

Flare emissions in X-ray and EUV wavelengths have previously been modeled as the plasma response to impulsive heating from magnetic reconnection. Some flares exhibit gradually evolving X-ray and EUV light curves, which are believed to result from superposition of an extended sequence of impulsive heating events occurring in different adjacent loops or even unresolved threads within each loop. In this paper, we apply this approach to a long duration two-ribbon flare SOL2011-09-13T22 observed by the Atmosphere Imaging Assembly (AIA). We find that to reconcile with observed signatures of flare emission in multiple EUV wavelengths, each thread should be heated inmore » two phases, an intense impulsive heating followed by a gradual, low-rate heating tail that is attenuated over 20–30 minutes. Each AIA resolved single loop may be composed of several such threads. The two-phase heating scenario is supported by modeling with both a zero-dimensional and a 1D hydrodynamic code. We discuss viable physical mechanisms for the two-phase heating in a post-reconnection thread.« less

On numerical reconstructions of lithographic masks in DUV scatterometry

NASA Astrophysics Data System (ADS)

Henn, M.-A.; Model, R.; Bär, M.; Wurm, M.; Bodermann, B.; Rathsfeld, A.; Gross, H.

2009-06-01

The solution of the inverse problem in scatterometry employing deep ultraviolet light (DUV) is discussed, i.e. we consider the determination of periodic surface structures from light diffraction patterns. With decreasing dimensions of the structures on photo lithography masks and wafers, increasing demands on the required metrology techniques arise. Scatterometry as a non-imaging indirect optical method is applied to periodic line structures in order to determine the sidewall angles, heights, and critical dimensions (CD), i.e., the top and bottom widths. The latter quantities are typically in the range of tens of nanometers. All these angles, heights, and CDs are the fundamental figures in order to evaluate the quality of the manufacturing process. To measure those quantities a DUV scatterometer is used, which typically operates at a wavelength of 193 nm. The diffraction of light by periodic 2D structures can be simulated using the finite element method for the Helmholtz equation. The corresponding inverse problem seeks to reconstruct the grating geometry from measured diffraction patterns. Fixing the class of gratings and the set of measurements, this inverse problem reduces to a finite dimensional nonlinear operator equation. Reformulating the problem as an optimization problem, a vast number of numerical schemes can be applied. Our tool is a sequential quadratic programing (SQP) variant of the Gauss-Newton iteration. In a first step, in which we use a simulated data set, we investigate how accurate the geometrical parameters of an EUV mask can be reconstructed, using light in the DUV range. We then determine the expected uncertainties of geometric parameters by reconstructing from simulated input data perturbed by noise representing the estimated uncertainties of input data. In the last step, we use the measurement data obtained from the new DUV scatterometer at PTB to determine the geometrical parameters of a typical EUV mask with our reconstruction algorithm. The results are compared to the outcome of investigations with two alternative methods namely EUV scatterometry and SEM measurements.

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

NASA Astrophysics Data System (ADS)

Fallica, Roberto; Stowers, Jason K.; Grenville, Andrew; Frommhold, Andreas; Robinson, Alex P. G.; Ekinci, Yasin

2016-07-01

The dynamic absorption coefficients of several chemically amplified resists (CAR) and non-CAR extreme ultraviolet (EUV) photoresists are measured experimentally using a specifically developed setup in transmission mode at the x-ray interference lithography beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general, the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called chemical sensitivity to account for all the postabsorption chemical reaction ongoing in the resist, which also predicts a quantitative clearing volume and clearing radius, due to the photon absorption in the resist. These parameters may help provide deeper insight into the underlying mechanisms of the EUV concepts of clearing volume and clearing radius, which are then defined and quantitatively calculated.

Sub-50-as isolated extreme ultraviolet continua generated by 1.6-cycle near-infrared pulse combined with double optical gating scheme

NASA Astrophysics Data System (ADS)

Oguri, Katsuya; Mashiko, Hiroki; Ogawa, Tatsuya; Hanada, Yasutaka; Nakano, Hidetoshi; Gotoh, Hideki

2018-04-01

We demonstrate the generation of ultrabroad bandwidth attosecond continua extending to sub-50-as duration in the extreme ultraviolet (EUV) region based on a 1.6-cycle Ti:sapphire laser pulse. The combination of the amplitude gating scheme with a sub-two-cycle driver pulse and the double optical gating scheme achieves the continuum generation with a bandwidth of 70 eV at the full width at half maximum near the peak photon energy of 140 eV, which supports a Fourier-transform-limited pulse duration as short as 32 as. The carrier-envelope-phase (CEP) dependence of the attosecond continua shows a single-peak structure originating from the half-cycle cut-off at appropriate CEP values, which strongly indicates the generation of a single burst of an isolated attosecond pulse. Our approach suggests a possibility for isolated sub-50-as pulse generation in the EUV region by compensating for the intrinsic attosecond chirp with a Zr filter.

Prospects of DUV OoB suppression techniques in EUV lithography

NASA Astrophysics Data System (ADS)

Park, Chang-Min; Kim, Insung; Kim, Sang-Hyun; Kim, Dong-Wan; Hwang, Myung-Soo; Kang, Soon-Nam; Park, Cheolhong; Kim, Hyun-Woo; Yeo, Jeong-Ho; Kim, Seong-Sue

2014-04-01

Though scaling of source power is still the biggest challenge in EUV lithography (EUVL) technology era, CD and overlay controls for transistor's requirement are also precondition of adopting EUVL in mass production. Two kinds of contributors are identified as risks for CDU and Overlay: Infrared (IR) and deep ultraviolet (DUV) out of band (OOB) radiations from laser produced plasma (LPP) EUV source. IR from plasma generating CO2 laser that causes optics heating and wafer overlay error is well suppressed by introducing grating on collector to diffract IR off the optical axis and is the effect has been confirmed by operation of pre-production tool (NXE3100). EUV and DUV OOB which are reflected from mask black boarder (BB) are root causes of EUV-specific CD error at the boundaries of exposed shots which would result in the problem of CDU out of spec unless sufficiently suppressed. Therefore, control of DUV OOB reflection from the mask BB is one of the key technologies that must be developed prior to EUV mass production. In this paper, quantitative assessment on the advantage and the disadvantage of potential OOB solutions will be discussed. EUV and DUV OOB impacts on wafer CDs are measured from NXE3100 & NXE3300 experiments. Significant increase of DUV OOB impact on CD from NXE3300 compared with NXE3100 is observed. There are three ways of technology being developed to suppress DUV OOB: spectral purity filter (SPF) as a scanner solution, multi-layer etching as a solution on mask, and resist top-coating as a process solution. PROs and CONs of on-scanner, on-mask, and on-resist solution for the mass production of EUV lithography will be discussed.

Free-electron laser emission architecture impact on extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Hosler, Erik R.; Wood, Obert R.; Barletta, William A.

2017-10-01

Laser-produced plasma (LPP) EUV sources have demonstrated ˜125 W at customer sites, establishing confidence in EUV lithography (EUVL) as a viable manufacturing technology. However, for extension to the 3-nm technology node and beyond, existing scanner/source technology must enable higher-NA imaging systems (requiring increased resist dose and providing half-field exposures) and/or EUV multipatterning (requiring increased wafer throughput proportional to the number of exposure passes). Both development paths will require a substantial increase in EUV source power to maintain the economic viability of the technology, creating an opportunity for free-electron laser (FEL) EUV sources. FEL-based EUV sources offer an economic, high-power/single-source alternative to LPP EUV sources. Should FELs become the preferred next-generation EUV source, the choice of FEL emission architecture will greatly affect its operational stability and overall capability. A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) self-amplified spontaneous emission, (2) regenerative amplifier, or (3) self-seeding. Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provides a framework for future FEL design and enablement for EUVL applications.

An extreme ultraviolet wave associated with a failed eruption observed by the Solar Dynamics Observatory

NASA Astrophysics Data System (ADS)

Zheng, R.; Jiang, Y.; Yang, J.; Bi, Y.; Hong, J.; Yang, B.; Yang, D.

2012-05-01

Aims: Taking advantage of the high temporal and spatial resolution of the Solar Dynamics Observatory (SDO) observations, we present an extreme ultraviolet (EUV) wave associated with a failed filament eruption that generated no coronal mass ejection (CME) on 2011 March 1. We aim at understanding the nature and origin of this EUV wave. Methods: Combining the high-quality observations in the photosphere, the chromosphere, and the corona, we studied the characteristics of the wave and its relations to the associated eruption. Results: The event occurred at an ephemeral region near a small active region. The continuous magnetic flux cancelation in the ephemeral region produced pre-eruption brightenings and two EUV jets, and excited the filament eruption, accompanying it with a microflare. After the eruption, the filament material appeared far from the eruption center, and the ambient loops seemed to be intact. It was evident that the filament eruption had failed and was not associated with a CME. The wave happened just after the north jet arrived, and apparently emanated ahead of the north jet, far from the eruption center. The wave propagated at nearly constant velocities in the range of 260-350 km s-1, with a slight negative acceleration in the last phase. Remarkably, the wave continued to propagate, and a loop in its passage was intact when wave and loop met. Conclusions: Our analysis confirms that the EUV wave is a true wave, which we interpret as a fast-mode wave. In addition, the close temporal and spatial relationship between the wave and the jet provides evidence that the wave was likely triggered by the jet when the CME failed to happen. Three movies are available in electronic form at http://www.aanda.org

Short wavelength laser

DOEpatents

Hagelstein, P.L.

1984-06-25

A short wavelength laser is provided that is driven by conventional-laser pulses. A multiplicity of panels, mounted on substrates, are supported in two separated and alternately staggered facing and parallel arrays disposed along an approximately linear path. When the panels are illuminated by the conventional-laser pulses, single pass EUV or soft x-ray laser pulses are produced.

Results from the calibration of the Extreme Ultraviolet Explorer instruments

NASA Technical Reports Server (NTRS)

Welsh, Barry Y.; Jelinsky, Pat; Vedder, Peter W.; Vallerga, John V.; Finley, David S.; Malina, Roger F.

1991-01-01

The paper describes the main features and selected results of the calibration of the scientific instruments to be flown on the Extreme Ultraviolet Explorer in 1991. The instrument payload includes three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument covering the spectral region 70-800 A. The measured imaging characteristics, the effective areas, and the details of spectral responses of the instruments are presented. Diagrams of the cross-sectional views of the scanning telescope and the deep-survey/spectrometer telescope are included.

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

NASA Astrophysics Data System (ADS)

Kim, Muyoung; Moon, Junghwan; Choi, Joonmyung; Lee, Byunghoon; Jeong, Changyoung; Kim, Heebom; Cho, Maenghyo

2018-03-01

Semiconductor manufacturing industry has reduced the size of wafer for enhanced productivity and performance, and Extreme Ultraviolet (EUV) light source is considered as a promising solution for downsizing. A series of EUV lithography procedures contain complex photo-chemical reaction on photoresist, and it causes technical difficulties on constructing theoretical framework which facilitates rigorous investigation of underlying mechanism. Thus, we formulated finite difference method (FDM) model of post exposure bake (PEB) process on positive chemically amplified resist (CAR), and it involved acid diffusion coupled-deprotection reaction. The model is based on Fick's second law and first-order chemical reaction rate law for diffusion and deprotection, respectively. Two kinetic parameters, diffusion coefficient of acid and rate constant of deprotection, which were obtained by experiment and atomic scale simulation were applied to the model. As a result, we obtained time evolutional protecting ratio of each functional group in resist monomer which can be used to predict resulting polymer morphology after overall chemical reactions. This achievement will be the cornerstone of multiscale modeling which provides fundamental understanding on important factors for EUV performance and rational design of the next-generation photoresist.

Studies of Solar EUV Irradiance from SOHO

NASA Technical Reports Server (NTRS)

Floyd, Linton

2002-01-01

The Extreme Ultraviolet (EUV) irradiance central and first order channel time series (COC and FOC) from the Solar EUV Monitor aboard the Solar and Heliospheric observatory (SOHO) issued in early 2002 covering the time period 1/1/96-31/1201 were analyzed in terms of other solar measurements and indices. A significant solar proton effect in the first order irradiance was found and characterized. When this effect is removed, the two irradiance time series are almost perfectly correlated. Earlier studies have shown good correlation between the FOC and the Hall core-to-wing ratio and likewise, it was the strongest component of the COC. Analysis of the FOC showed dependence on the F10.7 radio flux. Analysis of the CDC signals showed additional dependences on F10.7 and the GOES x-ray fluxes. The SEM FOC was also well correlated with thein 30.4 nm channel of the SOHO EUV Imaging Telescope (EIT). The irradiance derived from all four EIT channels (30.4 nm, 17.1 nm, 28.4 nm, and 19.5 nm) showed better correlation with MgII than F10.7.

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light.

PubMed

Hu, Min-Hui; Le Guen, Karine; André, Jean-Michel; Jonnard, Philippe; Meltchakov, Evgueni; Delmotte, Franck; Galtayries, Anouk

2010-09-13

We present the results of an optical and chemical, depth and surface study of Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC system, the introduction of Mo as a third material in the multilayer structure allows us to decrease In comparison to the previously studied Al/SiC system with a reflectance of 37% at near normal incidence around 17 nm, the introduction of Mo as a third material in the multilayer structure allows us to decrease the interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with synchrotron radiation. This is the first report of a reflectivity higher than 50% around 17 nm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC system in order to analyze the individual layers within the stack. ToF-SIMS and XPS results give evidence that the first SiC layer is partially oxidized, but the O atoms do not reach the first Mo and Al layers. We use these results to properly describe the multilayer stack and discuss the possible reasons for the difference between the measured and simulated EUV reflectivity values.

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

DOE PAGES

Benk, Markus P.; Wojdyla, Antoine; Chao, Weilun; ...

2016-07-12

The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed in this paper to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP’smore » Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. Finally, the anamorphic images show the same image quality in the horizontal and vertical directions.« less

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

DOE Office of Scientific and Technical Information (OSTI.GOV)

Benk, Markus P.; Wojdyla, Antoine; Chao, Weilun

The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed in this paper to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP’smore » Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. Finally, the anamorphic images show the same image quality in the horizontal and vertical directions.« less

Reconstruction of Solar EUV Flux 1740-2015

NASA Astrophysics Data System (ADS)

Svalgaard, L.

2015-12-01

Solar Extreme Ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo ionization of molecular Oxygen. Solar heating of the ionosphere creates thermal winds which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and sets with the Sun and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us the deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the 'Magnetic Crusade' of the 1830s and less reliable, but still usable, data are available for portions of the hundred years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F10.7 flux and the sunspot number, and find that the reconstructed EUV flux reproduces the F10.7 flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant 'solar magnetic ground state'.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatusmore » may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.« less

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

NASA Astrophysics Data System (ADS)

Takei, Satoshi; Hanabata, Makoto; Oshima, Akihiro; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi

2015-03-01

We investigated the eco-friendly electron beam (EB) and extreme-ultraviolet (EUV) lithography using a high-sensitive negative type of green resist material derived from biomass to take advantage of organic solvent-free water spin-coating and tetramethylammonium hydroxide(TMAH)-free water-developable techniques. A water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB lithography was developed for environmental affair, safety, easiness of handling, and health of the working people, instead of the common developable process of TMAH. The material design concept to use the water-soluble resist material with acceptable properties such as pillar patterns with less than 100 nm in high EB sensitivity of 10 μC/cm2 and etch selectivity with a silicon-based middle layer in CF4 plasma treatment was demonstrated for EB and EUV lithography.

The Origin of the EUV Late Phase: A Case Study of the C8.8 Flare on 2010 May 5

NASA Technical Reports Server (NTRS)

Hock, R. A.; Woods, T. N.; Klimchuk, J. A.; Eparvier, F. G.; Jones, A. R.

2012-01-01

Since the launch of NASA's Solar Dynamics Observatory on 2010 February 11, the Extreme ultraviolet Variability Experiment (EVE) has observed numerous flares. One interesting feature observed by EVE is that a subset of flares exhibit an additional enhancement of the 2-3 million K emission several hours after the flares soft X-ray emission. From the Atmospheric Imaging Assembly (AIA) images, we observe that this secondary emission, dubbed the EUV late phase, occurs in the same active region as the flare but not in the same coronal loops. Here, we examine the C8.8 flare that occurred on 2010 May 5 as a case study of EUV late phase flares. In addition to presenting detailed observations from both AIA and EVE, we develop a physical model of this flare and test it using the Enthalpy Based Thermal Evolution of Loops (EBTEL) model.

EUV process establishment through litho and etch for N7 node

NASA Astrophysics Data System (ADS)

Kuwahara, Yuhei; Kawakami, Shinichiro; Kubota, Minoru; Matsunaga, Koichi; Nafus, Kathleen; Foubert, Philippe; Mao, Ming

2016-03-01

Extreme ultraviolet lithography (EUVL) technology is steadily reaching high volume manufacturing for 16nm half pitch node and beyond. However, some challenges, for example scanner availability and resist performance (resolution, CD uniformity (CDU), LWR, etch behavior and so on) are remaining. Advance EUV patterning on the ASML NXE:3300/ CLEAN TRACK LITHIUS Pro Z- EUV litho cluster is launched at imec, allowing for finer pitch patterns for L/S and CH. Tokyo Electron Ltd. and imec are continuously collabo rating to develop manufacturing quality POR processes for NXE:3300. TEL's technologies to enhance CDU, defectivity and LWR/LER can improve patterning performance. The patterning is characterized and optimized in both litho and etch for a more complete understanding of the final patterning performance. This paper reports on post-litho CDU improvement by litho process optimization and also post-etch LWR reduction by litho and etch process optimization.

Generation of coherent magnons in NiO stimulated by EUV pulses from a seeded free-electron laser

NASA Astrophysics Data System (ADS)

Simoncig, A.; Mincigrucci, R.; Principi, E.; Bencivenga, F.; Calvi, A.; Foglia, L.; Kurdi, G.; Matruglio, A.; Dal Zilio, S.; Masciotti, V.; Lazzarino, M.; Masciovecchio, C.

2017-12-01

The full comprehension of magnetic phenomena at the femtosecond (fs) time scale is of high demand for current material science and technology. Here we report the observation of coherent collective modes in the antiferromagnetic insulator nickel oxide (NiO) identified by a frequency of 0.86 THz, which matches the expected out-of-plane single-mode magnon resonance. Such collective excitations are inelastically stimulated by extreme ultraviolet (EUV) pulses delivered by a seeded free-electron laser (FEL) and subsequently revealed probing the transient optical activity of NiO looking at the Faraday effect. Moreover, the unique capability of the employed FEL source to deliver circularly polarized pulses allows us to demonstrate optomagnetic control of such collective modes at EUV photon energies. These results may set a starting point for future investigations of magnetic materials at time scales comparable or faster than those typical of exchange interactions.

Unique Capabilities of the SUVI Telescopes For Both Space Weather Prediction and Fundamental Solar Physics

NASA Astrophysics Data System (ADS)

Slater, G. L.; Seaton, D. B.

2017-12-01

The recently launched Solar UltraViolet Imager (SUVI) aboard NOAA's GOES-16 satellite, provides image data that can potentially both improve earth effective solar storm predictions and contribute to fundamental research on structure and dynamics in what may be called the 'high EUV corona'. The wide field of view ( 53 x 53 arcmin) and passband set covering UV and EUV emission from plasmas ranging in temperature from 5000 K to 7 million K, allow for the detailed observation of structure and dynamics in the high EUV corona. Imaging this region is increasingly recognized as being critical to understanding how the low corona connects, disconnects from, and reconnects to, the high corona and heliosphere during transient events in the low corona. We will illustrate this claim with observations taken from the first few months on operation of the SUVI instrument.

Solar rotational modulations of spectral irradiance and correlations with the variability of total solar irradiance

NASA Astrophysics Data System (ADS)

Lee, Jae N.; Cahalan, Robert F.; Wu, Dong L.

2016-09-01

Aims: We characterize the solar rotational modulations of spectral solar irradiance (SSI) and compare them with the corresponding changes of total solar irradiance (TSI). Solar rotational modulations of TSI and SSI at wavelengths between 120 and 1600 nm are identified over one hundred Carrington rotational cycles during 2003-2013. Methods: The SORCE (Solar Radiation and Climate Experiment) and TIMED (Thermosphere Ionosphere Mesosphere Energetics and Dynamics)/SEE (Solar EUV Experiment) measured and SATIRE-S modeled solar irradiances are analyzed using the EEMD (Ensemble Empirical Mode Decomposition) method to determine the phase and amplitude of 27-day solar rotational variation in TSI and SSI. Results: The mode decomposition clearly identifies 27-day solar rotational variations in SSI between 120 and 1600 nm, and there is a robust wavelength dependence in the phase of the rotational mode relative to that of TSI. The rotational modes of visible (VIS) and near infrared (NIR) are in phase with the mode of TSI, but the phase of the rotational mode of ultraviolet (UV) exhibits differences from that of TSI. While it is questionable that the VIS to NIR portion of the solar spectrum has yet been observed with sufficient accuracy and precision to determine the 11-year solar cycle variations, the temporal variations over one hundred cycles of 27-day solar rotation, independent of the two solar cycles in which they are embedded, show distinct solar rotational modulations at each wavelength.

Solar Rotational Modulations of Spectral Irradiance and Correlations with the Variability of Total Solar Irradiance

NASA Technical Reports Server (NTRS)

Lee, Jae N.; Cahalan, Robert F.; Wu, Dong L.

2016-01-01

Aims: We characterize the solar rotational modulations of spectral solar irradiance (SSI) and compare them with the corresponding changes of total solar irradiance (TSI). Solar rotational modulations of TSI and SSI at wavelengths between 120 and 1600 nm are identified over one hundred Carrington rotational cycles during 2003-2013. Methods: The SORCE (Solar Radiation and Climate Experiment) and TIMED (Thermosphere Ionosphere Mesosphere Energetics and Dynamics)/SEE (Solar EUV Experiment) measured and SATIRE-S modeled solar irradiances are analyzed using the EEMD (Ensemble Empirical Mode Decomposition) method to determine the phase and amplitude of 27-day solar rotational variation in TSI and SSI. Results: The mode decomposition clearly identifies 27-day solar rotational variations in SSI between 120 and 1600 nm, and there is a robust wavelength dependence in the phase of the rotational mode relative to that of TSI. The rotational modes of visible (VIS) and near infrared (NIR) are in phase with the mode of TSI, but the phase of the rotational mode of ultraviolet (UV) exhibits differences from that of TSI. While it is questionable that the VIS to NIR portion of the solar spectrum has yet been observed with sufficient accuracy and precision to determine the 11-year solar cycle variations, the temporal variations over one hundred cycles of 27-day solar rotation, independent of the two solar cycles in which they are embedded, show distinct solar rotational modulations at each wavelength.

Extreme Ultraviolet Spectroscopy of the Thermosphere from the RAIDS Experiment on the ISS

NASA Astrophysics Data System (ADS)

Bishop, R. L.; Stephan, A. W.; Christensen, A. B.; Budzien, S. A.; Straus, P. R.; van Epps, Z.

2009-12-01

The RAIDS experiment is a suite of eight instruments to be flown aboard the Japanese Experiment Module-Exposed Facility on the International Space Station (ISS) in 2009. One of the sensors is the Extreme Ultraviolet Spectrograph (EUVS). The EUVS measures the radiance of the Earth’s airglow with a f/5 Wadsworth spectrograph fronted by a mechanical grid collimator. The 0.1 x 2.3 degree field of view is imaged onto a wedge-and-strip two dimensional detector and collapsed into a one-dimensional spectrum. The vertical profile is assembled from a series of these spectra obtained as the RAIDS platform scans in altitude. Two grating positions provide coverage of the 50.0-85.0 nm region or the 77.0-110.0 nm region at 1.2 nm spectral resolution. We will present a discussion of the scientific targets for the RAIDS EUVS and, if launched on schedule, also the first spectra observed from this sensor. The EUVS is sensitive to a number of emissions in the Earth’s dayglow including atomic and ionized oxygen and argon, ionized nitrogen, and atomic helium. One of the primary RAIDS science objectives is to use the EUVS to obtain simultaneous OII 83.4 nm and 61.7 nm limb profiles to perform an in-depth investigation of the OII excitation and emission processes in the daytime ionosphere. Some of the more dominant spectral features such as the OI (98.9, 102.7 nm), OII (83.4, 61.7 nm), and NII (108.5, 91.6 nm) lines will provide the opportunity to develop new methods to monitor thermospheric O and N2. The OI (102.7 nm) observations may also be used, in conjunction with other RAIDS measurements, to retrieve the spectrally unresolved H Lyman beta and thus a measure of atomic hydrogen. The argon emissions Ar I (104.8, 106.7 nm) and Ar II (91.96, 93.21 nm) will provide information on its relative abundance in the lower thermosphere. . Combinations of measurements, such as the EUVS OI (98.9 nm) and the RAIDS Near Infrared Spectrometer OI (799.0 nm) emission can be used to probe the details of their associated branching ratios and excitation cross sections. Finally, the very quiet solar minimum period provides a unique opportunity to observe the He I 58.4 nm emission at these altitudes. The initial RAIDS EUVS spectra will highlight this potential wealth of future ionospheric and thermospheric studies that can be accomplished using such a unique dataset.

Optical surface evaluation by soft X-ray scattering

NASA Technical Reports Server (NTRS)

Green, James C.; Finley, David S.; Bowyer, Stuart; Malina, Roger F.

1986-01-01

During the fabrication of the mirrors for the Extreme Ultraviolet Explorer (EUVE), methods for evaluating the surface quality of the optics have been developed. Measurement of soft X-ray scattering profiles allows for the determination of the surface roughness and correlation lengths for highly polished metal surfaces. With this method, the surface parameters for one of the Wolter Schwarzschild type I mirrors that had been fabricated for the EUVE mission have been determined. The techniques employed, the theoretical basis for the method, and the data that had been taken are presented. The measurements show that the best mirrors have a surface roughness of 20A rms or less.

Synchrotron radiation calibration of the EUVE variable line-spaced diffraction gratings at the NBS SURF II facility

NASA Technical Reports Server (NTRS)

Jelinsky, P.; Jelinsky, S. R.; Miller, A.; Vallerga, J.; Malina, R. F.

1988-01-01

The Extreme Ultraviolet Explorer (EUVE) has a spectrometer which utilizes variable line-spaced, plane diffraction gratings in the converging beam of a Wolter-Schwarzschild type II mirror. The gratings, microchannel plate detector, and thin film filters have been calibrated with continuum radiation provided by the NBS SURF II facility. These were calibrated in a continuum beam to find edges or other sharp spectral features in the transmission of the filters, quantum efficiency of the microchannel plate detector, and efficiency of the gratings. The details of the calibration procedure and the results of the calibration are presented.

INFRARED STUDY OF UV/EUV IRRADIATION OF NAPHTHALENE IN H2O+NH3 ICE

NASA Astrophysics Data System (ADS)

Chen, Y.-J.; Nuevo, M.; Yeh, F.-C.; Yih, T.-S.; Sun, W.-H.; Ip, W.-H.; Fung, H.-S.; Lee, Y.-Y.; Wu, C.-Y. R.

We have carried out photon irradiation study of naphthalene (C10H8), the smallest polycyclic aromatic hydrocarbon (PAH) in water and ammonia ice mixtures. Photons provided by a synchrotron radiation light source in two broad-band energy ranges in the ultraviolet/near extreme ultraviolet (4-20 eV) and the extreme ultraviolet (13-45 eV) ranges were used for the irradiation of H2O+NH3+C10H8 = 1:1:1 ice mixtures at 15K. We could identify several photo-products, namely CH4, C2H6, C3H8, CO, CO2, HNCO, OCN-, and probably quinoline (C9H7N) and phenanthridine (C13H9N). We found that the light hydrocarbons are preferably produced for the ice mixture subjected to 4-20 eV photons. However, the production yields of CO, CO2, and OCN- species seem to be higher for the mixture subjected to EUV photons (13-45 eV). Therefore, naphthalene and its photo-products appear to be more efficiently destroyed when high energy photons (E > 20 eV) are used. This has important consequences on the photochemical evolution of PAHs in astrophysical environments.

Characterization of photoluminescence spectra from poly allyl diglycol carbonate (CR-39) upon excitation with the ultraviolet radiation of various wavelengths

NASA Astrophysics Data System (ADS)

El Ghazaly, M.; Al-Thomali, Talal A.

2013-04-01

The induced photoluminescence (PL) from the π-conjugated polymer poly allyl diglycol carbonate (PADC) (CR-39) upon excitation with the ultraviolet radiation of different wavelengths was investigated. The absorption and attenuation coefficients of PADC (CR-39) were recorded using a UV-visible spectrometer. It was found that the absorption and attenuation coefficients of the PADC (CR-39) exhibit a strong dependence on the wavelength of ultraviolet radiation. The PL spectra were measured with a Flormax-4 spectrofluorometer (Horiba). PADC (CR-39) samples were excited by ultraviolet radiation with wavelengths in the range from 260 to 420 nm and the corresponding PL emission bands were recorded. The obtained results show a strong correlation between the PL and the excitation wavelength of ultraviolet radiation. The position of the fluorescence emission band peak was red shifted starting from 300 nm, which was increased with the increase in the excitation wavelength. The PL yield and its band peak height were increased with the increase in the excitation wavelength till 290 nm, thereafter they decreased exponentially with the increase in the ultraviolet radiation wavelength. These new findings should be considered carefully during the use of the PADC (CR-39) in the scientific applications and in using PADC (CR-39) in eyeglasses.

Shock Formation Height in the Solar Corona Estimated from SDO and Radio Observations

NASA Technical Reports Server (NTRS)

Gopalswamy, N.; Nitta, N.

2011-01-01

Wave transients at EUV wavelengths and type II radio bursts are good indicators of shock formation in the solar corona. We use recent EUV wave observations from SDO and combine them with metric type II radio data to estimate the height in the corona where the shocks form. We compare the results with those obtained from other methods. We also estimate the shock formation heights independently using white-light observations of coronal mass ejections that ultimately drive the shocks.

Results from a Grazing Incidence X-Ray Interferometer

NASA Technical Reports Server (NTRS)

Joy, Marshall K.; Shipley, Ann; Cash, Webster; Carter, James

2000-01-01

A prototype grazing incidence interferometer has been built and tested at EUV and X-ray wavelengths using a 120 meter long vacuum test facility at Marshall Space Flight Center. We describe the design and construction of the interferometer, the EUV and x-ray sources, the detector systems, and compare the interferometric fringe measurements with theoretical predictions. We also describe the next-generation grazing incidence system which is designed to provide laboratory demonstration of key technologies that will be needed for a space-based x-ray interferometer.

Repeatability of in vitro measurements of the ultraviolet protection factor (UPF) by spectrophotometry with automatic sampling.

PubMed

Hoffmann, K; Kesners, P; Bader, A; Avermaete, A; Altmeyer, P; Gambichler, T

2001-11-01

Spectrophotometric assessment (in vitro) is the most established method for determining the ultraviolet protection factor (UPF) of textiles. Apart from stringent requirements for measurement precision, practical methods are required for the routine determination of the UPF. We report here spectrophotometric measurements of textiles using a newly developed autosampler. Measurement precision was evaluated under repeatable conditions. Fifteen different textiles were spectrophotometrically assessed for the determination of the UPF. Sample handling inside the spectrophotometer was performed with a computer-controlled sampling device, capable of loading and unloading a textile sample from a magazine as well as rotating the sample perpendicular to the spectrometer beam. In order to evaluate the repeatability of measurements, one sample of each textile was assessed eight times under the same conditions in the same laboratory. A mean percentage of the standard error of 1% [E(UPF)] was calculated for the UPF measurements. For UPFs >30, a significantly higher E(UPF) was found (r=0.78; P<0.001). E(UV) (3.9%) of ultraviolet A (UVA) transmission differed significantly from E(UV) (1.1 %) of ultraviolet B (UVB) transmission (P<0.05). Though a slight decrease of repeatability was observed for UVA transmission measurements and UPFs higher than 30, our data indicate a high measurement precision under repeatable conditions. In conclusion, spectrophotometric measurements of textiles with the aid of the autosampler presented have been shown to be highly practical, time saving and precise.

Brightness and magnetic evolution of solar coronal bright points

NASA Astrophysics Data System (ADS)

Ugarte-Urra, I.

2004-12-01

This thesis presents a study of the brightness and magnetic evolution of several Extreme ultraviolet (EUV) coronal bright points (hereafter BPs). BPs are loop-like features of enhanced emission in the coronal EUV and X-ray images of the Sun, that are associated to the interaction of opposite photospheric magnetic polarities with magnetic fluxes of ≈1018 - 1019 Mx. The study was carried out using several instruments on board the Solar and Heliospheric Observatory (SOHO): the Extreme Ultraviolet Imager (EIT), the Coronal Diagnostic Spectrometer (CDS) and the Michelson Doppler Imager (MDI), supported by the high resolution imaging from the Transition Region And Coronal Explorer (TRACE). The results confirm that, down to 1'' (i.e. ~715 km) resolution, BPs are made of small loops with lengths of ~6 Mm and cross-sections of ~2 Mm. The loops are very dynamic, evolving in time scales as short as 1 - 2 minutes. This is reflected in a highly variable EUV response with fluctuations highly correlated in spectral lines at transition region temperatures (in the range 3.2x10^4 - 3.5x10^5 K), but not always at coronal temperatures. A wavelet analysis of the intensity variations reveals, for the first time, the existence of quasi-periodic oscillations with periods ranging 400 -- 1000 s, in the range of periods characteristic of the chromospheric network. The link between BPs and network bright points is discussed, as well as the interpretation of the oscillations in terms of global acoustic modes of closed magnetic structures. A comparison of the magnetic flux evolution of the magnetic polarities to the EUV flux changes is also presented. Throughout their lifetime, the intrinsic EUV emission of BPs is found to be dependent on the total magnetic flux of the polarities. In short time scales, co-spatial and co-temporal TRACE and MDI images, reveal the signature of heating events that produce sudden EUV brightenings simultaneous to magnetic flux cancellations. This is interpreted in terms of magnetic reconnection events. Finally, a electron density study of six coronal bright points produces values of ~1.6x109 cm-3, closer to active region plasma than to quiet Sun. The analysis of a large coronal loop (half length of 72 Mm) introduces the discussion on the prospects of future plasma diagnostics of BPs with forthcoming solar missions like Solar-B.

Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

2013-04-01

As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of the overall EUV CDU contribution helps deliver an accurate and integral CDU BB per product/process and litho tool. The better understanding of the entire CDU budget for advanced EUVL nodes achieved by Samsung and ASML helps extend the limits of Moore's Law and to deliver successful implementation of smaller, faster and smarter chips in semiconductor industry.

Solar Cycle Variation of Microwave Polar Brightening and EUV Coronal Hole Observed by Nobeyama Radioheliograph and SDO/AIA

NASA Astrophysics Data System (ADS)

Kim, Sujin; Park, Jong-Yeop; Kim, Yeon-Han

2017-08-01

We investigate the solar cycle variation of microwave and extreme ultraviolet (EUV) intensity in latitude to compare microwave polar brightening (MPB) with the EUV polar coronal hole (CH). For this study, we used the full-sun images observed in 17 GHz of the Nobeyama Radioheliograph from 1992 July to 2016 November and in two EUV channels of the Atmospheric Imaging Assembly (AIA) 193 Å and 171 Å on the Solar Dynamics Observatory (SDO) from 2011 January to 2016 November. As a result, we found that the polar intensity in EUV is anti-correlated with the polar intensity in microwave. Since the depression of EUV intensity in the pole is mostly owing to the CH appearance and continuation there, the anti-correlation in the intensity implies the intimate association between the polar CH and the MPB. Considering the report of tet{gopal99} that the enhanced microwave brightness in the CH is seen above the enhanced photospheric magnetic field, we suggest that the pole area during the solar minimum has a stronger magnetic field than the quiet sun level and such a strong field in the pole results in the formation of the polar CH. The emission mechanism of the MPB and the physical link with the polar CH are not still fully understood. It is necessary to investigate the MPB using high resolution microwave imaging data, which can be obtained by the high performance large-array radio observatories such as the ALMA project.

Recovery of EUVL substrates

DOE Office of Scientific and Technical Information (OSTI.GOV)

Vernon, S.P.; Baker, S.L.

1995-01-19

Mo/Si multilayers, were removed from superpolished zerodur and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

NASA Astrophysics Data System (ADS)

Tasdemir, Zuhal; Mochi, Iacopo; Olvera, Karen Garrido; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Fallica, Roberto; Vockenhuber, Michaela; Ekinci, Yasin

2017-10-01

Extreme UV lithography (EUVL) has gained considerable attention for several decades as a potential technology for the semiconductor industry and it is now close to being adopted in high-volume manufacturing. At Paul Scherrer Institute (PSI), we have focused our attention on EUV resist performance issues by testing available high-performance EUV resists in the framework of a joint collaboration with ASML. For this purpose, we use the grating-based EUV-IL setup installed at the Swiss Light Source (SLS) at PSI, in which a coherent beam with 13.5 nm wavelength is used to produce a periodic aerial image with virtually 100% contrast and large depth of focus. Interference lithography is a relatively simple technique and it does not require many optical components, therefore the unintended flare is minimized and the aerial image is well-defined sinusoidal pattern. For the collaborative work between PSI and ASML, exposures are being performed on the EUV-IL exposure tool at PSI. For better quantitative comparison to the NXE scanner results, it is targeted to determine the actual NILS of the EUV-IL exposure tool at PSI. Ultimately, any resist-related metrology must be aligned and compared with the performance of EUV scanners. Moreover, EUV-IL is a powerful method for evaluating the resist performance and a resist which performs well with EUV-IL, shows, in general, also good performance with NXE scanners. However, a quantitative prediction of the performance based on EUV-IL measurements has not been possible due to the differences in aerial image formation. In this work, we aim to study the performance of EUV resists with different aerial images. For this purpose, after the real interference pattern exposure, we overlay a flat field exposure to emulate different levels of contrast. Finally, the results are compared with data obtained from EUV scanner. This study will enable not only match the data obtained from EUV- IL at PSI with the performance of NXE scanners, but also a better understanding of resist fundamentals by studying the effects of the aerial image on resist performance by changing the aerial image contrast in a controlled manner using EUV-IL.

A novel technique to measure intensity fluctuations in EUV images and to detect coronal sound waves nearby active regions

NASA Astrophysics Data System (ADS)

Stenborg, G.; Marsch, E.; Vourlidas, A.; Howard, R.; Baldwin, K.

2011-02-01

Context. In the past years, evidence for the existence of outward-moving (Doppler blue-shifted) plasma and slow-mode magneto-acoustic propagating waves in various magnetic field structures (loops in particular) in the solar corona has been found in ultraviolet images and spectra. Yet their origin and possible connection to and importance for the mass and energy supply to the corona and solar wind is still unclear. There has been increasing interest in this problem thanks to the high-resolution observations available from the extreme ultraviolet (EUV) imagers on the Solar TErrestrial RElationships Observatory (STEREO) and the EUV spectrometer on the Hinode mission. Aims: Flows and waves exist in the corona, and their signatures appear in EUV imaging observations but are extremely difficult to analyse quantitatively because of their weak intensity. Hence, such information is currently available mostly from spectroscopic observations that are restricted in their spatial and temporal coverage. To understand the nature and origin of these fluctuations, imaging observations are essential. Here, we present measurements of the speed of intensity fluctuations observed along apparently open field lines with the Extreme UltraViolet Imagers (EUVI) onboard the STEREO mission. One aim of our paper is to demonstrate that we can make reliable kinematic measurements from these EUV images, thereby complementing and extending the spectroscopic measurements and opening up the full corona for such an analysis. Another aim is to examine the assumptions that lead to flow versus wave interpretation for these fluctuations. Methods: We have developed a novel image-processing method by fusing well established techniques for the kinematic analysis of coronal mass ejections (CME) with standard wavelet analysis. The power of our method lies with its ability to recover weak intensity fluctuations along individual magnetic structures at any orientation , anywhere within the full solar disk , and using standard synoptic observing sequences (cadence <3 min) without the need for special observation plans. Results: Using information from both EUVI imagers, we obtained wave phase speeds with values on the order of 60-90 km s-1, compatible with those obtained by other previous measurements. Moreover, we studied the periodicity of the observed fluctuations and established a predominance of a 16-min period, and other periods that seem to be multiples of an underlying 8-min period. Conclusions: The validation of our analysis technique opens up new possibilities for the study of coronal flows and waves, by extending it to the full disk and to a larger number of coronal structures than has been possible previously. It opens up a new scientific capability for the EUV observations from the recently launched Solar Dynamics Observatory. Here we clearly establish the ubiquitous existence of sound waves which continuously propagate along apparently open magnetic field lines. Movies 1 and 2 (Figs. 12 and 13) are only available in electronic form at http://www.aanda.org

Counter-streaming flows in a giant quiet-Sun filament observed in the extreme ultraviolet

NASA Astrophysics Data System (ADS)

Diercke, A.; Kuckein, C.; Verma, M.; Denker, C.

2018-03-01

Aim. The giant solar filament was visible on the solar surface from 2011 November 8-23. Multiwavelength data from the Solar Dynamics Observatory (SDO) were used to examine counter-streaming flows within the spine of the filament. Methods: We use data from two SDO instruments, the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager (HMI), covering the whole filament, which stretched over more than half a solar diameter. Hα images from the Kanzelhöhe Solar Observatory (KSO) provide context information of where the spine of the filament is defined and the barbs are located. We apply local correlation tracking (LCT) to a two-hour time series on 2011 November 16 of the AIA images to derive horizontal flow velocities of the filament. To enhance the contrast of the AIA images, noise adaptive fuzzy equalization (NAFE) is employed, which allows us to identify and quantify counter-streaming flows in the filament. We observe the same cool filament plasma in absorption in both Hα and EUV images. Hence, the counter-streaming flows are directly related to this filament material in the spine. In addition, we use directional flow maps to highlight the counter-streaming flows. Results: We detect counter-streaming flows in the filament, which are visible in the time-lapse movies in all four examined AIA wavelength bands (λ171 Å, λ193 Å, λ304 Å, and λ211 Å). In the time-lapse movies we see that these persistent flows lasted for at least two hours, although they became less prominent towards the end of the time series. Furthermore, by applying LCT to the images we clearly determine counter-streaming flows in time series of λ171 Å and λ193 Å images. In the λ304 Å wavelength band, we only see minor indications for counter-streaming flows with LCT, while in the λ211 Å wavelength band the counter-streaming flows are not detectable with this method. The diverse morphology of the filament in Hα and EUV images is caused by different absorption processes, i.e., spectral line absorption and absorption by hydrogen and helium continua, respectively. The horizontal flows reach mean flow speeds of about 0.5 km s-1 for all wavelength bands. The highest horizontal flow speeds are identified in the λ171 Å band with flow speeds of up to 2.5 km s-1. The results are averaged over a time series of 90 minutes. Because the LCT sampling window has finite width, a spatial degradation cannot be avoided leading to lower estimates of the flow velocities as compared to feature tracking or Doppler measurements. The counter-streaming flows cover about 15-20% of the whole area of the EUV filament channel and are located in the central part of the spine. Conclusions: Compared to the ground-based observations, the absence of seeing effects in AIA observations reveal counter-streaming flows in the filament even with a moderate image scale of 0. ''6 pixel-1. Using a contrast enhancement technique, these flows can be detected and quantified with LCT in different wavelengths. We confirm the omnipresence of counter-streaming flows also in giant quiet-Sun filaments. A movie associated to Fig. 6 is available at http://https://www.aanda.org

Reconstruction and analysis of erythemal UV radiation time series from Hradec Králové (Czech Republic) over the past 50 years

NASA Astrophysics Data System (ADS)

Čížková, Klára; Láska, Kamil; Metelka, Ladislav; Staněk, Martin

2018-02-01

This paper evaluates the variability of erythemal ultraviolet (EUV) radiation from Hradec Králové (Czech Republic) in the period 1964-2013. The EUV radiation time series was reconstructed using a radiative transfer model and additional empirical relationships, with the final root mean square error of 9.9 %. The reconstructed time series documented the increase in EUV radiation doses in the 1980s and the 1990s (up to 15 % per decade), which was linked to the steep decline in total ozone (10 % per decade). The changes in cloud cover were the major factor affecting the EUV radiation doses especially in the 1960s, 1970s, and at the beginning of the new millennium. The mean annual EUV radiation doses in the decade 2004-2013 declined by 5 %. The factors affecting the EUV radiation doses differed also according to the chosen integration period (daily, monthly, and annually): solar zenith angle was the most important for daily doses, cloud cover, and surface UV albedo for their monthly means, and the annual means of EUV radiation doses were most influenced by total ozone column. The number of days with very high EUV radiation doses increased by 22 % per decade, the increase was statistically significant in all seasons except autumn. The occurrence of the days with very high EUV doses was influenced mostly by low total ozone column (82 % of days), clear-sky or partly cloudy conditions (74 % of days) and by increased surface albedo (19 % of days). The principal component analysis documented that the occurrence of days with very high EUV radiation doses was much affected by the positive phase of North Atlantic Oscillation with an Azores High promontory reaching over central Europe. In the stratosphere, a strong Arctic circumpolar vortex and the meridional inflow of ozone-poor air from the southwest were favorable for the occurrence of days with very high EUV radiation doses. This is the first analysis of the relationship between the high EUV radiation doses and macroscale circulation patterns, and therefore more attention should be given also to other dynamical variables that may affect the solar UV radiation on the Earth surface.

CME Expansion as the Driver of Metric Type II Shock Emission as Revealed by Self-consistent Analysis of High-Cadence EUV Images and Radio Spectrograms

NASA Astrophysics Data System (ADS)

Kouloumvakos, A.; Patsourakos, S.; Hillaris, A.; Vourlidas, A.; Preka-Papadema, P.; Moussas, X.; Caroubalos, C.; Tsitsipis, P.; Kontogeorgos, A.

2014-06-01

On 13 June 2010, an eruptive event occurred near the solar limb. It included a small filament eruption and the onset of a relatively narrow coronal mass ejection (CME) surrounded by an extreme ultraviolet (EUV) wave front recorded by the Solar Dynamics Observatory's (SDO) Atmospheric Imaging Assembly (AIA) at high cadence. The ejection was accompanied by a GOES M1.0 soft X-ray flare and a Type-II radio burst; high-resolution dynamic spectra of the latter were obtained by the Appareil de Routine pour le Traitement et l'Enregistrement Magnetique de l'Information Spectral (ARTEMIS IV) radio spectrograph. The combined observations enabled a study of the evolution of the ejecta and the EUV wave front and its relationship with the coronal shock manifesting itself as metric Type-II burst. By introducing a novel technique, which deduces a proxy of the EUV compression ratio from AIA imaging data and compares it with the compression ratio deduced from the band-split of the Type-II metric radio burst, we are able to infer the potential source locations of the radio emission of the shock on that AIA images. Our results indicate that the expansion of the CME ejecta is the source for both EUV and radio shock emissions. Early in the CME expansion phase, the Type-II burst seems to originate in the sheath region between the EUV bubble and the EUV shock front in both radial and lateral directions. This suggests that both the nose and the flanks of the expanding bubble could have driven the shock.

Apollo-Soyuz survey of the extreme-ultraviolet/soft X-ray background

DOE Office of Scientific and Technical Information (OSTI.GOV)

Stern, R.; Bowyer, S.

1979-06-15

The results of an extensive sky survey of the extreme-ultraviolet (EUV)/soft X-ray background are reported. The data were obtained with a telescope, designed and calibrated at the University of California at Berkeley, which observed EUV sources and the diffuse background as part of the Apollo-Soyuz mission in 1975 July. With a primary field of view of 2 /sup 0/.3 +- 0 /sup 0/.1 FWHM and four EUV bandpass filters (16--25, 20--73, 80--108, and 80--250 eV), the EUV telescope obtained useful background data for 21 sky points, 11 large angle scans, and an additional group of short observations of both types.more » Analysis of the data reveals an intense 80--108 eV diffuse flux of 4.0 +- 1.3 photons cm/sup -2/ sr/sup -1/ eV/sup -1/ (broad-band weighted average). This is roughly a factor of 10 higher than the corresponding 150--280 eV average intensity and confirms the earlier results of Cash, Malina, and Stern. Galactic contributions to the background intensity at still lower energies are most likely masked by large fluxes of geocoronal or interplanetary solar-scattered resonance radiation; however, we drive upper limits to the local galactic background of 2 x 10/sup 4/ and 6 x 10/sup 2/ photons cm/sup -2/ sr/sup -1/ eV/sup -1/ averaged over the 16--25 eV and 20--73 eV bands, respectively. The uniformity of the background flux is uncertain due to limitations in the statistical accuracy of the data; we discuss probable upper limits to any spatial anisotropy. No evidence is found for a correlation between the telescope count rate and Earth-based parameters (zenith angle, Sun angle, etc.) for E> or approx. =80 eV. Unlike some previous claims for the soft X-ray background, no simple dependence upon galactic latitude is seen.Fitting models of thermal emission to the Apollo-Soyuz data yields constraints on model parameters that are consistent for a limited range of temperatures with the EUV results of Cash, Malina, and Stern and the soft X-ray data of Burstein et al.« less

Amorphous silicon carbide coatings for extreme ultraviolet optics

NASA Technical Reports Server (NTRS)

Kortright, J. B.; Windt, David L.

1988-01-01

Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

Modeling 13.3nm Fe XXIII Flare Emissions Using the GOES-R EXIS Instrument

NASA Astrophysics Data System (ADS)

Rook, H.; Thiemann, E.

2017-12-01

The solar EUV spectrum is dominated by atomic transitions in ionized atoms in the solar atmosphere. As solar flares evolve, plasma temperatures and densities change, influencing abundances of various ions, changing intensities of different EUV wavelengths observed from the sun. Quantifying solar flare spectral irradiance is important for constraining models of Earth's atmosphere, improving communications quality, and controlling satellite navigation. However, high time cadence measurements of flare irradiance across the entire EUV spectrum were not available prior to the launch of SDO. The EVE MEGS-A instrument aboard SDO collected 0.1nm EUV spectrum data from 2010 until 2014, when the instrument failed. No current or future instrument is capable of similar high resolution and time cadence EUV observation. This necessitates a full EUV spectrum model to study EUV phenomena at Earth. It has been recently demonstrated that one hot flare EUV line, such as the 13.3nm Fe XXIII line, can be used to model cooler flare EUV line emissions, filling the role of MEGS-A. Since unblended measurements of Fe XXIII are typically unavailable, a proxy for the Fe XXIII line must be found. In this study, we construct two models of this line, first using the GOES 0.1-0.8nm soft x-ray (SXR) channel as the Fe XXIII proxy, and second using a physics-based model dependent on GOES emission measure and temperature data. We determine that the more sophisticated physics-based model shows better agreement with Fe XXIII measurements, although the simple proxy model also performs well. We also conclude that the high correlation between Fe XXIII emissions and the GOES 0.1-0.8nm band is because both emissions tend to peak near the GOES emission measure peak despite large differences in their contribution functions.

ILT optimization of EUV masks for sub-7nm lithography

NASA Astrophysics Data System (ADS)

Hooker, Kevin; Kuechler, Bernd; Kazarian, Aram; Xiao, Guangming; Lucas, Kevin

2017-06-01

The 5nm and 7nm technology nodes will continue recent scaling trends and will deliver significantly smaller minimum features, standard cell areas and SRAM cell areas vs. the 10nm node. There are tremendous economic pressures to shrink each subsequent technology, though in a cost-effective and performance enhancing manner. IC manufacturers are eagerly awaiting EUV so that they can more aggressively shrink their technology than they could by using complicated MPT. The current 0.33NA EUV tools and processes also have their patterning limitations. EUV scanner lenses, scanner sources, masks and resists are all relatively immature compared to the current lithography manufacturing baseline of 193i. For example, lens aberrations are currently several times larger (as a function of wavelength) in EUV scanners than for 193i scanners. Robustly patterning 16nm L/S fully random logic metal patterns and 40nm pitch random logic rectangular contacts with 0.33NA EUV are tough challenges that will benefit from advanced OPC/RET. For example, if an IC manufacturer can push single exposure device layer resolution 10% tighter using improved ILT to avoid using DPT, there will be a significant cost and process complexity benefit to doing so. ILT is well known to have considerable benefits in finding flexible 193i mask pattern solutions to improve process window, improve 2D CD control, improve resolution in low K1 lithography regime and help to delay the introduction of DPT. However, ILT has not previously been applied to EUV lithography. In this paper, we report on new developments which extend ILT method to EUV lithography and we characterize the benefits seen vs. traditional EUV OPC/RET methods.

Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

NASA Technical Reports Server (NTRS)

Hock, R. A.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Chamberlin, P. C.; Woods, E. C.

2010-01-01

The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. . In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

Relationship of EUV Irradiance Coronal Dimming Slope and Depth to Coronal Mass Ejection Speed and Mass

NASA Technical Reports Server (NTRS)

Mason, James Paul; Woods, Thomas N.; Webb, David F.; Thompson, Barbara J.; Colaninno, Robin C.; Vourlidas, Angelos

2016-01-01

Extreme ultraviolet (EUV) coronal dimmings are often observed in response to solar eruptive events. These phenomena can be generated via several different physical processes. For space weather, the most important of these is the temporary void left behind by a coronal mass ejection (CME). Massive, fast CMEs tend to leave behind a darker void that also usually corresponds to minimum irradiance for the cooler coronal emissions. If the dimming is associated with a solar are, as is often the case, the are component of the irradiance light curve in the cooler coronal emission can be isolated and removed using simultaneous measurements of warmer coronal lines. We apply this technique to 37dimming events identified during two separate two-week periods in 2011, plus an event on 2010 August 7 analyzed in a previous paper, to parameterize dimming in terms of depth and slope. We provide statistics on which combination of wavelengths worked best for the flare-removal method, describe the fitting methods applied to the dimming light curves, and compare the dimming parameters with corresponding CME parameters of mass and speed. The best linear relationships found are nu(sub CME) [km/s] approx. equals 2.36 x 10 6 [km/%] x s(sub dim) [%/s] m(sub CME) [g] approx. equals 2.59 x 10(exp.15 [g/%] x the square root of d(sub dim) [%].These relationships could be used for space weather operations of estimating CME mass and speed using near-real-time irradiance dimming measurements.

Experiments- Skylab General (Apollo Telescope Mount) S082

NASA Image and Video Library

2013-10-23

S74-15583 (July 1973) --- A huge solar eruption can be seen in this Spectroheliogram obtained during the Skylab 3 mission by the Extreme Ultraviolet Spectrograph/Spectroheliograph SO82A Experiment aboard the Skylab space station in Earth orbit. SO82 is one of the Apollo Telescope Mount experiments. The SO82 "A" instrument covers the wavelength region from 150-650 angstroms (EUV regions). The magnitude of the eruption can be visualized by comparing it with the small white dot that represents the size of Earth. This photograph reveals for the first time that helium erupting from the sun can stay together to altitudes of up to 500,000 miles. After being ejected from the sun, the gas clouds seem to have come to a standstill, as though blocked by an unseen wall. Some materials appear to have been directed back toward the sun as a rain, distinguished by fine threads. At present it is a challenge to explain this mystery--what forces expelled these huge clouds, then blocked its further progress, yet allowed the cloud to maintain its threads. Both magnetic fields and gravity must play a part, but these curious forms seem to defy explanation based on magnetic and gravitational fields alone. The EUV spectroheliograph was designed and constructed by the U.S. Naval Research Laboratory and the Ball Brothers Research Corporation under the direction of Dr. R. Tousey, the principal investigator for this NASA experiment. On the left may be seen the sun's image in emission from iron atoms which have lost 14 electrons by collision in the sun's million-degree coronal plasma gas. Photo credit: NASA

Observations of decay-less low-amplitude kink oscillations of EUV coronal loops

NASA Astrophysics Data System (ADS)

Nisticò, Giuseppe; Nakariakov, Valery; Anfinogentov, Sergey

The high spatial and temporal resolution observations at Extreme Ultra-Violet (EUV) wavelengths from the Atmospheric Imaging Assembly (AIA) of the Solar Dynamics Observatory (SDO) reveal new features in kink oscillations of coronal loops. We show that, in addition to the well-known rapidly decaying oscillations, a new type of kink waves is present, characterized by low-amplitude and undamped oscillations, that we define as decay-less. Typical periods range from 2.5 to 12 min in both regimes and are different for different loops, increasing with the loop length. Estimates of the loop lengths are supported by three dimensional reconstruction of the loop geometry. The amplitude for the decay-less regime is about 1 Mm, close to the spatial resolution of the AIA instruments. The oscillation phase, measured by the cross-correlation method, is found to be constant along each analysed loop, and the spatial structure of the phase of the oscillations corresponds to the fundamental standing kink mode. We show that the observed behaviours are consistent with the empirical model of a damped linear oscillator excited by a continuous low-amplitude harmonic driver, in addition to an eventual impulsive high-amplitude driver. The observed life-time of the oscillations is likely to be determined by the observational conditions rather than any physical damping. However, the balance between the driving and damping is a necessary ingredient of this model. The properties of this type of transverse oscillations make them interesting object of study in the framework of resonant absorption theory and coronal heating process.

FLARE-GENERATED SHOCK WAVE PROPAGATION THROUGH SOLAR CORONAL ARCADE LOOPS AND AN ASSOCIATED TYPE II RADIO BURST

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kumar, Pankaj; Cho, Kyung-Suk; Innes, D. E., E-mail: pankaj@kasi.re.kr

2016-09-01

This paper presents multiwavelength observations of a flare-generated type II radio burst. The kinematics of the shock derived from the type II burst closely match a fast extreme ultraviolet (EUV) wave seen propagating through coronal arcade loops. The EUV wave was closely associated with an impulsive M1.0 flare without a related coronal mass ejection, and was triggered at one of the footpoints of the arcade loops in active region NOAA 12035. It was initially observed in the 335 Å images from the Atmospheric Image Assembly with a speed of ∼800 km s{sup −1} and it accelerated to ∼1490 km s{supmore » −1} after passing through the arcade loops. A fan–spine magnetic topology was revealed at the flare site. A small, confined filament eruption (∼340 km s{sup −1}) was also observed moving in the opposite direction to the EUV wave. We suggest that breakout reconnection in the fan–spine topology triggered the flare and associated EUV wave that propagated as a fast shock through the arcade loops.« less

Studying electron-PAG interactions using electron-induced fluorescence

NASA Astrophysics Data System (ADS)

Narasimhan, Amrit; Grzeskowiak, Steven; Ostrander, Jonathan; Schad, Jonathon; Rebeyev, Eliran; Neisser, Mark; Ocola, Leonidas E.; Denbeaux, Gregory; Brainard, Robert L.

2016-03-01

In extreme ultraviolet (EUV) lithography, 92 eV photons are used to expose photoresists. Typical EUV resists are organic-based and chemically amplified using photoacid generators (PAGs). Upon exposure, PAGs produce acids which catalyze reactions that result in changes in solubility. In EUV lithography, photo- and secondary electrons (energies of 10- 80 eV) play a large role in PAG acid-production. Several mechanisms for electron-PAG interactions (e.g. electron trapping, and hole-initiated chemistry) have been proposed. The aim of this study is to explore another mechanism - internal excitation - in which a bound PAG electron can be excited by receiving energy from another energetic electron, causing a reaction that produces acid. This paper explores the mechanism of internal excitation through the analogous process of electron-induced fluorescence, in which an electron loses energy by transferring that energy to a molecule and that molecule emits a photon rather than decomposing. We will show and quantify electron-induced fluorescence of several fluorophores in polymer films to mimic resist materials, and use this information to refine our proposed mechanism. Relationships between the molecular structure of fluorophores and fluorescent quantum yield may aid in the development of novel PAGs for EUV lithography.

Relation between electron- and photon-caused oxidation in EUVL optics

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Steinhaus, Charles A.; Meeker, Donald E.; Clift, W. Miles; Klebanoff, Leonard E.; Bajt, Sasa

2003-06-01

Extreme ultraviolet (EUV)-induced oxidation of silicon-capped, [Mo/Si] multilayer mirrors in the presence of background levels of water vapor is recognized as one of the most serious threats to multilayer lifetime since oxidation of the top silicon layer is an irreversible process. The current work directly compares the oxidation on a silicon-capped, [Mo/Si] multilayers caused by EUV photons with the oxidation caused by 1 keV electrons in the presence of the same water vapor environment (2 x 10-6 Torr). Similar, 4 nm, silicon-capped, [Mo/Si] multilayer mirror samples were exposed to photons (95.3 eV) + water vapor at the ALS, LBNL, and also to a 1 keV electron beam + water vapor in separate experimental systems. The results of this work showed that the oxidation produced by ~1 µA of e-beam current was found to be equivalent to that produced by ~1 mW of EUV exposure. These results will help allow the use of 1 keV electrons beams, instead of EUV photons, to perform environmental testing of multilayers in a low-pressure water environment and to more accurately determine projected mirror lifetimes based on the electron beam exposures.

Relation between electron- and photon-caused oxidation in EUVL optics

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Steinhaus, Charles A.; Meeker, Donald E.; Clift, W. Miles; Klebanoff, Leonard E.; Bajt, Sasa

2003-06-01

Extreme ultraviolet (EUV)-induced oxidation of silicon-capped, [Mo/Si] multilayer mirrors in the presence of background levels of water vapor is recognized as one of the most serious threats to multilayer lifetime since oxidation of the top silicon layer is an irreversible process. The current work directly compares the oxidation on a silicon-capped, [Mo/Si] multilayers caused by EUV photons with the oxidation caused by 1 keV electrons in the presence of the same water vapor environment (2 x 10-6 Torr). Similar, 4 nm, silicon-capped, [Mo/Si] multilayer mirror samples were exposed to photons (95.3 eV) + water vapor at the ALS, LBNL, and also to a 1 keV electron beam + water vapor in separate experimental systems. The results of this work showed that the oxidation produced by ~1 ´A of e-beam current was found to be equivalent to that produced by ~1 mW of EUV exposure. These results will help allow the use of 1 keV electrons beams, instead of EUV photons, to perform environmental testing of multilayers in a low-pressure water environment and to more accurately determine projected mirror lifetimes based on the electron beam exposures.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bučík, Radoslav; Innes, Davina E.; Mason, Glenn M.

Small, {sup 3}He-rich solar energetic particle (SEP) events have been commonly associated with extreme-ultraviolet (EUV) jets and narrow coronal mass ejections (CMEs) that are believed to be the signatures of magnetic reconnection, involving field lines open to interplanetary space. The elemental and isotopic fractionation in these events are thought to be caused by processes confined to the flare sites. In this study, we identify 32 {sup 3}He-rich SEP events observed by the Advanced Composition Explorer , near the Earth, during the solar minimum period 2007–2010, and we examine their solar sources with the high resolution Solar Terrestrial Relations Observatory (more » STEREO ) EUV images. Leading the Earth, STEREO -A has provided, for the first time, a direct view on {sup 3}He-rich flares, which are generally located on the Sun’s western hemisphere. Surprisingly, we find that about half of the {sup 3}He-rich SEP events in this survey are associated with large-scale EUV coronal waves. An examination of the wave front propagation, the source-flare distribution, and the coronal magnetic field connections suggests that the EUV waves may affect the injection of {sup 3}He-rich SEPs into interplanetary space.« less

A FAST PROPAGATING EXTREME-ULTRAVIOLET WAVE ASSOCIATED WITH A MINI-FILAMENT ERUPTION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zheng Ruisheng; Jiang Yunchun; Yang Jiayan

The fast extreme-ultraviolet (EUV) waves (>1000 km s{sup -1}) in the solar corona were very rare in the past. Taking advantage of the high temporal and spatial resolution of the Solar Dynamics Observatory observations, we present a fast EUV wave associated with a mini-filament eruption, a C1.0 flare, and a coronal mass ejection (CME) on 2011 September 30. The event took place at the periphery between two active regions (ARs). The mini-filament rapidly erupted as a blowout jet associated with a flare and a CME. The CME front was likely developed from the large-scale overlying loops. The wave onset wasmore » nearly simultaneous with the start of the jet and the flare. The wave departed far from the flare center and showed a close location relative to the rapid jet. The wave had an initial speed of about 1100 km s{sup -1} and a slight deceleration in the last phase, and the velocity decreased to about 500 km s{sup -1}. The wave propagated in a narrow angle extent, likely to avoid the ARs on both sides. All the results provide evidence that the fast EUV wave was a fast-mode MHD wave. The wave resisted being driven by the CME, because it opened up the large-scale loops and its front likely formed later than the wave. The wave was most likely triggered by the jet, due to their close timing and location relations.« less

Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity

NASA Astrophysics Data System (ADS)

Kim, In-Seon; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

2015-07-01

The usage of the extreme ultraviolet (EUV) pellicle is regarded as the solution for defect control since it can protect the mask from airborne debris. However some obstacles disrupt real-application of the pellicle such as structural weakness, thermal damage and so on. For these reasons, flawless fabrication of the pellicle is impossible. In this paper, we discuss the influence of deformed pellicle in terms of non-uniform intensity distribution and critical dimension (CD) uniformity. It was found that non-uniform intensity distribution is proportional to local tilt angle of pellicle and CD variation was linearly proportional to transmission difference. When we consider the 16 nm line and space pattern with dipole illumination (σc=0.8, σr=0.1, NA=0.33), the transmission difference (max-min) of 0.7 % causes 0.1 nm CD uniformity. Influence of gravity caused deflection to the aerial image is small enough to ignore. CD uniformity is less than 0.1 nm even for the current gap of 2 mm between mask and pellicle. However, heat caused EUV pellicle wrinkle might cause serious image distortion because a wrinkle of EUV pellicle causes a transmission loss variation as well as CD non-uniformity. In conclusion, local angle of a wrinkle, not a period or an amplitude of a wrinkle is a main factor to CD uniformity, and local angle of less than ~270 mrad is needed to achieve 0.1 nm CD uniformity with 16 nm L/S pattern.

Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Grunow, Philip A.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.

2001-08-01

Carbon deposition and removal experiments on Mo/Si multilayer mirror (MLM) samples were performed using extreme ultraviolet (EUV) light on Beamline 12.0.1.2 of the Advanced Light Source, Lawrence Berkeley National Laboratory (LBNL). Carbon (C) was deposited onto Mo/Si multilayer mirror (MLM) samples when hydrocarbon vapors where intentionally introduced into the MLM test chamber in the presence of EUV at 13.44 nm (92.3eV). The carbon deposits so formed were removed by molecular oxygen + EUV. The MLM reflectivities and photoemission were measured in-situ during these carbon deposition and cleaning procedures. Auger Electron Spectroscopy (AES) sputter-through profiling of the samples was performed after experimental runs to help determine C layer thickness and the near-surface compositional-depth profiles of all samples studied. EUV powers were varied from ~0.2mW/mm2 to 3mW/mm2(at 13.44 nm) during both deposition and cleaning experiments and the oxygen pressure ranged from ~5x10-5 to 5x10-4 Torr during the cleaning experiments. C deposition rates as high as ~8nm/hr were observed, while cleaning rates as high as ~5nm/hr could be achieved when the highest oxygen pressure were used. A limited set of experiments involving intentional oxygen-only exposure of the MLM samples showed that slow oxidation of the MLM surface could occur.

Probing the Quiet Solar Atmosphere from the Photosphere to the Corona

NASA Astrophysics Data System (ADS)

Kontogiannis, Ioannis; Gontikakis, Costis; Tsiropoula, Georgia; Tziotziou, Kostas

2018-04-01

We investigate the morphology and temporal variability of a quiet-Sun network region in different solar layers. The emission in several extreme ultraviolet (EUV) spectral lines through both raster and slot time-series, recorded by the EUV Imaging Spectrometer (EIS) on board the Hinode spacecraft is studied along with Hα observations and high-resolution spectropolarimetric observations of the photospheric magnetic field. The photospheric magnetic field is extrapolated up to the corona, showing a multitude of large- and small-scale structures. We show for the first time that the smallest magnetic structures at both the network and internetwork contribute significantly to the emission in EUV lines, with temperatures ranging from 8× 104 K to 6× 105 K. Two components of transition region emission are present, one associated with small-scale loops that do not reach coronal temperatures, and another component that acts as an interface between coronal and chromospheric plasma. Both components are associated with persistent chromospheric structures. The temporal variability of the EUV intensity at the network region is also associated with chromospheric motions, pointing to a connection between transition region and chromospheric features. Intensity enhancements in the EUV transition region lines are preferentially produced by Hα upflows. Examination of two individual chromospheric jets shows that their evolution is associated with intensity variations in transition region and coronal temperatures.

Investigation of contamination of thin-film aluminum filters by MMH-NTO plumes exposed to UV radiation

NASA Astrophysics Data System (ADS)

Gupta, Vaibhav; Wieman, Seth; Didkovsky, Leonid; Haiges, Ralf; Yao, Yuhan; Wu, Wei; Gruntman, Mike; Erwin, Dan

2015-09-01

Thin-film aluminum filters degrade in space with significant reduction of their Extreme Ultraviolet (EUV) transmission. This degradation was observed on the EUV Spectrophotometer (ESP) onboard the Solar Dynamics Observatory's EUV Variability Experiment and the Solar EUV Monitor (SEM) onboard the Solar and Heliospheric Observatory. One of the possible causes for deterioration of such filters over time is contamination of their surfaces from plumes coming from periodic firing of their satellite's Monomethylhydrazine (MMH) - Nitrogen Tetroxide (NTO) thrusters. When adsorbed by the filters, the contaminant molecules are exposed to solar irradiance and could lead to two possible compositions. First, they could get polymerized leading to a permanent hydrocarbon layer buildup on the filter's surface. Second, they could accelerate and increase the depth of oxidation into filter's bulk aluminum material. To study the phenomena we experimentally replicate contamination of such filters in a simulated environment by MMH-NTO plumes. We apply, Scanning Electron Microscopy and X-Ray photoelectron spectroscopy to characterize the physical and the chemical changes on these contaminated sample filter surfaces. In addition, we present our first analysis of the effects of additional protective layer coatings based on self-assembled carbon monolayers for aluminum filters. This coverage is expected to significantly decrease their susceptibility to contamination and reduce the overall degradation of filter-based EUV instruments over their mission life.

Visible and near-ultraviolet spectra of low-pressure rare-gas microwave discharges

NASA Technical Reports Server (NTRS)

Campbell, J. P.; Spisz, E. W.; Bowman, R. L.

1971-01-01

The spectral emission characteristics of three commercial low pressure rare gas discharge lamps wire obtained in the near ultraviolet and visible wavelength range. All three lamps show a definite continuum over the entire wavelength range from 0.185 to 0.6 micrometers. Considerable line emission is superimposed on much of the continuum for wavelengths greater than 0.35 micrometers. These sources were used to make transmittance measurements on quartz samples in the near ultraviolet wavelength range.

Solar coronal temperature diagnostics using emission line from multiple stages of ionization of iron

NASA Technical Reports Server (NTRS)

Brosius, Jeffrey W.; Davila, Joseph M.; Thomas, Roger J.; Thompson, William T.

1994-01-01

We obtained spatially resolved extreme-ultraviolet (EUV) spectra of AR 6615 on 1991 May 7 with NASA/ Goddard Space Flight Center's Solar EUV Rocket Telescope and Spectrograph (SERTS). Included are emission lines from four different stages of ionization of iron: Fe(+15) lambda 335 A, Fe(+14) lambda 327 A, Fe(+13) lambda 334 A, and Fe(+12) lambda 348 A. Using intensity ratios from among these lines, we have calculated the active region coronal temperature along the Solar Extreme Ultraviolet Telescope and Spectrograph (SERTS) slit. Temperatures derived from line ratios which incorporate adjacent stages of ionization are most sensitive to measurement uncertainties and yield the largest scatter. Temperatures derived from line ratios which incorporate nonadjacent stages of ionization are less sensitive to measurement uncertainties and yield little scatter. The active region temperature derived from these latter ratios has an average value of 2.54 x 10(exp 6) K, with a standard deviation approximately 0.12 x 10(exp 6) K, and shows no significant variation with position along the slit.

Remote sensing of the low-latitude daytime ionosphere: ICON simulations and retrievals

NASA Astrophysics Data System (ADS)

Stephan, A. W.; Korpela, E.; England, S.; Immel, T. J.

2016-12-01

The Ionospheric Connection Explorer (ICON) sensor suite includes a spectrograph that will provide altitude profiles of the OII 61.7 and 83.4 nm airglow features, from which the daytime F-region ionosphere can be inferred. To make the connection between these extreme-ultraviolet (EUV) airglow emissions and ionospheric densities, ICON will use a method that has matured significantly in the last decade with the analysis of data from the Remote Atmospheric and Ionospheric Detection System (RAIDS) on the International Space Station, and the Special Sensor Ultraviolet Limb Imager (SSULI) sensors on the Defense Meteorological Satellite Program (DMSP) series of satellites. We will present end-to-end simulations of ICON EUV airglow measurements and data inversion for the expected viewing geometry and sensor capabilities, including noise. While we will focus on the performance of the algorithm for ICON within the context of the current state of knowledge, we will also identify areas where fundamental information can be gained from the high-sensitivity ICON measurements that could be used as feedback to directly improve the overall performance of the algorithm itself.

Telescience - Concepts And Contributions To The Extreme Ultraviolet Explorer Mission

NASA Astrophysics Data System (ADS)

Marchant, Will; Dobson, Carl; Chakrabarti, Supriya; Malina, Roger F.

1987-10-01

A goal of the telescience concept is to allow scientists to use remotely located instruments as they would in their laboratory. Another goal is to increase reliability and scientific return of these instruments. In this paper we discuss the role of transparent software tools in development, integration, and postlaunch environments to achieve hands on access to the instrument. The use of transparent tools helps to reduce the parallel development of capability and to assure that valuable pre-launch experience is not lost in the operations phase. We also discuss the use of simulation as a rapid prototyping technique. Rapid prototyping provides a cost-effective means of using an iterative approach to instrument design. By allowing inexpensive produc-tion of testbeds, scientists can quickly tune the instrument to produce the desired scientific data. Using portions of the Extreme Ultraviolet Explorer (EUVE) system, we examine some of the results of preliminary tests in the use of simulation and tran-sparent tools. Additionally, we discuss our efforts to upgrade our software "EUVE electronics" simulator to emulate a full instrument, and give the pros and cons of the simulation facilities we have developed.

Thermal conduction properties of Mo/Si multilayers for extreme ultraviolet optics

NASA Astrophysics Data System (ADS)

Bozorg-Grayeli, Elah; Li, Zijian; Asheghi, Mehdi; Delgado, Gil; Pokrovsky, Alexander; Panzer, Matthew; Wack, Daniel; Goodson, Kenneth E.

2012-10-01

Extreme ultraviolet (EUV) lithography requires nanostructured optical components, whose reliability can be influenced by radiation absorption and thermal conduction. Thermal conduction analysis is complicated by sub-continuum electron and phonon transport and the lack of thermal property data. This paper measures and interprets thermal property data, and their evolution due to heating exposure, for Mo/Si EUV mirrors with 6.9 nm period and Mo/Si thickness ratios of 0.4/0.6 and 0.6/0.4. We use time-domain thermoreflectance and the 3ω method to estimate the thermal resistance between the Ru capping layer and the Mo/Si multilayers (RRu-Mo/Si = 1.5 m2 K GW-1), as well as the out-of-plane thermal conductivity (kMo/Si 1.1 W m-1 K-1) and thermal anisotropy (η = 13). This work also reports the impact of annealing on thermal conduction in a co-deposited MoSi2 layer, increasing the thermal conductivity from 1.7 W m-1 K-1 in the amorphous phase to 2.8 W m-1 K-1 in the crystalline phase.

Energy transport in short-pulse-laser-heated targets measured using extreme ultraviolet laser backlighting.

PubMed

Wilson, L A; Tallents, G J; Pasley, J; Whittaker, D S; Rose, S J; Guilbaud, O; Cassou, K; Kazamias, S; Daboussi, S; Pittman, M; Delmas, O; Demailly, J; Neveu, O; Ros, D

2012-08-01

The accurate characterization of thermal electron transport and the determination of heating by suprathermal electrons in laser driven solid targets are both issues of great importance to the current experiments being performed at the National Ignition Facility, which aims to achieve thermonuclear fusion ignition using lasers. Ionization, induced by electronic heat conduction, can cause the opacity of a material to drop significantly once bound-free photoionization is no longer energetically possible. We show that this drop in opacity enables measurements of the transmission of extreme ultraviolet (EUV) laser pulses at 13.9 nm to act as a signature of the heating of thin (50 nm) iron layers with a 50-nm thick parylene-N (CH) overlay irradiated by 35-fs pulses at irradiance 3×10(16) Wcm(-2). Comparing EUV transmission measurements at different times after irradiation to fluid code simulations shows that the target is instantaneously heated by hot electrons (with approximately 10% of the laser energy), followed by thermal conduction with a flux limiter of ≈0.05.

The XUV environments of exoplanets from Jupiter-size to super-Earth

NASA Astrophysics Data System (ADS)

King, George W.; Wheatley, Peter J.; Salz, Michael; Bourrier, Vincent; Czesla, Stefan; Ehrenreich, David; Kirk, James; Lecavelier des Etangs, Alain; Louden, Tom; Schmitt, Jürgen; Schneider, P. Christian

2018-07-01

Planets that reside close-in to their host star are subject to intense high-energy irradiation. Extreme-ultraviolet (EUV) and X-ray radiation (together, XUV) is thought to drive mass-loss from planets with volatile envelopes. We present XMM-Newton observations of six nearby stars hosting transiting planets in tight orbits (with orbital period, Porb < 10 d), wherein we characterize the XUV emission from the stars and subsequent irradiation levels at the planets. In order to reconstruct the unobservable EUV emission, we derive a new set of relations from Solar TIMED/SEE data that are applicable to the standard bands of the current generation of X-ray instruments. From our sample, WASP-80b and HD 149026b experience the highest irradiation level, but HAT-P-11b is probably the best candidate for Ly α evaporation investigations because of the system's proximity to the Solar system. The four smallest planets have likely lost a greater percentage of their mass over their lives than their larger counterparts. We also detect the transit of WASP-80b in the near-ultraviolet with the optical monitor on XMM-Newton.

The XUV environments of exoplanets from Jupiter-size to super-Earth

NASA Astrophysics Data System (ADS)

King, George W.; Wheatley, Peter J.; Salz, Michael; Bourrier, Vincent; Czesla, Stefan; Ehrenreich, David; Kirk, James; Lecavelier des Etangs, Alain; Louden, Tom; Schmitt, Jürgen; Schneider, P. Christian

2018-05-01

Planets that reside close-in to their host star are subject to intense high-energy irradiation. Extreme-ultraviolet (EUV) and X-ray radiation (together, XUV) is thought to drive mass loss from planets with volatile envelopes. We present XMM-Newton observations of six nearby stars hosting transiting planets in tight orbits (with orbital period, Porb < 10 d), wherein we characterise the XUV emission from the stars and subsequent irradiation levels at the planets. In order to reconstruct the unobservable EUV emission, we derive a new set of relations from Solar TIMED/SEE data that are applicable to the standard bands of the current generation of X-ray instruments. From our sample, WASP-80b and HD 149026b experience the highest irradiation level, but HAT-P-11b is probably the best candidate for Ly α evaporation investigations because of the system's proximity to the Solar System. The four smallest planets have likely lost a greater percentage of their mass over their lives than their larger counterparts. We also detect the transit of WASP-80b in the near ultraviolet with the Optical Monitor on XMM-Newton

The Berkeley extreme ultraviolet calibration facility

NASA Technical Reports Server (NTRS)

Welsh, Barry Y.; Jelinsky, Patrick; Malina, Roger F.

1988-01-01

The vacuum calibration facilities of the Space Sciences Laboratory, University of California at Berkeley are designed for the calibration and testing of EUV and FUV spaceborne instrumentation (spectral range 44-2500 A). The facility includes one large cylindrical vacuum chamber (3 x 5 m) containing two EUV collimators, and it is equipped with a 4-axis manipulator of angular-control resolution 1 arcsec for payloads weighing up to 500 kg. In addition, two smaller cylindrical chambers, each 0.9 x 1.2 m, are available for vacuum and thermal testing of UV detectors, filters, and space electronics hardware. All three chambers open into class-10,000 clean rooms, and all calibrations are referred to NBS secondary standards.

SEMATECH EUVL mask program status

NASA Astrophysics Data System (ADS)

Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

2009-04-01

As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been made but a continued collaborative effort will be needed along with timely infrastructure investments to meet these challenging goals.

Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems

NASA Astrophysics Data System (ADS)

Brux, O.; van der Walle, P.; van der Donck, J. C. J.; Dress, P.

2011-11-01

Extreme Ultraviolet Lithography (EUVL) is the most promising solution for technology nodes 16nm (hp) and below. However, several unique EUV mask challenges must be resolved for a successful launch of the technology into the market. Uncontrolled introduction of particles and/or contamination into the EUV scanner significantly increases the risk for device yield loss and potentially scanner down-time. With the absence of a pellicle to protect the surface of the EUV mask, a zero particle adder regime between final clean and the point-of-exposure is critical for the active areas of the mask. A Dual Pod concept for handling EUV masks had been proposed by the industry as means to minimize the risk of mask contamination during transport and storage. SuSS-HamaTech introduces MaskTrackPro InSync as a fully automated solution for the handling of EUV masks in and out of this Dual Pod System and therefore constitutes an interface between various tools inside the Fab. The intrinsic cleanliness of each individual handling and storage step of the inner shell (EIP) of this Dual Pod and the EUV mask inside the InSync Tool has been investigated to confirm the capability for minimizing the risk of cross-contamination. An Entegris Dual Pod EUV-1000A-A110 has been used for the qualification. The particle detection for the qualification procedure was executed with the TNO's RapidNano Particle Scanner, qualified for particle sizes down to 50nm (PSL equivalent). It has been shown that the target specification of < 2 particles @ 60nm per 25 cycles has been achieved. In case where added particles were measured, the EIP has been identified as a potential root cause for Ni particle generation. Any direct Ni-Al contact has to be avoided to mitigate the risk of material abrasion.

Solar Coronal Jets Extending to High Altitudes Observed during the 2017 August 21 Total Eclipse

NASA Astrophysics Data System (ADS)

Hanaoka, Yoichiro; Hasuo, Ryuichi; Hirose, Tsukasa; Ikeda, Akiko C.; Ishibashi, Tsutomu; Manago, Norihiro; Masuda, Yukio; Morita, Sakuhiro; Nakazawa, Jun; Ohgoe, Osamu; Sakai, Yoshiaki; Sasaki, Kazuhiro; Takahashi, Koichi; Toi, Toshiyuki

2018-06-01

Coronal jets, which extend from the solar surface to beyond 2 R ⊙, were observed in the polar coronal hole regions during the total solar eclipse on 2017 August 21. In a time-series of white-light images of the corona spanning 70 minutes taken with our multi-site observations of this eclipse, six jets were found as narrow structures upwardly ejected with an apparent speed of about 450 km s‑1 in polar plumes. On the other hand, extreme-ultraviolet (EUV) images taken with the Atmospheric Image Assembly of the Solar Dynamics Observatory show that all of the eclipse jets were preceded by EUV jets. Conversely, all the EUV jets whose brightnesses are comparable to ordinary soft X-ray jets and that occurred in the polar regions near the eclipse period, were observed as eclipse jets. These results suggest that ordinary polar jets generally reach high altitudes and escape from the Sun as part of the solar wind.

Driving down defect density in composite EUV patterning film stacks

NASA Astrophysics Data System (ADS)

Meli, Luciana; Petrillo, Karen; De Silva, Anuja; Arnold, John; Felix, Nelson; Johnson, Richard; Murray, Cody; Hubbard, Alex; Durrant, Danielle; Hontake, Koichi; Huli, Lior; Lemley, Corey; Hetzer, Dave; Kawakami, Shinichiro; Matsunaga, Koichi

2017-03-01

Extreme ultraviolet lithography (EUVL) technology is one of the leading candidates for enabling the next generation devices, for 7nm node and beyond. As the technology matures, further improvement is required in the area of blanket film defectivity, pattern defectivity, CD uniformity, and LWR/LER. As EUV pitch scaling approaches sub 20 nm, new techniques and methods must be developed to reduce the overall defectivity, mitigate pattern collapse and eliminate film related defect. IBM Corporation and Tokyo Electron Limited (TELTM) are continuously collaborating to develop manufacturing quality processes for EUVL. In this paper, we review key defectivity learning required to enable 7nm node and beyond technology. We will describe ongoing progress in addressing these challenges through track-based processes (coating, developer, baking), highlighting the limitations of common defect detection strategies and outlining methodologies necessary for accurate characterization and mitigation of blanket defectivity in EUV patterning stacks. We will further discuss defects related to pattern collapse and thinning of underlayer films.

EUV patterning improvement toward high-volume manufacturing

NASA Astrophysics Data System (ADS)

Kuwahara, Yuhei; Matsunaga, Koichi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Anne-Marie

2015-03-01

Extreme ultraviolet lithography (EUVL) technology is a promising candidate for a semiconductor process for 18nm half pitch and beyond. So far, the studies of EUV for manufacturability have been focused on particular aspects. It still requires fine resolution, uniform and smooth patterns, and low defectivity, not only after lithography but also after the etch process. Tokyo Electron Limited and imec are continuously collaborating to improve manufacturing quality of the process of record (POR) on a CLEAN TRACKTM LITHIUS ProTMZ-EUV. This next generation coating/developing system has been upgraded with defectivity reduction enhancements which are applied along with TELTM best known methods. We have evaluated process defectivity post lithography and post etch. Apart from defectivity, FIRMTM rinse material and application compatibility with sub 18nm patterning is improved to prevent line pattern collapse and increase process window on next generation resist materials. This paper reports on the progress of defectivity and patterning performance optimization towards the NXE:3300 POR.

Plasma Surface Interactions Common to Advanced Fusion Wall Materials and EUV Lithography - Lithium and Tin

NASA Astrophysics Data System (ADS)

Ruzic, D. N.; Alman, D. A.; Jurczyk, B. E.; Stubbers, R.; Coventry, M. D.; Neumann, M. J.; Olczak, W.; Qiu, H.

2004-09-01

Advanced plasma facing components (PFCs) are needed to protect walls in future high power fusion devices. In the semiconductor industry, extreme ultraviolet (EUV) sources are needed for next generation lithography. Lithium and tin are candidate materials in both areas, with liquid Li and Sn plasma material interactions being critical. The Plasma Material Interaction Group at the University of Illinois is leveraging liquid metal experimental and computational facilities to benefit both fields. The Ion surface InterAction eXperiment (IIAX) has measured liquid Li and Sn sputtering, showing an enhancement in erosion with temperature for light ion bombardment. Surface Cleaning of Optics by Plasma Exposure (SCOPE) measures erosion and damage of EUV mirror samples, and tests cleaning recipes with a helicon plasma. The Flowing LIquid surface Retention Experiment (FLIRE) measures the He and H retention in flowing liquid metals, with retention coefficients varying between 0.001 at 500 eV to 0.01 at 4000 eV.

A battery power model for the EUVE spacecraft

NASA Technical Reports Server (NTRS)

Yen, Wen L.; Littlefield, Ronald G.; Mclean, David R.; Tuchman, Alan; Broseghini, Todd A.; Page, Brenda J.

1993-01-01

This paper describes a battery power model that has been developed to simulate and predict the behavior of the 50 ampere-hour nickel-cadmium battery that supports the Extreme Ultraviolet Explorer (EUVE) spacecraft in its low Earth orbit. First, for given orbit, attitude, solar array panel and spacecraft load data, the model calculates minute-by-minute values for the net power available for charging the battery for a user-specified time period (usually about two weeks). Next, the model is used to calculate minute-by-minute values for the battery voltage, current and state-of-charge for the time period. The model's calculations are explained for its three phases: sunrise charging phase, constant voltage phase, and discharge phase. A comparison of predicted model values for voltage, current and state-of-charge with telemetry data for a complete charge-discharge cycle shows good correlation. This C-based computer model will be used by the EUVE Flight Operations Team for various 'what-if' scheduling analyses.

Tomographic reconstruction of circularly polarized high-harmonic fields: 3D attosecond metrology

PubMed Central

Chen, Cong; Tao, Zhensheng; Hernández-García, Carlos; Matyba, Piotr; Carr, Adra; Knut, Ronny; Kfir, Ofer; Zusin, Dimitry; Gentry, Christian; Grychtol, Patrik; Cohen, Oren; Plaja, Luis; Becker, Andreas; Jaron-Becker, Agnieszka; Kapteyn, Henry; Murnane, Margaret

2016-01-01

Bright, circularly polarized, extreme ultraviolet (EUV) and soft x-ray high-harmonic beams can now be produced using counter-rotating circularly polarized driving laser fields. Although the resulting circularly polarized harmonics consist of relatively simple pairs of peaks in the spectral domain, in the time domain, the field is predicted to emerge as a complex series of rotating linearly polarized bursts, varying rapidly in amplitude, frequency, and polarization. We extend attosecond metrology techniques to circularly polarized light by simultaneously irradiating a copper surface with circularly polarized high-harmonic and linearly polarized infrared laser fields. The resulting temporal modulation of the photoelectron spectra carries essential phase information about the EUV field. Utilizing the polarization selectivity of the solid surface and by rotating the circularly polarized EUV field in space, we fully retrieve the amplitude and phase of the circularly polarized harmonics, allowing us to reconstruct one of the most complex coherent light fields produced to date. PMID:26989782

RE 1016-053 - A pre-cataclysmic binary, and the first extreme ultraviolet and X-ray detections of a DAO white dwarf

NASA Technical Reports Server (NTRS)

Tweedy, R. W.; Holberg, J. B.; Barstow, M. A.; Bergeron, P.; Grauer, A. D.; Liebert, James; Fleming, T. A.

1993-01-01

Photometric observations and analysis of the optical, UV, EUV, and X-ray spectra are presented for the EUV/X-ray source RE 1016-53. Multiwavelength observations of RE 1016-53 point out that it is a precataclysmic binary. Optical spectra exhibit the steep blue continuum and Balmer absorption typical of a hot white dwarf, but there are bright, narrow emission lines of H I, He I, and Ca II superimposed on this. The white dwarf component, with T (eff) = 55,800 +/- 1000 K and log g = 7.81 +/- 0.007, dominates the spectrum from the optical to the EUV/X-ray. An He II 4686 A absorption line suggests that the white dwarf is a hydrogen-helium (DAO) hybrid star. Four of the five precataclysmic binaries with white dwarfs with T(eff) greater than 40,000 K appear to be DAOs. A mass of 0.57 +/- 0.003 solar mass has been derived.

First spectrum of an extra-solar object in the extreme ultraviolet The white dwarf HZ 43

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.; Paresce, F.

1979-01-01

An EUV instrument is described which has been used to carry out a spectroscopic observation of the hot white dwarf HZ 43. The instrument consists of an EUV telescope and spectrometer housed in a sounding-rocket shell 44 cm in diameter and 176 cm in length. It is noted that HZ 43 was successfully observed for 200 sec and that the EUV spectrum was strongly detected from 170 to 400 A. A second-order image was detected beyond 400 A, and a decrement was observed at 200 A, which corresponds to photoelectric absorption of He II. The observed spectrum is shown to be inconsistent with a coronal model. It is concluded that the surface number density of helium relative to hydrogen must be in the range from 0.00001 to 0.0001 and that an upper limit of 4 x 10 to the 17th per sq cm can be placed on the column density of ionized helium in the intervening interstellar medium.

Spectroscopy of Highly Charged Tin Ions for AN Extreme Ultraviolet Light Source for Lithography

NASA Astrophysics Data System (ADS)

Torretti, Francesco; Windberger, Alexander; Ubachs, Wim; Hoekstra, Ronnie; Versolato, Oscar; Ryabtsev, Alexander; Borschevsky, Anastasia; Berengut, Julian; Crespo Lopez-Urrutia, Jose

2017-06-01

Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) light around 13.5 nm in nanolithographic applications. This light is generated primarily by atomic transitions in highly charged tin ions: Sn^{8+}-Sn^{14+}. Due to the electronic configurations of these charge states, thousands of atomic lines emit around 13.5 nm, clustered in a so-called unresolved transition array. As a result, accurate line identification becomes difficult in this regime. Nevertheless, this issue can be circumvented if one turns to the optical: with far fewer atomic states, only tens of transitions take place and the spectra can be resolved with far more ease. We have investigated optical emission lines in an electron-beam-ion-trap (EBIT), where we managed to charge-state resolve the spectra. Based on this technique and on a number of different ab initio techniques for calculating the level structure, the optical spectra could be assigned [1,2]. As a conclusion the assignments of EUV transitions in the literature require corrections. The EUV and optical spectra are measured simultaneously in the controlled conditions of the EBIT as well as in a droplet-based laser-produced plasma source providing information on the contribution of Sn^{q+} charge states to the EUV emission. [1] A. Windberger, F. Torretti, A. Borschevsky, A. Ryabtsev, S. Dobrodey, H. Bekker, E. Eliav, U. Kaldor, W. Ubachs, R. Hoekstra, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Analysis of the fine structure of Sn^{11+} - Sn^{14+} ions by optical spectroscopy in an electron beam ion trap, Phys. Rev. A 94, 012506 (2016). [2] F. Torretti, A. Windberger, A. Ryabtsev, S. Dobrodey, H. Bekker, W. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Optical spectroscopy of complex open 4d-shell ions Sn^{7+} - Sn^{10+}, arXiv:1612.00747

Exploring dynamic events in the solar corona

NASA Astrophysics Data System (ADS)

Downs, Cooper James

With the advent of modern computational technology it is now becoming the norm to employ detailed 3D computer models as empirical tools that directly account for the inhomogeneous nature of the Sun-Heliosphere environment. The key advantage of this approach lies in the ability to compare model results directly to observational data and to use a successful comparison (or lack thereof) to glean information on the underlying physical processes. Using extreme ultraviolet waves (EUV waves) as the overarching scientific driver, we apply this observation modeling approach to study the complex dynamics of the magnetic and thermodynamic structures that are observed in the low solar corona. Representing a highly non-trivial effort, this work includes three main scientific thrusts: an initial modeling effort and two EUV wave case-studies. First we document the development of the new Low Corona (LC) model, a 3D time-dependent thermodynamic magnetohydrodynamic (MHD) model implemented within the Space Weather Modeling Framework (SWMF). Observation synthesis methods are integrated within the LC model, which provides the ability to compare model results directly to EUV imaging observations taken by spacecraft. The new model is then used to explore the dynamic interplay between magnetic structures and thermodynamic energy balance in the corona that is caused by coronal heating mechanisms. With the model development complete, we investigate the nature of EUV waves in detail through two case-studies. Starting with the 2008 March 25 event, we conduct a series of numerical simulations that independently vary fundamental parameters thought to govern the physical mechanisms behind EUV waves. Through the subsequent analysis of the 3D data and comparison to observations we find evidence for both wave and non-wave mechanisms contributing to the EUV wave signal. We conclude with a comprehensive observation and modeling analysis of the 2010 June 13 EUV wave event, which was observed by the recently launched Solar Dynamics Observatory. We use a high resolution simulation of the transient to unambiguously characterize the globally propagating front of EUV wave as a fast-mode magnetosonic wave, and use the rich set of observations to place the many other facets of the EUV transient within a unified scenario involving wave and non-wave components.

Distinct EUV minimum of the solar irradiance (16-40 nm) observed by SolACES spectrometers onboard the International Space Station (ISS) in August/September 2009

NASA Astrophysics Data System (ADS)

Nikutowski, B.; Brunner, R.; Erhardt, Ch.; Knecht, St.; Schmidtke, G.

2011-09-01

In the field of terrestrial climatology the continuous monitoring of the solar irradiance with highest possible accuracy is an important goal. SolACES as a part of the ESA mission SOLAR on the ISS is measuring the short-wavelength solar EUV irradiance from 16-150 nm. This data will be made available to the scientific community to investigate the impact of the solar irradiance variability on the Earth's climate as well as the thermospheric/ionospheric interactions that are pursued in the TIGER program. Since the successful launch with the shuttle mission STS-122 on February 7th, 2008, SolACES initially recorded the low EUV irradiance during the extended solar activity minimum. Thereafter it has been observing the EUV irradiance during the increasing solar activity with enhanced intensity and changing spectral composition. SolACES consists of three grazing incidence planar grating spectrometers. In addition there are two three-signal ionisation chambers, each with exchangeable band-pass filters to determine the absolute EUV fluxes repeatedly during the mission. One important problem of space-borne instrumentation recording the solar EUV irradiance is the degradation of the spectrometer sensitivity. The two double ionisation chambers of SolACES, which could be re-filled with three different gases for each recording, allow the recalibration of the efficiencies of the three SolACES spectrometers from time to time.

Ultraviolet Imaging Telescope images of the reflection nebula NGC 7023 - Derivation of ultraviolet scattering properties of dust grains

NASA Technical Reports Server (NTRS)

Witt, Adolf N.; Petersohn, Jens K.; Bohlin, Ralph C.; O'Connell, Robert W.; Roberts, Morton S.; Smith, Andrew M.; Stecher, Theodore P.

1992-01-01

The Ultraviolet Imaging Telescope as part of the Astro-1 mission, was used to obtain high-resolution surface brightness distribution data in six ultraviolet wavelength bands for the bright reflection nebula NGC 7023. From the quantitative comparison of the measured surface brightness gradients ratios of nebular to stellar flux, and detail radial surface brightness profiles with corresponding data from the visible, two major conclusions results: (1) the scattering in the near- and far-ultraviolet in this nebula is more strongly forward-directed than in the visible; (2) the dust albedo in the ultraviolet for wavelengths not less than 140 nm is identical to that in the visible, with the exception of the 220 nm bump in the extinction curve. In the wavelengths region of the bump, the albedo is reduced by 25 to 30 percent in comparison with wavelengths regions both shorter and longer. This lower albedo is expected, if the bump is a pure absorption feature.

Laser plasma cryogenic target on translating substrate for generation of continuously repetitive EUV and soft X-ray pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Amano, Sho

2014-06-15

To generate continuously repetitive EUV and soft X-ray pulses with various wavelengths from laser-produced plasmas, a one-dimensionally translating substrate system with a closed He gas cryostat that can continuously supply various cryogenic targets for ∼10 Hz laser pulses has been developed. The system was successfully operated at a lowest temperature of 15 K and at a maximum up-down speed of 12 mm/s. Solid Ar, Kr, and Xe layers were formed, and their growth rates and the laser crater sizes on them were studied. By optimization of the operational parameters in accordance with our design rule, it was shown that stablemore » output power was achieved continuously from the plasma emission at frequencies of 1–10 Hz. The average soft X-ray and EUV powers obtained were 19 mW at 3.2 nm, 33 mW at 10.0 nm, and 66 mW at 10.8 nm, with 10% bandwidths, from the Ar, Kr, and Xe solid targets, respectively, with a laser power of 1 W. We will be able to achieve higher frequencies using a high beam quality laser that produces smaller craters, and can expect higher powers. Although only Ar, Kr, and Xe gases were tested in this study, the target system achieved a temperature of 15 K and can thus solidify almost all target gases, apart from H and He, and can continuously supply the solid target. The use of various target materials will enable expansion of the EUV and soft X-ray emission wavelength range.« less

Dynamical structure of extreme ultraviolet macrospicules

NASA Technical Reports Server (NTRS)

Karovska, Margarita; Habbal, Shadia Rifai

1994-01-01

We describe the substructures forming the macrospicules and their temporal evolution, as revealed by the application of an image enhancement algorithm to extreme ultraviolet (EUV) observations of macrospicules. The enhanced images uncover, for the first time, the substructures forming the column-like structures within the macrospicules and the low-lying arches at their base. The spatial and temporal evolution of macrospicules clearly show continuous interaction between these substructures with occasional ejection of plasma following a ballistic trajectory. We comment on the importance of these results for planning near future space observations of macrospicules with better temporal and spatial resolution.